PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES

Industry

CPC
G03F

Parent Industries

Current Industry

G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES

Sub Industries

G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof G03F3/00Colour separation Correction of tonal value G03F5/00Screening processes Screens therefor G03F7/00Photomechanical G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method of forming patterns on substrate by double nanoimprint litho...
- Patent number 11,960,203
- Issue date Apr 16, 2024
- United Microelectronics Corp.
- Yi-Chieh Lai
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Optical lithography system and method of using the same
- Patent number 11,960,211
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation filter for a radiation sensor
- Patent number 11,960,215
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Vahid Mohammadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solvent compatible nozzle plate
- Patent number 11,958,292
- Issue date Apr 16, 2024
- Funai Electric Co., Ltd.
- Sean T. Weaver
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Mask, flexible display panel and manufacturing method thereof
- Patent number 11,963,431
- Issue date Apr 16, 2024
- Chengdu BOE Optoelectronics Technology Co., Ltd.
- Qian Hu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of critical dimension control by oxygen and nitrogen plasma...
- Patent number 11,960,201
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition, coated substrate including the photoresist...
- Patent number 11,960,206
- Issue date Apr 16, 2024
- Rohm and Hass Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitive element, resin composition for forming barrier layer...
- Patent number 11,960,208
- Issue date Apr 16, 2024
- Resonac Corporation
- Masakazu Kume
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Photocurable composition, method for producing concave-convex struc...
- Patent number 11,958,971
- Issue date Apr 16, 2024
- Mitsui Chemicals, Inc.
- Takashi Oda
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Charged particle beam writing apparatus, charged particle beam writ...
- Patent number 11,961,708
- Issue date Apr 16, 2024
- NuFlare Technology, Inc.
- Haruyuki Nomura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Laser interference fringe control for higher EUV light source and E...
- Patent number 11,960,210
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chansyun David Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography device and method of operating extr...
- Patent number 11,960,212
- Issue date Apr 16, 2024
- Samsung Electronics Co., Ltd.
- Hoduk Cho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computer-readable storage medium recording data structure for stori...
- Patent number 11,960,214
- Issue date Apr 16, 2024
- AUROS TECHNOLOGY, INC.
- Sol-Lee Hwang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for manufacturing a horology component
- Patent number 11,960,205
- Issue date Apr 16, 2024
- Rolex S.A.
- Florian Calame
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and resist film
- Patent number 11,960,207
- Issue date Apr 16, 2024
- Zeon Corporation
- Manabu Hoshino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photolithography method and photolithography system
- Patent number 11,959,864
- Issue date Apr 16, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Chi-Hung Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Target material control in an EUV light source
- Patent number 11,963,285
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Abhiram Lakshmi Ganesh Govindaraju
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV mask defect tool apparatus
- Patent number 11,960,202
- Issue date Apr 16, 2024
- EUV TECH, INC.
- Chami N Perera
- G01 - MEASURING TESTING
Information Patent Grant
Microlithographic fabrication of structures
- Patent number 11,960,204
- Issue date Apr 16, 2024
- Molecular Imprints, Inc.
- Vikramjit Singh
- G02 - OPTICS
Information Patent Grant
Developing treatment method and developing treatment apparatus
- Patent number 11,960,209
- Issue date Apr 16, 2024
- Tokyo Electron Limited
- Akiko Kai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate holder, lithographic apparatus, device manufacturing meth...
- Patent number 11,960,213
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Raymond Wilhelmus Louis Lafarre
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Invariable magnification multilevel optical device with telecentric...
- Patent number 11,960,216
- Issue date Apr 16, 2024
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Micro-lens array, projection type image display device, method for...
- Patent number 11,960,103
- Issue date Apr 16, 2024
- DEXERIALS CORPORATION
- Kazuyuki Shibuya
- G02 - OPTICS
Information Patent Grant
Electronic-sensing and magnetic-modulation (ESMM) biosensor for pha...
- Patent number 11,951,476
- Issue date Apr 9, 2024
- Rutgers, The State University of New Jersey
- Umer Hassan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Measurement method and apparatus
- Patent number 11,953,823
- Issue date Apr 9, 2024
- ASML Netherlands B.V.
- Christopher Alan Spence
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Molecular resist composition and patterning process
- Patent number 11,953,827
- Issue date Apr 9, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,953,829
- Issue date Apr 9, 2024
- FUJIFILM Corporation
- Kazunari Yagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, photosensitive resin sheet, cured...
- Patent number 11,953,830
- Issue date Apr 9, 2024
- Toray Industries, Inc.
- Yusuke Komori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography support cleaning with cleaning substrate having control...
- Patent number 11,953,838
- Issue date Apr 9, 2024
- ASML Holding N.V.
