treatment by exposure to a gas or vapour

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H01L21/02337

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HELECTRICITY H01Electric elements H01LSEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Current Industry

H01L21/02337treatment by exposure to a gas or vapour

Industries

Patents Grantslast 30 patents

Information Patent Grant
Forming nitrogen-containing low-K gate spacer
- Patent number 11,948,841
- Issue date Apr 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wan-Yi Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for fabricating the same
- Patent number 11,901,437
- Issue date Feb 13, 2024
- Marlin Semiconductor Limited
- Te-Chang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,887,861
- Issue date Jan 30, 2024
- Tokyo Electron Limited
- Jaewon Woo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method and non...
- Patent number 11,869,764
- Issue date Jan 9, 2024
- Kokusai Electric Corporation
- Akinori Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and display device including the same
- Patent number 11,862,454
- Issue date Jan 2, 2024
- Semiconductor Energy Laboratory Co., Ltd.
- Shunpei Yamazaki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Isolation features and methods of fabricating the same
- Patent number 11,843,028
- Issue date Dec 12, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- I-Wen Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming semiconductor structure with high aspect ratio
- Patent number 11,823,960
- Issue date Nov 21, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Han-Pin Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition and methods using same for carbon doped silicon contain...
- Patent number 11,742,200
- Issue date Aug 29, 2023
- VERSUM MATERIALS US, LLC
- Haripin Chandra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Mechanism for FinFET well doping
- Patent number 11,742,237
- Issue date Aug 29, 2023
- Taiwan Semiconductor Manufacturing Company
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fin field-effect transistor device and method
- Patent number 11,735,430
- Issue date Aug 22, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yin Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing semiconductor device, substrate processing...
- Patent number 11,735,412
- Issue date Aug 22, 2023
- Kokusai Electric Corporation
- Atsushi Sano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Varying temperature anneal for film and structures formed thereby
- Patent number 11,715,637
- Issue date Aug 1, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shu Ling Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method for manufacturing the same
- Patent number 11,688,647
- Issue date Jun 27, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Bwo-Ning Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for producing high-density, nitrogen-doped carbon films for...
- Patent number 11,664,214
- Issue date May 30, 2023
- Applied Materials, Inc.
- Jui-Yuan Hsu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Strain enhancement for FinFETs
- Patent number 11,626,328
- Issue date Apr 11, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tsung-Lin Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of dielectric material fill and treatment
- Patent number 11,615,984
- Issue date Mar 28, 2023
- Applied Materials, Inc.
- Shi You
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interconnect structure for semiconductor device and methods of fabr...
- Patent number 11,610,841
- Issue date Mar 21, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Ta Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor structure with enlarged volu...
- Patent number 11,581,425
- Issue date Feb 14, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tsung-Hsi Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment method including low temperature degassing before fl...
- Patent number 11,574,824
- Issue date Feb 7, 2023
- SCREEN Holdings Co., Ltd.
- Takayuki Aoyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method
- Patent number 11,527,430
- Issue date Dec 13, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern formation method and method of manufacturing semiconductor...
- Patent number 11,521,855
- Issue date Dec 6, 2022
- Kioxia Corporation
- Ryosuke Yamamoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing an etch stop layer and an inter-layer diele...
- Patent number 11,522,062
- Issue date Dec 6, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
In-situ film annealing with spatial atomic layer deposition
- Patent number 11,515,144
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Keiichi Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Deposition of flowable silicon-containing films
- Patent number 11,515,149
- Issue date Nov 29, 2022
- Applied Materials, Inc.
- Lakmal C. Kalutarage
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 11,476,112
- Issue date Oct 18, 2022
- Kokusai Electric Corporation
- Akinori Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flash memory containing air gaps
- Patent number 11,456,307
- Issue date Sep 27, 2022
- Semiconductor Manufacturing International (Shanghai) Corporation
- Liang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for controlling contact resistance in cobalt-...
- Patent number 11,424,132
- Issue date Aug 23, 2022
- Applied Materials, Inc.
- Takashi Kuratomi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor structure formation
- Patent number 11,404,267
- Issue date Aug 2, 2022
- Micron Technology, Inc.
- Santanu Sarkar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicous film forming composition comprising block copolymer and me...
- Patent number 11,401,384
- Issue date Aug 2, 2022
- Merck Patent GmbH
- Takashi Fujiwara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon oxide layer for oxidation resistance and method forming same
- Patent number 11,393,711
- Issue date Jul 19, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wan-Yi Kao
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS, PROCESSING METHOD, AND NON-TRANSITO...
- Publication number 20240096615
- Publication date Mar 21, 2024
- Kokusai Electric Corporation
- Akinori TANAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Volume-less Fluorine Incorporation Method
- Publication number 20240071767
- Publication date Feb 29, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsueh-Ju Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADHESION IMPROVEMENT BETWEEN LOW-K MATERIALS AND CAP LAYERS
- Publication number 20240071817
- Publication date Feb 29, 2024
- Applied Materials, Inc.
- Ruitong Xiong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE DEPOSITION FOR SUB 20 NM PITCH EUV PATTERNING
- Publication number 20240055255
- Publication date Feb 15, 2024
- Applied Materials, Inc.
- Zeqing Shen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR STRUCTURE
- Publication number 20230411343
- Publication date Dec 21, 2023
- United Microelectronics Corp.
- Sheng Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAIN...
- Publication number 20230377874
- Publication date Nov 23, 2023
- VERSUM MATERIALS US, LLC
- Haripin Chandra
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS FOR REDUCING SCRATCH DEFECTS IN CHEMICAL MECHANICAL PLANARI...
- Publication number 20230377898
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wan-Chun Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20230343580
- Publication date Oct 26, 2023
- Kokusai Electric Corporation
- Atsushi SANO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Mechanism for FinFET Well Doping
- Publication number 20230343634
- Publication date Oct 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE
- Publication number 20230326977
- Publication date Oct 12, 2023
- TOKYO ELECTRON LIMITED
- Koji AKIYAMA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Varying Temperature Anneal for Film and Structures Formed Thereby
- Publication number 20230317448
- Publication date Oct 5, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shu Ling Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MODIFYING INSULATING FILM AND METHOD FOR MANUFACTURING S...
- Publication number 20230317832
- Publication date Oct 5, 2023
- SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- Shunpei YAMAZAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE SPACER AND FORMATION METHOD THEREOF
- Publication number 20230299175
- Publication date Sep 21, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yi-Rui CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR DEPOSITING GAP-FILLING FLUIDS AND RELATED SYSTEMS AND D...
- Publication number 20230298885
- Publication date Sep 21, 2023
- ASM IP HOLDING, B.V.
- Ranjit Borude
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD, SEMICONDUCTOR STRUCTURE, AND VACUUM PROCESSING SYSTEM
- Publication number 20230223252
- Publication date Jul 13, 2023
- TURUN YLIOPISTO
- Pekka Laukkanen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
INTEGRATED CIRCUIT WITH GETTER LAYER FOR HYDROGEN ENTRAPMENT
- Publication number 20230223274
- Publication date Jul 13, 2023
- CIRRUS LOGIC INTERNATIONAL SEMICONDUCTOR LTD.
- Marc L. Tarabbia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF DIELECTRIC MATERIAL FILL AND TREATMENT
- Publication number 20230187276
- Publication date Jun 15, 2023
- Applied Materials, Inc.
- Shi YOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method
- Publication number 20230113320
- Publication date Apr 13, 2023
- Taiwan Semiconductor Manufacturing Co, LTD.
- Shiang-Bau Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND NON...
- Publication number 20230077197
- Publication date Mar 9, 2023
- Kokusai Electric Corporation
- Akinori TANAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20220415652
- Publication date Dec 29, 2022
- Kokusai Electric Corporation
- Daigo YAMAGUCHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Inter-Layer Dielectrics and Etch Stop Layers for Transistor Source/...
- Publication number 20220384593
- Publication date Dec 1, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shahaji B. More
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon Oxide Layer for Oxidation Resistance and Method Forming Same
- Publication number 20220336264
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wan-Yi Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR CONTROLLING CONTACT RESISTANCE IN COBALT-TITANIUM STRUC...
- Publication number 20220336227
- Publication date Oct 20, 2022
- Applied Materials, Inc.
- TAKASHI KURATOMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
- Publication number 20220278225
- Publication date Sep 1, 2022
- Marlin Semiconductor Limited
- Te-Chang Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES WITH LINERS AND RELATED METHODS
- Publication number 20220278214
- Publication date Sep 1, 2022
- Micron Technologiy, Inc.
- Christopher J. Larsen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CARBON FILM DEPOSITION METHOD AND DEPOSITION APPARATUS
- Publication number 20220246429
- Publication date Aug 4, 2022
- TOKYO ELECTRON LIMITED
- Yosuke WATANABE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Forming Nitrogen-Containing Low-K Gate Spacer
- Publication number 20220246478
- Publication date Aug 4, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wan-Yi Kao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR TREATING SUBSTRATE
- Publication number 20220165589
- Publication date May 26, 2022
- SEMES CO., LTD.
- Ki Sang EUM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for Annealing a Gate Insulation Layer on a Wide Band Gap Sem...
- Publication number 20220157607
- Publication date May 19, 2022
- Thomas Aichinger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Varying Temperature Anneal for Film and Structures Formed Thereby
- Publication number 20220157596
- Publication date May 19, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shu Ling Liao
- H01 - BASIC ELECTRIC ELEMENTS

