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G03F7/704

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/704Scanned exposure beam

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for fabrication of large area 3D photonic crys...
- Patent number 12,287,571
- Issue date Apr 29, 2025
- Steven R.J. Brueck
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Systems and methods for direct laser writing
- Patent number 12,282,261
- Issue date Apr 22, 2025
- Northwestern University
- Sridhar Krishnaswamy
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Backside deposition tuning of stress to control wafer bow in semico...
- Patent number 12,276,922
- Issue date Apr 15, 2025
- Tokyo Electron Limited
- Daniel Fulford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Parallel mask rule checking on evolving mask shapes in optical prox...
- Patent number 12,271,676
- Issue date Apr 8, 2025
- NVIDIA Corporation
- Kumara Narasimha Sastry Kunigal
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor manufacturing apparatus and method thereof
- Patent number 12,265,327
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ching-Hai Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical proximity correction and photomasks
- Patent number 12,265,334
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Dong-Yo Jheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus
- Patent number 12,265,337
- Issue date Apr 1, 2025
- ASML Netherlands B.V.
- Junichi Kanehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device with grating structure
- Patent number 12,259,658
- Issue date Mar 25, 2025
- NANYA TECHNOLOGY CORPORATION
- Chun-Yen Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for optically processing an object
- Patent number 12,253,803
- Issue date Mar 18, 2025
- Karlsruher Institut für Technologie
- Matthias Lauermann
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Selective patterning with wet-dry bilayer resist
- Patent number 12,249,508
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Anton J. deVilliers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Information processing apparatus and information processing method
- Patent number 12,242,765
- Issue date Mar 4, 2025
- Canon Kabushiki Kaisha
- Naoki Miyata
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for correcting mask pattern, apparatus for correcting mask p...
- Patent number 12,216,979
- Issue date Feb 4, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shuping Li
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical proximity correction method and method of fabricating a sem...
- Patent number 12,210,290
- Issue date Jan 28, 2025
- Samsung Electronics Co., Ltd.
- Pilsoo Kang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Training methods for machine learning assisted optical proximity error
- Patent number 12,204,250
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Jing Su
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical mode optimization for wafer inspection
- Patent number 12,204,842
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bing-Siang Chao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Digital lithography scan sequencing
- Patent number 12,189,299
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Ying-Chiao Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing an optical system and optical system
- Patent number 12,189,301
- Issue date Jan 7, 2025
- Karlsruhe Institute of Technology
- Philipp-Immanuel Dietrich
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Scanning interference lithographic system
- Patent number 12,189,300
- Issue date Jan 7, 2025
- Tsinghua University; Beijing U-Precision Tech Co., Ltd.
- Leijie Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computational metrology
- Patent number 12,189,302
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Liquid amount measuring method and computer-readable recording medium
- Patent number 12,174,549
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Yuichiro Kunugimoto
- B08 - CLEANING
Information Patent Grant
Storage for extreme ultraviolet light lithography
- Patent number 12,169,369
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Guancyun Li
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for coloring circuit layout and system for performing the same
- Patent number 12,159,092
- Issue date Dec 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Ping Chiang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for aligned stitching
- Patent number 12,154,862
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chia Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-component kernels for vector optical image simulation
- Patent number 12,153,349
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kenneth Lik Kin Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for direct writing photoetching by parallel in...
- Patent number 12,130,554
- Issue date Oct 29, 2024
- ZHEJIANG LAB
- Cuifang Kuang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for printing a periodic pattern with a varying...
- Patent number 12,124,170
- Issue date Oct 22, 2024
- Eulitha A.G.
- Francis Clube
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase plate and fabrication method for color-separated laser backli...
- Patent number 12,124,070
- Issue date Oct 22, 2024
- Meta Platforms Technologies, LLC
- Jian Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to manufacture nano ridges in hard ceramic coatings
- Patent number 12,111,581
- Issue date Oct 8, 2024
- ASML Holding N.V.
- Mehmet Ali Akbas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arrangement apparatus and arrangement method
- Patent number 12,112,962
- Issue date Oct 8, 2024
- Shinkawa Ltd.
- Kohei Seyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling a lithographic system
- Patent number 12,099,306
- Issue date Sep 24, 2024
- ASML Netherlands B.V.
- Oscar Franciscus Jozephus Noordman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF CONFIGURING EXTREME ULTRA-VIOLET (EUV) LIGHT SOURCE AND E...
- Publication number 20250138431
