Optical aspects of catoptric systems

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CPC
G03F7/70233

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70233Optical aspects of catoptric systems

Industries

Patents Grantslast 30 patents

Information Patent Grant
Spectrometric metrology systems based on multimode interference and...
- Patent number 12,135,505
- Issue date Nov 5, 2024
- ASML Holding N.V.
- Mohamed Swillam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image-forming optical system, exposure apparatus, and device produc...
- Patent number 12,105,428
- Issue date Oct 1, 2024
- Nikon Corporation
- Hideki Komatsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system with an aperture stop
- Patent number 12,105,429
- Issue date Oct 1, 2024
- Carl Zeiss SMT GmbH
- Tanja Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical objective for operation in EUV spectral region
- Patent number 11,934,105
- Issue date Mar 19, 2024
- Nikon Corporation
- Daniel Gene Smith
- G02 - OPTICS
Information Patent Grant
Optical objective for operation in EUV spectral region
- Patent number 11,899,371
- Issue date Feb 13, 2024
- Nikon Corporation
- Daniel Gene Smith
- G02 - OPTICS
Information Patent Grant
UV lithography system
- Patent number 11,561,476
- Issue date Jan 24, 2023
- Kenneth Carlisle Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image-forming optical system, exposure apparatus, and device produc...
- Patent number 11,467,501
- Issue date Oct 11, 2022
- Nikon Corporation
- Hideki Komatsuda
- G02 - OPTICS
Information Patent Grant
Imaging optical unit for EUV microlithography
- Patent number 11,422,470
- Issue date Aug 23, 2022
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system with curved 1d-patterned mask for use in EUV-ex...
- Patent number 11,300,884
- Issue date Apr 12, 2022
- Nikon Corporation
- Daniel Gene Smith
- G02 - OPTICS
Information Patent Grant
Systems and methods using mask pattern measurements performed with...
- Patent number 11,281,093
- Issue date Mar 22, 2022
- Samsung Electronics Co., Ltd.
- Ji Hoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging optical unit for imaging an object field into an image field
- Patent number 11,119,413
- Issue date Sep 14, 2021
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing a mirror as an optical component for an optica...
- Patent number 11,092,897
- Issue date Aug 17, 2021
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Systems and methods using mask pattern measurements performed with...
- Patent number 11,061,322
- Issue date Jul 13, 2021
- Samsung Electronics Co., Ltd.
- Ji Hoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multi-mirror UV-LED optical lithography system
- Patent number 11,042,097
- Issue date Jun 22, 2021
- Soulnano Limited
- Cho Hang Wong
- G02 - OPTICS
Information Patent Grant
Reflective image-forming optical system, exposure apparatus, and de...
- Patent number 10,976,669
- Issue date Apr 13, 2021
- Nikon Corporation
- Yoshio Kawabe
- G02 - OPTICS
Information Patent Grant
Illumination optic for projection lithography
- Patent number 10,928,733
- Issue date Feb 23, 2021
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position measurement of optical elements in a lithographic apparatus
- Patent number 10,908,508
- Issue date Feb 2, 2021
- Carl Zeiss SMT GmbH
- Erik Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image-forming optical system, exposure apparatus, and device produc...
- Patent number 10,866,522
- Issue date Dec 15, 2020
- Nikon Corporation
- Hideki Komatsuda
- G02 - OPTICS
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,684,551
- Issue date Jun 16, 2020
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Imaging optical unit and projection exposure unit including same
- Patent number 10,656,400
- Issue date May 19, 2020
- Carl Zeiss SMT GmbH
- Markus Schwab
- G02 - OPTICS
Information Patent Grant
Metal-compound-removing solvent and method in lithography
- Patent number 10,622,211
- Issue date Apr 14, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Reflective image-forming optical system, exposure apparatus, and de...
- Patent number 10,599,042
- Issue date Mar 24, 2020
- Nikon Corporation
- Yoshio Kawabe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection lens, projection exposure apparatus and projection expos...
- Patent number 10,591,825
- Issue date Mar 17, 2020
- Carl Zeiss SMT GmbH
- Stephan Andre
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and method
- Patent number 10,558,126
- Issue date Feb 11, 2020
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical unit for imaging an object field into an image f...
- Patent number 10,558,026
- Issue date Feb 11, 2020
- Carl Zeiss SMT GmbH
- Markus Schwab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical unit for EUV projection lithography
- Patent number 10,545,323
- Issue date Jan 28, 2020
- Carl Zeiss SMT GmbH
- Markus Schwab
- G02 - OPTICS
Information Patent Grant
Imaging optical unit and projection exposure apparatus including same
- Patent number 10,527,832
- Issue date Jan 7, 2020
- Carl Zeiss SMT GmbH
- Markus Schwab
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Position measurement of optical elements in a lithographic apparatus
- Patent number 10,509,325
- Issue date Dec 17, 2019
- Carl Zeiss SMT GmbH
- Erik Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection optical system, exposure apparatus, and device manufactu...
- Patent number 10,495,978
- Issue date Dec 3, 2019
- Canon Kabushiki Kaisha
- Yasuhito Sasaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging optical system and projection exposure installation for mic...
- Patent number 10,481,500
- Issue date Nov 19, 2019
