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CPC
G03F7/40

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/40Treatment after imagewise removal

Industries

Patents Grantslast 30 patents

Information Patent Grant
Resist composition and pattern forming process
- Patent number 12,174,536
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist characteristics analysis method and characteristics ana...
- Patent number 12,174,113
- Issue date Dec 24, 2024
- FEMTO DEPLOYMENTS INC.
- Akira Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive resin composition, method for producing resist patte...
- Patent number 12,174,538
- Issue date Dec 24, 2024
- JSR Corporation
- Naoki Nishiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,174,541
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Surface treatment agent and method for manufacturing surface treatm...
- Patent number 12,163,087
- Issue date Dec 10, 2024
- Central Glass Company, Limited
- Yuki Fukui
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition, method for forming resist pattern...
- Patent number 12,158,700
- Issue date Dec 3, 2024
- JSR Corporation
- Hirokazu Sakakibara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing semiconductor devices
- Patent number 12,153,350
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Ru-Gun Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of compositions comprising a solvent mixture for avoiding patte...
- Patent number 12,146,125
- Issue date Nov 19, 2024
- BASF SE
- Marcel Brill
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Photocurable composition and method for producing semiconductor device
- Patent number 12,147,158
- Issue date Nov 19, 2024
- NISSAN CHEMICAL CORPORATION
- Hikaru Tokunaga
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist composition and method of manufacturing a semiconductor...
- Patent number 12,134,690
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yen-Hao Chen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, resin, composition, resist pattern formation method, circ...
- Patent number 12,134,596
- Issue date Nov 5, 2024
- Mitsubishi Gas Chemical Company, Inc.
- Takashi Makinoshima
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin, photoresist composition, and method of manufacturing semicon...
- Patent number 12,135,502
- Issue date Nov 5, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Siao-Shan Wang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Sulfonium salt, photoacid generator, curable composition and resist...
- Patent number 12,129,240
- Issue date Oct 29, 2024
- San-Apro Ltd.
- Takuto Nakao
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Carboxylate, resist composition and method for producing resist pat...
- Patent number 12,124,167
- Issue date Oct 22, 2024
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Formation of antireflective surfaces
- Patent number 12,122,668
- Issue date Oct 22, 2024
- Brookhaven Science Associates, LLC
- Charles T. Black
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 12,111,573
- Issue date Oct 8, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Takuya Ikeda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet photolithography method with infiltration for e...
- Patent number 12,111,576
- Issue date Oct 8, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Christine Y Ouyang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist development with halide chemistries
- Patent number 12,105,422
- Issue date Oct 1, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Coating composition for pattern inversion
- Patent number 12,084,592
- Issue date Sep 10, 2024
- NISSAN CHEMICAL CORPORATION
- Hiroaki Yaguchi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,085,857
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Reducing line edge roughness and mitigating defects by wafer freezing
- Patent number 12,087,601
- Issue date Sep 10, 2024
- International Business Machines Corporation
- Karen E. Petrillo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition comprising a primary and a secondary surfactant, for cl...
- Patent number 12,084,628
- Issue date Sep 10, 2024
- BASF SE
- I Chen Chou
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Photosensitive resin composition, pattern forming method, cured fil...
- Patent number 12,078,929
- Issue date Sep 3, 2024
- FUJIFILM Corporation
- Toshihide Aoshima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor aqueous composition and use of the same
- Patent number 12,077,727
- Issue date Sep 3, 2024
- Merck Patent GmbH
- Kazuma Yamamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Carboxylate, quencher, resist composition and method for producing...
- Patent number 12,060,316
- Issue date Aug 13, 2024
- Sumitomo Chemical Company, Limited
- Katsuhiro Komuro
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 12,042,813
- Issue date Jul 23, 2024
- SCREEN Holdings Co., Ltd.
- Hiroshi Abe
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method of manufacturing flexographic printing plate
- Patent number 12,044,972
- Issue date Jul 23, 2024
- FUJIFILM Corporation
- Hiroshi Tashiro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for building an etching-free hybrid nonlinear waveguide comp...
- Patent number 12,038,687
- Issue date Jul 16, 2024
- SHANDONG NORMAL UNIVERSITY
- Chen Chen
- G02 - OPTICS
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 12,032,290
- Issue date Jul 9, 2024
- FUJIFILM Corporation
