the macromolecular compound being present in a chemically amplified positive photoresist composition

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CPC
G03F7/0392

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0392the macromolecular compound being present in a chemically amplified positive photoresist composition

Industries

Patents Grantslast 30 patents

Information Patent Grant
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PAG-free positive chemically amplified resist composition and metho...
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Method for manufacturing indium-containing organic polymer film, pa...
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Photo resist as opaque aperture mask on multispectral filter arrays
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Fluorine-containing resin composition and preparation method thereo...
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Information Patent Grant
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Information Patent Grant
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Information Patent Grant
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- Naomi Shida
- B82 - NANO-TECHNOLOGY
Information Patent Grant
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Information Patent Grant
Electronic system of specimen qualification
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- Issue date Mar 18, 2025
- NANYA TECHNOLOGY CORPORATION
- Hung-Chih Chang
- G01 - MEASURING TESTING
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,228,857
- Issue date Feb 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist composition and patterning process
- Patent number 12,228,856
- Issue date Feb 18, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
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Photosensitive composition
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Information Patent Grant
Positive photosensitive resin composition, positive photosensitive...
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Photoresist composition and method of forming photoresist pattern
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Information Patent Grant
Resist composition and pattern forming process
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- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for producing resist patte...
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- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
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- Issue date Dec 17, 2024
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- Jun Hatakeyama
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Information Patent Grant
Resist composition and method for producing resist pattern
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- Sumitomo Chemical Company, Limited
- Masako Sugihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
- Patent number 12,164,230
- Issue date Dec 10, 2024
- FUJIFILM Corporation
- Taro Miyoshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Chemically amplified positive resist composition and resist pattern...
- Patent number 12,164,231
- Issue date Dec 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaaki Kotake
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and resist pattern forming method
- Patent number 12,140,867
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- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
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Information Patent Grant
Sulfonium salt, photoacid generator, curable composition and resist...
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- Issue date Oct 29, 2024
- San-Apro Ltd.
- Takuto Nakao
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 12,099,298
- Issue date Sep 24, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

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POSITIVE RESIST MATERIAL AND PATTERNING PROCESS
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CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING...
- Publication number 20250199406
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- Young Cheol CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...
- Publication number 20250196140
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- SHENZHEN INSTITUTES OF ADVANCED TECHNOLOGY
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- B82 - NANO-TECHNOLOGY
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POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT OF THE SAM...
- Publication number 20250199402
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- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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DISPLAY DEVICE AND PHOTOSENSITIVE COMPOSITION
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- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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METHOD OF MANUFACTURING PLATED ARTICLE
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- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PHOTOSENSITIVE RESIN COMPOSITION, CURED ARTICLE, METHOD FOR MANUFAC...
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- TORAY INDUSTRIES, INC.
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PHOTORESIST MATERIAL AND METHOD FOR LITHOGRAPHY
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Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...
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- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...
- Publication number 20250053087
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- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
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- Publication date Feb 6, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY

the macromolecular compound being present in a chemically amplified positive photoresist composition

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Resist underlayer film-forming composition

PAG-free positive chemically amplified resist composition and metho...

Method for manufacturing indium-containing organic polymer film, pa...

Photo resist as opaque aperture mask on multispectral filter arrays

Fluorine-containing resin composition and preparation method thereo...

Pattern-forming method and composition

Micro- and nano-fluidic chip, method of fabricating the same, and a...

Treatment liquid and pattern forming method

Photoacid generator for chemically amplified photoresists for deep...

Flow cells and methods for making the same

Onium salt, chemically amplified resist composition and patterning...

Radiation-sensitive resin composition and method for forming resist...

Transparent electrode, process for producing transparent electrode,...

Radiation-sensitive resin composition, method of forming resist pat...

Electronic system of specimen qualification

Solution, solution storage body, actinic ray-sensitive or radiation...

Resist composition and patterning process

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Photosensitive composition

Positive photosensitive resin composition, positive photosensitive...

Photoresist composition and method of forming photoresist pattern

Resist composition and pattern forming process

Photosensitive resin composition, method for producing resist patte...

Resist composition and patterning process

Resist composition and method for producing resist pattern

Actinic ray-sensitive or radiation-sensitive resin composition, act...

Chemically amplified positive resist composition and resist pattern...

Resist composition and resist pattern forming method

Sulfonium salt, photoacid generator, curable composition and resist...

Resist composition and method of forming resist pattern

Patents Applicationslast 30 patents

RESIST COMPOSITION, METHOD FOR MANUFACTURING RESIST FILM, AND METHO...

POSITIVE RESIST MATERIAL AND PATTERNING PROCESS

CHEMICALLY AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR IMPROVING...

MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT OF THE SAM...

DISPLAY DEVICE AND PHOTOSENSITIVE COMPOSITION

MICRO- AND NANO-FLUIDIC CHIP, METHOD OF FABRICATING THE SAME, AND A...

CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN P...

METHOD OF MANUFACTURING PLATED ARTICLE

POLYIMIDES COMPRISING NOVEL INDANE BIS-O-AMINOPHENOLS, PHOTOSENSITI...

CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, METH...

PHOTOSENSITIVE RESIN COMPOSITION, CURED ARTICLE, METHOD FOR MANUFAC...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN,...

PHOTORESIST MATERIAL AND METHOD FOR LITHOGRAPHY

Radiation-Sensitive Composition and Method for Forming Resist Pattern

PHOTORESIST COMPOSITION

PHOTOSENSITIVE POLYMER, PHOTORESIST COMPOSITION INCLUDING THE SAME,...

Polymer, Positive And Negative Photosensitive Resin Compositions, P...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

POSITIVE TYPE LIFT-OFF RESIST COMPOSITION AND METHOD FOR MANUFACTUR...

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...

HYBRID METHOD OF FORMING MICROSTRUCTURE ARRAY MOLDS, METHODS OF MAK...

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...

PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FO...

RESIST COMPOSITION AND PATTERN FORMING PROCESS