- Carl Zeiss SMT GmbH
- Hans-Juergen Mann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
EUV LITHOGRAPHY SYSTEM HAVING A GAS-BINDING COMPONENT
- Publication number 20240385541
- Publication date Nov 21, 2024
- Carl Zeiss SMT GMBH
- Wilbert KRUITHOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...
- Publication number 20240302756
- Publication date Sep 12, 2024
- Carl Zeiss SMT GMBH
- Dirk EHM
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC APPARATUS, TEMPERATURE SENSOR, AND FIBER BRAGG GRATING...
- Publication number 20240302753
- Publication date Sep 12, 2024
- ASML Holding N.V.
- Mahesh Upendra AJGAONKAR
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD
- Publication number 20240288777
- Publication date Aug 29, 2024
- Carl Zeiss SMT GMBH
- Stefan Krone
- G02 - OPTICS
Information Patent Application
DEFORMABLE MIRROR SYSTEM
- Publication number 20240280909
- Publication date Aug 22, 2024
- ASML NETHERLANDS B.V.
- Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD
- Publication number 20240280916
- Publication date Aug 22, 2024
- Carl Zeiss SMT GMBH
- Stefan Krone
- G02 - OPTICS
Information Patent Application
METHOD FOR DETERMINING A POSITION OF A MIRROR
- Publication number 20240255319
- Publication date Aug 1, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G01 - MEASURING TESTING
Information Patent Application
EUV ILLUMINATION DEVICE AND METHOD FOR OPERATING A MICROLITHOGRAPHI...
- Publication number 20240248410
- Publication date Jul 25, 2024
- Carl Zeiss SMT GMBH
- Michael Patra
- G02 - OPTICS
Information Patent Application
EUV LITHOGRAPHY SYSTEM COMPRISING A GAS-BINDING COMPONENT IN THE FO...
- Publication number 20240201604
- Publication date Jun 20, 2024
- Carl Zeiss SMT GMBH
- Ralf WICHARD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM AND PROJECTION EXPOSURE APPARATUS
- Publication number 20240184212
- Publication date Jun 6, 2024
- Carl Zeiss SMT GMBH
- Boaz Pnini
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE M...
- Publication number 20240184220
- Publication date Jun 6, 2024
- Gigaphoton Inc.
- Yuichi NISHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT, PROJECTION OPTICAL UNIT AND PROJECTION EXPOSURE AP...
- Publication number 20240176249
- Publication date May 30, 2024
- Carl Zeiss SMT GMBH
- Marwene Nefzi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ASSEMBLY FOR SEPARATING RADIATION IN THE FAR FIELD
- Publication number 20240168392
- Publication date May 23, 2024
- ASML NETHERLANDS B.V.
- Petrus Wilhelmus SMORENBURG
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
IMAGING OPTICAL UNIT
- Publication number 20240103382
- Publication date Mar 28, 2024
- Carl Zeiss SMT GMBH
- Hans-Jürgen Rostalski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD
- Publication number 20230367227
- Publication date Nov 16, 2023
- Carl Zeiss SMT GMBH
- Heiko Feldmann
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM, AND METHOD FOR OPERATING AN OPTICAL SYSTEM
- Publication number 20230324648
- Publication date Oct 12, 2023
- Carl Zeiss SMT GMBH
- Andre Dirauf
- G02 - OPTICS
Information Patent Application
SPECTROMETRIC METROLOGY SYSTEMS BASED ON MULTIMODE INTERFERENCE AND...
- Publication number 20230273531
- Publication date Aug 31, 2023
- ASML Holding N.V.
- Mohamed SWILLAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM, IN PARTICULAR LITHOGRAPHY SYSTEM
- Publication number 20230194994
- Publication date Jun 22, 2023
- Carl Zeiss SMT GMBH
- Tanja Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM WITH AN APERTURE STOP
- Publication number 20230123115
- Publication date Apr 20, 2023
- Carl Zeiss SMT GMBH
- Tanja Mueller
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUC...
- Publication number 20230024028
- Publication date Jan 26, 2023
- Nikon Corporation
- Hideki Komatsuda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UV Lithography System
- Publication number 20230011685
- Publication date Jan 12, 2023
- Kenneth Carlisle Johnson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR ASSEMBLY AND OPTICAL ASSEMBLY COMPRISING SAME
- Publication number 20220187516
- Publication date Jun 16, 2022
- Carl Zeiss SMT GMBH
- Alexandra PAZIDIS
- G02 - OPTICS
Information Patent Application
SYSTEMS AND METHODS USING MASK PATTERN MEASUREMENTS PERFORMED WITH...
- Publication number 20210302828
- Publication date Sep 30, 2021
- Samsung Electronics Co., Ltd.
- Ji Hoon Na
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUC...
- Publication number 20210200100
- Publication date Jul 1, 2021
- Nikon Corporation
- Hideki Komatsuda
- G02 - OPTICS
Information Patent Application
MULTI-MIRROR UV-LED OPTICAL LITHOGRAPHY SYSTEM
- Publication number 20210200103
- Publication date Jul 1, 2021
- Soulnano Limited
- Cho Hang WONG
- G02 - OPTICS
Information Patent Application
POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS
- Publication number 20210149309
- Publication date May 20, 2021
- Carl Zeiss SMT GMBH
- Erik Loopstra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OPTICAL UNIT FOR EUV MICROLITHOGRAPHY
- Publication number 20200348602
- Publication date Nov 5, 2020
- Carl Zeiss SMT GMBH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTIC FOR PROJECTION LITHOGRAPHY
- Publication number 20200348600
- Publication date Nov 5, 2020
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Apparatus, Lithographic Projection Apparatus and Devic...
- Publication number 20200209757
- Publication date Jul 2, 2020
- ASML NETHERLANDS B.V.
- Hans BUTLER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DE...
- Publication number 20200174375
- Publication date Jun 4, 2020
- Nikon Corporation
- Yoshio KAWABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Optical aspects of catoptric systems