- Keane Michael Levy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for coating photo resist over a substrate
- Patent number 11,955,335
- Issue date Apr 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tung-Hung Feng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
- Publication number 20240126162
- Publication date Apr 18, 2024
- S&S TECH CO., LTD.
- Yong-Dae KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPRINT APPARATUS AND PRODUCT MANUFACTURING METHOD
- Publication number 20240126165
- Publication date Apr 18, 2024
- Canon Kabushiki Kaisha
- Kenichi Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FREEFORM OPTICAL SUBSTRATES IN WAVEGUIDE DISPLAYS
- Publication number 20240126166
- Publication date Apr 18, 2024
- Applied Materials, Inc.
- David Alexander SELL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE DEVICE AND METHOD
- Publication number 20240126177
- Publication date Apr 18, 2024
- Chun-Jung Chiu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL IMAGING METHOD, DEVICE AND SYSTEM FOR PHOTOLITHOGRAPHY SYSTEM
- Publication number 20240126179
- Publication date Apr 18, 2024
- Wuhan Yuwei Optical Software Co., Ltd.
- Haiqing Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, CONTROL METHOD OF EXPOSURE APPARATUS, INFORMATI...
- Publication number 20240126182
- Publication date Apr 18, 2024
- Canon Kabushiki Kaisha
- JUN MOIZUMI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Nanoparticle Ink Based Patterning Of Inorganic Materials
- Publication number 20240124726
- Publication date Apr 18, 2024
- The Trustees of the University of Pennsylvania
- Akhila Mallavarapu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY
- Publication number 20240126163
- Publication date Apr 18, 2024
- S&S TECH CO., LTD.
- Yong-Dae KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPATIAL LIGHT MODULATION UNIT AND EXPOSURE APPARATUS
- Publication number 20240126176
- Publication date Apr 18, 2024
- Nikon Corporation
- Yasuhito KUBOTA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMI...
- Publication number 20240124635
- Publication date Apr 18, 2024
- Samsung Electronics Co., Ltd.
- Minsang KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOGRAPHIC COLOR IMAGE USING BLACK AND WHITE EMULSION
- Publication number 20240126159
- Publication date Apr 18, 2024
- Penumbra Foundation
- Eric Rosenthal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20240126167
- Publication date Apr 18, 2024
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE
- Publication number 20240126169
- Publication date Apr 18, 2024
- SAMSUNG DISPLAY CO., LTD.
- YANG-HO JUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ULTRAVIOLET LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
- Publication number 20240128701
- Publication date Apr 18, 2024
- Gigaphoton Inc.
- Atsushi FUCHIMUKAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BYPASS APPARATUS, LASER APPARATUS, AND ELECTRONIC DEVICE MANUFACTUR...
- Publication number 20240128702
- Publication date Apr 18, 2024
- Gigaphoton Inc.
- Shinichi MATSUMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET (EUV) MASK AND MANUFACTURING METHOD THEREOF
- Publication number 20240126161
- Publication date Apr 18, 2024
- Samsung Electronics Co., Ltd.
- Sungwoo JANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND PHOTORESIST COMP...
- Publication number 20240126170
- Publication date Apr 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Chih HO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCALING FOR DIE-LAST ADVANCED IC PACKAGING
- Publication number 20240126180
- Publication date Apr 18, 2024
- Applied Materials, Inc.
- Jang Fung CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BEARING SYSTEM, LITHOGRAPHY SYSTEM, AND METHOD FOR PRODUCING A BEAR...
- Publication number 20240126184
- Publication date Apr 18, 2024
- Carl Zeiss SMT GMBH
- Radhakrishna RAO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GAS LASER AMPLIFIER, GAS LASER APPARATUS, EUV LIGHT GENERATION APPA...
- Publication number 20240128705
- Publication date Apr 18, 2024
- Mitsubishi Electric Corporation
- Tatsuya YAMAMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK
- Publication number 20240126160
- Publication date Apr 18, 2024
- TOPPAN PHOTOMASK CO., LTD.
- Ayumi GODA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle Constructions and Photo-Processing Methods
- Publication number 20240126164
- Publication date Apr 18, 2024
- Micron Technology, Inc.
- Chung-Yi Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPO...
- Publication number 20240126168
- Publication date Apr 18, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HOLLOW STRUCTURE, ELECTRONIC COMPONENT USING SAME, AND NEGATIVE PHO...
- Publication number 20240126171
- Publication date Apr 18, 2024
- TORAY INDUSTRIES, INC.
- Yutaro KOYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST UNDERLAYER COMPOSITION
- Publication number 20240126172
- Publication date Apr 18, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Anton CHAVEZ
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF F...
- Publication number 20240126173
- Publication date Apr 18, 2024
- FUJIFILM CORPORATION
- Kazuki WATANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY
- Publication number 20240126174
- Publication date Apr 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Meng-Che Tu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING SEMICONDUCT...
- Publication number 20240126175
- Publication date Apr 18, 2024
- TOKYO ELECTRON LIMITED
- Seiji NAGAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS, CONTROL METHOD, AND DEVICE MANUFACTURING METHOD
- Publication number 20240126178
- Publication date Apr 18, 2024
- Nikon Corporation
- Masaki KATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS WINDOW BASED ON DEFECT PROBABILITY
- Publication number 20240126181
- Publication date Apr 18, 2024
- ASML NETHERLANDS B.V.
- Abraham SLACHTER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES

Industry

Parent Industries

Current Industry

Sub Industries

Patents Grantslast 30 patents

Method of forming patterns on substrate by double nanoimprint litho...

Optical lithography system and method of using the same

Radiation filter for a radiation sensor

Solvent compatible nozzle plate

Mask, flexible display panel and manufacturing method thereof

Method of critical dimension control by oxygen and nitrogen plasma...

Photoresist composition, coated substrate including the photoresist...

Photosensitive element, resin composition for forming barrier layer...

Photocurable composition, method for producing concave-convex struc...

Charged particle beam writing apparatus, charged particle beam writ...

Laser interference fringe control for higher EUV light source and E...

Extreme ultraviolet lithography device and method of operating extr...

Computer-readable storage medium recording data structure for stori...

Method for manufacturing a horology component

Resist composition and resist film

Photolithography method and photolithography system

Target material control in an EUV light source

EUV mask defect tool apparatus

Microlithographic fabrication of structures

Developing treatment method and developing treatment apparatus

Substrate holder, lithographic apparatus, device manufacturing meth...

Invariable magnification multilevel optical device with telecentric...

Micro-lens array, projection type image display device, method for...

Electronic-sensing and magnetic-modulation (ESMM) biosensor for pha...

Measurement method and apparatus

Molecular resist composition and patterning process

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Photosensitive resin composition, photosensitive resin sheet, cured...

Lithography support cleaning with cleaning substrate having control...

Method and apparatus for coating photo resist over a substrate

Patents Applicationslast 30 patents

PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY

IMPRINT APPARATUS AND PRODUCT MANUFACTURING METHOD

FREEFORM OPTICAL SUBSTRATES IN WAVEGUIDE DISPLAYS

EXPOSURE DEVICE AND METHOD

OPTICAL IMAGING METHOD, DEVICE AND SYSTEM FOR PHOTOLITHOGRAPHY SYSTEM

EXPOSURE APPARATUS, CONTROL METHOD OF EXPOSURE APPARATUS, INFORMATI...

Nanoparticle Ink Based Patterning Of Inorganic Materials

PHASE SHIFT BLANKMASK AND PHOTOMASK FOR EUV LITHOGRAPHY

SPATIAL LIGHT MODULATION UNIT AND EXPOSURE APPARATUS

POLYMER, RESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FORMI...

PHOTOGRAPHIC COLOR IMAGE USING BLACK AND WHITE EMULSION

RADIATION-SENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN

PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE

ULTRAVIOLET LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD

BYPASS APPARATUS, LASER APPARATUS, AND ELECTRONIC DEVICE MANUFACTUR...

EXTREME ULTRAVIOLET (EUV) MASK AND MANUFACTURING METHOD THEREOF

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND PHOTORESIST COMP...

SCALING FOR DIE-LAST ADVANCED IC PACKAGING

BEARING SYSTEM, LITHOGRAPHY SYSTEM, AND METHOD FOR PRODUCING A BEAR...

GAS LASER AMPLIFIER, GAS LASER APPARATUS, EUV LIGHT GENERATION APPA...

REFLECTIVE PHOTOMASK BLANK AND REFLECTIVE PHOTOMASK

Reticle Constructions and Photo-Processing Methods

ONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPO...

HOLLOW STRUCTURE, ELECTRONIC COMPONENT USING SAME, AND NEGATIVE PHO...

PHOTORESIST UNDERLAYER COMPOSITION

FLEXOGRAPHIC PRINTING PLATE PRECURSOR AND MANUFACTURING METHOD OF F...

LITHOGRAPHY

METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING SEMICONDUCT...

EXPOSURE APPARATUS, CONTROL METHOD, AND DEVICE MANUFACTURING METHOD

PROCESS WINDOW BASED ON DEFECT PROBABILITY