Testing or measuring features

Industry

CPC
G03F1/44

This industry / category may be too specific. Please go to a parent level for more data

Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles Mask blanks or pellicles therefor Containers specially adapted therefor Preparation thereof

Current Industry

G03F1/44Testing or measuring features

Industries

Please log in for detailed analytics

Patents Grantslast 30 patents

Information Patent Grant
Wafer carrier with reticle template for marking reticle fields on a...
- Patent number 12,183,609
- Issue date Dec 31, 2024
- Micron Technology, Inc.
- Gabe Glass
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for manufacturing phase masks and lens-less camera module
- Patent number 12,108,134
- Issue date Oct 1, 2024
- Seung Ah Lee
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Targets for diffraction-based overlay error metrology
- Patent number 12,105,414
- Issue date Oct 1, 2024
- KLA Corporation
- Itay Gdor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabricating method of photomask, photomask structure thereof, and s...
- Patent number 12,055,850
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Cheng-Ming Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 12,013,634
- Issue date Jun 18, 2024
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Enforcing mask synthesis consistency across random areas of integra...
- Patent number 11,977,327
- Issue date May 7, 2024
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods for modeling of a design in reticle enhancement technology
- Patent number 11,972,187
- Issue date Apr 30, 2024
- D2S, Inc.
- P. Jeffrey Ungar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask fingerprint using mask sensitive circuit
- Patent number 11,934,094
- Issue date Mar 19, 2024
- International Business Machines Corporation
- Effendi Leobandung
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photomask including fiducial mark and method of making a semiconduc...
- Patent number 11,860,532
- Issue date Jan 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing reflective mask blank, reflective mask bla...
- Patent number 11,852,964
- Issue date Dec 26, 2023
- Hoya Corporation
- Tsutomu Shoki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sub-resolution assist features
- Patent number 11,829,066
- Issue date Nov 28, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kenji Yamazoe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Image pickup apparatus and focus adjustment method using bending co...
- Patent number 11,822,233
- Issue date Nov 21, 2023
- Lasertec Corporation
- Hiroki Miyai
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for generating patterning device pattern at patch boundary
- Patent number 11,797,748
- Issue date Oct 24, 2023
- ASML Netherlands B.V.
- Quan Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Image-based overlay targets incorporating features for pattern reco...
- Patent number 11,748,869
- Issue date Sep 5, 2023
- Intel Corporation
- Martin Weiss
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
EUV in-situ linearity calibration for TDI image sensors using test...
- Patent number 11,733,605
- Issue date Aug 22, 2023
- KLA Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Grant
Method of accelerated hazing of mask assembly
- Patent number 11,703,752
- Issue date Jul 18, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wu-Hung Ko
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fabricating method of photomask, photomask structure thereof, and s...
- Patent number 11,662,660
- Issue date May 30, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Cheng-Ming Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Aperture design and methods thereof
- Patent number 11,656,391
- Issue date May 23, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hung-Chih Hsieh
- G02 - OPTICS
Information Patent Grant
Obtaining a mask using a cost function gradient from a jacobian mat...
- Patent number 11,644,747
- Issue date May 9, 2023
- Synopsys, Inc.
- Thomas Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Fabricating method of photomask, photomask structure thereof, and s...
- Patent number 11,624,978
- Issue date Apr 11, 2023
