the macromolecular compound being present in a chemically amplified positive photoresist composition

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CPC
G03F7/0392

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0392the macromolecular compound being present in a chemically amplified positive photoresist composition

Industries

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and resist pattern forming method
- Patent number 12,140,867
- Issue date Nov 12, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Tsuyoshi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonium salt, photoacid generator, curable composition and resist...
- Patent number 12,129,240
- Issue date Oct 29, 2024
- San-Apro Ltd.
- Takuto Nakao
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 12,099,298
- Issue date Sep 24, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Masaru Takeshita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
- Patent number 12,092,957
- Issue date Sep 17, 2024
- JSR Corporation
- Kazuya Kiriyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, photoresist composition, and method of manufacturing semicon...
- Patent number 12,085,855
- Issue date Sep 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Siao-Shan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and pattern forming process
- Patent number 12,072,628
- Issue date Aug 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist with polar-acid-labile-group
- Patent number 12,050,404
- Issue date Jul 30, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,038,689
- Issue date Jul 16, 2024
- FUJIFILM Corporation
- Akihiro Kaneko
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for producing substrate with patterned film
- Patent number 12,038,691
- Issue date Jul 16, 2024
- Central Glass Company, Limited
- Yuzuru Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing substrate with patterned film and fluorine-con...
- Patent number 12,038,692
- Issue date Jul 16, 2024
- Central Glass Company, Limited
- Yuzuru Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Quantum dot film, quantum dot device, and display panel
- Patent number 12,031,071
- Issue date Jul 9, 2024
- BOE Technology Group Co., Ltd.
- Wenhai Mei
- G02 - OPTICS
Information Patent Grant
Lithography techniques for reducing defects
- Patent number 12,025,920
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ming-Hui Weng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electronic system and method of specimen qualification
- Patent number 12,019,032
- Issue date Jun 25, 2024
- NANYA TECHNOLOGY CORPORATION
- Hung-Chih Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 12,001,139
- Issue date Jun 4, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition for EUV lithography and method of formi...
- Patent number 11,988,964
- Issue date May 21, 2024
- Zeon Corporation
- Manabu Hoshino
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of forming patterns using resist underlayer composition
- Patent number 11,982,943
- Issue date May 14, 2024
- Samsung SDI Co., Ltd.
- Jaeyeol Baek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor devices and methods of manufacturing
- Patent number 11,977,333
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Hung-Jui Kuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polybenzoxazole precursor and application thereof
- Patent number 11,976,170
- Issue date May 7, 2024
- Microcosm Technology Co., Ltd.
- Steve Lien-chung Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cross-linked polymer for resist
- Patent number 11,971,660
- Issue date Apr 30, 2024
- Maruzen Petrochemical Co., LTD
- Tomohiro Masukawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition and method of manufacturing a semiconductor...
- Patent number 11,966,162
- Issue date Apr 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Yang Lin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Radiation-sensitive resin composition and method for forming pattern
- Patent number 11,966,160
- Issue date Apr 23, 2024
- JSR Corporation
- Ryuichi Nemoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method of forming resist pat...
- Patent number 11,966,161
- Issue date Apr 23, 2024
- JSR Corporation
- Takuhiro Taniguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Two-stage bake photoresist with releasable quencher
- Patent number 11,955,343
- Issue date Apr 9, 2024
- Intel Corporation
- Robert L. Bristol
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist compositions and pattern formation methods
- Patent number 11,940,730
- Issue date Mar 26, 2024
- Rohm and Haas Electronic Materials LLC
- Mitsuru Haga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern forming process
- Patent number 11,914,294
- Issue date Feb 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 11,914,291
- Issue date Feb 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of semiconductor chip, and kit
- Patent number 11,914,300
- Issue date Feb 27, 2024
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemically amplified positive photoresist composition for improving...
- Patent number 11,906,900
- Issue date Feb 20, 2024
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Colored film, manufacturing method of same, and solid-state imaging...
- Patent number 11,908,877
- Issue date Feb 20, 2024
- FUJIFILM Corporation
- Daisuke Hamada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Alternating copolymer chain scission photoresists
- Patent number 11,906,901
- Issue date Feb 20, 2024
- International Business Machines Corporation
- Dario Goldfarb
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHY
- Publication number 20240385505
- Publication date Nov 21, 2024
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240385517
- Publication date Nov 21, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE TYPE PHOTORESIST COMPOSITION, METHOD OF FORMING PHOTORESIS...
- Publication number 20240377740
- Publication date Nov 14, 2024
- Samsung Electronics Co., Ltd.
- Jooyoung Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...
- Publication number 20240377742
- Publication date Nov 14, 2024
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...
- Publication number 20240377733
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- C07 - ORGANIC CHEMISTRY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240377741
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Keiichi Masunaga
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES
- Publication number 20240377744
- Publication date Nov 14, 2024
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20240369928
- Publication date Nov 7, 2024
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist Material, Resist Composition, And Patterning Process
- Publication number 20240361691
- Publication date Oct 31, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yutaro OTOMO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
- Publication number 20240337927
- Publication date Oct 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240337938
- Publication date Oct 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...
- Publication number 20240337939
- Publication date Oct 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACETAL MODIFIER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMP...
- Publication number 20240329532
- Publication date Oct 3, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro FUKUSHIMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM
- Publication number 20240319606
- Publication date Sep 26, 2024
- Central Glass Company, Limited
- Yuzuru KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM AND FLUORINE-CON...
- Publication number 20240319607
- Publication date Sep 26, 2024
- Central Glass Company, Limited
- Yuzuru KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240310725
- Publication date Sep 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHY TECHNIQUES FOR REDUCING DEFECTS
- Publication number 20240310735
- Publication date Sep 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Hui WENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, AND POLYMER
- Publication number 20240295814
- Publication date Sep 5, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Keiichi IBATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ELECTRONIC SYSTEM OF SPECIMEN QUALIFICATION
- Publication number 20240295505
- Publication date Sep 5, 2024
- NANYA TECHNOLOGY CORPORATION
- Hung-Chih CHANG
- G01 - MEASURING TESTING
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...
- Publication number 20240280903
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Yang LIN
- B82 - NANO-TECHNOLOGY
Information Patent Application
ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...
- Publication number 20240280900
- Publication date Aug 22, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro Fukushima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND USE THEREOF
- Publication number 20240280901
- Publication date Aug 22, 2024
- The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Xiangang LUO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PREFERENTIAL INFILTRATION IN LITHOGRAPHIC PROCESS FLOW FOR EUV CAR...
- Publication number 20240272552
- Publication date Aug 15, 2024
- Applied Materials, Inc.
- GABRIELA ALVA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240272553
- Publication date Aug 15, 2024
- FUJIFILM CORPORATION
- YUMA KURUMISAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240241443
- Publication date Jul 18, 2024
- FUJIFILM CORPORATION
- Eiji FUKUZAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20240241444
- Publication date Jul 18, 2024
- FUJIFILM CORPORATION
- Shuhei YAMAGUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Conductive Polymer Composition, Coated Product, And Patterning Process
- Publication number 20240219836
- Publication date Jul 4, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takayuki NAGASAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USI...
- Publication number 20240210832
- Publication date Jun 27, 2024
- Samsung Electronics Co., Ltd.
- Chawon KOH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20240192596
- Publication date Jun 13, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masahiro FUKUSHIMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, PHOTOSENSITIVE COMPOSITION, DRY FILM PHOTORESIST, AND LITH...
- Publication number 20240192597
- Publication date Jun 13, 2024
- Industrial Technology Research Institute
- Yu-Ying HSU
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

