Pellicles, e.g. pellicle assemblies

Industry

CPC
G03F1/62

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/62Pellicles, e.g. pellicle assemblies

Industries

Patents Grantslast 30 patents

Information Patent Grant
Metal-silicide-nitridation for stress reduction
- Patent number 11,971,654
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Pieter-Jan Van Zwol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing a membrane assembly
- Patent number 11,971,656
- Issue date Apr 30, 2024
- ASML Netherlands B.V.
- Johan Hendrik Klootwijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle removal tool
- Patent number 11,948,824
- Issue date Apr 2, 2024
- Photronics, Inc.
- Hilario Ar-Miguel Alvarez
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Simultaneous double-side coating of multilayer graphene pellicle by...
- Patent number 11,947,256
- Issue date Apr 2, 2024
- ASML Netherlands B.V.
- Evgenia Kurganova
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Mask protective module, pellicle having the same, and lithography a...
- Patent number 11,940,726
- Issue date Mar 26, 2024
- Industry-University Cooperation Foundation Hanyang University
- Jinho Ahn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle for extreme ultraviolet lithography based on yttrium carbide
- Patent number 11,927,881
- Issue date Mar 12, 2024
- Korea Electronics Technology Institute
- Hyeong Keun Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle assembly and method for advanced lithography
- Patent number 11,914,286
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Amo Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for determining a condition associated with a...
- Patent number 11,906,907
- Issue date Feb 20, 2024
- ASML Netherlands B.V.
- Derk Servatius Gertruda Brouns
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle and method of using the same
- Patent number 11,868,041
- Issue date Jan 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chue San Yoo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Creating inductors, resistors, capacitors and other structures in p...
- Patent number 11,864,327
- Issue date Jan 2, 2024
- International Business Machines Corporation
- Gerald Bartley
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 11,860,534
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Ang Chao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle, exposure master, exposure device and method for manufactu...
- Patent number 11,852,968
- Issue date Dec 26, 2023
- Mitsui Chemicals, Inc.
- Yosuke Ono
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask assembly and method of forming the same
- Patent number 11,789,360
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuo-Hao Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing pellicle for extreme ultraviolet lithograp...
- Patent number 11,789,359
- Issue date Oct 17, 2023
- Korea Electronics Technology Institute
- Hyeong Keun Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 11,782,339
- Issue date Oct 10, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle
- Patent number 11,774,847
- Issue date Oct 3, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yu Yanase
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask including first refractive member that concentrates first ligh...
- Patent number 11,762,255
- Issue date Sep 19, 2023
- Samsung Display Co., Ltd.
- Hyunggyu Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Membrane for EUV lithography
- Patent number 11,762,281
- Issue date Sep 19, 2023
- ASML Netherlands B.V.
- Maxim Aleksandrovich Nasalevich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle structure for EUV lithography and manufacturing method the...
- Patent number 11,740,552
- Issue date Aug 29, 2023
- ESOL Inc.
- Dong Gun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle frame with stress relief trenches
- Patent number 11,726,401
- Issue date Aug 15, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuo-Hao Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for removing a pellicle frame from a photomask and the me...
- Patent number 11,714,348
- Issue date Aug 1, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Wei Cheng Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicles for photomasks, reticles including the photomasks, and me...
- Patent number 11,703,753
- Issue date Jul 18, 2023
- Samsung Electronics Co., Ltd.
- Minhyun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of accelerated hazing of mask assembly
- Patent number 11,703,752
- Issue date Jul 18, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wu-Hung Ko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal-silicide-nitridation for stress reduction
- Patent number 11,686,997
- Issue date Jun 27, 2023
- ASML Netherlands B.V.
- Pieter-Jan Van Zwol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle removal tool
- Patent number 11,682,573
- Issue date Jun 20, 2023
- Photronics, Inc.
- Hilario Ar-Miguel Alvarez
- B32 - LAYERED PRODUCTS
Information Patent Grant
Membrane cleaning apparatus
- Patent number 11,673,169
- Issue date Jun 13, 2023
- ASML Netherlands B.V.
- Andrey Nikipelov
- B08 - CLEANING
Information Patent Grant
Reticle cleaning device and method of use
- Patent number 11,650,512
- Issue date May 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Che-Chang Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask assembly and associated methods
- Patent number 11,635,681
- Issue date Apr 25, 2023
- ASML Netherlands B.V.
- Derk Servatius Gertruda Brouns
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing a membrane assembly
- Patent number 11,624,980
- Issue date Apr 11, 2023
- ASML Netherlands B.V.
- Johan Hendrik Klootwijk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle and method for producing the same
- Patent number 11,599,018
- Issue date Mar 7, 2023