- Taiwan Semiconductor Manufacturing Company Ltd.
- Cheng-Ming Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for modeling of a design in reticle enhancement technology
- Patent number 11,620,425
- Issue date Apr 4, 2023
- D2S, Inc.
- P. Jeffrey Ungar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-channel device and method for measuring distortion and magnif...
- Patent number 11,604,418
- Issue date Mar 14, 2023
- Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences
- Yisha Cao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for detecting flare degree of lens of exposure machine
- Patent number 11,604,417
- Issue date Mar 14, 2023
- Shanghai Huali Microelectronics Corporation
- Haisheng Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reduction or elimination of pattern placement error in metrology me...
- Patent number 11,537,043
- Issue date Dec 27, 2022
- KLA-Tencor Corporation
- Yoel Feler
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus to anneal EUV mask blank
- Patent number 11,480,866
- Issue date Oct 25, 2022
- Applied Materials, Inc.
- Herng Yau Yoong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask including fiducial mark and method of making semiconducto...
- Patent number 11,422,466
- Issue date Aug 23, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hsin-Chang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology apparatus and method for determining a characteristic rel...
- Patent number 11,385,554
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Miguel Garcia Granda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Enforcing mask synthesis consistency across random areas of integra...
- Patent number 11,360,382
- Issue date Jun 14, 2022
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and patterning devices and apparatuses for measuring focus...
- Patent number 11,314,174
- Issue date Apr 26, 2022
- ASML Netherlands B.V.
- Laurentius Cornelius De Winter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask, mask assembly, exposure machine, method for testing shadowing...
- Patent number 11,307,491
- Issue date Apr 19, 2022
- BOE Technology Group Co., Ltd.
- Jiabin Cui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTOMASK SET, DESIGN METHOD THEREOF, AND MANUFACTURING METHOD OF P...
- Publication number 20240411221
- Publication date Dec 12, 2024
- United Microelectronics Corp.
- Chun-Yi Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK CREATING METHOD, DATA CREATING METHOD, AND ELECTRONIC DEV...
- Publication number 20240329518
- Publication date Oct 3, 2024
- Gigaphoton Inc.
- Koichi FUJII
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR CALIBRATING AN OPERATION ON A PHOTOMASK
- Publication number 20240310721
- Publication date Sep 19, 2024
- Cart Zeiss SMT GmbH
- Michael Budach
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RETICLE-LIKE SENSING ASSEMBLY
- Publication number 20240302733
- Publication date Sep 12, 2024
- MICROPROGRAM INFORMATION CO., LTD.
- TENG YEN WU
- G01 - MEASURING TESTING
Information Patent Application
PHOTOMASK STRUCTURE AND PATTERNING METHOD
- Publication number 20240304445
- Publication date Sep 12, 2024
- WINBOND ELECTRONICS CORP.
- Kao-Tun Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLUSTERED IC DIES TO INCREASE IC DIES PER WAFER
- Publication number 20240282647
- Publication date Aug 22, 2024
- GLOBALFOUNDRIES U.S. Inc.
- Laszlo Andras Fürst
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENFORCING MASK SYNTHESIS CONSISTENCY ACROSS RANDOM AREAS OF INTEGRA...
- Publication number 20240248392
- Publication date Jul 25, 2024
- Synopsys, Inc.
- Thomas Christopher Cecil
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF MEASURING OVERLAY AND SEMICONDUCTOR DEVICE MANUFACTURED U...
- Publication number 20240241451
- Publication date Jul 18, 2024
- Samsung Electronics Co., Ltd.
- Daehee LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRONIC DEVICE
- Publication number 20240241455
- Publication date Jul 18, 2024
- InnoLux Corporation
- Kuang-Ming FAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR MODELING OF A DESIGN IN RETICLE ENHANCEMENT TECHNOLOGY
- Publication number 20240220695
- Publication date Jul 4, 2024
- D2S, INC.
- P. Jeffrey Ungar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOMASK INCLUDING MONITORING MARK
