Scanned exposure beam

Industry

CPC
G03F7/704

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/704Scanned exposure beam

Industries

Patents Grantslast 30 patents

Information Patent Grant
Methods and systems for reticle enhancement technology of a design...
- Patent number 12,340,164
- Issue date Jun 24, 2025
- D2S, Inc.
- Akira Fujimura
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Wet-dry bilayer resist dual tone exposure
- Patent number 12,327,726
- Issue date Jun 10, 2025
- Tokyo Electron Limited
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor lithography system and/or method
- Patent number 12,321,100
- Issue date Jun 3, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Tsiao-Chen Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern layout and the forming method thereof
- Patent number 12,309,993
- Issue date May 20, 2025
- Fujian Jinhua Integrated Circuit Co., Ltd.
- Yifei Yan
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical imaging method, device and system for photolithography system
- Patent number 12,306,543
- Issue date May 20, 2025
- Wuhan Yuwei Optical Software Co., Ltd.
- Haiqing Wei
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for measuring stitching overlay accuracy of image sensor sti...
- Patent number 12,306,547
- Issue date May 20, 2025
- Shanghai Huali Microelectronics Corporation
- Yu Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimization of a digital pattern file for a digital lithography de...
- Patent number 12,302,641
- Issue date May 13, 2025
- Applied Materials, Inc.
- Chung-Shin Kang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of manufacturing a semiconductor device
- Patent number 12,299,368
- Issue date May 13, 2025
- Samsung Electronics Co., Ltd.
- Akio Misaka
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor processing tool and methods of operation
- Patent number 12,298,672
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kai-Chieh Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing photo masks
- Patent number 12,298,673
- Issue date May 13, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Cheng Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV wafer defect improvement and method of collecting nonconductive...
- Patent number 12,292,695
- Issue date May 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tao-Hsin Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Image stitching method for stitching product
- Patent number 12,292,692
- Issue date May 6, 2025
- Shanghai Huali Microelectronics Corporation
- Xiaobin Zhu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Data inspection for digital lithography for HVM using offline and i...
- Patent number 12,292,693
- Issue date May 6, 2025
- Applied Materials, Inc.
- Chung-Shin Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for fabrication of large area 3D photonic crys...
- Patent number 12,287,571
- Issue date Apr 29, 2025
- Steven R.J. Brueck
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Systems and methods for direct laser writing
- Patent number 12,282,261
- Issue date Apr 22, 2025
- Northwestern University
- Sridhar Krishnaswamy
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Backside deposition tuning of stress to control wafer bow in semico...
- Patent number 12,276,922
- Issue date Apr 15, 2025
- Tokyo Electron Limited
- Daniel Fulford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Parallel mask rule checking on evolving mask shapes in optical prox...
- Patent number 12,271,676
- Issue date Apr 8, 2025
- NVIDIA Corporation
- Kumara Narasimha Sastry Kunigal
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor manufacturing apparatus and method thereof
- Patent number 12,265,327
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Ching-Hai Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Optical proximity correction and photomasks
- Patent number 12,265,334
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Dong-Yo Jheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus
- Patent number 12,265,337
- Issue date Apr 1, 2025
- ASML Netherlands B.V.
- Junichi Kanehara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor device with grating structure
