Sputtering sources

Industry

CPC
H01J2237/081

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/081Sputtering sources

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Single beam plasma source
- Patent number 12,165,829
- Issue date Dec 10, 2024
- Board of Trustees of Michigan State University
- Qi Hua Fan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Device to control uniformity of extracted ion beam
- Patent number 12,154,753
- Issue date Nov 26, 2024
- Applied Materials, Inc.
- Jay T. Scheuer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 12,119,203
- Issue date Oct 15, 2024
- Canon Anelva Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Grant
Ion milling device
- Patent number 12,020,893
- Issue date Jun 25, 2024
- HITACHI HIGH-TECH CORPORATION
- Kengo Asai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing sputtering target, method for forming oxid...
- Patent number 11,967,505
- Issue date Apr 23, 2024
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Composite ion source based upon heterogeneous metal-metal fluoride...
- Patent number 11,887,806
- Issue date Jan 30, 2024
- Applied Materials, Inc.
- Graham Wright
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Partial spray refurbishment of sputtering targets
- Patent number 11,739,416
- Issue date Aug 29, 2023
- H.C. Starck Solutions Euclid, LLC
- Steven A. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for forming substrate surfaces with exposed cr...
- Patent number 11,735,432
- Issue date Aug 22, 2023
- Exogenesis Corporation
- Sean R. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for modifying the wettability and/or other biocompatibility...
- Patent number 11,698,582
- Issue date Jul 11, 2023
- Exogenesis Corporation
- Joseph B. Khoury
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modular microwave source with embedded ground surface
- Patent number 11,670,489
- Issue date Jun 6, 2023
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing sputtering target, method for forming oxid...
- Patent number 11,637,015
- Issue date Apr 25, 2023
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Gratings with variable depths formed using planarization for wavegu...
- Patent number 11,579,364
- Issue date Feb 14, 2023
- Meta Platforms Technologies, LLC
- Matthew E. Colburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal plating of grids for ion beam sputtering
- Patent number 11,581,164
- Issue date Feb 14, 2023
- Excelitas Technologies Corp.
- Eric Baltz
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion beam lithography method based on ion beam lithography system
- Patent number 11,538,653
- Issue date Dec 27, 2022
- Beijing Normal University
- Bin Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
GeH4/Ar plasma chemistry for ion implant productivity enhancement
- Patent number 11,450,504
- Issue date Sep 20, 2022
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source with tubular cathode
- Patent number 11,424,097
- Issue date Aug 23, 2022
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gratings with variable depths formed using planarization for wavegu...
- Patent number 11,402,578
- Issue date Aug 2, 2022
- Meta Platforms Technologies, LLC
- Matthew E. Colburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus, electrode assembly, and method of cl...
- Patent number 11,355,314
- Issue date Jun 7, 2022
- Canon Anelva Corporation
- Yasushi Yasumatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniaxial counter-propagating monolaser atom trap
- Patent number 11,291,103
- Issue date Mar 29, 2022
- GOVERNMENT OF THE UNITED STATES OF AMERICA, AS REPRESENTED BY THE SECRETARY O...
- Stephen Paul Eckel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Partial spray refurbishment of sputtering targets
- Patent number 11,203,809
- Issue date Dec 21, 2021
- H.C. Starck Inc.
- Steven A. Miller
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and apparatus for neutral beam processing based on gas clust...
- Patent number 11,199,769
- Issue date Dec 14, 2021
- Sean R. Kirkpatrick
- B24 - GRINDING POLISHING
Information Patent Grant
Volume scanning electron microscopy of serial thick tissue sections...
- Patent number 11,177,110
- Issue date Nov 16, 2021
- Howard Hughes Medical Institute
- Kenneth J. Hayworth
- G01 - MEASURING TESTING
Information Patent Grant
Gratings with variable etch heights for waveguide displays
- Patent number 11,175,455
- Issue date Nov 16, 2021
- Facebook Technologies, LLC
- Matthew E. Colburn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device, ion source, and ion milling method
- Patent number 11,158,481
- Issue date Oct 26, 2021
- HITACHI HIGH-TECH CORPORATION
- Kengo Asai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing sputtering target, method for forming oxid...
- Patent number 11,139,166
- Issue date Oct 5, 2021
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Modular microwave source with embedded ground surface
- Patent number 11,049,694
- Issue date Jun 29, 2021
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for neutral beam processing based on gas clust...
- Patent number 11,048,162
- Issue date Jun 29, 2021
- Exogenesis Corporation
- Sean R. Kirkpatrick
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Device for generating negative ions by impinging positive ions on a...
- Patent number 11,031,205
- Issue date Jun 8, 2021
- Georg-August-Universitat Gottingen Stiftung Offentlichen Rechts, Universitats...
- Hans Hofsäss
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for ultra-shallow etching using neutral beam processing base...
- Patent number 11,004,692
- Issue date May 11, 2021
- Exogenesis Corporation
- Sean R. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion milling device
- Patent number 11,004,652
- Issue date May 11, 2021
- HITACHI HIGH-TECH CORPORATION
- Asako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ION IMPLANTATION SYSTEM AND RELATED METHODS
- Publication number 20240379320