- Daisuke Asakawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cooling unit, substrate treating apparatus including the same, and...
- Patent number 12,025,921
- Issue date Jul 2, 2024
- Semes Co., Ltd.
- Jun Ho Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
NANOPATTERNED SUBSTRATES
- Publication number 20240427235
- Publication date Dec 26, 2024
- Corning Incorporated
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20240427243
- Publication date Dec 26, 2024
- FUJIFILM CORPORATION
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240419078
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADDITIVE-CONTAINING SILICON-CONTAINING RESIST UNDERLAYER FILM FORMI...
- Publication number 20240419073
- Publication date Dec 19, 2024
- NISSAN CHEMICAL CORPORATION
- Shuhei SHIGAKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURE COMPRISING MICROCHANNEL, PRODUCTION METHOD FOR SAID STRUC...
- Publication number 20240408595
- Publication date Dec 12, 2024
- Asahi Kasei Kabushiki Kaisha
- Yuzo KOTANI
- B32 - LAYERED PRODUCTS
Information Patent Application
SEMICONDUCTOR PROCESSING TOOL AND METHOD OF USING AN EMBEDDED CHAMBER
- Publication number 20240395581
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...
- Publication number 20240377739
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Siao-Shan WANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...
- Publication number 20240376303
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yen-hao CHEN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240361696
- Publication date Oct 31, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING PRINTING PLATE AND PRINTING METHOD
- Publication number 20240361700
- Publication date Oct 31, 2024
- Asahi Kasei Kabushiki Kaisha
- Yuka YOSHIDA
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
METHOD FOR MANUFACTURING DRIVE CIRCUIT, DRIVE CIRCUIT AND PHOTOMASK
- Publication number 20240347552
- Publication date Oct 17, 2024
- HKC CORPORATION LIMITED
- Xiaozhen SUN
- G09 - EDUCATION CRYPTOGRAPHY DISPLAY ADVERTISING SEALS
Information Patent Application
CHIP PREPARATION METHOD AND SYSTEM, AND CHIP
- Publication number 20240334843
- Publication date Oct 3, 2024
- TENCENT TECHNOLOGY (SHENZHEN) COMPANY LIMITED
- Jingjing HU
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
LITHOGRAPHY TECHNIQUES FOR REDUCING DEFECTS
- Publication number 20240310735
- Publication date Sep 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ming-Hui WENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20240295823
- Publication date Sep 5, 2024
- Innolux Corporation
- Chun-Yuan Chuang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
- Publication number 20240295822
- Publication date Sep 5, 2024
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...
- Publication number 20240280903
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Yang LIN
- B82 - NANO-TECHNOLOGY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20240261814
- Publication date Aug 8, 2024
- SCREEN Holdings Co., Ltd.
- Hiroshi ABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROLITHOGRAPHIC FABRICATION OF STRUCTURES
- Publication number 20240248394
- Publication date Jul 25, 2024
- Molecular Imprints, Inc.
- Vikramjit Singh
- G02 - OPTICS
Information Patent Application
FABRICATION OF NANOIMPRINT WORKING STAMPS WITH COMBINED PATTERNS FR...
- Publication number 20240231221
- Publication date Jul 11, 2024
- Google LLC
- Lu Tian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INKJET HEAD, METHOD FOR PRODUCING SAME, METHOD FOR PRODUCING SEMICO...
- Publication number 20240227395
- Publication date Jul 11, 2024
- YAMAGATA UNIVERSITY
- Shinri SAKAI
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Application
PRECURSORS AND METHODS FOR PRODUCING BISMUTH-OXY-CARBIDE-BASED PHOT...
- Publication number 20240210821
- Publication date Jun 27, 2024
- Intel Corporation
- Charles Cameron Mokhtarzadeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM FOR EXPOSURE OF ULTRA-VIOLET LIGHT TO A PHOTORESIST DEVELOPE...
- Publication number 20240210835
- Publication date Jun 27, 2024
- Intel Corporation
- Joseph Bloxham
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SOLVENT COMPATIBLE NOZZLE PLATE
- Publication number 20240198675
- Publication date Jun 20, 2024
- Funai Electric Co., Ltd.
- Sean T. WEAVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR SUPPRESSING COLLAPSE OF THREE-DIMENSIONAL STRUCTURE
- Publication number 20240199913
- Publication date Jun 20, 2024
- Tokyo Ohka Kogyo Co., Ltd.
- Fusayo SAEKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR PREPARING PIXEL DEFINE LAYER
- Publication number 20240192589
- Publication date Jun 13, 2024
- DUK SAN NEOLUX CO., LTD.
- Jun BAE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20240194517
- Publication date Jun 13, 2024
- SEMES CO., LTD.
- Jaeoh BANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST BAKING APPARATUS
- Publication number 20240192604
- Publication date Jun 13, 2024
- Samsung Electronics Co., Ltd.
- Jaehong LIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PREPARING PIXEL DEFINE LAYER
- Publication number 20240176241
- Publication date May 30, 2024
- DUK SAN NEOLUX CO., LTD.
- Hanwook SEO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20240168374
- Publication date May 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROTECTIVE FILM-FORMING COMPOSITION
- Publication number 20240168385
- Publication date May 23, 2024
- NISSAN CHEMICAL CORPORATION
- Tokio NISHITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Treatment after imagewise removal

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Resist composition and pattern forming process

Photoresist characteristics analysis method and characteristics ana...

Photosensitive resin composition, method for producing resist patte...

Composition for forming silicon-containing resist underlayer film a...

Surface treatment agent and method for manufacturing surface treatm...

Photosensitive resin composition, method for forming resist pattern...

Method of manufacturing semiconductor devices

Use of compositions comprising a solvent mixture for avoiding patte...

Photocurable composition and method for producing semiconductor device

Photoresist composition and method of manufacturing a semiconductor...

Compound, resin, composition, resist pattern formation method, circ...

Resin, photoresist composition, and method of manufacturing semicon...

Sulfonium salt, photoacid generator, curable composition and resist...

Carboxylate, resist composition and method for producing resist pat...

Formation of antireflective surfaces

Resist composition and method of forming resist pattern

Extreme ultraviolet photolithography method with infiltration for e...

Photoresist development with halide chemistries

Coating composition for pattern inversion

Composition for forming silicon-containing resist underlayer film a...

Reducing line edge roughness and mitigating defects by wafer freezing

Composition comprising a primary and a secondary surfactant, for cl...

Photosensitive resin composition, pattern forming method, cured fil...

Semiconductor aqueous composition and use of the same

Carboxylate, quencher, resist composition and method for producing...

Substrate processing method and substrate processing apparatus

Method of manufacturing flexographic printing plate

Method for building an etching-free hybrid nonlinear waveguide comp...

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Cooling unit, substrate treating apparatus including the same, and...

Patents Applicationslast 30 patents

NANOPATTERNED SUBSTRATES

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

ADDITIVE-CONTAINING SILICON-CONTAINING RESIST UNDERLAYER FILM FORMI...

STRUCTURE COMPRISING MICROCHANNEL, PRODUCTION METHOD FOR SAID STRUC...

SEMICONDUCTOR PROCESSING TOOL AND METHOD OF USING AN EMBEDDED CHAMBER

RESIN, PHOTORESIST COMPOSITION, AND METHOD OF MANUFACTURING SEMICON...

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

METHOD FOR PRODUCING PRINTING PLATE AND PRINTING METHOD

METHOD FOR MANUFACTURING DRIVE CIRCUIT, DRIVE CIRCUIT AND PHOTOMASK

CHIP PREPARATION METHOD AND SYSTEM, AND CHIP

LITHOGRAPHY TECHNIQUES FOR REDUCING DEFECTS

METHOD FOR MANUFACTURING ELECTRONIC DEVICE

PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

MICROLITHOGRAPHIC FABRICATION OF STRUCTURES

FABRICATION OF NANOIMPRINT WORKING STAMPS WITH COMBINED PATTERNS FR...

INKJET HEAD, METHOD FOR PRODUCING SAME, METHOD FOR PRODUCING SEMICO...

PRECURSORS AND METHODS FOR PRODUCING BISMUTH-OXY-CARBIDE-BASED PHOT...

SYSTEM FOR EXPOSURE OF ULTRA-VIOLET LIGHT TO A PHOTORESIST DEVELOPE...

SOLVENT COMPATIBLE NOZZLE PLATE

METHOD FOR SUPPRESSING COLLAPSE OF THREE-DIMENSIONAL STRUCTURE

METHOD FOR PREPARING PIXEL DEFINE LAYER

SUBSTRATE PROCESSING APPARATUS

POST BAKING APPARATUS

METHOD FOR PREPARING PIXEL DEFINE LAYER

PHOTORESIST COMPOSITION

PROTECTIVE FILM-FORMING COMPOSITION