- Patent number 12,259,658
- Issue date Mar 25, 2025
- NANYA TECHNOLOGY CORPORATION
- Chun-Yen Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and method for optically processing an object
- Patent number 12,253,803
- Issue date Mar 18, 2025
- Karlsruher Institut für Technologie
- Matthias Lauermann
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Selective patterning with wet-dry bilayer resist
- Patent number 12,249,508
- Issue date Mar 11, 2025
- Tokyo Electron Limited
- Anton J. deVilliers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Information processing apparatus and information processing method
- Patent number 12,242,765
- Issue date Mar 4, 2025
- Canon Kabushiki Kaisha
- Naoki Miyata
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for correcting mask pattern, apparatus for correcting mask p...
- Patent number 12,216,979
- Issue date Feb 4, 2025
- CHANGXIN MEMORY TECHNOLOGIES, INC.
- Shuping Li
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical proximity correction method and method of fabricating a sem...
- Patent number 12,210,290
- Issue date Jan 28, 2025
- Samsung Electronics Co., Ltd.
- Pilsoo Kang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Training methods for machine learning assisted optical proximity error
- Patent number 12,204,250
- Issue date Jan 21, 2025
- ASML Netherlands B.V.
- Jing Su
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical mode optimization for wafer inspection
- Patent number 12,204,842
- Issue date Jan 21, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bing-Siang Chao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Digital lithography scan sequencing
- Patent number 12,189,299
- Issue date Jan 7, 2025
- Applied Materials, Inc.
- Ying-Chiao Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing an optical system and optical system
- Patent number 12,189,301
- Issue date Jan 7, 2025
- Karlsruhe Institute of Technology
- Philipp-Immanuel Dietrich
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR IMAGING A MASK LAYER WITH TWO IMAGING SETTINGS AND ASSOC...
- Publication number 20250208514
- Publication date Jun 26, 2025
- XSYS PREPRESS N.V.
- Dirk Ludo Julien DE RAUW
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
A METHOD FOR DETERMINING A VERTICAL POSITION OF A STRUCTURE ON A SU...
- Publication number 20250208520
- Publication date Jun 26, 2025
- ASML NETHERLANDS B.V.
- Arie Jeffrey DEN BOEF
- G01 - MEASURING TESTING
Information Patent Application
ELECTRON PROBE POSITIONING PATTERN, DISPLACEMENT MEASUREMENT METHOD...
- Publication number 20250208518
- Publication date Jun 26, 2025
- HUNAN UNIVERSITY
- Koichi MATSUDA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GRAYSCALE LITHOGRAPHY MANUFACTURE OF A WAVEGUIDE DISPLAY
- Publication number 20250199213
- Publication date Jun 19, 2025
- Meta Platforms Technologies, LLC
- Zheyi Han
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC PATTERN REPRESENTATION WITH CURVILINEAR ELEMENTS
- Publication number 20250189881
- Publication date Jun 12, 2025
- ASML NETHERLANDS B.V.
- Ya LUO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHOD FOR CALIBRATING A FLUID DISPENSER
- Publication number 20250189899
- Publication date Jun 12, 2025
- Canon Kabushiki Kaisha
- Qi Ni
- B82 - NANO-TECHNOLOGY
Information Patent Application
OPTICAL PROXIMITY CORRECTION (OPC) METHOD, AND METHOD OF MANUFACTUR...
- Publication number 20250172880
- Publication date May 29, 2025
- Samsung Electronics Co., Ltd.
- Jihyeon Woo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTION DEVICE AND METHOD FOR OPERATING THE SAME
- Publication number 20250172520
- Publication date May 29, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ya-Chin KING
- G01 - MEASURING TESTING
Information Patent Application
ALIGNMENT METHOD BASED ON HOLOGRAPHIC LITHOGRAPHY, SYSTEM AND DEVICE
- Publication number 20250155829
- Publication date May 15, 2025
- HYPER-OPTICS (BEIJING) TECHNOLOGIES LTD.
- Wen XIE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FIELD OF VIEW SELECTION FOR METROLOGY ASSOCIATED WITH SEMICONDUCTOR...
- Publication number 20250147433
- Publication date May 8, 2025
- ASML NETHERLANDS B.V.
- Tsung-Pao FANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...
