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the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements
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Electric elements
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SEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
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Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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H01L21/02126
the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements
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last 30 patents
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Patent Grant
Systems and methods for depositing low-k dielectric films
Patent number
11,967,498
Issue date
Apr 23, 2024
Applied Materials, Inc.
Bo Xie
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Etching solution and method for selectively removing silicon nitrid...
Patent number
11,955,341
Issue date
Apr 9, 2024
VERSUM MATERIALS US, LLC
Jhih Kuei Ge
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
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Patent Grant
Device of dielectric layer
Patent number
11,935,752
Issue date
Mar 19, 2024
Taiwan Semiconductor Manufacturing Co., Ltd
Yu-Yun Peng
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Silyl pseudohalides for silicon containing films
Patent number
11,932,940
Issue date
Mar 19, 2024
Applied Materials, Inc.
Keenan N. Woods
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Patent Grant
Method of manufacturing semiconductor device, substrate processing...
Patent number
11,923,193
Issue date
Mar 5, 2024
Kokusai Electric Corporation
Kimihiko Nakatani
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Fin field-effect transistor and method of forming the same
Patent number
11,923,433
Issue date
Mar 5, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Sheng-Liang Pan
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Semiconductor device manufacturing method
Patent number
11,915,925
Issue date
Feb 27, 2024
Daicel Corporation
Naoko Tsuji
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Dielectric film for semiconductor fabrication
Patent number
11,901,295
Issue date
Feb 13, 2024
Taiwan Semiconductor Manufacturing Co., Ltd
Cheng-Yi Wu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Conformal deposition of silicon carbide films
Patent number
11,894,227
Issue date
Feb 6, 2024
Novellus Systems, Inc.
Bhadri N. Varadarajan
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Patent Grant
Method of processing substrate, method of manufacturing semiconduct...
Patent number
11,885,016
Issue date
Jan 30, 2024
Kokusai Electric Corporation
Kazuhiro Harada
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Patent Grant
Multi-layer line structure and method for manufacturing thereof
Patent number
11,862,564
Issue date
Jan 2, 2024
Dai Nippon Printing Co., Ltd.
Hiroshi Kudo
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Semiconductor device including trench isolation layer and method of...
Patent number
11,854,864
Issue date
Dec 26, 2023
Samsung Electronics Co., Ltd.
Juyeon Kim
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Semiconductor device structure with gate spacer
Patent number
11,854,796
Issue date
Dec 26, 2023
Taiwan Semiconductor Manufacturing Company, Ltd
Guan-Yao Tu
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Semiconductor device with a passivation layer and method for produc...
Patent number
11,854,926
Issue date
Dec 26, 2023
Infineon Technologies AG
Jens Peter Konrath
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Methods of processing substrate and manufacturing semiconductor dev...
Patent number
11,848,203
Issue date
Dec 19, 2023
Kokusai Electric Corporation
Takayuki Waseda
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Method for forming semiconductor device with multi-layer etch stop...
Patent number
11,848,231
Issue date
Dec 19, 2023
Taiwan Semiconductor Manufacturing Company, Ltd
Po-Cheng Shih
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Doped or undoped silicon carbide deposition and remote hydrogen pla...
Patent number
11,848,199
Issue date
Dec 19, 2023
Lam Research Corporation
Guangbi Yuan
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Patent Grant
Semiconductor device and method
Patent number
11,837,515
Issue date
Dec 5, 2023
Taiwan Semiconductor Manufacturing Company, Ltd
Yin-Jie Pan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Transistor spacer structures
Patent number
11,830,931
Issue date
Nov 28, 2023
Taiwan Semiconductor Manufacturing Co., Ltd
Chansyun David Yang
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Methods of depositing SiCON with C, O, and N compositional control
Patent number
11,823,893
Issue date
Nov 21, 2023
Applied Materials, Inc.
Mark Saly
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Dielectric gap fill
Patent number
11,817,343
Issue date
Nov 14, 2023
Taiwan Semiconductor Manufacturing Company, Ltd
Yu-Yun Peng
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Cleaning method, method of manufacturing semiconductor device, and...
Patent number
11,788,188
Issue date
Oct 17, 2023
Kokusai Electric Corporation
Naoya Miyashita
B08 - CLEANING
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Patent Grant
Cyclic spin-on coating process for forming dielectric material
Patent number
11,791,154
Issue date
Oct 17, 2023
Taiwan Semiconductor Manufacturing Co., Ltd
Je-Ming Kuo
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Semiconductor device and fabrication method thereof
Patent number
11,791,413
Issue date
Oct 17, 2023
United Microelectronics Corp.
Shi-You Liu
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Plasma enhanced deposition processes for controlled formation of ox...
Patent number
11,776,807
Issue date
Oct 3, 2023
ASM IP Holding, B.V.
Lingyun Jia
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Techniques for improved low dielectric constant film processing
Patent number
11,756,796
Issue date
Sep 12, 2023
Applied Materials, Inc.
Rajesh Prasad
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Forming high carbon content flowable dielectric film with low proce...
Patent number
11,756,786
Issue date
Sep 12, 2023
International Business Machines Corporation
Benjamin D. Briggs
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Method of processing substrate and manufacturing semiconductor devi...
Patent number
11,746,416
Issue date
Sep 5, 2023
Kokusai Electric Corporation
Kimihiko Nakatani
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Composition for depositing silicon-containing thin film containing...
Patent number
11,749,522
Issue date
Sep 5, 2023
DNF Co., Ltd.
Sung Gi Kim
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
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Patent Grant
Composition and methods using same for carbon doped silicon contain...
