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the macromolecular compound being present in a chemically amplified positive photoresist composition
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the macromolecular compound being present in a chemically amplified positive photoresist composition
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Method of forming patterns using resist underlayer composition
Patent number
11,982,943
Issue date
May 14, 2024
Samsung SDI Co., Ltd.
Jaeyeol Baek
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Semiconductor devices and methods of manufacturing
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11,977,333
Issue date
May 7, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Hung-Jui Kuo
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Polybenzoxazole precursor and application thereof
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11,976,170
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May 7, 2024
Microcosm Technology Co., Ltd.
Steve Lien-chung Hsu
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Cross-linked polymer for resist
Patent number
11,971,660
Issue date
Apr 30, 2024
Maruzen Petrochemical Co., LTD
Tomohiro Masukawa
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Photoresist composition and method of manufacturing a semiconductor...
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11,966,162
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Apr 23, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Tzu-Yang Lin
B82 - NANO-TECHNOLOGY
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Radiation-sensitive resin composition and method for forming pattern
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11,966,160
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Apr 23, 2024
JSR Corporation
Ryuichi Nemoto
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Radiation-sensitive resin composition, method of forming resist pat...
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11,966,161
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Apr 23, 2024
JSR Corporation
Takuhiro Taniguchi
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Two-stage bake photoresist with releasable quencher
Patent number
11,955,343
Issue date
Apr 9, 2024
Intel Corporation
Robert L. Bristol
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Photoresist compositions and pattern formation methods
Patent number
11,940,730
Issue date
Mar 26, 2024
Rohm and Haas Electronic Materials LLC
Mitsuru Haga
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Positive resist composition and pattern forming process
Patent number
11,914,294
Issue date
Feb 27, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Resist composition and patterning process
Patent number
11,914,291
Issue date
Feb 27, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Manufacturing method of semiconductor chip, and kit
Patent number
11,914,300
Issue date
Feb 27, 2024
FUJIFILM Corporation
Tetsuya Kamimura
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Chemically amplified positive photoresist composition for improving...
Patent number
11,906,900
Issue date
Feb 20, 2024
YOUNG CHANG CHEMICAL CO., LTD
Su Jin Lee
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Colored film, manufacturing method of same, and solid-state imaging...
Patent number
11,908,877
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Feb 20, 2024
FUJIFILM Corporation
Daisuke Hamada
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Alternating copolymer chain scission photoresists
Patent number
11,906,901
Issue date
Feb 20, 2024
International Business Machines Corporation
Dario Goldfarb
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Manufacturing method of semiconductor device and semiconductor proc...
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11,899,368
Issue date
Feb 13, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Yu-Kai Chen
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Multiple patterning with organometallic photopatternable layers wit...
Patent number
11,886,116
Issue date
Jan 30, 2024
Inpria Corporation
Peter de Schepper
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Film structure for electric field guided photoresist patterning pro...
Patent number
11,880,137
Issue date
Jan 23, 2024
Applied Materials, Inc.
Huixiong Dai
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Resist composition, method of forming resist pattern, compound, and...
Patent number
11,874,601
Issue date
Jan 16, 2024
Tokyo Ohka Kogyo Co., Ltd.
KhanhTin Nguyen
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Photoresist composition comprising amide compound and pattern forma...
Patent number
11,874,603
Issue date
Jan 16, 2024
Rohm and Haas Electronic Materials Korea Ltd.
Philjae Kang
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Positive resist composition and patterning process
Patent number
11,860,540
Issue date
Jan 2, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Chemically amplified resist composition and patterning process
Patent number
11,846,884
Issue date
Dec 19, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Semiconductor devices and methods of manufacturing
Patent number
11,842,896
Issue date
Dec 12, 2023
Taiwan Semiconductor Manufacturing Company, Ltd
Hung-Jui Kuo
H01 - BASIC ELECTRIC ELEMENTS
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Resist composition and patterning process
Patent number
11,835,859
Issue date
Dec 5, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Resist composition and method of forming resist pattern
Patent number
11,835,857
Issue date
Dec 5, 2023
Tokyo Ohka Kogyo Co., Ltd.
Yuta Iwasawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Salt, acid generator, resist composition and method for producing r...
Patent number
11,820,735
Issue date
Nov 21, 2023
Sumitomo Chemical Company, Limited
Yukako Anryu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Photoresist with polar-acid-labile-group
Patent number
11,822,251
Issue date
Nov 21, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
An-Ren Zi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Resist composition and pattern forming process
Patent number
11,822,245
Issue date
Nov 21, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Resist composition and patterning process
Patent number
11,822,239
Issue date
Nov 21, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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Iodized aromatic carboxylic acid type pendant-containing polymer, r...
