Rim PSM or outrigger PSM Preparation thereof

Industry

CPC
G03F1/29

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/29Rim PSM or outrigger PSM Preparation thereof

Industries

Patents Grantslast 30 patents

Information Patent Grant
Half-tone phase shift mask blank and method for manufacturing half-...
- Patent number 9,158,192
- Issue date Oct 13, 2015
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chromeless phase-shifting photomask with undercut rim-shifting element
- Patent number 8,591,749
- Issue date Nov 26, 2013
- International Business Machines Corporation
- Brent A. Anderson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Boundary layer formation and resultant structures
- Patent number 8,465,885
- Issue date Jun 18, 2013
- International Business Machines Corporation
- Jed H. Rankin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chromeless phase-shifting photomask with undercut rim-shifting element
- Patent number 8,389,183
- Issue date Mar 5, 2013
- International Business Machines Corporation
- Brent A. Anderson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask for EUV lithography and method for exposure using the same
- Patent number 8,187,774
- Issue date May 29, 2012
- Hynix Semiconductor Inc.
- Goo Min Jeong
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithography masks and methods of manufacture thereof
- Patent number 8,071,261
- Issue date Dec 6, 2011
- Infineon Technologies AG
- Alois Gutmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask for double patterning and method for exposing wafe...
- Patent number 8,021,802
- Issue date Sep 20, 2011
- Hynix Semiconductor Inc.
- Goo Min Jeong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for fabricating patterns using a photomask
- Patent number 8,003,302
- Issue date Aug 23, 2011
- Hynix Semiconductor Inc.
- Jin Ho Ryu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for fabricating rim type photomask
- Patent number 7,887,979
- Issue date Feb 15, 2011
- Hynix Semiconductor Inc.
- Young Dae Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic mask and methods for fabricating a semiconductor device
- Patent number 7,776,494
- Issue date Aug 17, 2010
- Global Foundries Inc.
- Norman Shaowen Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, fabrication method for the same and pattern formation me...
- Patent number 7,771,902
- Issue date Aug 10, 2010
- Panasonic Corporation
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Binary photomask having a compensation layer
- Patent number 7,745,068
- Issue date Jun 29, 2010
- Samsung Electronics Co., Ltd.
- Jin-Sik Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing rim type of photomask and photomask made by...
- Patent number 7,632,611
- Issue date Dec 15, 2009
- Samsung Electronics Co., Ltd.
- Chang-hwan Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, method for producing the same, and method for forming pa...
- Patent number 7,504,186
- Issue date Mar 17, 2009
- Panasonic Corporation
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming generating mask data
- Patent number 7,501,213
- Issue date Mar 10, 2009
- Panasonic Corporation
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chromeless phase shifting mask for integrated circuits using interi...
- Patent number 7,493,587
- Issue date Feb 17, 2009
- James Word
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and method for crystallizing amorphous silicon
- Patent number 7,481,880
- Issue date Jan 27, 2009
- LG Display Co., Ltd.
- Kwang-Jo Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning method using photomask
- Patent number 7,468,240
- Issue date Dec 23, 2008
- Panasonic Corporation
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming pattern
- Patent number 7,449,285
- Issue date Nov 11, 2008
- Panasonic Corporation
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask
- Patent number 7,378,198
- Issue date May 27, 2008
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Masks for fabricating semiconductor devices and methods of forming...
- Patent number 7,316,958
- Issue date Jan 8, 2008
- Dongbu Electronics Co., Ltd.
- Jun Seok Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask, method for producing the same, and method for forming pa...
- Patent number 7,282,309
- Issue date Oct 16, 2007
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming pattern using a photomask
- Patent number 7,250,248
- Issue date Jul 31, 2007
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Structure and method of correcting proximity effects in a tri-tone...
- Patent number 7,236,916
- Issue date Jun 26, 2007
- Synopsys, Inc.
- Christophe Pierrat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming and testing a phase shift mask
- Patent number 7,232,629
- Issue date Jun 19, 2007
- United Microelectronics Corp.
- Lin-Hsin Tu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of printing structures
- Patent number 7,226,707
- Issue date Jun 5, 2007
- Micron Technology, Inc.
- H. Daniel Dulman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing photomask and method for producing photomask p...
- Patent number 7,205,077
- Issue date Apr 17, 2007
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming pattern using photomask
- Patent number 7,144,684
- Issue date Dec 5, 2006
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and pattern forming method employing the same
- Patent number 7,115,344
- Issue date Oct 3, 2006
- Renesas Technology Corp.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask, method for producing the same, and method for forming pa...
- Patent number 7,060,398
- Issue date Jun 13, 2006
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
HALF-TONE PHASE SHIFT MASK BLANK AND METHOD FOR MANUFACTURING HALF-...
