TREA

Use of illumination settings tailored to particular mask patterns

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Industry

  • CPC
  • G03F7/70125
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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70125Use of illumination settings tailored to particular mask patterns
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