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Sungmin Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Bottom-Up Main Pole Electroplating For A Magnetic Recording Write Head
- Publication number 20250138432
- Publication date May 1, 2025
- HEADWAY TECHNOLOGIES, INC.
- Cherng-Chyi Han
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHOD OF FORMING PATTERNS, SEMICONDUCTOR MEMORY DEVICE, AND METHOD...
- Publication number 20250140558
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Yeongsup SOHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR REPLICATING A MASTER HOLOGRAPHIC OPTICAL ELEMENT WITH VA...
- Publication number 20250130506
- Publication date Apr 24, 2025
- Carl Zeiss Jena GmbH
- Markus GIEHL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING OPTICAL ELEMENT
- Publication number 20250130507
- Publication date Apr 24, 2025
- MITSUBISHI CHEMICAL CORPORATION
- Ken SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK DESIGN DEVICE FOR 3D PROXIMITY FIELD PATTERNING BASED ON ELECT...
- Publication number 20250123554
- Publication date Apr 17, 2025
- POSTECH Research and Business Development Foundation
- Jun Suk RHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR PATTERNED LAYER DESIGN AND FORMATION
- Publication number 20250123553
- Publication date Apr 17, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Yu-Chen CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STITCHING METHOD FOR EXPOSURE PROCESS
- Publication number 20250116941
- Publication date Apr 10, 2025
- Powerchip Semiconductor Manufacturing Corporation
- Shou-Zen Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method of semiconductor pattern
- Publication number 20250102922
- Publication date Mar 27, 2025
- UNITED MICROELECTRONICS CORP.
- Shin-Hung Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADAPTIVE TARGET CONTROL FOR CURVILINEAR OPTICAL PROXIMITY CORRECTIO...
- Publication number 20250102921
- Publication date Mar 27, 2025
- Siemens Industry Software Inc.
- George P. Lippincott
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EDGE PLACEMENT WITH SPATIAL LIGHT MODULATOR WRITING
- Publication number 20250093783
- Publication date Mar 20, 2025
- Mycronic AB
- Martin GLIMTOFT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK QUALITY MANAGEMENT SYSTEM
- Publication number 20250093769
- Publication date Mar 20, 2025
- SAMSUNG DISPLAY CO., LTD.
- SUNGMIN HUR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTER IMPLEMENTED METHOD FOR SIMULATING AN AERIAL IMAGE OF A MOD...
- Publication number 20250085640
- Publication date Mar 13, 2025
- Carl Zeiss SMT GMBH
- Niklas Georg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN PREDICTION DEVICE AND RESIST PATTERN PREDICTION DEVI...
- Publication number 20250076772
- Publication date Mar 6, 2025
- Samsung Electronics Co., Ltd.
- Hanveen Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STORAGE FOR EXTREME ULTRAVIOLET LIGHT LITHOGRAPHY
- Publication number 20250068088
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Guancyun LI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR...
- Publication number 20250069899
- Publication date Feb 27, 2025
- Samsung Electronics Co., Ltd.
- Jakyoung Gu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A METHOD AND APPARATUS FOR IMPROVING THE UNIFORMITY OF EXPOSURE OF...
- Publication number 20250053095
- Publication date Feb 13, 2025
- EULITHA A.G.
- FRANCIS CLUBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PERFORMANCE QUALIFICATION AND ASSOCIATED APPARATUSES
- Publication number 20250044707
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Alina Nicoleta TARAU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD, INFORMATION PROCE...
- Publication number 20250036032
- Publication date Jan 30, 2025
- Canon Kabushiki Kaisha
- FUMA KIZU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING A MECHANICAL PROPERTY OF A LAYER APPLIED TO...
- Publication number 20250028254
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Huaichen ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND RELATED METHODS FOR FORMING STRUCTURES OF DI...
- Publication number 20250028251
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- Thomas L. LAIDIG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION
- Publication number 20250021015
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Jin CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR LITHOGRAPHIC TOOLS WITH INCREASED TOLERANCES
- Publication number 20250021012
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Jasper WINTERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED...
- Publication number 20250021014
- Publication date Jan 16, 2025
- TSINGHUA UNIVERSITY
- Zhen ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY METHOD AND METHOD FOR TRAINING A DATA STRUCTURE FOR USE I...
- Publication number 20250014164
- Publication date Jan 9, 2025
- ASML NETHERLANDS B.V.
- Vasco Tomas TENNER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EXPOSURE APPARATUS, CONTROL METHOD, AND METHOD OF MANUFACTURING ART...
- Publication number 20250004388
- Publication date Jan 2, 2025
- Canon Kabushiki Kaisha
- HIRONOBU FUJISHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPTIMIZING LAYOUT PATTERN AND SEMICONDUCTOR WAFER
- Publication number 20250006562
- Publication date Jan 2, 2025
- WINBOND ELECTRONICS CORP.
- Chun-Hung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STITCH STRUCTURE AND METHOD FOR FORMING THE SAME
- Publication number 20250004201
- Publication date Jan 2, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- YOU-CHENG LU
- G02 - OPTICS
Information Patent Application
OPTICAL PROXIMITY CORRECTION METHOD AND METHOD OF FABRICATING SEMIC...
- Publication number 20240419084
- Publication date Dec 19, 2024
- Samsung Electronics Co., Ltd.
- HEUNGSUK OH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI HEAD SCANNING LITHOGRAPHIC LASER WRITER
- Publication number 20240411231
- Publication date Dec 12, 2024
- Mycronic AB
- Andrzej Karawajczyk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Scanned exposure beam

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and apparatus for fabrication of large area 3D photonic crys...

