the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements

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H01L21/02126

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02126the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements

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Patents Grantslast 30 patents

Information Patent Grant
Cyclic spin-on coating process for forming dielectric material
- Patent number 12,170,199
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Je-Ming Kuo
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Silicon oxide layer for oxidation resistance and method forming same
- Patent number 12,148,652
- Issue date Nov 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wan-Yi Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 12,142,668
- Issue date Nov 12, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chien-Chih Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device
- Patent number 12,125,703
- Issue date Oct 22, 2024
- Renesas Electronics Corporation
- Shibun Tsuda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of area-selective deposition and method of fabricating an el...
- Patent number 12,116,667
- Issue date Oct 15, 2024
- SK Hynix Inc.
- Woo-Hee Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing substrate, substrate processing apparatus, rec...
- Patent number 12,094,708
- Issue date Sep 17, 2024
- Kokusai Electric Corporation
- Yoshitomo Hashimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for filling a gap and related systems and devices
- Patent number 12,094,769
- Issue date Sep 17, 2024
- ASM IP Holding B.V.
- Zecheng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of forming the same
- Patent number 12,074,021
- Issue date Aug 27, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Chang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition of SiOC thin films
- Patent number 12,068,156
- Issue date Aug 20, 2024
- ASM IP Holding B.V.
- Jan Willem Maes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning method, method of manufacturing semiconductor device, and...
- Patent number 12,065,736
- Issue date Aug 20, 2024
- Kokusai Electric Corporation
- Naoya Miyashita
- B08 - CLEANING
Information Patent Grant
Semiconductor device having an extra low-k dielectric layer and met...
- Patent number 12,062,613
- Issue date Aug 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Cheng Shih
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low-k dielectric aerogel and preparation method therefor
- Patent number 12,054,585
- Issue date Aug 6, 2024
- TAIWAN AEROGEL TECHNOLOGY MATERIAL CO., LTD.
- Jean-Hong Chen
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Functionalized cyclosilazanes as precursors for high growth rate si...
- Patent number 12,057,310
- Issue date Aug 6, 2024
- VERSUM MATERIALS US, LLC
- Manchao Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Compositions and methods using same for deposition of silicon-conta...
- Patent number 12,049,695
- Issue date Jul 30, 2024
- VERSUM MATERIALS US, LLC
- Raymond Nicholas Vrtis
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low-κ ALD gap-fill methods and material
- Patent number 12,020,923
- Issue date Jun 25, 2024
- Lam Research Corporation
- Joseph R. Abel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching method and plasma processing apparatus
- Patent number 12,014,930
- Issue date Jun 18, 2024
- Tokyo Electron Limited
- Mitsuhiro Iwano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of SiOCN thin films
- Patent number 11,996,284
- Issue date May 28, 2024
- ASM IP Holding B.V.
- Toshiya Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for deposition of low-k films
- Patent number 11,990,332
- Issue date May 21, 2024
- Applied Materials, Inc.
- Bhaskar Jyoti Bhuyan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Porogen bonded gap filling material in semiconductor manufacturing
- Patent number 11,984,316
- Issue date May 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Bo-Jiun Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of forming metal nitride films
- Patent number 11,978,625
- Issue date May 7, 2024
- Applied Materials, Inc.
- Joseph AuBuchon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Connection between source/drain and gate
- Patent number 11,980,016
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Chuan Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems and methods for depositing low-k dielectric films
- Patent number 11,967,498
- Issue date Apr 23, 2024
- Applied Materials, Inc.
- Bo Xie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching solution and method for selectively removing silicon nitrid...
- Patent number 11,955,341
- Issue date Apr 9, 2024
- VERSUM MATERIALS US, LLC
- Jhih Kuei Ge
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Device of dielectric layer
- Patent number 11,935,752
- Issue date Mar 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yu-Yun Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silyl pseudohalides for silicon containing films
- Patent number 11,932,940
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Keenan N. Woods
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 11,923,193
- Issue date Mar 5, 2024
- Kokusai Electric Corporation
- Kimihiko Nakatani
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field-effect transistor and method of forming the same
- Patent number 11,923,433
- Issue date Mar 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sheng-Liang Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 11,915,925
- Issue date Feb 27, 2024
- Daicel Corporation
- Naoko Tsuji
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dielectric film for semiconductor fabrication
- Patent number 11,901,295
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-Yi Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Conformal deposition of silicon carbide films
