Scanned exposure beam

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CPC
G03F7/704

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/704Scanned exposure beam

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method for correcting mask pattern, apparatus for correcting mask p...
- Patent number 12,216,979
- Issue date Feb 4, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shuping Li
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical proximity correction method and method of fabricating a sem...
- Patent number 12,210,290
- Issue date Jan 28, 2025
- Samsung Electronics Co., Ltd.
- Pilsoo Kang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Training methods for machine learning assisted optical proximity error
- Patent number 12,204,250
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Jing Su
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical mode optimization for wafer inspection
- Patent number 12,204,842
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bing-Siang Chao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Digital lithography scan sequencing
- Patent number 12,189,299
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Ying-Chiao Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing an optical system and optical system
- Patent number 12,189,301
- Issue date Jan 7, 2025
- Karlsruhe Institute of Technology
- Philipp-Immanuel Dietrich
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Scanning interference lithographic system
- Patent number 12,189,300
- Issue date Jan 7, 2025
- Tsinghua University; Beijing U-Precision Tech Co., Ltd.
- Leijie Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Computational metrology
- Patent number 12,189,302
- Issue date Jan 7, 2025
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Liquid amount measuring method and computer-readable recording medium
- Patent number 12,174,549
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Yuichiro Kunugimoto
- B08 - CLEANING
Information Patent Grant
Storage for extreme ultraviolet light lithography
- Patent number 12,169,369
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Guancyun Li
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for coloring circuit layout and system for performing the same
- Patent number 12,159,092
- Issue date Dec 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chia-Ping Chiang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for aligned stitching
- Patent number 12,154,862
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Chia Hu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-component kernels for vector optical image simulation
- Patent number 12,153,349
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kenneth Lik Kin Ho
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for direct writing photoetching by parallel in...
- Patent number 12,130,554
- Issue date Oct 29, 2024
- ZHEJIANG LAB
- Cuifang Kuang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for printing a periodic pattern with a varying...
- Patent number 12,124,170
- Issue date Oct 22, 2024
- Eulitha A.G.
- Francis Clube
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase plate and fabrication method for color-separated laser backli...
- Patent number 12,124,070
- Issue date Oct 22, 2024
- Meta Platforms Technologies, LLC
- Jian Xu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to manufacture nano ridges in hard ceramic coatings
- Patent number 12,111,581
- Issue date Oct 8, 2024
- ASML Holding N.V.
- Mehmet Ali Akbas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Arrangement apparatus and arrangement method
- Patent number 12,112,962
- Issue date Oct 8, 2024
- Shinkawa Ltd.
- Kohei Seyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling a lithographic system
- Patent number 12,099,306
- Issue date Sep 24, 2024
- ASML Netherlands B.V.
- Oscar Franciscus Jozephus Noordman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and computing device for manufacturing semiconductor device
- Patent number 12,093,630
- Issue date Sep 17, 2024
- Samsung Electronics Co., Ltd.
- Sooyong Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask topology optimization method and system for surface plasmon ne...
- Patent number 12,092,960
- Issue date Sep 17, 2024
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang Luo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Interferometric lithography grating-mask-based wafer-scale large-ar...
- Patent number 12,092,959
- Issue date Sep 17, 2024
- UNM Rainforest Innovations
- Steven R. J. Brueck
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device manufacturing method and extreme ultraviolet m...
- Patent number 12,092,961
- Issue date Sep 17, 2024
- Samsung Electronics Co., Ltd.
- Sang Chul Yeo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for inverse optical proximity correction of super-resolution...
- Patent number 12,085,846
- Issue date Sep 10, 2024
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang Luo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Layout correction method
- Patent number 12,078,924
- Issue date Sep 3, 2024
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Tingting Xu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
IC device layout method
- Patent number 12,079,559
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shih-Wei Peng
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for fabricating mask, method for fabricating semiconductor d...
- Patent number 12,068,327
- Issue date Aug 20, 2024
- Samsung Electronics Co., Ltd.
- Myoung-Ho Kang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inspection tool for an extreme ultraviolet radiation source to obse...
- Patent number 12,066,761
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chiao-Hua Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
3-side buttable stitched image sensor
- Patent number 12,061,420
- Issue date Aug 13, 2024
- IMASENIC ADVANCED IMAGING S.L.
- Renato Turchetta
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for correcting semiconductor mask pattern and semiconductor...
- Patent number 12,055,849
- Issue date Aug 6, 2024
- United Microelectronics Corp.
- Sheng-Lun Tseng
