PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES

Industry

CPC
G03F

Parent Industries

Current Industry

G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES

Sub Industries

G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof G03F3/00Colour separation Correction of tonal value G03F5/00Screening processes Screens therefor G03F7/00Photomechanical G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Industries

Patents Grantslast 30 patents

Information Patent Grant
Phase shift mask blank, manufacturing method of phase shift mask, a...
- Patent number 12,197,121
- Issue date Jan 14, 2025
- Shin-Etsu Chemical Co., Ltd.
- Shohei Mimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for making semiconductor-based integrated circuits
- Patent number 12,197,123
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yu-Hao Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Negative photosensitive resin composition, patterning process, meth...
- Patent number 12,197,127
- Issue date Jan 14, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masashi Iio
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist and method
- Patent number 12,197,128
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Liang-Yi Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
DFR film manufacturing system
- Patent number 12,197,130
- Issue date Jan 14, 2025
- Anytape Co., Ltd.
- Sungho Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Machine learning on overlay management
- Patent number 12,197,138
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tzu-Cheng Lin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Display substrate and manufacture method thereof, display panel and...
- Patent number 12,197,068
- Issue date Jan 14, 2025
- BOE Technology Group Co., Ltd.
- Renquan Gu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 12,198,891
- Issue date Jan 14, 2025
- NuFlare Technology, Inc.
- Taku Yamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implantation method for reducing roughness of patterned resist...
- Patent number 12,198,931
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Liang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
3D semiconductor devices and structures with metal layers
- Patent number 12,199,093
- Issue date Jan 14, 2025
- Monolithic 3D Inc.
- Zvi Or-Bach
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Positive photosensitive resin composition, positive photosensitive...
- Patent number 12,195,568
- Issue date Jan 14, 2025
- Shin-Etsu Chemical Co., Ltd.
- Masashi Iio
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Patterning device and method of use thereof
- Patent number 12,197,120
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Marie-Claire Van Lare
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography measurement machine and operating method thereof
- Patent number 12,197,124
- Issue date Jan 14, 2025
- Hon Hai Precision Industry Co., Ltd.
- Kuo-Kuei Fu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate treatment method and substrate treatment system
- Patent number 12,197,129
- Issue date Jan 14, 2025
- Tokyo Electron Limited
- Satoru Shimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for process-window characterization
- Patent number 12,197,134
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Te-Sheng Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device and method for setting relative laser intensities
- Patent number 12,197,135
- Issue date Jan 14, 2025
- Mycronic AB
- Fredric Ihren
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically sensitive sensor comprising micro-barrier and method of...
- Patent number 12,196,699
- Issue date Jan 14, 2025
- Technion Research & Development Foundation Limited
- Hossam Haick
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Superstrate and a method of using the same
- Patent number 12,195,382
- Issue date Jan 14, 2025
- Canon Kabushiki Kaisha
- Steven C. Shackleton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Shock absorbers in an optical assembly for a wearable display device
- Patent number 12,196,973
- Issue date Jan 14, 2025
- Meta Platforms Technologies, LLC
- Richard Farrell
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Mask and reticle protection with atomic layer deposition (ALD)
- Patent number 12,197,125
- Issue date Jan 14, 2025
- Nano-Master, Inc.
- Birol Kuyel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nanostamping method and nano-optical component
- Patent number 12,197,126
- Issue date Jan 14, 2025
- Osram Opto Semiconductors GmbH
- Fabian Knorr
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Method for reducing line-end space in integrated circuit patterning
- Patent number 12,197,131
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jing-Huei Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of determining control parameters of a device manufacturing...
- Patent number 12,197,136
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Substrate table, immersion lithographic apparatus and device manufa...
- Patent number 12,197,140
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Marco Koert Stavenga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Suction clamp, object handler, stage apparatus and lithographic app...
- Patent number 12,197,141
- Issue date Jan 14, 2025
- ASML Netherlands B.V.
- Gijs Kramer
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Grant
Compensation method and system for exposure alignment
- Patent number 12,197,122
- Issue date Jan 14, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Sheng'an Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tool control using multistage LSTM for predicting on-wafer measurem...
- Patent number 12,197,133
- Issue date Jan 14, 2025
- International Business Machines Corporation
- Dung Tien Phan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Adaptive baking method
- Patent number 12,196,491
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzung-Chen Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for improved wafer coating
- Patent number 12,199,054