the macromolecular compound being present in a chemically amplified positive photoresist composition

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Resist composition and resist pattern forming method

Sulfonium salt, photoacid generator, curable composition and resist...

Resist composition and method of forming resist pattern

Radiation-sensitive resin composition, method for forming resist pa...

Resin, photoresist composition, and method of manufacturing semicon...

Resist composition and pattern forming process

Photoresist with polar-acid-labile-group

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Method for producing substrate with patterned film

Method for producing substrate with patterned film and fluorine-con...

Quantum dot film, quantum dot device, and display panel

Lithography techniques for reducing defects

Electronic system and method of specimen qualification

Resist composition and patterning process

Positive resist composition for EUV lithography and method of formi...

Method of forming patterns using resist underlayer composition

Semiconductor devices and methods of manufacturing

Polybenzoxazole precursor and application thereof

Cross-linked polymer for resist

Photoresist composition and method of manufacturing a semiconductor...

Radiation-sensitive resin composition and method for forming pattern

Radiation-sensitive resin composition, method of forming resist pat...

Two-stage bake photoresist with releasable quencher

Photoresist compositions and pattern formation methods

Positive resist composition and pattern forming process

Resist composition and patterning process

Manufacturing method of semiconductor chip, and kit

Chemically amplified positive photoresist composition for improving...

Colored film, manufacturing method of same, and solid-state imaging...

Alternating copolymer chain scission photoresists

Patents Applicationslast 30 patents

DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHY

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

POSITIVE TYPE PHOTORESIST COMPOSITION, METHOD OF FORMING PHOTORESIS...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PAT...

ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

Resist Material, Resist Composition, And Patterning Process

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN...

ACETAL MODIFIER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMP...

METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM

METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM AND FLUORINE-CON...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

LITHOGRAPHY TECHNIQUES FOR REDUCING DEFECTS

RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, AND POLYMER

ELECTRONIC SYSTEM OF SPECIMEN QUALIFICATION

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...

ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND R...

PHOTORESIST COMPOSITION AND USE THEREOF

PREFERENTIAL INFILTRATION IN LITHOGRAPHIC PROCESS FLOW FOR EUV CAR...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

Conductive Polymer Composition, Coated Product, And Patterning Process

PHOTORESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USI...

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS

POLYMER, PHOTOSENSITIVE COMPOSITION, DRY FILM PHOTORESIST, AND LITH...