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
A METHOD AND APPARATUS FOR IMPROVING THE UNIFORMITY OF EXPOSURE OF...
- Publication number 20250053095
- Publication date Feb 13, 2025
- EULITHA A.G.
- FRANCIS CLUBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PERFORMANCE QUALIFICATION AND ASSOCIATED APPARATUSES
- Publication number 20250044707
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Alina Nicoleta TARAU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD, INFORMATION PROCE...
- Publication number 20250036032
- Publication date Jan 30, 2025
- Canon Kabushiki Kaisha
- FUMA KIZU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING A MECHANICAL PROPERTY OF A LAYER APPLIED TO...
- Publication number 20250028254
- Publication date Jan 23, 2025
- ASML NETHERLANDS B.V.
- Huaichen ZHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY SYSTEM AND RELATED METHODS FOR FORMING STRUCTURES OF DI...
- Publication number 20250028251
- Publication date Jan 23, 2025
- Applied Materials, Inc.
- Thomas L. LAIDIG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION
- Publication number 20250021015
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Jin CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR LITHOGRAPHIC TOOLS WITH INCREASED TOLERANCES
- Publication number 20250021012
- Publication date Jan 16, 2025
- ASML NETHERLANDS B.V.
- Jasper WINTERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED...
- Publication number 20250021014
- Publication date Jan 16, 2025
- TSINGHUA UNIVERSITY
- Zhen ZHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY METHOD AND METHOD FOR TRAINING A DATA STRUCTURE FOR USE I...
- Publication number 20250014164
- Publication date Jan 9, 2025
- ASML NETHERLANDS B.V.
- Vasco Tomas TENNER
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EXPOSURE APPARATUS, CONTROL METHOD, AND METHOD OF MANUFACTURING ART...
- Publication number 20250004388
- Publication date Jan 2, 2025
- Canon Kabushiki Kaisha
- HIRONOBU FUJISHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPTIMIZING LAYOUT PATTERN AND SEMICONDUCTOR WAFER
- Publication number 20250006562
- Publication date Jan 2, 2025
- WINBOND ELECTRONICS CORP.
- Chun-Hung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STITCH STRUCTURE AND METHOD FOR FORMING THE SAME
- Publication number 20250004201
- Publication date Jan 2, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- YOU-CHENG LU
- G02 - OPTICS
Information Patent Application
OPTICAL PROXIMITY CORRECTION METHOD AND METHOD OF FABRICATING SEMIC...
- Publication number 20240419084
- Publication date Dec 19, 2024
- Samsung Electronics Co., Ltd.
- HEUNGSUK OH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI HEAD SCANNING LITHOGRAPHIC LASER WRITER
- Publication number 20240411231
- Publication date Dec 12, 2024
- Mycronic AB
- Andrzej Karawajczyk
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR A LITHOGRAPHY-BASED GENERATIVE MANUFACTURE OF...
- Publication number 20240408822
- Publication date Dec 12, 2024
- UPNANO GMBH
- Peter GRUBER
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
METHOD FOR NON-INVASIVE PRODUCTION OF DEFINED STRUCTURES INSIDE COM...
- Publication number 20240402608
- Publication date Dec 5, 2024
- Max-Planck-Gesellschaft zur Forderung der Wissenschaften e.V.
- Kerstin GÖPFRICH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UVC LED LIGHT FINISHER FOR DETACKING FLEXOGRAPHIC PRINTING PLATES
- Publication number 20240402607
- Publication date Dec 5, 2024
- ESKO-GRAPHICS IMAGING GMBH
- Thomas Klein
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF FORMING BIOACTIVE PATTERNS USING BEAM PEN LITHOGRAPY-CON...
- Publication number 20240385528
- Publication date Nov 21, 2024
- Northwestern University
- Chad A. Mirkin
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Application
Material for Enhancing the Effects of Exercise
- Publication number 20240385529
- Publication date Nov 21, 2024
- Michael Rudan
- A41 - WEARING APPAREL
Information Patent Application
EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, EXPOSURE DEVICE, AND...
- Publication number 20240377754
- Publication date Nov 14, 2024
- Nikon Corporation
- Yoji WATANABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS
- Publication number 20240377755
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Peter Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES
- Publication number 20240377744
- Publication date Nov 14, 2024
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO MANUFACTURE NANO RIDGES IN HARD CERAMIC COATINGS
- Publication number 20240369947
- Publication date Nov 7, 2024
- ASML Holding N.V.
- Mehmet Ali AKBAS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND COMPUTER PROGRAMS FOR DATA MAPPING FOR LOW DIMENSIONAL...
- Publication number 20240369943
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Kedir Mohammed ADAL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FABRICATING MASK, METHOD FOR FABRICATING SEMICONDUCTOR D...
- Publication number 20240371886
- Publication date Nov 7, 2024
- Samsung Electronics Co., Ltd.
- Myoung-Ho KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IC DEVICE
- Publication number 20240370628
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Wei PENG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERN SELECTION FOR SOURCE MASK OPTIMIZATION AND TARGET OPTIMIZATION
- Publication number 20240369940
- Publication date Nov 7, 2024
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY CONTAMINATION CONTROL
- Publication number 20240361708
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chieh HSIEH
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
METHOD FOR PRODUCING FLEXIBLE PRINTED WIRING BOARD
- Publication number 20240365469
- Publication date Oct 31, 2024
- FUJIKURA PRINTED CIRCUITS LTD.
- Daisuke Arai
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
NOVEL DESIGN OF AN INSPECTION TOOL FOR AN EXTREME ULTRAVIOLET RADIA...
- Publication number 20240361701
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chiao-Hua CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Scanned exposure beam

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method for correcting mask pattern, apparatus for correcting mask p...

