Plasma diagnostics

Industry

CPC
H01J37/32917

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32917Plasma diagnostics

Industries

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,074,076
- Issue date Aug 27, 2024
- HITACHI HIGH-TECH CORPORATION
- Soichiro Eto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for in-situ plasma modification
- Patent number 12,074,013
- Issue date Aug 27, 2024
- Qi Liang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave resonator array for plasma diagnostics
- Patent number 12,062,529
- Issue date Aug 13, 2024
- Applied Materials, Inc.
- David John Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Diagnosis apparatus, plasma processing apparatus and diagnosis method
- Patent number 12,040,167
- Issue date Jul 16, 2024
- HITACHI HIGH-TECH CORPORATION
- Shota Umeda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Plasma processing apparatus and wear amount measurement method
- Patent number 12,033,838
- Issue date Jul 9, 2024
- Tokyo Electron Limited
- Joji Takayoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Waveform shape factor for pulsed PVD power
- Patent number 12,018,361
- Issue date Jun 25, 2024
- Applied Materials, Inc.
- Shouyin Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Adaptive predictive control system
- Patent number 11,990,324
- Issue date May 21, 2024
- Advanced Energy Industries, Inc.
- Chad S. Samuels
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing method
- Patent number 11,915,951
- Issue date Feb 27, 2024
- HITACHI HIGH-TECH CORPORATION
- Hiroyuki Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Measurement method and measurement system
- Patent number 11,906,466
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Takayuki Hatanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing chamber with optical fiber with bragg grating sensors
- Patent number 11,901,165
- Issue date Feb 13, 2024
- William J. O'Banion
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductive broad-band sensors for electromagnetic waves
- Patent number 11,830,708
- Issue date Nov 28, 2023
- COMET Technologies USA, Inc.
- Stephen E. Savas
- G01 - MEASURING TESTING
Information Patent Grant
Wet etching composition and method
- Patent number 11,781,066
- Issue date Oct 10, 2023
- Entegris, Inc.
- YoungMin Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Measurement method and measurement apparatus
- Patent number 11,735,402
- Issue date Aug 22, 2023
- Tokyo Electron Limited
- Takashi Kubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ optical chamber surface and process sensor
- Patent number 11,735,401
- Issue date Aug 22, 2023
- Applied Materials, Inc.
- Chuang-Chia Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resonant process monitor
- Patent number 11,551,905
- Issue date Jan 10, 2023
- Intel Corporation
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma parameters and skew characterization by high speed imaging
- Patent number 11,545,376
- Issue date Jan 3, 2023
- Applied Materials, Inc.
- Sidharth Bhatia
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Low contamination chamber for surface activation
- Patent number 11,508,562
- Issue date Nov 22, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ping-Yin Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Automatic ESC bias compensation when using pulsed DC bias
- Patent number 11,476,145
- Issue date Oct 18, 2022
- Applied Materials, Inc.
- James Rogers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching silicon containing films selectively against each...
- Patent number 11,404,281
- Issue date Aug 2, 2022
- Tokyo Electron Limited
- Taku Gohira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for actively tuning a plasma power source
- Patent number 11,398,369
- Issue date Jul 26, 2022
- Applied Materials, Inc.
- Rongping Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma treatment method
- Patent number 11,373,847
- Issue date Jun 28, 2022
- Industrial Technology Research Institute
- Hung-Yuan Hsieh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wet etching composition and method
- Patent number 11,365,351
- Issue date Jun 21, 2022
- Entegris, Inc.
- YoungMin Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 11,315,792
- Issue date Apr 26, 2022
- HITACHI HIGH-TECH CORPORATION
- Masaki Ishiguro
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma device
- Patent number 11,251,019
- Issue date Feb 15, 2022
- Toyota Jidosha Kabushiki Kaisha
- Tetsuharu Baba
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Microwave applicator with solid-state generator power source
- Patent number 11,222,770
- Issue date Jan 11, 2022
- MKS Instruments, Inc.
- Mohammad Kamarehi
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
In-situ optical chamber surface and process sensor
- Patent number 11,114,286
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Chuang-Chia Lin
- G01 - MEASURING TESTING
Information Patent Grant
Substrate processing apparatus, storage medium and substrate proces...
- Patent number 11,094,505
- Issue date Aug 17, 2021
- ASM IP Holding B.V.
- Kazuhiro Nishiwaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Image based plasma sheath profile detection on plasma processing tools
- Patent number 10,957,521
- Issue date Mar 23, 2021
- Lam Research Corporation
- Yuhou Wang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Object detection systems
- Patent number 10,914,837
- Issue date Feb 9, 2021
- onVector Technologies LLC
- Michael Weber-Grabau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for determining film thickness using DC self-bi...
- Patent number 10,876,209
- Issue date Dec 29, 2020
- Novellus Systems, Inc.
- Edward J. Augustyniak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESS MONITORING APPARATUS USING TERAHERTZ WAVES AND MONIT...
- Publication number 20240297014
- Publication date Sep 5, 2024
- IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)
- Hak Sung KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DIAGNOSTIC APPARATUS AND OPERATING METHOD THEREOF
- Publication number 20240242944
- Publication date Jul 18, 2024
- Samsung Electronics Co., Ltd.
- Haewook PARK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING CHAMBER WITH OPTICAL FIBER WITH BRAGG GRATING SENSORS
- Publication number 20240186124
- Publication date Jun 6, 2024
- iSenseCloud, Inc.
- William J. O'Banion
- G01 - MEASURING TESTING
Information Patent Application
INDUCTIVE BROAD-BAND SENSORS FOR ELECTROMAGNETIC WAVES
- Publication number 20240145221
- Publication date May 2, 2024
- COMET TECHNOLOGIES USA, INC.
- STEPHEN E. SAVAS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CONTROL APPARATUS AND METHOD USING THE SAME
- Publication number 20240128054
- Publication date Apr 18, 2024
- Samsung Electronics Co., Ltd.
- Changho Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DETERMINING AN OPTIMAL ION ENERGY FOR PLASMA PROCESSING OF A DIELEC...
- Publication number 20240105430
- Publication date Mar 28, 2024
- PRODRIVE TECHNOLOGIES INNOVATION SERVICES B.V.
- Qihao YU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WIDEBAND VARIABLE IMPEDANCE LOAD FOR HIGH VOLUME MANUFACTURING QUAL...
- Publication number 20240094273
- Publication date Mar 21, 2024
- Applied Materials, Inc.
- Yue GUO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE MODIFYING APPARATUS AND BONDING STRENGTH DETERMINATION METHOD
- Publication number 20240079222
- Publication date Mar 7, 2024
- TOKYO ELECTRON LIMITED
- Takashi Terada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SENSOR MODULE
- Publication number 20240071737
- Publication date Feb 29, 2024
- Samsung Electronics Co., Ltd.
- Sungwon Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADICAL SENSOR SUBSTRATE
- Publication number 20240035896
- Publication date Feb 1, 2024
- Applied Materials, Inc.
- CHUANG-CHIA LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA DIAGNOSIS SYSTEM AND PLASMA DIAGNOSIS METHOD
- Publication number 20240021420
- Publication date Jan 18, 2024
- Kwangwoon University Industry-Academic Collaboration Foundation
- Gi Chung KWON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONITORING METHOD AND PLASMA PROCESSING APPARATUS
- Publication number 20240006163
- Publication date Jan 4, 2024
- TOKYO ELECTRON LIMITED
- Takeshi KOBAYASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROMAGNETIC FIELD SIGNAL ACQUISITION SYSTEM FOR HIGH SIGNAL-TO-...
- Publication number 20230352281
- Publication date Nov 2, 2023
- Dublin City University
- Alessio Di Liberto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EDGE RING OR PROCESS KIT FOR SEMICONDUCTOR PROCESS MODULE
- Publication number 20230296512
- Publication date Sep 21, 2023
- Applied Materials, Inc.
- Allen L. D'AMBRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASURING INSTRUMENT AND MEASURING METHOD
- Publication number 20230204643
- Publication date Jun 29, 2023
- TOKYO ELECTRON LIMITED
- Takayuki HATANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PRESSURE PUCK DIAGNOSTIC WAFER
- Publication number 20230141012
- Publication date May 11, 2023
- Applied Materials, Inc.
- Kostiantyn Achkasov
- G05 - CONTROLLING REGULATING
Information Patent Application
TWO STAGE ION CURRENT MEASUREMENT IN A DEVICE FOR ANALYSIS OF PLASM...
- Publication number 20230143487
- Publication date May 11, 2023
- Impedans Ltd
- David GAHAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE
- Publication number 20230136707
- Publication date May 4, 2023
- SEMES CO., LTD.
- Dong-Hun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASUREMENT SYSTEM, MEASUREMENT METHOD, AND PLASMA PROCESSING DEVICE
- Publication number 20230062662
- Publication date Mar 2, 2023
- TOKYO ELECTRON LIMITED
- Ayuta SUZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROWAVE RESONATOR ARRAY FOR PLASMA DIAGNOSTICS
- Publication number 20230044262
- Publication date Feb 9, 2023
- Applied Materials, Inc.
- David John Peterson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MEASUREMENT METHOD AND MEASUREMENT APPARATUS
- Publication number 20220406579
- Publication date Dec 22, 2022
- TOKYO ELECTRON LIMITED
- Takashi KUBO
- G01 - MEASURING TESTING
Information Patent Application
DETECTION AND LOCATION OF ANOMALOUS PLASMA EVENTS IN FABRICATION CH...
- Publication number 20220406578
- Publication date Dec 22, 2022
- LAM RESEARCH CORPORATION
- Yukinori Sakiyama
- G01 - MEASURING TESTING
Information Patent Application
WET ETCHING COMPOSITION AND METHOD
- Publication number 20220275276
- Publication date Sep 1, 2022
- Entegris, Inc.
- YoungMin KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRAPHENE FUNCTIONALIZATION METHOD, APPARATUS, AND FUNCTIONALIZED GR...
- Publication number 20220185674
- Publication date Jun 16, 2022
- United Kingdom Research and Innovation
- Christopher Russo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA TREATMENT APPARATUS, A METHOD OF MONITORING A PROCESS OF MAN...
- Publication number 20220181219
- Publication date Jun 9, 2022
- Samsung Electronics Co., Ltd.
- MEEHYUN LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIAGNOSIS APPARATUS, PLASMA PROCESSING APPARATUS AND DIAGNOSIS METHOD
- Publication number 20220157580
- Publication date May 19, 2022
- Hitachi High-Tech Corporation
- Shota Umeda
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
IN-SITU OPTICAL CHAMBER SURFACE AND PROCESS SENSOR
- Publication number 20210398785
- Publication date Dec 23, 2021
- Applied Materials, Inc.
- Chuang-Chia Lin
- G01 - MEASURING TESTING
Information Patent Application
MEASUREMENT METHOD AND MEASUREMENT SYSTEM
- Publication number 20210262987
- Publication date Aug 26, 2021
- TOKYO ELECTRON LIMITED
- Takayuki HATANAKA
- G01 - MEASURING TESTING
Information Patent Application
BROAD-BAND SENSORS FOR ELECTROMAGNETIC WAVES
- Publication number 20210217595
- Publication date Jul 15, 2021
- COMET TECHNOLOGIES USA, INC.
- STEPHEN E. SAVAS
- G01 - MEASURING TESTING
Information Patent Application
TEST WAFER WITH OPTICAL FIBER WITH BRAGG GRATING SENSORS
- Publication number 20210118654
- Publication date Apr 22, 2021
- iSenseCloud, Inc.
- William J. O'Banion
- H01 - BASIC ELECTRIC ELEMENTS