Systems and methods for direct laser writing

Backside deposition tuning of stress to control wafer bow in semico...

Parallel mask rule checking on evolving mask shapes in optical prox...

Semiconductor manufacturing apparatus and method thereof

Optical proximity correction and photomasks

Exposure apparatus

Semiconductor device with grating structure

Apparatus and method for optically processing an object

Selective patterning with wet-dry bilayer resist

Information processing apparatus and information processing method

Method for correcting mask pattern, apparatus for correcting mask p...

Optical proximity correction method and method of fabricating a sem...

Training methods for machine learning assisted optical proximity error

Optical mode optimization for wafer inspection

Digital lithography scan sequencing

Method for producing an optical system and optical system

Scanning interference lithographic system

Computational metrology

Liquid amount measuring method and computer-readable recording medium

Storage for extreme ultraviolet light lithography

Method for coloring circuit layout and system for performing the same

System and method for aligned stitching

Multi-component kernels for vector optical image simulation

Method and apparatus for direct writing photoetching by parallel in...

Method and apparatus for printing a periodic pattern with a varying...

Phase plate and fabrication method for color-separated laser backli...

Method to manufacture nano ridges in hard ceramic coatings

Arrangement apparatus and arrangement method

Method for controlling a lithographic system

Patents Applicationslast 30 patents

METHOD OF CONFIGURING EXTREME ULTRA-VIOLET (EUV) LIGHT SOURCE AND E...

Bottom-Up Main Pole Electroplating For A Magnetic Recording Write Head

METHOD OF FORMING PATTERNS, SEMICONDUCTOR MEMORY DEVICE, AND METHOD...

DEVICE FOR REPLICATING A MASTER HOLOGRAPHIC OPTICAL ELEMENT WITH VA...

METHOD FOR PRODUCING OPTICAL ELEMENT

MASK DESIGN DEVICE FOR 3D PROXIMITY FIELD PATTERNING BASED ON ELECT...

SYSTEM AND METHOD FOR PATTERNED LAYER DESIGN AND FORMATION

STITCHING METHOD FOR EXPOSURE PROCESS

Exposure method of semiconductor pattern

ADAPTIVE TARGET CONTROL FOR CURVILINEAR OPTICAL PROXIMITY CORRECTIO...

EDGE PLACEMENT WITH SPATIAL LIGHT MODULATOR WRITING

MASK QUALITY MANAGEMENT SYSTEM

COMPUTER IMPLEMENTED METHOD FOR SIMULATING AN AERIAL IMAGE OF A MOD...

RESIST PATTERN PREDICTION DEVICE AND RESIST PATTERN PREDICTION DEVI...

STORAGE FOR EXTREME ULTRAVIOLET LIGHT LITHOGRAPHY

SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR...

A METHOD AND APPARATUS FOR IMPROVING THE UNIFORMITY OF EXPOSURE OF...

LITHOGRAPHIC PERFORMANCE QUALIFICATION AND ASSOCIATED APPARATUSES

LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD, INFORMATION PROCE...

METHODS OF DETERMINING A MECHANICAL PROPERTY OF A LAYER APPLIED TO...

LITHOGRAPHY SYSTEM AND RELATED METHODS FOR FORMING STRUCTURES OF DI...

DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION

SYSTEMS AND METHODS FOR LITHOGRAPHIC TOOLS WITH INCREASED TOLERANCES

SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED...

METROLOGY METHOD AND METHOD FOR TRAINING A DATA STRUCTURE FOR USE I...

EXPOSURE APPARATUS, CONTROL METHOD, AND METHOD OF MANUFACTURING ART...

METHOD FOR OPTIMIZING LAYOUT PATTERN AND SEMICONDUCTOR WAFER

SEMICONDUCTOR STITCH STRUCTURE AND METHOD FOR FORMING THE SAME

OPTICAL PROXIMITY CORRECTION METHOD AND METHOD OF FABRICATING SEMIC...

MULTI HEAD SCANNING LITHOGRAPHIC LASER WRITER