- Publication number 20240192583
- Publication date Jun 13, 2024
- SAMSUNG DISPLAY CO., LTD.
- Yoon Yeol LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR OPTIMIZING MASK PARAMETERS
- Publication number 20240176228
- Publication date May 30, 2024
- Institute of Microelectronics, Chinese Academy of Sciences
- Jianfang HE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DECOUPLING SOURCES OF VARIATION RELATED TO SEMICONDUCTOR...
- Publication number 20240142959
- Publication date May 2, 2024
- ASML NETHERLANDS B.V.
- Jill Elizabeth FREEMAN
- G05 - CONTROLLING REGULATING
Information Patent Application
IMPROVED TARGETS FOR DIFFRACTION-BASED OVERLAY ERROR METROLOGY
- Publication number 20240118606
- Publication date Apr 11, 2024
- KLA Corporation
- Itay GDOR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR GENERATING PATTERNING DEVICE PATTERN AT PATCH BOUNDARY
- Publication number 20240095437
- Publication date Mar 21, 2024
- ASML NETHERLANDS B.V.
- Quan ZHANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK
- Publication number 20240094625
- Publication date Mar 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chang LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANU...
- Publication number 20240085778
- Publication date Mar 14, 2024
- Samsung Electronics Co., Ltd.
- Byungje Jung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MODELING OF A DESIGN IN RETICLE ENHANCEMENT TECHNOLOGY
- Publication number 20240086607
- Publication date Mar 14, 2024
- D2S, INC.
- P. Jeffrey Ungar
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR QUALIFYING A MASK FOR USE IN LITHOGRAPHY
- Publication number 20240085779
- Publication date Mar 14, 2024
- Carl Zeiss SMT GMBH
- Renzo Capelli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CORRECTING LITHOGRAPHY PATTERN OF SURFACE PLASMA
- Publication number 20240077799
- Publication date Mar 7, 2024
- Institute of Microelectronics, Chinese Academy of Sciences
- Le Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHODS FOR MEASURING AND MANUFACTURING THE PHOTOMASK
- Publication number 20240077804
- Publication date Mar 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ping-Hsun LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURE AND METHOD OF SIGNAL ENHANCEMENT FOR ALIGNMENT PATTERNS
- Publication number 20240053673
- Publication date Feb 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsin-Chieh CHEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL PROXIMITY CORRECTION METHOD USING NEURAL JACOBIAN MATRIX AN...
- Publication number 20240045321
- Publication date Feb 8, 2024
- Samsung Electronics Co., Ltd.
- Moojoon Shin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE FOR MASK BLANKS AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20230418149
- Publication date Dec 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tomoaki SUGIYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING PHOTO MASKS AND SEMICONDUCTOR DEVICES
- Publication number 20230418151
- Publication date Dec 28, 2023
- Taiwan Semiconductor Manufacturing Company,Ltd.
- Wen-Hao CHENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUB-RESOLUTION ASSIST FEATURES
- Publication number 20230384665
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Kenji Yamazoe
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test...
- Publication number 20230341760
- Publication date Oct 26, 2023
- KLA Corporation
- Haifeng Huang
- G01 - MEASURING TESTING
Information Patent Application
Method Of Fabricating Mask And Method Of Fabricating Semiconductor...
- Publication number 20230288795
- Publication date Sep 14, 2023
- Samsung Electronics Co., Ltd.
- Sung-Hwan BAE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS FOR MANUFACTURING PHASE MASKS AND LENS-LESS CAMERA MODULE
- Publication number 20230291986
- Publication date Sep 14, 2023
- UIF (UNIVERSITY INDUSTRY FOUNDATION), YONSEI UNIVERSITY
- Seung Ah LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAFER CARRIER WITH RETICLE TEMPLATE FOR MARKING RETICLE FIELDS ON A...
- Publication number 20230282502
- Publication date Sep 7, 2023
- Micron Technology, Inc.
- Gabe Glass
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Testing or measuring features