- Shin-Etsu Chemical Co., Ltd.
- Akinori Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20240116760
- Publication date Apr 11, 2024
- Paul Alexander VERMEULEN
- B82 - NANO-TECHNOLOGY
Information Patent Application
APPARATUS AND METHOD FOR DETERMINING A CONDITION ASSOCIATED WITH A...
- Publication number 20240103386
- Publication date Mar 28, 2024
- ASML NETHERLANDS B.V.
- Derk Servatius Gertruda BROUNS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FILM, PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE,...
- Publication number 20240103357
- Publication date Mar 28, 2024
- MITSUI CHEMICALS, INC.
- Yosuke ONO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND STRUCTURE INCLUDING A PELLICLE
- Publication number 20240103358
- Publication date Mar 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chue San YOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...
- Publication number 20240094629
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Ang CHAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...
- Publication number 20240094626
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Pei-Cheng HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INSPECTION METHOD FOR PELLICLE MEMBRANE OF LITHOGRAPHY SYSTEM
- Publication number 20240053676
- Publication date Feb 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia Hao CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROTECTIVE MEMBRANE FOR PHOTO LITHOGRAPHY, PELLICLE INCLUDING THE S...
- Publication number 20240036460
- Publication date Feb 1, 2024
- SOULBRAIN CO., LTD
- MUN JA KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...
- Publication number 20240036459
- Publication date Feb 1, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Hao LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY
- Publication number 20240036461
- Publication date Feb 1, 2024
- S&S TECH Co., Ltd.
- Ju-Hee HONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEMBRANE FOR EUV LITHOGRAPHY
- Publication number 20240004283
- Publication date Jan 4, 2024
- ASML NETHERLANDS B.V.
- Maxim Aleksandrovich Nasalevich
- G02 - OPTICS
Information Patent Application
PELLICLE MEMBRANE AND METHOD OF FORMING THE SAME
- Publication number 20230408904
- Publication date Dec 21, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Hao LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PELLICLE FOR EUV EXPOSURE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20230408905
- Publication date Dec 21, 2023
- Samsung Electronics Co., Ltd.
- Mun Ja KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ASSEMBLY WITH COATING AND METHODS OF USE
- Publication number 20230408906
- Publication date Dec 21, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Pei-Cheng Hsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PELLICLE
- Publication number 20230408907
- Publication date Dec 21, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yu YANASE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE
- Publication number 20230408910
- Publication date Dec 21, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yu YANASE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK ASSEMBLY AND METHOD OF FORMING THE SAME
- Publication number 20230384664
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo-Hao LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...
- Publication number 20230367203
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS
- Publication number 20230333462
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Ties Wouter VAN DER WOORD
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FRAME WITH STRESS RELIEF TRENCHES
- Publication number 20230324787
- Publication date Oct 12, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo-Hao LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METAL-SILICIDE-NITRIDATION FOR STRESS REDUCTION
- Publication number 20230324786
- Publication date Oct 12, 2023
- ASML NETHERLANDS B.V.
- Pieter-Jan VAN ZWOL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEMBRANE CLEANING APPARATUS
- Publication number 20230311173
- Publication date Oct 5, 2023
- ASML NETHERLANDS B.V.
- Andrey NIKIPELOV
- B08 - CLEANING
Information Patent Application
METHOD OF FABRICATING PELLICLE STRUCTURE
- Publication number 20230273515
- Publication date Aug 31, 2023
- Samsung Electronics Co., LTD
- MUN JA KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE CLEANING DEVICE AND METHOD OF USE
- Publication number 20230266680
- Publication date Aug 24, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Che-Chang HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GROWTH INHIBITOR FOR FORMING PELLICLE-PROTECTIVE THIN FILM, METHOD...
- Publication number 20230251565
- Publication date Aug 10, 2023
- Soulbrain Co., LTD
- Chang Bong YEON
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING A MEMBRANE ASSEMBLY
- Publication number 20230213851
- Publication date Jul 6, 2023
- ASML NETHERLANDS B.V.
- Johan Hendrik KLOOTWIJK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FILM FOR PHOTOLITHOGRAPHY, PELLICLE, PHOTOLITHOGRAPHY MASK...
- Publication number 20230194977
- Publication date Jun 22, 2023
- Mitsui Chemicals, Inc.
- Yousuke ONO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE AND METHOD FOR PRODUCING THE SAME
- Publication number 20230185186
- Publication date Jun 15, 2023
- Shin-Etsu Chemical Co., Ltd.
- Akinori Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR FLAT PANEL DISPLAY PHOTOMASK
- Publication number 20230161259
- Publication date May 25, 2023
- PHOTRONICS, INC.
- Bryan S. Kasprowicz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR CLEANING LITHOGRAPHY MASK
- Publication number 20230152686
- Publication date May 18, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- I-Hsiung HUANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Pellicles, e.g. pellicle assemblies