Patent number
11,815,814
Issue date
Nov 14, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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last 30 patents
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MANUFACTURING METHOD OF SEMICONDUCTOR CHIP, AND KIT
Publication number
20240152055
Publication date
May 9, 2024
FUJIFILM CORPORATION
Tetsuya KAMIMURA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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RESIN MEMBRANE FILTER AND MANUFACTURING METHOD OF RESIN MEMBRANE FI...
Publication number
20240139686
Publication date
May 2, 2024
FUJIFILM CORPORATION
Hiroyuki YONEZAWA
B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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PHOTORESIST AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
Publication number
20240134279
Publication date
Apr 25, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Chieh-Hsin HSIEH
H01 - BASIC ELECTRIC ELEMENTS
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PHOTORESIST UNDERLAYER COMPOSITION
Publication number
20240126172
Publication date
Apr 18, 2024
Rohm and Haas Electronic Materials L.L.C.
Anton CHAVEZ
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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MULTIPLE PATTERNING WITH ORGANOMETALLIC PHOTOPATTERNABLE LAYERS WIT...
Publication number
20240118614
Publication date
Apr 11, 2024
INPRIA CORPORATION
Peter de Schepper
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20240118610
Publication date
Apr 11, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
Publication number
20240118613
Publication date
Apr 11, 2024
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20240111212
Publication date
Apr 4, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
Publication number
20240103364
Publication date
Mar 28, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro Fukushima
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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COLORED PHOTOSENSITIVE RESIN COMPOSITION AND MUTILAYER CURED FILM P...
Publication number
20240085791
Publication date
Mar 14, 2024
ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.
Seung-Keun KIM
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING
Publication number
20240079235
Publication date
Mar 7, 2024
Taiwan Semiconductor Manufacturing Co., Ltd.
Hung-Jui Kuo
H01 - BASIC ELECTRIC ELEMENTS
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PHOTOSENSITIVE DRY FILM, LAMINATED FILM, METHOD FOR PRODUCING LAMIN...
Publication number
20240053680
Publication date
Feb 15, 2024
Tokyo Ohka Kogyo Co., Ltd.
Aya MOMOZAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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CRITICAL DIMENSION INSPECTION METHOD AND SEMICONDUCTOR DEVICE MANUF...
Publication number
20240045342
Publication date
Feb 8, 2024
Samsung Electronics Co., Ltd.
Su Bin KONG
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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Onium Salt, Resist Composition, And Patterning Process
Publication number
20240036466
Publication date
Feb 1, 2024
Shin-Etsu Chemical Co., Ltd.
Masahiro FUKUSHIMA
C07 - ORGANIC CHEMISTRY
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POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20240027909
Publication date
Jan 25, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20240027902
Publication date
Jan 25, 2024
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20230393462
Publication date
Dec 7, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C07 - ORGANIC CHEMISTRY
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RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20230393463
Publication date
Dec 7, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PHOTORESIST WITH POLAR-ACID-LABILE-GROUP
Publication number
20230384683
Publication date
Nov 30, 2023
Taiwan Semiconductor Manufacturing Co., LTD
An-Ren Zi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...
Publication number
20230384675
Publication date
Nov 30, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
Ming-Hui WENG
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PHOTO RESIST AS OPAQUE APERTURE MASK ON MULTISPECTRAL FILTER ARRAYS
Publication number
20230375761
Publication date
Nov 23, 2023
MATERION CORPORATION
Kevin R. Downing
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED...
Publication number
20230367213
Publication date
Nov 16, 2023
Shin-Etsu Chemical Co., Ltd.
Keiichi Masunaga
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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CROSSLINKABLE PHOTORESIST FOR EXTREME ULTRAVIOLET LITHOGRAPHY
Publication number
20230350295
Publication date
Nov 2, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Li-Po YANG
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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PATTERN FORMING METHOD, KIT, AND RESIST COMPOSITION
Publication number
20230350290
Publication date
Nov 2, 2023
FUJIFILM CORPORATION
Tetsuya KAMIMURA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20230350296
Publication date
Nov 2, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
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RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
Publication number
20230341772
Publication date
Oct 26, 2023
JSR Corporation
Ken MARUYAMA
C07 - ORGANIC CHEMISTRY
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PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...
Publication number
20230341780
Publication date
Oct 26, 2023
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY , LTD.
Tzu-Yang LIN
B82 - NANO-TECHNOLOGY
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Patent Application
PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND...
Publication number
20230333478
Publication date
Oct 19, 2023
FUJIFILM CORPORATION
Tetsuya KAMIMURA
H01 - BASIC ELECTRIC ELEMENTS
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PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
Publication number
20230324796
Publication date
Oct 12, 2023
Taiwan Semiconductor Manufacturing Company, Ltd.
Li-Po YANG
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
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RESIST COMPOSITION AND PATTERN FORMING PROCESS
Publication number
20230324798
Publication date
Oct 12, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY