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Particle removal device and method
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Patent number 12,158,701
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Issue date Dec 3, 2024
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Taiwan Semiconductor Manufacturing Company, Ltd
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Cheng-Hsuan Wu
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Imprint lithography
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Patent number 12,147,162
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Issue date Nov 19, 2024
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ASML Netherlands B.V.
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Catharinus De Schiffart
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Method of manufacturing photo masks
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Patent number 12,038,693
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Issue date Jul 16, 2024
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Taiwan Semiconductor Manufacturing Company, Ltd
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Chien-Cheng Chen
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H01 - BASIC ELECTRIC ELEMENTS
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Method of manufacturing photo masks
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Patent number 11,687,006
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Issue date Jun 27, 2023
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Taiwan Semiconductor Manufacturing Company, Ltd
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Chien-Cheng Chen
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H01 - BASIC ELECTRIC ELEMENTS
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Lithographic method
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Patent number 11,644,755
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Issue date May 9, 2023
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ASML Netherland B.V.
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Bearrach Moest
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Imprint lithography
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Patent number 11,635,696
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Issue date Apr 25, 2023
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ASML Netherlands B.V.
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Catharinus De Schiffart
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Particle removal device and method
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Patent number 11,392,041
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Issue date Jul 19, 2022
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Taiwan Semiconductor Manufacturing Company, Ltd
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Cheng-Hsuan Wu
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G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Method of manufacturing photo masks
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Patent number 11,327,405
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Issue date May 10, 2022
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Taiwan Semiconductor Manufacturing Co., Ltd
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Chien-Cheng Chen
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H01 - BASIC ELECTRIC ELEMENTS
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