- Publication date Nov 14, 2024
- Entegris, Inc.
- Ying Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CRENELLATED SAMPLE HOLDER AND SPUTTER TARGET FOR SAMPLE PREPARATION...
- Publication number 20240331969
- Publication date Oct 3, 2024
- FEI Company
- Chad Rue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF...
- Publication number 20240301546
- Publication date Sep 12, 2024
- Applied Materials, Inc.
- Thomas Werner Zilbauer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ION SOURCE HEAD AND ION SOURCE HEAD CURVED LINER, DEFLECTOR, OR REP...
- Publication number 20240249906
- Publication date Jul 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Tang TSENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION MILLING DEVICE
- Publication number 20230352263
- Publication date Nov 2, 2023
- Hitachi High-Tech Corporation
- Kengo ASAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITE ION SOURCE BASED UPON HETEROGENEOUS METAL-METAL FLUORIDE...
- Publication number 20230326703
- Publication date Oct 12, 2023
- Applied Materials, Inc.
- Graham Wright
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING SPUTTERING TARGET, METHOD FOR FORMING OXID...
- Publication number 20230260785
- Publication date Aug 17, 2023
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei YAMAZAKI
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURI...
- Publication number 20220285170
- Publication date Sep 8, 2022
- KIOXIA Corporation
- Junichi HASHIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20220262598
- Publication date Aug 18, 2022
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- B08 - CLEANING
Information Patent Application
METHODS AND SYSTEMS FOR RECLAMATION OF LI-ION CATHODE MATERIALS USI...
- Publication number 20220223379
- Publication date Jul 14, 2022
- 6K Inc.
- Richard K. Holman
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA JET SOLID ABLATION-BASED DIRECT ANALYSIS APPARATUS
- Publication number 20220208522
- Publication date Jun 30, 2022
- CHENGDU ALIEBN SCIENCE AND TECHNOLOGY CO., LTD
- Yanting YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MIXED GAS CLUSTER ION BEAM GENERATOR AND MASS SPECTROMETER INCLUDIN...
- Publication number 20220157554
- Publication date May 19, 2022
- KOREA BASIC SCIENCE INSTITUTE
- Sang Ju LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SPUTTERING TARGET, METHOD FOR FORMING OXID...
- Publication number 20220020586
- Publication date Jan 20, 2022
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei YAMAZAKI
- B82 - NANO-TECHNOLOGY
Information Patent Application
SINGLE BEAM PLASMA SOURCE
- Publication number 20220013324
- Publication date Jan 13, 2022
- Board of Trustees of Michigan State University
- Qi Hua FAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HYDROGEN CO-GAS WHEN USING A CHLORINE-BASED ION SOURCE MATERIAL
- Publication number 20220013323
- Publication date Jan 13, 2022
- Axcelis Technologies, Inc.
- Neil K. Colvin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INHIBITING BACTERIA COLONIZATION WITHOUT ANTIBIOTICS
- Publication number 20210405523
- Publication date Dec 30, 2021
- Exogenesis Corporation
- Joseph Khoury
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODULAR MICROWAVE SOURCE WITH EMBEDDED GROUND SURFACE
- Publication number 20210313153
- Publication date Oct 7, 2021
- Applied Materials, Inc.
- Joseph F. AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETRON SPUTTERING EQUIPMENT
- Publication number 20210225624
- Publication date Jul 22, 2021
- MIASOLÉ EQUIPMENT INTEGRATION (FUJIAN) CO., LTD.
- Yang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR FORMING SUBSTRATE SURFACES WITH EXPOSED CR...
- Publication number 20210225661
- Publication date Jul 22, 2021
- Exogenesis Corporation
- Sean R. Kirkpatrick
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM LITHOGRAPHY METHOD BASED ON ION BEAM LITHOGRAPHY SYSTEM
- Publication number 20210183616
- Publication date Jun 17, 2021
- BEIJING NORMAL UNIVERSITY
- Bin Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...
- Publication number 20210104377
- Publication date Apr 8, 2021
- Canon ANELVA Corporation
- Yasushi Yasumatsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GeH4/Ar Plasma Chemistry For Ion Implant Productivity Enhancement
- Publication number 20210005416
- Publication date Jan 7, 2021
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion Milling Device
- Publication number 20200357602
- Publication date Nov 12, 2020
- Hitachi High-Technologies Corporation
- Asako KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION SOURCE WITH TUBULAR CATHODE
- Publication number 20200343071
- Publication date Oct 29, 2020
- Applied Materials, Inc.
- Bon-Woong Koo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR NEUTRAL BEAM PROCESSING BASED ON GAS CLUST...
- Publication number 20200249565
- Publication date Aug 6, 2020
- Exogenesis Corporation
- Sean R. Kirkpatrick
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING SPUTTERING TARGET, METHOD FOR FORMING OXID...
- Publication number 20200144059
- Publication date May 7, 2020
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei YAMAZAKI
- B82 - NANO-TECHNOLOGY
Information Patent Application
PARTIAL SPRAY REFURBISHMENT OF SPUTTERING TARGETS
- Publication number 20200102643
- Publication date Apr 2, 2020
- Steven A. MILLER
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND SYSTEMS FOR PLASMA DEPOSITION AND TREATMENT
- Publication number 20200090898
- Publication date Mar 19, 2020
- Peter F. Vandermeulen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Compensated Location Specific Processing Apparatus And Method
- Publication number 20200066485
- Publication date Feb 27, 2020
- TEL Epion Inc.
- Matthew C. Gwinn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND SYSTEMS FOR PLASMA DEPOSITION AND TREATMENT
- Publication number 20200058463
- Publication date Feb 20, 2020
- Peter F. Vandermeulen
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Sputtering sources