Plasma diagnostics

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Plasma processing apparatus and plasma processing method

System and method for in-situ plasma modification

Microwave resonator array for plasma diagnostics

Diagnosis apparatus, plasma processing apparatus and diagnosis method

Plasma processing apparatus and wear amount measurement method

Waveform shape factor for pulsed PVD power

Adaptive predictive control system

Plasma processing method

Measurement method and measurement system

Processing chamber with optical fiber with bragg grating sensors

Inductive broad-band sensors for electromagnetic waves

Wet etching composition and method

Measurement method and measurement apparatus

In-situ optical chamber surface and process sensor

Resonant process monitor

Plasma parameters and skew characterization by high speed imaging

Low contamination chamber for surface activation

Automatic ESC bias compensation when using pulsed DC bias

Method of etching silicon containing films selectively against each...

Method and apparatus for actively tuning a plasma power source

Plasma treatment method

Wet etching composition and method

Plasma processing apparatus and plasma processing method

Plasma device

Microwave applicator with solid-state generator power source

In-situ optical chamber surface and process sensor

Substrate processing apparatus, storage medium and substrate proces...

Image based plasma sheath profile detection on plasma processing tools

Object detection systems

Systems and methods for determining film thickness using DC self-bi...

Patents Applicationslast 30 patents

PLASMA PROCESS MONITORING APPARATUS USING TERAHERTZ WAVES AND MONIT...

PLASMA DIAGNOSTIC APPARATUS AND OPERATING METHOD THEREOF

PROCESSING CHAMBER WITH OPTICAL FIBER WITH BRAGG GRATING SENSORS

INDUCTIVE BROAD-BAND SENSORS FOR ELECTROMAGNETIC WAVES

PLASMA CONTROL APPARATUS AND METHOD USING THE SAME

DETERMINING AN OPTIMAL ION ENERGY FOR PLASMA PROCESSING OF A DIELEC...

WIDEBAND VARIABLE IMPEDANCE LOAD FOR HIGH VOLUME MANUFACTURING QUAL...

SURFACE MODIFYING APPARATUS AND BONDING STRENGTH DETERMINATION METHOD

PLASMA SENSOR MODULE

RADICAL SENSOR SUBSTRATE

PLASMA DIAGNOSIS SYSTEM AND PLASMA DIAGNOSIS METHOD

MONITORING METHOD AND PLASMA PROCESSING APPARATUS

ELECTROMAGNETIC FIELD SIGNAL ACQUISITION SYSTEM FOR HIGH SIGNAL-TO-...

EDGE RING OR PROCESS KIT FOR SEMICONDUCTOR PROCESS MODULE

MEASURING INSTRUMENT AND MEASURING METHOD

PRESSURE PUCK DIAGNOSTIC WAFER

TWO STAGE ION CURRENT MEASUREMENT IN A DEVICE FOR ANALYSIS OF PLASM...

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

MEASUREMENT SYSTEM, MEASUREMENT METHOD, AND PLASMA PROCESSING DEVICE

MICROWAVE RESONATOR ARRAY FOR PLASMA DIAGNOSTICS

MEASUREMENT METHOD AND MEASUREMENT APPARATUS

DETECTION AND LOCATION OF ANOMALOUS PLASMA EVENTS IN FABRICATION CH...

WET ETCHING COMPOSITION AND METHOD

GRAPHENE FUNCTIONALIZATION METHOD, APPARATUS, AND FUNCTIONALIZED GR...

PLASMA TREATMENT APPARATUS, A METHOD OF MONITORING A PROCESS OF MAN...

DIAGNOSIS APPARATUS, PLASMA PROCESSING APPARATUS AND DIAGNOSIS METHOD

IN-SITU OPTICAL CHAMBER SURFACE AND PROCESS SENSOR

MEASUREMENT METHOD AND MEASUREMENT SYSTEM

BROAD-BAND SENSORS FOR ELECTROMAGNETIC WAVES

TEST WAFER WITH OPTICAL FIBER WITH BRAGG GRATING SENSORS