- Publication number 20250149336
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Yonghoon MOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CONFIGURING EXTREME ULTRA-VIOLET (EUV) LIGHT SOURCE AND E...
- Publication number 20250138431
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Sungmin Nam
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Bottom-Up Main Pole Electroplating For A Magnetic Recording Write Head
- Publication number 20250138432
- Publication date May 1, 2025
- HEADWAY TECHNOLOGIES, INC.
- Cherng-Chyi Han
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METHOD OF FORMING PATTERNS, SEMICONDUCTOR MEMORY DEVICE, AND METHOD...
- Publication number 20250140558
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Yeongsup SOHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE FOR REPLICATING A MASTER HOLOGRAPHIC OPTICAL ELEMENT WITH VA...
- Publication number 20250130506
- Publication date Apr 24, 2025
- Carl Zeiss Jena GmbH
- Markus GIEHL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING OPTICAL ELEMENT
- Publication number 20250130507
- Publication date Apr 24, 2025
- MITSUBISHI CHEMICAL CORPORATION
- Ken SATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK DESIGN DEVICE FOR 3D PROXIMITY FIELD PATTERNING BASED ON ELECT...
- Publication number 20250123554
- Publication date Apr 17, 2025
- POSTECH Research and Business Development Foundation
- Jun Suk RHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR PATTERNED LAYER DESIGN AND FORMATION
- Publication number 20250123553
- Publication date Apr 17, 2025
- Taiwan Semiconductor Manufacturing Company Limited
- Yu-Chen CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STITCHING METHOD FOR EXPOSURE PROCESS
- Publication number 20250116941
- Publication date Apr 10, 2025
- Powerchip Semiconductor Manufacturing Corporation
- Shou-Zen Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure method of semiconductor pattern
- Publication number 20250102922
- Publication date Mar 27, 2025
- UNITED MICROELECTRONICS CORP.
- Shin-Hung Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADAPTIVE TARGET CONTROL FOR CURVILINEAR OPTICAL PROXIMITY CORRECTIO...
- Publication number 20250102921
- Publication date Mar 27, 2025
- Siemens Industry Software Inc.
- George P. Lippincott
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EDGE PLACEMENT WITH SPATIAL LIGHT MODULATOR WRITING
- Publication number 20250093783
- Publication date Mar 20, 2025
- Mycronic AB
- Martin GLIMTOFT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK QUALITY MANAGEMENT SYSTEM
- Publication number 20250093769
- Publication date Mar 20, 2025
- SAMSUNG DISPLAY CO., LTD.
- SUNGMIN HUR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPUTER IMPLEMENTED METHOD FOR SIMULATING AN AERIAL IMAGE OF A MOD...
- Publication number 20250085640
- Publication date Mar 13, 2025
- Carl Zeiss SMT GMBH
- Niklas Georg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN PREDICTION DEVICE AND RESIST PATTERN PREDICTION DEVI...
- Publication number 20250076772
- Publication date Mar 6, 2025
- Samsung Electronics Co., Ltd.
- Hanveen Koh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STORAGE FOR EXTREME ULTRAVIOLET LIGHT LITHOGRAPHY
- Publication number 20250068088
- Publication date Feb 27, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Guancyun LI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR...
- Publication number 20250069899
- Publication date Feb 27, 2025
- Samsung Electronics Co., Ltd.
- Jakyoung Gu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A METHOD AND APPARATUS FOR IMPROVING THE UNIFORMITY OF EXPOSURE OF...
- Publication number 20250053095
- Publication date Feb 13, 2025
- EULITHA A.G.
- FRANCIS CLUBE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PERFORMANCE QUALIFICATION AND ASSOCIATED APPARATUSES
- Publication number 20250044707
- Publication date Feb 6, 2025
- ASML NETHERLANDS B.V.
- Alina Nicoleta TARAU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD, INFORMATION PROCE...
- Publication number 20250036032
- Publication date Jan 30, 2025
- Canon Kabushiki Kaisha
- FUMA KIZU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Scanned exposure beam