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Single beam plasma source

Device to control uniformity of extracted ion beam

Ion beam processing apparatus, electrode assembly, and method of cl...

Ion milling device

Method for manufacturing sputtering target, method for forming oxid...

Composite ion source based upon heterogeneous metal-metal fluoride...

Partial spray refurbishment of sputtering targets

Method and apparatus for forming substrate surfaces with exposed cr...

Method for modifying the wettability and/or other biocompatibility...

Modular microwave source with embedded ground surface

Method for manufacturing sputtering target, method for forming oxid...

Gratings with variable depths formed using planarization for wavegu...

Metal plating of grids for ion beam sputtering

Ion beam lithography method based on ion beam lithography system

GeH4/Ar plasma chemistry for ion implant productivity enhancement

Ion source with tubular cathode

Gratings with variable depths formed using planarization for wavegu...

Ion beam processing apparatus, electrode assembly, and method of cl...

Uniaxial counter-propagating monolaser atom trap

Partial spray refurbishment of sputtering targets

Method and apparatus for neutral beam processing based on gas clust...

Volume scanning electron microscopy of serial thick tissue sections...

Gratings with variable etch heights for waveguide displays

Ion milling device, ion source, and ion milling method

Method for manufacturing sputtering target, method for forming oxid...

Modular microwave source with embedded ground surface

Method and apparatus for neutral beam processing based on gas clust...

Device for generating negative ions by impinging positive ions on a...

Method for ultra-shallow etching using neutral beam processing base...

Ion milling device

Patents Applicationslast 30 patents

ION IMPLANTATION SYSTEM AND RELATED METHODS

CRENELLATED SAMPLE HOLDER AND SPUTTER TARGET FOR SAMPLE PREPARATION...

SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF...

ION SOURCE HEAD AND ION SOURCE HEAD CURVED LINER, DEFLECTOR, OR REP...

ION MILLING DEVICE

COMPOSITE ION SOURCE BASED UPON HETEROGENEOUS METAL-METAL FLUORIDE...

METHOD FOR MANUFACTURING SPUTTERING TARGET, METHOD FOR FORMING OXID...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURI...

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

METHODS AND SYSTEMS FOR RECLAMATION OF LI-ION CATHODE MATERIALS USI...

PLASMA JET SOLID ABLATION-BASED DIRECT ANALYSIS APPARATUS

MIXED GAS CLUSTER ION BEAM GENERATOR AND MASS SPECTROMETER INCLUDIN...

METHOD FOR MANUFACTURING SPUTTERING TARGET, METHOD FOR FORMING OXID...

SINGLE BEAM PLASMA SOURCE

HYDROGEN CO-GAS WHEN USING A CHLORINE-BASED ION SOURCE MATERIAL

INHIBITING BACTERIA COLONIZATION WITHOUT ANTIBIOTICS

MODULAR MICROWAVE SOURCE WITH EMBEDDED GROUND SURFACE

MAGNETRON SPUTTERING EQUIPMENT

METHOD AND APPARATUS FOR FORMING SUBSTRATE SURFACES WITH EXPOSED CR...

ION BEAM LITHOGRAPHY METHOD BASED ON ION BEAM LITHOGRAPHY SYSTEM

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CL...

GeH4/Ar Plasma Chemistry For Ion Implant Productivity Enhancement

Ion Milling Device

ION SOURCE WITH TUBULAR CATHODE

METHOD AND APPARATUS FOR NEUTRAL BEAM PROCESSING BASED ON GAS CLUST...

METHOD FOR MANUFACTURING SPUTTERING TARGET, METHOD FOR FORMING OXID...

PARTIAL SPRAY REFURBISHMENT OF SPUTTERING TARGETS

METHODS AND SYSTEMS FOR PLASMA DEPOSITION AND TREATMENT

Compensated Location Specific Processing Apparatus And Method

METHODS AND SYSTEMS FOR PLASMA DEPOSITION AND TREATMENT