- Patent number 11,894,227
- Issue date Feb 6, 2024
- Novellus Systems, Inc.
- Bhadri N. Varadarajan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240404802
- Publication date Dec 5, 2024
- Kokusai Electric Corporation
- Atsushi Moriya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
- Publication number 20240405096
- Publication date Dec 5, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yun Chen Teng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FUNCTIONALIZED CYCLOSILAZANES AS PRECURSORS FOR HIGH GROWTH RATE SI...
- Publication number 20240395541
- Publication date Nov 28, 2024
- VERSUM MATERIALS US, LLC
- Manchao Xiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD
- Publication number 20240395902
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chien-Chih Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON OXIDE LAYER FOR OXIDATION RESISTANCE AND METHOD FORMING SAME
- Publication number 20240387238
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wan-Yi Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE AND METHOD OF FORMING THE SAME
- Publication number 20240387255
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Lien Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE DEPOSITION OF A MATERIAL COMPRISING SILICON AND NITROGEN
- Publication number 20240379347
- Publication date Nov 14, 2024
- ASM IP HOLDING B.V.
- Mikko Ruoho
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE HAVING AN EXTRA LOW-K DIELECTRIC LAYER AND MET...
- Publication number 20240371769
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Cheng SHIH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME
- Publication number 20240363338
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Chang Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT OVER ACTIVE GATE STRUCTURES WITH ETCH STOP LAYERS FOR ADVAN...
- Publication number 20240347465
- Publication date Oct 17, 2024
- Intel Corporation
- Atul MADHAVAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW-K ALD GAP-FILL METHODS AND MATERIAL
- Publication number 20240347337
- Publication date Oct 17, 2024
- LAM RESEARCH CORPORATION
- Joseph R. Abel
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR DEPOSITING GAP-FILLING FLUIDS AND RELATED SYSTEMS AND D...
- Publication number 20240339359
- Publication date Oct 10, 2024
- ASM IP HOLDING B.V.
- René Henricus Jozef Vervuurt
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF DIELECTRIC MATERIAL UPON...
- Publication number 20240332071
- Publication date Oct 3, 2024
- Intel Corporation
- Alireza Narimannezhad
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITION AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAIN...
- Publication number 20240304438
- Publication date Sep 12, 2024
- VERSUM MATERIALS US, LLC
- Haripin Chandra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONNECTION BETWEEN SOURCE/DRAIN AND GATE
- Publication number 20240292592
- Publication date Aug 29, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Chuan Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20240290625
- Publication date Aug 29, 2024
- TOKYO ELECTRON LIMITED
- Mitsuhiro Iwano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING THIN FILM AND APPARATUS FOR PROCESSING SUBSTRATE...
- Publication number 20240290586
- Publication date Aug 29, 2024
- WONIK IPS CO., LTD.
- Jae Hun LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS FOR DEPOSITING LOW-K DIELECTRIC FILMS
- Publication number 20240290611
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Bo Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRONIC DEVICE FABRICATION USING AREA-SELECTIVE DEPOSITION
- Publication number 20240282632
- Publication date Aug 22, 2024
- Applied Materials, Inc.
- Zachary J. Devereaux
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240282571
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wan-Lin Tsai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEFORMATION COMPENSATION METHOD FOR GROWING THICK GALIUM NITRIDE ON...
- Publication number 20240263348
- Publication date Aug 8, 2024
- ROBERT BOSCH GmbH
- Bo CHENG
- C30 - CRYSTAL GROWTH
Information Patent Application
DIELECTRIC DENSIFICATION
- Publication number 20240266166
- Publication date Aug 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Ming Lin
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED CIRCUIT DEVICE
- Publication number 20240258399
- Publication date Aug 1, 2024
- Samsung Electronics Co., Ltd.
- Chaeho Na
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FIN FIELD-EFFECT TRANSISTOR AND METHOD OF FORMING THE SAME
- Publication number 20240250150
- Publication date Jul 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Sheng-Liang Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEVICE OF DIELECTRIC LAYER
- Publication number 20240249947
- Publication date Jul 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Yun PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20240234132
- Publication date Jul 11, 2024
- Kokusai Electric Corporation
- Yusuke TERUI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Thin Film Transistor, Fabrication Method Thereof, and Display Appar...
- Publication number 20240204076
- Publication date Jun 20, 2024
- LG Display Co., Ltd.
- KyungChul Ok
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE TREATMENT DEVICE AND METHOD
- Publication number 20240186145
- Publication date Jun 6, 2024
- ASML Netherlands B.V.
- Monim AZIMI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR OBTAINING AN INTEGRATED DEVICE COMPRISING USING AN ETCHI...
- Publication number 20240178183
- Publication date May 30, 2024
- Murata Manufacturing Co., Ltd.
- Florent LALLEMAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUPPORT DIELECTRIC FIN TO PREVENT GATE FLOP-OVER IN NANOSHEET TRANS...
- Publication number 20240178156
- Publication date May 30, 2024
- International Business Machines Corporation
- Juntao Li
- H01 - BASIC ELECTRIC ELEMENTS

