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Inorganic chemistry
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NON-METALLIC ELEMENTS COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
Current Industry
C01B33/00
Silicon Compounds thereof
Sub Industries
C01B33/02
Silicon
C01B33/021
Preparation
C01B33/023
by reduction of silica or free silica-containing material
C01B33/025
with carbon or a solid carbonaceous material
C01B33/027
by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
C01B33/029
by decomposition of monosilane
C01B33/03
by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent
C01B33/031
by decomposition of silicon tetraiodide
C01B33/033
by reduction of silicon halides or halosilanes with a metal or a metallic alloy as the only reducing agents
C01B33/035
by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal
C01B33/037
Purification
C01B33/039
by conversion of the silicon into a compound, optional purification of the compound, and reconversion into silicon
C01B33/04
Hydrides of silicon
C01B33/043
Monosilane
C01B33/046
Purification
C01B33/06
Metal silicides
C01B33/08
Compounds containing halogen
C01B33/10
Compounds containing silicon, fluorine, and other elements
C01B33/103
Fluosilicic acid; Salts thereof
C01B33/107
Halogenated silanes
C01B33/10705
Tetrafluoride
C01B33/1071
Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
C01B33/10715
prepared by reacting chlorine with silicon or a silicon-containing material
C01B33/10721
with the preferential formation of tetrachloride
C01B33/10726
from silicon
C01B33/10731
with the preferential formation of trichlorosilane
C01B33/10736
from silicon
C01B33/10742
prepared by hydrochlorination of silicon or of a silicon-containing material
C01B33/10747
with the preferential formation of tetrachloride
C01B33/10752
from silicon
C01B33/10757
with the preferential formation of trichlorosilane
C01B33/10763
from silicon
C01B33/10768
Tetrabromide; Tetraiodide
C01B33/10773
Halogenated silanes obtained by disproportionation and molecular rearrangement of halogenated silanes
C01B33/10778
Purification
C01B33/10784
by adsorption
C01B33/10789
the adsorbing material being formed in situ
C01B33/10794
by forming addition compounds or complexes, the reactant being possibly contained in an adsorbent
C01B33/113
Silicon oxides Hydrates thereof
C01B33/12
Silica Hydrates thereof
C01B33/122
Lepidoic silicic acid
C01B33/124
Preparation of adsorbing porous silica not in gel form and not finely divided
C01B33/126
Preparation of silica of undetermined type
C01B33/128
by acidic treatment of aqueous silicate solutions
C01B33/14
Colloidal silica
C01B33/141
Preparation of hydrosols or aqueous dispersions
C01B33/1412
by oxidation of silicon in basic medium
C01B33/1415
by suspending finely divided silica in water
C01B33/1417
an aqueous dispersion being obtained
C01B33/142
by acidic treatment of silicates
C01B33/143
of aqueous solutions of silicates
C01B33/1435
using ion exchangers
C01B33/145
Preparation of hydroorganosols, organosols or dispersions in an organic medium
C01B33/146
After-treatment of sols
C01B33/1465
"Build-up" of particles using only one sol and a "heel" consisting or not of the sol
C01B33/148
Concentration Drying Dehydration Stabilisation Purification
C01B33/1485
Stabilisation
C01B33/149
Coating
C01B33/151
by progressively adding a sol to a different sol
C01B33/152
Preparation of hydrogels
C01B33/1525
from or via fluosilicic acid or salts thereof
C01B33/154
by acidic treatment of aqueous silicate solutions
C01B33/1543
using ion exchangers
C01B33/1546
the first formed hydrosol being converted to a hydrogel by introduction into an organic medium immiscible or only partly miscible with water
C01B33/155
Preparation of hydroorganogels or organogels
C01B33/157
After-treatment of gels
C01B33/158
Purification Drying Dehydrating
C01B33/1585
Dehydration into aerogels
C01B33/159
Coating or hydrophobisation
C01B33/16
Preparation of silica xerogels
C01B33/163
by hydrolysis of organosilicon compounds
C01B33/166
by acidification of silicate in the presence of an inert organic phase
C01B33/18
Preparation of finely divided silica neither in sol nor in gel form After-treatment thereof
C01B33/181
by a dry process
C01B33/182
by reduction of a siliceous material
C01B33/183
by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
C01B33/184
by hydrolysis of tetrafluoride
C01B33/185
of crystalline silica-polymorphs having molecular sieve properties
C01B33/186
from or via fluosilicic acid or salts thereof by a wet process
C01B33/187
by acidic treatment of silicates
C01B33/193
of aqueous solutions of silicates
C01B33/20
Silicates
C01B33/22
Magnesium silicates
C01B33/24
Alkaline-earth metal silicates
C01B33/26
Aluminium-containing silicates
C01B33/28
Base exchange silicates
C01B33/2807