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Wafer carrier with reticle template for marking reticle fields on a...

Methods for manufacturing phase masks and lens-less camera module

Targets for diffraction-based overlay error metrology

Fabricating method of photomask, photomask structure thereof, and s...

Reduction or elimination of pattern placement error in metrology me...

Enforcing mask synthesis consistency across random areas of integra...

Methods for modeling of a design in reticle enhancement technology

Mask fingerprint using mask sensitive circuit

Photomask including fiducial mark and method of making a semiconduc...

Method for manufacturing reflective mask blank, reflective mask bla...

Sub-resolution assist features

Image pickup apparatus and focus adjustment method using bending co...

Method for generating patterning device pattern at patch boundary

Image-based overlay targets incorporating features for pattern reco...

EUV in-situ linearity calibration for TDI image sensors using test...

Method of accelerated hazing of mask assembly

Fabricating method of photomask, photomask structure thereof, and s...

Aperture design and methods thereof

Obtaining a mask using a cost function gradient from a jacobian mat...

Fabricating method of photomask, photomask structure thereof, and s...

Methods for modeling of a design in reticle enhancement technology

Multi-channel device and method for measuring distortion and magnif...

Method for detecting flare degree of lens of exposure machine

Reduction or elimination of pattern placement error in metrology me...

Method and apparatus to anneal EUV mask blank

Photomask including fiducial mark and method of making semiconducto...

Metrology apparatus and method for determining a characteristic rel...

Enforcing mask synthesis consistency across random areas of integra...

Methods and patterning devices and apparatuses for measuring focus...

Mask, mask assembly, exposure machine, method for testing shadowing...

Patents Applicationslast 30 patents

PHOTOMASK SET, DESIGN METHOD THEREOF, AND MANUFACTURING METHOD OF P...

PHOTOMASK CREATING METHOD, DATA CREATING METHOD, AND ELECTRONIC DEV...

METHOD AND APPARATUS FOR CALIBRATING AN OPERATION ON A PHOTOMASK

RETICLE-LIKE SENSING ASSEMBLY

PHOTOMASK STRUCTURE AND PATTERNING METHOD

CLUSTERED IC DIES TO INCREASE IC DIES PER WAFER

ENFORCING MASK SYNTHESIS CONSISTENCY ACROSS RANDOM AREAS OF INTEGRA...

METHOD OF MEASURING OVERLAY AND SEMICONDUCTOR DEVICE MANUFACTURED U...

ELECTRONIC DEVICE

METHODS FOR MODELING OF A DESIGN IN RETICLE ENHANCEMENT TECHNOLOGY

PHOTOMASK INCLUDING MONITORING MARK

METHOD AND DEVICE FOR OPTIMIZING MASK PARAMETERS

METHOD FOR DECOUPLING SOURCES OF VARIATION RELATED TO SEMICONDUCTOR...

IMPROVED TARGETS FOR DIFFRACTION-BASED OVERLAY ERROR METROLOGY

METHOD FOR GENERATING PATTERNING DEVICE PATTERN AT PATCH BOUNDARY

PHOTOMASK INCLUDING FIDUCIAL MARK AND METHOD OF MAKING A PHOTOMASK

PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANU...

MODELING OF A DESIGN IN RETICLE ENHANCEMENT TECHNOLOGY

METHOD AND APPARATUS FOR QUALIFYING A MASK FOR USE IN LITHOGRAPHY

METHOD FOR CORRECTING LITHOGRAPHY PATTERN OF SURFACE PLASMA

PHOTOMASK AND METHODS FOR MEASURING AND MANUFACTURING THE PHOTOMASK

STRUCTURE AND METHOD OF SIGNAL ENHANCEMENT FOR ALIGNMENT PATTERNS

OPTICAL PROXIMITY CORRECTION METHOD USING NEURAL JACOBIAN MATRIX AN...

SUBSTRATE FOR MASK BLANKS AND METHOD FOR MANUFACTURING THE SAME

METHOD OF MANUFACTURING PHOTO MASKS AND SEMICONDUCTOR DEVICES

SUB-RESOLUTION ASSIST FEATURES

EUV In-Situ Linearity Calibration for TDI Image Sensors Using Test...

Method Of Fabricating Mask And Method Of Fabricating Semiconductor...

METHODS FOR MANUFACTURING PHASE MASKS AND LENS-LESS CAMERA MODULE

WAFER CARRIER WITH RETICLE TEMPLATE FOR MARKING RETICLE FIELDS ON A...