Optical proximity correction method and method of fabricating a sem...

Training methods for machine learning assisted optical proximity error

Optical mode optimization for wafer inspection

Digital lithography scan sequencing

Method for producing an optical system and optical system

Scanning interference lithographic system

Computational metrology

Liquid amount measuring method and computer-readable recording medium

Storage for extreme ultraviolet light lithography

Method for coloring circuit layout and system for performing the same

System and method for aligned stitching

Multi-component kernels for vector optical image simulation

Method and apparatus for direct writing photoetching by parallel in...

Method and apparatus for printing a periodic pattern with a varying...

Phase plate and fabrication method for color-separated laser backli...

Method to manufacture nano ridges in hard ceramic coatings

Arrangement apparatus and arrangement method

Method for controlling a lithographic system

Method and computing device for manufacturing semiconductor device

Mask topology optimization method and system for surface plasmon ne...

Interferometric lithography grating-mask-based wafer-scale large-ar...

Semiconductor device manufacturing method and extreme ultraviolet m...

Method for inverse optical proximity correction of super-resolution...

Layout correction method

IC device layout method

Method for fabricating mask, method for fabricating semiconductor d...

Inspection tool for an extreme ultraviolet radiation source to obse...

3-side buttable stitched image sensor

Method for correcting semiconductor mask pattern and semiconductor...

Patents Applicationslast 30 patents

A METHOD AND APPARATUS FOR IMPROVING THE UNIFORMITY OF EXPOSURE OF...

LITHOGRAPHIC PERFORMANCE QUALIFICATION AND ASSOCIATED APPARATUSES

LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD, INFORMATION PROCE...

METHODS OF DETERMINING A MECHANICAL PROPERTY OF A LAYER APPLIED TO...

LITHOGRAPHY SYSTEM AND RELATED METHODS FOR FORMING STRUCTURES OF DI...

DETERMINING AN ETCH EFFECT BASED ON AN ETCH BIAS DIRECTION

SYSTEMS AND METHODS FOR LITHOGRAPHIC TOOLS WITH INCREASED TOLERANCES

SCANNING ELECTRON MICROSCOPIC DIRECT-WRITE LITHOGRAPHY SYSTEM BASED...

METROLOGY METHOD AND METHOD FOR TRAINING A DATA STRUCTURE FOR USE I...

EXPOSURE APPARATUS, CONTROL METHOD, AND METHOD OF MANUFACTURING ART...

METHOD FOR OPTIMIZING LAYOUT PATTERN AND SEMICONDUCTOR WAFER

SEMICONDUCTOR STITCH STRUCTURE AND METHOD FOR FORMING THE SAME

OPTICAL PROXIMITY CORRECTION METHOD AND METHOD OF FABRICATING SEMIC...

MULTI HEAD SCANNING LITHOGRAPHIC LASER WRITER

METHOD AND DEVICE FOR A LITHOGRAPHY-BASED GENERATIVE MANUFACTURE OF...

METHOD FOR NON-INVASIVE PRODUCTION OF DEFINED STRUCTURES INSIDE COM...

UVC LED LIGHT FINISHER FOR DETACKING FLEXOGRAPHIC PRINTING PLATES

METHODS OF FORMING BIOACTIVE PATTERNS USING BEAM PEN LITHOGRAPY-CON...

Material for Enhancing the Effects of Exercise

EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, EXPOSURE DEVICE, AND...

MULTIPLE-MASK MULTIPLE-EXPOSURE LITHOGRAPHY AND MASKS

LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES

METHOD TO MANUFACTURE NANO RIDGES IN HARD CERAMIC COATINGS

METHODS AND COMPUTER PROGRAMS FOR DATA MAPPING FOR LOW DIMENSIONAL...

METHOD FOR FABRICATING MASK, METHOD FOR FABRICATING SEMICONDUCTOR D...

IC DEVICE

PATTERN SELECTION FOR SOURCE MASK OPTIMIZATION AND TARGET OPTIMIZATION

LITHOGRAPHY CONTAMINATION CONTROL

METHOD FOR PRODUCING FLEXIBLE PRINTED WIRING BOARD

NOVEL DESIGN OF AN INSPECTION TOOL FOR AN EXTREME ULTRAVIOLET RADIA...