Patent number
11,742,200
Issue date
Aug 29, 2023
VERSUM MATERIALS US, LLC
Haripin Chandra
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Patents Applications
last 30 patents
Information
Patent Application
CARBON REPLENISHMENT OF SILICON-CONTAINING MATERIAL
Publication number
20240120193
Publication date
Apr 11, 2024
Applied Materials, Inc.
Shankar Venkataraman
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
BACKSIDE WAFER TREATMENTS TO REDUCE DISTORTIONS AND OVERLAY ERRORS...
Publication number
20240113039
Publication date
Apr 4, 2024
Intel Corporation
Tayseer Mahdi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
Publication number
20240112907
Publication date
Apr 4, 2024
Kokusai Electric Corporation
Shoma MIYATA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
Publication number
20240105448
Publication date
Mar 28, 2024
Kokusai Electric Corporation
Motomu DEGAI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
Publication number
20240105443
Publication date
Mar 28, 2024
Kokusai Electric Corporation
Kimihiko NAKATANI
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
FORMATION OF SELF-ASSEMBLED MONOLAYER FOR SELECTIVE ETCHING PROCESS
Publication number
20240105462
Publication date
Mar 28, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Yi-Hsiu CHEN
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
MULTI-LAYER LINE STRUCTURE
Publication number
20240088040
Publication date
Mar 14, 2024
DAI NIPPON PRINTING CO., LTD.
Hiroshi Kudo
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SYSTEMS AND METHODS FOR DEPOSITING LOW-K DIELECTRIC FILMS
Publication number
20240087880
Publication date
Mar 14, 2024
Applied Materials, Inc.
Shruba Gangopadhyay
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
SYSTEMS AND METHODS FOR DEPOSITING LOW-K DIELECTRIC FILMS
Publication number
20240087881
Publication date
Mar 14, 2024
Applied Materials, Inc.
Michael Haverty
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
AIR GAP SPACER FORMATION FOR NANO-SCALE SEMICONDUCTOR DEVICES
Publication number
20240079266
Publication date
Mar 7, 2024
TESSERA LLC
Kangguo Cheng
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method for Reducing Loss of Dielectric Layer in IO Silicon Oxide Re...
Publication number
20240071760
Publication date
Feb 29, 2024
Shanghai Huali Integrated Circuit Corporation
Zhenquan Li
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF PROCESSING SUBSTRATE, SUBSTRATE PROCESSING APPARATUS, MET...
Publication number
20240071752
Publication date
Feb 29, 2024
Kokusai Electric Corporation
Takayuki WASEDA
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
DOPED OR UNDOPED SILICON CARBIDE DEPOSITION AND REMOTE HYDROGEN PLA...
Publication number
20240063015
Publication date
Feb 22, 2024
LAM RESEARCH CORPORATION
Guangbi Yuan
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Methods of Depositing SiCON with C, O, and N Compositional Control
Publication number
20240047193
Publication date
Feb 8, 2024
Applied Materials, Inc.
Mark Saly
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF FORMING TREATED SILICON-CARBON MATERIAL
Publication number
20240047198
Publication date
Feb 8, 2024
ASM IP HOLDING B.V.
Hirotsugu Sugiura
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
FORMING FILMS WITH IMPROVED FILM QUALITY
Publication number
20240038527
Publication date
Feb 1, 2024
Applied Materials, Inc.
Bhargav S. Citla
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PR...
Publication number
20240030026
Publication date
Jan 25, 2024
Kokusai Electric Corporation
Shoma MIYATA
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME
Publication number
20240014034
Publication date
Jan 11, 2024
Taiwan Semiconductor Manufacturing Company, Ltd.
Chi-Chang Liu
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SELECTIVE PLASMA ENHANCED ATOMIC LAYER DEPOSITION
Publication number
20240014036
Publication date
Jan 11, 2024
VERSUM MATERIALS US, LLC
RONALD M. PEARLSTEIN
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING...
Publication number
20240014032
Publication date
Jan 11, 2024
Kokusai Electric Corporation
Kazuhiro HARADA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
CONTACT OVER ACTIVE GATE STRUCTURES WITH ETCH STOP LAYERS FOR ADVAN...
Publication number
20240006322
Publication date
Jan 4, 2024
Intel Corporation
Atul MADHAVAN
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
SELECTIVE DEPOSITION OF SILICON AND OXYGEN CONTAINING DIELECTRIC FI...
Publication number
20230416911
Publication date
Dec 28, 2023
VERSUM MATERIALS US, LLC
RAVINDRA KANJOLIA
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
METHODS AND SYSTEMS FOR FORMING A LAYER COMPRISING SILICON OXIDE
Publication number
20230411147
Publication date
Dec 21, 2023
ASM IP HOLDING, B.V.
Jihee Jeon
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Cyclic Spin-On Coating Process for Forming Dielectric Material
Publication number
20230411150
Publication date
Dec 21, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Je-Ming Kuo
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD OF FORMING SiOCN LAYER
Publication number
20230407465
Publication date
Dec 21, 2023
ASM IP HOLDING B.V.
Takashi Yoshida
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
SEMICONDUCTOR DEVICE AND METHOD
Publication number
20230386947
Publication date
Nov 30, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Yin-Jie Pan
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
ALKOXYDISILOXANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM
Publication number
20230386825
Publication date
Nov 30, 2023
VERSUM MATERIALS US, LLC
MANCHAO XIAO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
TRANSISTOR SPACER STRUCTURES
Publication number
20230387257
Publication date
Nov 30, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Chansyun David Yang
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Dielectric Gap Fill
Publication number
20230377944
Publication date
Nov 23, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Yu-Yun PENG
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
COMPOSITION AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAIN...
Publication number
20230377874
Publication date
Nov 23, 2023
VERSUM MATERIALS US, LLC
Haripin Chandra
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...