- Issue date Jan 14, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Feng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Master for micro flow path creation, transfer copy, and method for...
- Patent number 12,194,459
- Issue date Jan 14, 2025
- Dexerials Corporation
- Shinya Suzuki
- B81 - MICRO-STRUCTURAL TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
APPARATUS FOR SUPPLYING LIQUID TARGET MATERIAL TO A RADIATION SOURCE
- Publication number 20250021026
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- William Peter VAN DRENT
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
ORGANOTIN PHOTORESISTS AND METHOD OF DEVELOPING PHOTOLITHOGRAPHY PA...
- Publication number 20250020996
- Publication date Jan 16, 2025
- Feng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
AN ASSEMBLY FOR A LASER-OPERATED LIGHT SOURCE AND METHOD OF USE
- Publication number 20250021009
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Ferry ZIJP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION
- Publication number 20250021015
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Jin CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...
- Publication number 20250021018
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Joost Cyrillus Lambert HAGEMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNED LOW MELTING GLASS (LMG) PHOTONIC FILM SURFACES BY WET-ETC...
- Publication number 20250019293
- Publication date Jan 16, 2025
- Corning Incorporated
- Leonard Charles Dabich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RELIEF PRECURSORS WITH ENHANCED STABILITY
- Publication number 20250019520
- Publication date Jan 16, 2025
- XSYS Germany GmbH
- Isabel Schlegel
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...
- Publication number 20250020995
- Publication date Jan 16, 2025
- Samsung SDI Co., Ltd.
- Seungbeom KEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, MONOMER, RESIST COMPOSITION COMPRISING THE SAME AND METHOD...
- Publication number 20250021003
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Cheol KANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CONTROL DEVICE, OPTICAL SYSTEM, LITHOGRAPHY INSTALLATION AND METHOD
- Publication number 20250021011
- Publication date Jan 16, 2025
- Carl Zeiss SMT GMBH
- Cornelius Richt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGE STABILIZATION FOR DIGITAL LITHOGRAPHY
- Publication number 20250021016
- Publication date Jan 16, 2025
- Applied Materials, Inc.
- Thomas L. LAIDIG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS TO CALIBRATE RETICLE THERMAL EFFECTS
- Publication number 20250021017
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Raaja Ganapathy SUBRAMANIAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY CALIBRATION METHOD
- Publication number 20250021021
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Giulio BOTTEGAL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPH APPARATUS, METHOD FOR INSPECTING PARTICLES AND SEMI...
- Publication number 20250020570
- Publication date Jan 16, 2025
- National Tsing-Hua University
- Tsai-Sheng Gau
- G01 - MEASURING TESTING
Information Patent Application
CONTROL METHOD OF DRIVING APPARATUS, DRIVING APPARATUS, LITHOGRAPHY...
- Publication number 20250021023
- Publication date Jan 16, 2025
- Canon Kabushiki Kaisha
- Hayato Hoshino
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...
- Publication number 20250020998
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Kyungoh Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250020999
- Publication date Jan 16, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION
- Publication number 20250021000
- Publication date Jan 16, 2025
- Merck Patent GmbH
- Seishi SHIBAYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR REDUCING EXTREME ULTRAVIOLET (EUV) VESSEL TIN...
- Publication number 20250021005
- Publication date Jan 16, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chia-Wei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Wafer Bow Mitigation
- Publication number 20250021006
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Andrew Whittaker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR LITHOGRAPHIC TOOLS WITH INCREASED TOLERANCES
- Publication number 20250021012
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Jasper WINTERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED...
- Publication number 20250021014
- Publication date Jan 16, 2025
- TSINGHUA UNIVERSITY
- Zhen ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...
- Publication number 20250021019
- Publication date Jan 16, 2025
- KLA Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
UTILITY STAGE FOR PHOTOLITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20250021024
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Keane Michael Levy
- B25 - HAND TOOLS PORTABLE POWER-DRIVEN TOOLS MANIPULATORS
Information Patent Application
EDGE EXPOSURE APPARATUS AND EDGE EXPOSURE METHOD
- Publication number 20250021027
- Publication date Jan 16, 2025
- TOKYO ELECTRON LIMITED
- Keisaku KAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Decorative Plate and Manufacturing Method Therefor, and Electronic...
- Publication number 20250024617
- Publication date Jan 16, 2025
- BYD COMPANY LIMITED
- Fuhua Luo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...
- Publication number 20250020997
- Publication date Jan 16, 2025
- Samsung Electronics Co., Ltd.
- Suk Koo Hong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PR...
- Publication number 20250021002
- Publication date Jan 16, 2025
- SHANGHAI SINYANG SEMICONDUCTOR MATERIALS CO., LTD.
- Shunong FANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
OBTAINING A PARAMETER CHARACTERIZING A FABRICATION PROCESS
- Publication number 20250021020
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Patrick Philipp HELFENSTEIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THERMAL PRINT HEAD AND METHOD FOR MANUFACTURING THERMAL PRINT HEAD
- Publication number 20250018730
- Publication date Jan 16, 2025
- ROHM CO., LTD.
- Goro NAKATANI
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS

PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES

Industry

Parent Industries

Current Industry

Sub Industries

Patents Grantslast 30 patents

Phase shift mask blank, manufacturing method of phase shift mask, a...

Methods for making semiconductor-based integrated circuits

Negative photosensitive resin composition, patterning process, meth...

Photoresist and method

DFR film manufacturing system

Machine learning on overlay management

Display substrate and manufacture method thereof, display panel and...

Charged particle beam writing apparatus, charged particle beam writ...

Ion implantation method for reducing roughness of patterned resist...

3D semiconductor devices and structures with metal layers

Positive photosensitive resin composition, positive photosensitive...

Patterning device and method of use thereof

Lithography measurement machine and operating method thereof

Substrate treatment method and substrate treatment system

Apparatus and method for process-window characterization

Device and method for setting relative laser intensities

Chemically sensitive sensor comprising micro-barrier and method of...

Superstrate and a method of using the same

Shock absorbers in an optical assembly for a wearable display device

Mask and reticle protection with atomic layer deposition (ALD)

Nanostamping method and nano-optical component

Method for reducing line-end space in integrated circuit patterning

Method of determining control parameters of a device manufacturing...

Substrate table, immersion lithographic apparatus and device manufa...

Suction clamp, object handler, stage apparatus and lithographic app...

Compensation method and system for exposure alignment

Tool control using multistage LSTM for predicting on-wafer measurem...

Adaptive baking method

Method and apparatus for improved wafer coating

Master for micro flow path creation, transfer copy, and method for...

Patents Applicationslast 30 patents

APPARATUS FOR SUPPLYING LIQUID TARGET MATERIAL TO A RADIATION SOURCE

ORGANOTIN PHOTORESISTS AND METHOD OF DEVELOPING PHOTOLITHOGRAPHY PA...

AN ASSEMBLY FOR A LASER-OPERATED LIGHT SOURCE AND METHOD OF USE

DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION

SYSTEMS AND METHODS FOR REDUCING PATTERN SHIFT IN A LITHOGRAPHIC AP...

PATTERNED LOW MELTING GLASS (LMG) PHOTONIC FILM SURFACES BY WET-ETC...

RELIEF PRECURSORS WITH ENHANCED STABILITY

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING...

POLYMER, MONOMER, RESIST COMPOSITION COMPRISING THE SAME AND METHOD...

CONTROL DEVICE, OPTICAL SYSTEM, LITHOGRAPHY INSTALLATION AND METHOD

IMAGE STABILIZATION FOR DIGITAL LITHOGRAPHY

METHODS AND SYSTEMS TO CALIBRATE RETICLE THERMAL EFFECTS

METROLOGY CALIBRATION METHOD

PHOTOLITHOGRAPH APPARATUS, METHOD FOR INSPECTING PARTICLES AND SEMI...

CONTROL METHOD OF DRIVING APPARATUS, DRIVING APPARATUS, LITHOGRAPHY...

PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

COMPOSITION

SYSTEM AND METHOD FOR REDUCING EXTREME ULTRAVIOLET (EUV) VESSEL TIN...

Wafer Bow Mitigation

SYSTEMS AND METHODS FOR LITHOGRAPHIC TOOLS WITH INCREASED TOLERANCES

SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED...

IMAGING OVERLAY TARGETS USING MOIRÉ ELEMENTS AND ROTATIONAL SYMMETR...

UTILITY STAGE FOR PHOTOLITHOGRAPHIC APPARATUS AND METHOD

EDGE EXPOSURE APPARATUS AND EDGE EXPOSURE METHOD

Decorative Plate and Manufacturing Method Therefor, and Electronic...

PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...

BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PR...

OBTAINING A PARAMETER CHARACTERIZING A FABRICATION PROCESS

THERMAL PRINT HEAD AND METHOD FOR MANUFACTURING THERMAL PRINT HEAD