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Metal-silicide-nitridation for stress reduction

Method for manufacturing a membrane assembly

Pellicle removal tool

Simultaneous double-side coating of multilayer graphene pellicle by...

Mask protective module, pellicle having the same, and lithography a...

Pellicle for extreme ultraviolet lithography based on yttrium carbide

Pellicle assembly and method for advanced lithography

Apparatus and method for determining a condition associated with a...

Pellicle and method of using the same

Creating inductors, resistors, capacitors and other structures in p...

Pellicle for an EUV lithography mask and a method of manufacturing...

Pellicle, exposure master, exposure device and method for manufactu...

Photomask assembly and method of forming the same

Method for manufacturing pellicle for extreme ultraviolet lithograp...

Pellicle for an EUV lithography mask and a method of manufacturing...

Pellicle

Mask including first refractive member that concentrates first ligh...

Membrane for EUV lithography

Pellicle structure for EUV lithography and manufacturing method the...

Pellicle frame with stress relief trenches

Apparatus for removing a pellicle frame from a photomask and the me...

Pellicles for photomasks, reticles including the photomasks, and me...

Method of accelerated hazing of mask assembly

Metal-silicide-nitridation for stress reduction

Pellicle removal tool

Membrane cleaning apparatus

Reticle cleaning device and method of use

Mask assembly and associated methods

Method for manufacturing a membrane assembly

Pellicle and method for producing the same

Patents Applicationslast 30 patents

PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS AND METHOD

APPARATUS AND METHOD FOR DETERMINING A CONDITION ASSOCIATED WITH A...

PELLICLE FILM, PELLICLE, EXPOSURE ORIGINAL PLATE, EXPOSURE DEVICE,...

SYSTEM AND STRUCTURE INCLUDING A PELLICLE

PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...

PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...

INSPECTION METHOD FOR PELLICLE MEMBRANE OF LITHOGRAPHY SYSTEM

PROTECTIVE MEMBRANE FOR PHOTO LITHOGRAPHY, PELLICLE INCLUDING THE S...

PELLICLE FOR EUV LITHOGRAPHY MASKS AND METHODS OF MANUFACTURING THE...

PELLICLE FOR EUV LITHOGRAPHY

MEMBRANE FOR EUV LITHOGRAPHY

PELLICLE MEMBRANE AND METHOD OF FORMING THE SAME

PELLICLE FOR EUV EXPOSURE AND METHOD FOR MANUFACTURING THE SAME

OPTICAL ASSEMBLY WITH COATING AND METHODS OF USE

PELLICLE

PELLICLE

PHOTOMASK ASSEMBLY AND METHOD OF FORMING THE SAME

PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...

PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS

PELLICLE FRAME WITH STRESS RELIEF TRENCHES

METAL-SILICIDE-NITRIDATION FOR STRESS REDUCTION

MEMBRANE CLEANING APPARATUS

METHOD OF FABRICATING PELLICLE STRUCTURE

RETICLE CLEANING DEVICE AND METHOD OF USE

GROWTH INHIBITOR FOR FORMING PELLICLE-PROTECTIVE THIN FILM, METHOD...

METHOD FOR MANUFACTURING A MEMBRANE ASSEMBLY

PELLICLE FILM FOR PHOTOLITHOGRAPHY, PELLICLE, PHOTOLITHOGRAPHY MASK...

PELLICLE AND METHOD FOR PRODUCING THE SAME

PELLICLE FOR FLAT PANEL DISPLAY PHOTOMASK

METHODS FOR CLEANING LITHOGRAPHY MASK