Triode systems

Industry

CPC
H01J37/32587

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge

Current Industry

H01J37/32587Triode systems

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,935,724
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,587,766
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber for etching low k and other dielectric films
- Patent number 11,410,860
- Issue date Aug 9, 2022
- Applied Materials, Inc.
- Dmitry Lubomirsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 11,043,361
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber for etching low K and other dielectric films
- Patent number 10,923,367
- Issue date Feb 16, 2021
- Applied Materials, Inc.
- Dmitry Lubomirsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process chamber for etching low K and other dielectric films
- Patent number 10,096,496
- Issue date Oct 9, 2018
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Symmetric VHF source for a plasma reactor
- Patent number 9,824,862
- Issue date Nov 21, 2017
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of producing plasma by multiple-phase alternating or pulsed...
- Patent number 9,721,764
- Issue date Aug 1, 2017
- AGC FLAT GLASS NORTH AMERICA, INC.
- John Chambers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process chamber for etching low k and other dielectric films
- Patent number 9,666,414
- Issue date May 30, 2017
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor fabrication apparatuses to perform semiconductor etch...
- Patent number 8,652,342
- Issue date Feb 18, 2014
- Samsung Electronics Co., Ltd.
- Kyung-Woo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and arrangements for managing plasma confinement
- Patent number 8,206,604
- Issue date Jun 26, 2012
- Lam Research Corporation
- Sebastien Dine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor fabrication apparatuses to perform semiconductor etch...
- Patent number 8,197,637
- Issue date Jun 12, 2012
- Samsung Electronics Co., Ltd.
- Kyung-Woo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for uniformity control in ballistic electron beam...
- Patent number 7,829,469
- Issue date Nov 9, 2010
- Tokyo Electron Limited
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum processing apparatus
- Patent number 7,780,790
- Issue date Aug 24, 2010
- Canon Anelva Corporation
- Hiroshi Nogami
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reduced electric field arrangement for managing plasma confinement
- Patent number 7,758,718
- Issue date Jul 20, 2010
- Lam Research Corporation
- Sebastien Dine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method, and electrode plate for pla...
- Patent number 7,494,561
- Issue date Feb 24, 2009
- Tokyo Electron Limited
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor and method
- Patent number 7,223,699
- Issue date May 29, 2007
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor and method
- Patent number 6,905,969
- Issue date Jun 14, 2005
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor and method
- Patent number 6,620,335
- Issue date Sep 16, 2003
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor and method
- Patent number 6,500,314
- Issue date Dec 31, 2002
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for etching a semiconductor wafer with feature...
- Patent number 6,492,280
- Issue date Dec 10, 2002
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor and method for emerging films
- Patent number 6,410,448
- Issue date Jun 25, 2002
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor having a plurality of magnets
- Patent number 6,354,240
- Issue date Mar 12, 2002
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor and method for emerging films
- Patent number 6,190,496
- Issue date Feb 20, 2001
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for etching a semiconductor wafer with feature...
- Patent number 6,127,277
- Issue date Oct 3, 2000
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etch reactor and method for emerging films
- Patent number 6,048,435
- Issue date Apr 11, 2000
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-electrode plasma processing apparatus
- Patent number 5,464,499
- Issue date Nov 7, 1995
- Texas Instruments Incorporated
- Mehrdad M. Moslehi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma reactor for processing substrates
- Patent number 5,453,305
- Issue date Sep 26, 1995
- International Business Machines Corporation
- Young H. Lee
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Dry etching apparatus and method of forming a via hole in an interl...
- Patent number 5,441,595
- Issue date Aug 15, 1995
- NEC Corporation
- Yasushi Yamagata
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dry etching apparatus and method of forming a via hole in an interl...
- Patent number 5,362,358
- Issue date Nov 8, 1994
- NEC Corporation
- Yasushi Yamagata
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR
- Publication number 20230197406
- Publication date Jun 22, 2023
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR
- Publication number 20210313147
- Publication date Oct 7, 2021
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CHAMBER FOR ETCHING LOW K AND OTHER DIELECTRIC FILMS
- Publication number 20210134618
- Publication date May 6, 2021
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CHAMBER FOR ETCHING LOW K AND OTHER DIELECTRIC FILMS
- Publication number 20180358244
- Publication date Dec 13, 2018
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Symmetric VHF Source for a Plasma Reactor
- Publication number 20180053630
- Publication date Feb 22, 2018
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PRODUCING PLASMA BY MULTIPLE-PHASE ALTERNATING OR PULSED...
- Publication number 20170140903
- Publication date May 18, 2017
- AGC Flat Glass North America, Inc.
- John CHAMBERS
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR
- Publication number 20150075719
- Publication date Mar 19, 2015
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20120241412
- Publication date Sep 27, 2012
- TOKYO ELECTRON LIMITED
- Takahiro MURAKAMI
- B08 - CLEANING
Information Patent Application
PLASMA CVD DEVICE AND METHOD OF MANUFACTURING SILICON THIN FILM
- Publication number 20120220109
- Publication date Aug 30, 2012
- Tsunenori Komori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR FABRICATION APPARATUSES TO PERFORM SEMICONDUCTOR ETCH...
- Publication number 20120220110
- Publication date Aug 30, 2012
- Samsung Electronics Co., Ltd.
- Kyung-Woo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR
- Publication number 20120043023
- Publication date Feb 23, 2012
- Applied Materials, Inc.
- Kartik Ramaswamy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR GENERATING PLASMA
- Publication number 20110003087
- Publication date Jan 6, 2011
- Beneq Oy
- Pekka Soininen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND ARRANGEMENTS FOR MANAGING PLASMA CONFINEMENT
- Publication number 20100279028
- Publication date Nov 4, 2010
- Sebastien Dine
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VACUUM PROCESSING APPARATUS
- Publication number 20100037821
- Publication date Feb 18, 2010
- Canon ANELVA Corporation
- Hiroshi NOGAMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20090239383
- Publication date Sep 24, 2009
- Sanyo Electric Co., Ltd.
- Youichirou AYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR FABRICATION APPARATUSES TO PERFORM SEMICONDUCTOR ETCH...
- Publication number 20080206998
- Publication date Aug 28, 2008
- Samsung Electronics Co., Ltd.
- Kyung-Woo Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR UNIFORMITY CONTROL IN BALLISTIC ELECTRON BEAM...
- Publication number 20080135518
- Publication date Jun 12, 2008
- TOKYO ELECTRON LIMITED
- Lee Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus of triple-electrode dielectric barrier discharge at atmos...
- Publication number 20080060579
- Publication date Mar 13, 2008
- ATOMIC ENERGY COUNCIL-INSTITUE OF NUCLEAR ENERGY RESEARCH
- Cheng-Chang Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20070221332
- Publication date Sep 27, 2007
- TOKYO ELECTRON LIMITED
- Masanobu HONDA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method, and electrode plate for pla...
- Publication number 20050269292
- Publication date Dec 8, 2005
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma etch reactor and method
- Publication number 20050164513
- Publication date Jul 28, 2005
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ionic plasma deposition apparatus
- Publication number 20040134770
- Publication date Jul 15, 2004
- John H Petersen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma etch reactor and method
- Publication number 20020139665
- Publication date Oct 3, 2002
- Tegal Corporation
- Stephen P. DeOrnellas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and plasma processing method
- Publication number 20020020497
- Publication date Feb 21, 2002
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS

Triode systems

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Symmetric VHF source for a plasma reactor

Symmetric VHF source for a plasma reactor

Process chamber for etching low k and other dielectric films

Symmetric VHF source for a plasma reactor

Process chamber for etching low K and other dielectric films

Process chamber for etching low K and other dielectric films

Symmetric VHF source for a plasma reactor

Method of producing plasma by multiple-phase alternating or pulsed...

Process chamber for etching low k and other dielectric films

Semiconductor fabrication apparatuses to perform semiconductor etch...

Methods and arrangements for managing plasma confinement

Semiconductor fabrication apparatuses to perform semiconductor etch...

Method and system for uniformity control in ballistic electron beam...

Vacuum processing apparatus

Reduced electric field arrangement for managing plasma confinement

Plasma processing apparatus and method, and electrode plate for pla...

Plasma etch reactor and method

Plasma etch reactor and method

Plasma etch reactor and method

Plasma etch reactor and method

Method and apparatus for etching a semiconductor wafer with feature...

Plasma etch reactor and method for emerging films

Plasma etch reactor having a plurality of magnets

Plasma etch reactor and method for emerging films

Method and apparatus for etching a semiconductor wafer with feature...

Plasma etch reactor and method for emerging films

Multi-electrode plasma processing apparatus

Plasma reactor for processing substrates

Dry etching apparatus and method of forming a via hole in an interl...

Dry etching apparatus and method of forming a via hole in an interl...

Patents Applicationslast 30 patents

SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR

SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR

PROCESS CHAMBER FOR ETCHING LOW K AND OTHER DIELECTRIC FILMS

PROCESS CHAMBER FOR ETCHING LOW K AND OTHER DIELECTRIC FILMS

Symmetric VHF Source for a Plasma Reactor

METHOD OF PRODUCING PLASMA BY MULTIPLE-PHASE ALTERNATING OR PULSED...

SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA CVD DEVICE AND METHOD OF MANUFACTURING SILICON THIN FILM

SEMICONDUCTOR FABRICATION APPARATUSES TO PERFORM SEMICONDUCTOR ETCH...

SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR

METHOD AND APPARATUS FOR GENERATING PLASMA

METHODS AND ARRANGEMENTS FOR MANAGING PLASMA CONFINEMENT

VACUUM PROCESSING APPARATUS

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

SEMICONDUCTOR FABRICATION APPARATUSES TO PERFORM SEMICONDUCTOR ETCH...

METHOD AND SYSTEM FOR UNIFORMITY CONTROL IN BALLISTIC ELECTRON BEAM...

Apparatus of triple-electrode dielectric barrier discharge at atmos...

PLASMA PROCESSING APPARATUS

Plasma processing apparatus and method, and electrode plate for pla...

Plasma etch reactor and method

Ionic plasma deposition apparatus

Plasma etch reactor and method

Plasma processing apparatus and plasma processing method