the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Cyclic spin-on coating process for forming dielectric material

Silicon oxide layer for oxidation resistance and method forming same

Semiconductor device and method

Method of manufacturing semiconductor device

Method of area-selective deposition and method of fabricating an el...

Method of processing substrate, substrate processing apparatus, rec...

Methods for filling a gap and related systems and devices

Semiconductor device and method of forming the same

Selective deposition of SiOC thin films

Cleaning method, method of manufacturing semiconductor device, and...

Semiconductor device having an extra low-k dielectric layer and met...

Low-k dielectric aerogel and preparation method therefor

Functionalized cyclosilazanes as precursors for high growth rate si...

Compositions and methods using same for deposition of silicon-conta...

Low-κ ALD gap-fill methods and material

Etching method and plasma processing apparatus

Formation of SiOCN thin films

Methods and apparatus for deposition of low-k films

Porogen bonded gap filling material in semiconductor manufacturing

Methods of forming metal nitride films

Connection between source/drain and gate

Systems and methods for depositing low-k dielectric films

Etching solution and method for selectively removing silicon nitrid...

Device of dielectric layer

Silyl pseudohalides for silicon containing films

Method of manufacturing semiconductor device, substrate processing...

Fin field-effect transistor and method of forming the same

Semiconductor device manufacturing method

Dielectric film for semiconductor fabrication

Conformal deposition of silicon carbide films

Patents Applicationslast 30 patents

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE

FUNCTIONALIZED CYCLOSILAZANES AS PRECURSORS FOR HIGH GROWTH RATE SI...

SEMICONDUCTOR DEVICE AND METHOD

SILICON OXIDE LAYER FOR OXIDATION RESISTANCE AND METHOD FORMING SAME

DEVICE AND METHOD OF FORMING THE SAME

SELECTIVE DEPOSITION OF A MATERIAL COMPRISING SILICON AND NITROGEN

SEMICONDUCTOR DEVICE HAVING AN EXTRA LOW-K DIELECTRIC LAYER AND MET...

SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME

CONTACT OVER ACTIVE GATE STRUCTURES WITH ETCH STOP LAYERS FOR ADVAN...

LOW-K ALD GAP-FILL METHODS AND MATERIAL

METHODS FOR DEPOSITING GAP-FILLING FLUIDS AND RELATED SYSTEMS AND D...

PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF DIELECTRIC MATERIAL UPON...

COMPOSITION AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAIN...

CONNECTION BETWEEN SOURCE/DRAIN AND GATE

PLASMA PROCESSING APPARATUS

METHOD FOR FORMING THIN FILM AND APPARATUS FOR PROCESSING SUBSTRATE...

SYSTEMS AND METHODS FOR DEPOSITING LOW-K DIELECTRIC FILMS

ELECTRONIC DEVICE FABRICATION USING AREA-SELECTIVE DEPOSITION

METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE

DEFORMATION COMPENSATION METHOD FOR GROWING THICK GALIUM NITRIDE ON...

DIELECTRIC DENSIFICATION

INTEGRATED CIRCUIT DEVICE

FIN FIELD-EFFECT TRANSISTOR AND METHOD OF FORMING THE SAME

DEVICE OF DIELECTRIC LAYER

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

Thin Film Transistor, Fabrication Method Thereof, and Display Appar...

SURFACE TREATMENT DEVICE AND METHOD

METHOD FOR OBTAINING AN INTEGRATED DEVICE COMPRISING USING AN ETCHI...

SUPPORT DIELECTRIC FIN TO PREVENT GATE FLOP-OVER IN NANOSHEET TRANS...