treatment by exposure to a gas or vapour

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Forming nitrogen-containing low-K gate spacer

Semiconductor device and method for fabricating the same

Substrate processing method and substrate processing apparatus

Substrate processing apparatus, substrate processing method and non...

Semiconductor device and display device including the same

Isolation features and methods of fabricating the same

Method for forming semiconductor structure with high aspect ratio

Composition and methods using same for carbon doped silicon contain...

Mechanism for FinFET well doping

Fin field-effect transistor device and method

Method of manufacturing semiconductor device, substrate processing...

Varying temperature anneal for film and structures formed thereby

Semiconductor device and method for manufacturing the same

Methods for producing high-density, nitrogen-doped carbon films for...

Strain enhancement for FinFETs

Method of dielectric material fill and treatment

Interconnect structure for semiconductor device and methods of fabr...

Method for manufacturing semiconductor structure with enlarged volu...

Heat treatment method including low temperature degassing before fl...

Semiconductor device and method

Pattern formation method and method of manufacturing semiconductor...

Method of manufacturing an etch stop layer and an inter-layer diele...

In-situ film annealing with spatial atomic layer deposition

Deposition of flowable silicon-containing films

Substrate processing apparatus

Flash memory containing air gaps

Methods and apparatus for controlling contact resistance in cobalt-...

Semiconductor structure formation

Silicous film forming composition comprising block copolymer and me...

Silicon oxide layer for oxidation resistance and method forming same

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS, PROCESSING METHOD, AND NON-TRANSITO...

Volume-less Fluorine Incorporation Method

ADHESION IMPROVEMENT BETWEEN LOW-K MATERIALS AND CAP LAYERS

SELECTIVE DEPOSITION FOR SUB 20 NM PITCH EUV PATTERNING

MANUFACTURING METHOD OF SEMICONDUCTOR STRUCTURE

COMPOSITION AND METHODS USING SAME FOR CARBON DOPED SILICON CONTAIN...

METHODS FOR REDUCING SCRATCH DEFECTS IN CHEMICAL MECHANICAL PLANARI...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

Mechanism for FinFET Well Doping

MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE

Varying Temperature Anneal for Film and Structures Formed Thereby

METHOD FOR MODIFYING INSULATING FILM AND METHOD FOR MANUFACTURING S...

GATE SPACER AND FORMATION METHOD THEREOF

METHODS FOR DEPOSITING GAP-FILLING FLUIDS AND RELATED SYSTEMS AND D...

METHOD, SEMICONDUCTOR STRUCTURE, AND VACUUM PROCESSING SYSTEM

INTEGRATED CIRCUIT WITH GETTER LAYER FOR HYDROGEN ENTRAPMENT

METHOD OF DIELECTRIC MATERIAL FILL AND TREATMENT

Semiconductor Device and Method

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND NON...

METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCT...

Inter-Layer Dielectrics and Etch Stop Layers for Transistor Source/...

Silicon Oxide Layer for Oxidation Resistance and Method Forming Same

METHODS FOR CONTROLLING CONTACT RESISTANCE IN COBALT-TITANIUM STRUC...

SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

SEMICONDUCTOR DEVICES WITH LINERS AND RELATED METHODS

CARBON FILM DEPOSITION METHOD AND DEPOSITION APPARATUS

Forming Nitrogen-Containing Low-K Gate Spacer

APPARATUS FOR TREATING SUBSTRATE

Method for Annealing a Gate Insulation Layer on a Wide Band Gap Sem...

Varying Temperature Anneal for Film and Structures Formed Thereby