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Spectrometric metrology systems based on multimode interference and...

Image-forming optical system, exposure apparatus, and device produc...

Optical system with an aperture stop

Optical objective for operation in EUV spectral region

Optical objective for operation in EUV spectral region

UV lithography system

Image-forming optical system, exposure apparatus, and device produc...

Imaging optical unit for EUV microlithography

Illumination system with curved 1d-patterned mask for use in EUV-ex...

Systems and methods using mask pattern measurements performed with...

Imaging optical unit for imaging an object field into an image field

Method for producing a mirror as an optical component for an optica...

Systems and methods using mask pattern measurements performed with...

Multi-mirror UV-LED optical lithography system

Reflective image-forming optical system, exposure apparatus, and de...

Illumination optic for projection lithography

Position measurement of optical elements in a lithographic apparatus

Image-forming optical system, exposure apparatus, and device produc...

EUV exposure apparatus with reflective elements having reduced infl...

Imaging optical unit and projection exposure unit including same

Metal-compound-removing solvent and method in lithography

Reflective image-forming optical system, exposure apparatus, and de...

Projection lens, projection exposure apparatus and projection expos...

Lithographic apparatus and method

Projection optical unit for imaging an object field into an image f...

Projection optical unit for EUV projection lithography

Imaging optical unit and projection exposure apparatus including same

Position measurement of optical elements in a lithographic apparatus

Projection optical system, exposure apparatus, and device manufactu...

Imaging optical system and projection exposure installation for mic...

Patents Applicationslast 30 patents

EUV LITHOGRAPHY SYSTEM HAVING A GAS-BINDING COMPONENT

METHOD FOR DEPOSITING A COVER LAYER, EUV LITHOGRAPHY SYSTEM AND OPT...

LITHOGRAPHIC APPARATUS, TEMPERATURE SENSOR, AND FIBER BRAGG GRATING...

OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD

DEFORMABLE MIRROR SYSTEM

OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD

METHOD FOR DETERMINING A POSITION OF A MIRROR

EUV ILLUMINATION DEVICE AND METHOD FOR OPERATING A MICROLITHOGRAPHI...

EUV LITHOGRAPHY SYSTEM COMPRISING A GAS-BINDING COMPONENT IN THE FO...

OPTICAL SYSTEM AND PROJECTION EXPOSURE APPARATUS

EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM AND ELECTRONIC DEVICE M...

OPTICAL ELEMENT, PROJECTION OPTICAL UNIT AND PROJECTION EXPOSURE AP...

ASSEMBLY FOR SEPARATING RADIATION IN THE FAR FIELD

IMAGING OPTICAL UNIT

OPTICAL SYSTEM, LITHOGRAPHY APPARATUS AND METHOD

OPTICAL SYSTEM, AND METHOD FOR OPERATING AN OPTICAL SYSTEM

SPECTROMETRIC METROLOGY SYSTEMS BASED ON MULTIMODE INTERFERENCE AND...

OPTICAL SYSTEM, IN PARTICULAR LITHOGRAPHY SYSTEM

OPTICAL SYSTEM WITH AN APERTURE STOP

IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUC...

UV Lithography System

MIRROR ASSEMBLY AND OPTICAL ASSEMBLY COMPRISING SAME

SYSTEMS AND METHODS USING MASK PATTERN MEASUREMENTS PERFORMED WITH...

IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE PRODUC...

MULTI-MIRROR UV-LED OPTICAL LITHOGRAPHY SYSTEM

POSITION MEASUREMENT OF OPTICAL ELEMENTS IN A LITHOGRAPHIC APPARATUS

IMAGING OPTICAL UNIT FOR EUV MICROLITHOGRAPHY

ILLUMINATION OPTIC FOR PROJECTION LITHOGRAPHY

Lithographic Apparatus, Lithographic Projection Apparatus and Devic...

REFLECTIVE IMAGE-FORMING OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DE...