- Publication number 20130309598
- Publication date Nov 21, 2013
- SHIN-ETSU CHEMICAL CO., LTD.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHROMELESS PHASE-SHIFTING PHOTOMASK WITH UNDERCUT RIM-SHIFTING ELEMENT
- Publication number 20130089815
- Publication date Apr 11, 2013
- International Business Machines Corporation
- Brent A. Anderson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Boundary Layer Formation and Resultant Structures
- Publication number 20120202139
- Publication date Aug 9, 2012
- International Business Machines Corporation
- Jed H. Rankin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHROMELESS PHASE-SHIFTING PHOTOMASK WITH UNDERCUT RIM-SHIFTING ELEMENT
- Publication number 20110195349
- Publication date Aug 11, 2011
- International Business Machines Corporation
- Brent A. Anderson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase-shift photomask and patterning method
- Publication number 20110159411
- Publication date Jun 30, 2011
- Bennett Olson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask for EUV Lithography and Method for Exposure Using the Same
- Publication number 20100323280
- Publication date Dec 23, 2010
- Hynix Semiconductor Inc.
- Goo Min Jeong
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR FABRICATING PATTERNS USING A PHOTOMASK
- Publication number 20090325082
- Publication date Dec 31, 2009
- Hynix Semiconductor Inc.
- Jin Ho Ryu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase Shift Mask for Double Patterning and Method for Exposing Wafe...
- Publication number 20090269679
- Publication date Oct 29, 2009
- Hynix Semiconductor Inc.
- Goo Min Jeong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLES INCLUDING ASSISTANT STRUCTURES, METHODS OF FORMING SUCH RE...
- Publication number 20090226823
- Publication date Sep 10, 2009
- Micron Technology, Inc.
- William A. Stanton
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, Fabrication Method for the Same and Pattern Formation Me...
- Publication number 20090208851
- Publication date Aug 20, 2009
- PANASONIC CORPORATION
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for Fabricating RIM Type Photomask
- Publication number 20090111034
- Publication date Apr 30, 2009
- Hynix Semiconductor Inc.
- Young Dae Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithography Masks and Methods of Manufacture Thereof
- Publication number 20090023078
- Publication date Jan 22, 2009
- Alois Gutmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC MASK AND METHODS FOR FABRICATING A SEMICONDUCTOR DEVICE
- Publication number 20080160422
- Publication date Jul 3, 2008
- Norman Shaowen Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask and pattern forming method employing the same
- Publication number 20080057408
- Publication date Mar 6, 2008
- RENESAS TECHNOLOGY CORP.
- Norio Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, method for producing the same, and method for forming pa...
- Publication number 20070254219
- Publication date Nov 1, 2007
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Patterning method using photomask
- Publication number 20070224542
- Publication date Sep 27, 2007
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Evanescent wave assist features for microlithography
- Publication number 20070172745
- Publication date Jul 26, 2007
- Bruce W. Smith
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask, method for producing the same, and method for forming pa...
- Publication number 20070054204
- Publication date Mar 8, 2007
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Binary photomask having a compensation layer and method of manufact...
- Publication number 20070054200
- Publication date Mar 8, 2007
- SAMSUNG ELECTRONICS CO., LTD.
- Jin-Sik Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of manufacturing rim type of photomask and photomask made by...
- Publication number 20070020533
- Publication date Jan 25, 2007
- Chang-hwan Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK FOR PATTERNING ULTRA-SMALL HOLE FEATURES
- Publication number 20070020531
- Publication date Jan 25, 2007
- Chin-Lung Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chromeless phase shifting mask for integrated circuits
- Publication number 20060199084
- Publication date Sep 7, 2006
- Mentor Graphics Corporation
- James Word
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming generating mask data
- Publication number 20060183032
- Publication date Aug 17, 2006
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming pattern
- Publication number 20060183033
- Publication date Aug 17, 2006
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photomask
- Publication number 20060183034
- Publication date Aug 17, 2006
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for forming pattern using a photomask
- Publication number 20060183035
- Publication date Aug 17, 2006
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing photomask and method for producing photomask p...
- Publication number 20060121367
- Publication date Jun 8, 2006
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mask and method for crystallizing amorphous silicon
- Publication number 20060121369
- Publication date Jun 8, 2006
- Kwang-Jo Hwang
- C30 - CRYSTAL GROWTH
Information Patent Application
Method for forming pattern using photomask
- Publication number 20060099523
- Publication date May 11, 2006
- Matsushita Electric Industrial Co., Ltd.
- Akio Misaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase shift mask and method of producing the same
- Publication number 20050255389
- Publication date Nov 17, 2005
- Renesas Technology Corp.
- Koji Tange
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Rim PSM or outrigger PSM Preparation thereof

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Half-tone phase shift mask blank and method for manufacturing half-...

Chromeless phase-shifting photomask with undercut rim-shifting element

Boundary layer formation and resultant structures

Chromeless phase-shifting photomask with undercut rim-shifting element

Mask for EUV lithography and method for exposure using the same

Lithography masks and methods of manufacture thereof

Phase shift mask for double patterning and method for exposing wafe...

Method for fabricating patterns using a photomask

Method for fabricating rim type photomask

Lithographic mask and methods for fabricating a semiconductor device

Photomask, fabrication method for the same and pattern formation me...

Binary photomask having a compensation layer

Method of manufacturing rim type of photomask and photomask made by...

Photomask, method for producing the same, and method for forming pa...

Method for forming generating mask data

Chromeless phase shifting mask for integrated circuits using interi...

Mask and method for crystallizing amorphous silicon

Patterning method using photomask

Method for forming pattern

Photomask

Masks for fabricating semiconductor devices and methods of forming...

Photomask, method for producing the same, and method for forming pa...

Method for forming pattern using a photomask

Structure and method of correcting proximity effects in a tri-tone...

Method of forming and testing a phase shift mask

Methods of printing structures

Method for producing photomask and method for producing photomask p...

Method for forming pattern using photomask

Photomask and pattern forming method employing the same

Photomask, method for producing the same, and method for forming pa...

Patents Applicationslast 30 patents

HALF-TONE PHASE SHIFT MASK BLANK AND METHOD FOR MANUFACTURING HALF-...

CHROMELESS PHASE-SHIFTING PHOTOMASK WITH UNDERCUT RIM-SHIFTING ELEMENT

Boundary Layer Formation and Resultant Structures

CHROMELESS PHASE-SHIFTING PHOTOMASK WITH UNDERCUT RIM-SHIFTING ELEMENT

Phase-shift photomask and patterning method

Mask for EUV Lithography and Method for Exposure Using the Same

METHOD FOR FABRICATING PATTERNS USING A PHOTOMASK

Phase Shift Mask for Double Patterning and Method for Exposing Wafe...

RETICLES INCLUDING ASSISTANT STRUCTURES, METHODS OF FORMING SUCH RE...

Photomask, Fabrication Method for the Same and Pattern Formation Me...

Method for Fabricating RIM Type Photomask

Lithography Masks and Methods of Manufacture Thereof

LITHOGRAPHIC MASK AND METHODS FOR FABRICATING A SEMICONDUCTOR DEVICE

Photomask and pattern forming method employing the same

Photomask, method for producing the same, and method for forming pa...

Patterning method using photomask

Evanescent wave assist features for microlithography

Photomask, method for producing the same, and method for forming pa...

Binary photomask having a compensation layer and method of manufact...

Method of manufacturing rim type of photomask and photomask made by...

PHASE SHIFT MASK FOR PATTERNING ULTRA-SMALL HOLE FEATURES

Chromeless phase shifting mask for integrated circuits

Method for forming generating mask data

Method for forming pattern

Photomask

Method for forming pattern using a photomask

Method for producing photomask and method for producing photomask p...

Mask and method for crystallizing amorphous silicon

Method for forming pattern using photomask

Phase shift mask and method of producing the same