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Methods and systems for reticle enhancement technology of a design...

Wet-dry bilayer resist dual tone exposure

Semiconductor lithography system and/or method

Pattern layout and the forming method thereof

Optical imaging method, device and system for photolithography system

Method for measuring stitching overlay accuracy of image sensor sti...

Optimization of a digital pattern file for a digital lithography de...

Method of manufacturing a semiconductor device

Semiconductor processing tool and methods of operation

Method of manufacturing photo masks

EUV wafer defect improvement and method of collecting nonconductive...

Image stitching method for stitching product

Data inspection for digital lithography for HVM using offline and i...

Method and apparatus for fabrication of large area 3D photonic crys...

Systems and methods for direct laser writing

Backside deposition tuning of stress to control wafer bow in semico...

Parallel mask rule checking on evolving mask shapes in optical prox...

Semiconductor manufacturing apparatus and method thereof

Optical proximity correction and photomasks

Exposure apparatus

Semiconductor device with grating structure

Apparatus and method for optically processing an object

Selective patterning with wet-dry bilayer resist

Information processing apparatus and information processing method

Method for correcting mask pattern, apparatus for correcting mask p...

Optical proximity correction method and method of fabricating a sem...

Training methods for machine learning assisted optical proximity error

Optical mode optimization for wafer inspection

Digital lithography scan sequencing

Method for producing an optical system and optical system

Patents Applicationslast 30 patents

METHOD FOR IMAGING A MASK LAYER WITH TWO IMAGING SETTINGS AND ASSOC...

A METHOD FOR DETERMINING A VERTICAL POSITION OF A STRUCTURE ON A SU...

ELECTRON PROBE POSITIONING PATTERN, DISPLACEMENT MEASUREMENT METHOD...

GRAYSCALE LITHOGRAPHY MANUFACTURE OF A WAVEGUIDE DISPLAY

LITHOGRAPHIC PATTERN REPRESENTATION WITH CURVILINEAR ELEMENTS

APPARATUS AND METHOD FOR CALIBRATING A FLUID DISPENSER

OPTICAL PROXIMITY CORRECTION (OPC) METHOD, AND METHOD OF MANUFACTUR...

DETECTION DEVICE AND METHOD FOR OPERATING THE SAME

ALIGNMENT METHOD BASED ON HOLOGRAPHIC LITHOGRAPHY, SYSTEM AND DEVICE

FIELD OF VIEW SELECTION FOR METROLOGY ASSOCIATED WITH SEMICONDUCTOR...

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...

METHOD OF CONFIGURING EXTREME ULTRA-VIOLET (EUV) LIGHT SOURCE AND E...

Bottom-Up Main Pole Electroplating For A Magnetic Recording Write Head

METHOD OF FORMING PATTERNS, SEMICONDUCTOR MEMORY DEVICE, AND METHOD...

DEVICE FOR REPLICATING A MASTER HOLOGRAPHIC OPTICAL ELEMENT WITH VA...

METHOD FOR PRODUCING OPTICAL ELEMENT

MASK DESIGN DEVICE FOR 3D PROXIMITY FIELD PATTERNING BASED ON ELECT...

SYSTEM AND METHOD FOR PATTERNED LAYER DESIGN AND FORMATION

STITCHING METHOD FOR EXPOSURE PROCESS

Exposure method of semiconductor pattern

ADAPTIVE TARGET CONTROL FOR CURVILINEAR OPTICAL PROXIMITY CORRECTIO...

EDGE PLACEMENT WITH SPATIAL LIGHT MODULATOR WRITING

MASK QUALITY MANAGEMENT SYSTEM

COMPUTER IMPLEMENTED METHOD FOR SIMULATING AN AERIAL IMAGE OF A MOD...

RESIST PATTERN PREDICTION DEVICE AND RESIST PATTERN PREDICTION DEVI...

STORAGE FOR EXTREME ULTRAVIOLET LIGHT LITHOGRAPHY

SEMICONDUCTOR PACKAGE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR...

A METHOD AND APPARATUS FOR IMPROVING THE UNIFORMITY OF EXPOSURE OF...

LITHOGRAPHIC PERFORMANCE QUALIFICATION AND ASSOCIATED APPARATUSES

LITHOGRAPHY METHOD, ARTICLE MANUFACTURING METHOD, INFORMATION PROCE...