Zeolitic silicoaluminates with a tridimensional crystalline structure possessing molecular sieve properties; Isomorphous compounds wherein a part of the aluminium ore of the silicon present may be replaced by other elements such as gallium, germanium, phosphorus; Preparation of zeolitic molecular sieves from molecular sieves of another type or from preformed reacting mixtures
C01B33/2815
of type A (UNION CARBIDE trade name; corresponds to GRACE's types Z-12 or Z-12L)
C01B33/2823
from aqueous solutions of an alkali metal aluminate and an alkali metal silicate excluding any other source of alumina or silica
C01B33/283
from a reaction mixture containing at least one aluminium silicate or aluminosilicate of a clay-type
C01B33/2838
of faujasite type, or type X or Y (UNION CARBIDE trade names; correspond to GRACE's types Z-14 and Z-14HS, respectively)
C01B33/2846
of type X
C01B33/2853
of type Y
C01B33/2861
of mordenite type
C01B33/2869
of other types characterised by an X-ray spectrum and a definite composition
C01B33/2876
from a reacting mixture containing an amine or an organic cation
C01B33/2884
the aluminium or the silicon in the network being partly replaced
C01B33/2892
containing an element or a compound occluded in the pores of the network
C01B33/32
Alkali metal silicates
C01B33/325
After-treatment
C01B33/36
having base-exchange properties but not having molecular sieve properties
C01B33/38
Layered base-exchange silicates
C01B33/40
Clays
C01B33/405
not containing aluminium
C01B33/42
Micas; Interstratified clay-mica products
C01B33/425
not containing aluminium
C01B33/44
Products obtained from layered base-exchange silicates by ion-exchange with organic compounds such as ammonium, phosphonium or sulfonium compounds or by intercalation of organic compounds
C01B33/46
Amorphous silicates
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Issue date
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Publication date
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Publication date
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Publication date
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Publication date
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Publication date
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Publication date
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Publication date
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Publication date
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Publication number
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Publication date
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Publication date
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Publication number
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Publication date
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Publication date
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H01 - BASIC ELECTRIC ELEMENTS
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Publication number
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Publication date
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H01 - BASIC ELECTRIC ELEMENTS
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Publication number
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Publication date
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C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Patent Application
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Publication number
20250059049
Publication date
Feb 20, 2025
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C01 - INORGANIC CHEMISTRY
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Patent Application
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Publication number
20250059050
Publication date
Feb 20, 2025
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C01 - INORGANIC CHEMISTRY
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Patent Application
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Publication number
20250059051
Publication date
Feb 20, 2025
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B82 - NANO-TECHNOLOGY
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Publication number
20250059052
Publication date
Feb 20, 2025
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Owen Evans
C01 - INORGANIC CHEMISTRY
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Patent Application
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Publication number
20250059053
Publication date
Feb 20, 2025
AGC Inc.
Hiromichi KAMO
C01 - INORGANIC CHEMISTRY
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Patent Application
PRECIPITATED SILICA AND METHODS THEREOF
Publication number
20250059054
Publication date
Feb 20, 2025
Evonik Operations GmbH
Karl W. GALLIS
C01 - INORGANIC CHEMISTRY