Use of illumination settings tailored to particular mask patterns

Industry

CPC
G03F7/70125

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70125Use of illumination settings tailored to particular mask patterns

Industries

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for photolithographic imaging
- Patent number 12,117,730
- Issue date Oct 15, 2024
- ASML Netherlands B.V.
- Joern-Holger Franke
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Flows of optimization for patterning processes
- Patent number 11,886,124
- Issue date Jan 30, 2024
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for high numerical aperture thru-slit source mask optimization
- Patent number 11,815,808
- Issue date Nov 14, 2023
- ASML Netherlands B.V.
- Kars Zeger Troost
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Simulation of lithography using multiple-sampling of angular distri...
- Patent number 11,506,984
- Issue date Nov 22, 2022
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Flows of optimization for patterning processes
- Patent number 11,480,882
- Issue date Oct 25, 2022
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask and method for manufacturing the same, lithography method, dis...
- Patent number 11,474,434
- Issue date Oct 18, 2022
- Hefei Xinsheng Optoelectronics Technology Co., Ltd.
- Dengfeng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dynamic illumination method based on scan exposure machine
- Patent number 11,422,474
- Issue date Aug 23, 2022
- Shanghai Huali Integrated Circuit Corporation
- Yuyang Bian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Control of reticle placement for defectivity optimization
- Patent number 11,422,478
- Issue date Aug 23, 2022
- ASML Holding N.V.
- Andrew Judge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of performing model-based scanner tuning
- Patent number 11,372,337
- Issue date Jun 28, 2022
- ASML Netherlands B.V.
- Jun Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology system and method for measuring diagonal diffraction-base...
- Patent number 11,353,321
- Issue date Jun 7, 2022
- KLA Corporation
- Roie Volkovich
- G01 - MEASURING TESTING
Information Patent Grant
Photomask design for generating plasmonic effect
- Patent number 11,211,374
- Issue date Dec 28, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Minfeng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Flows of optimization for patterning processes
- Patent number 11,137,690
- Issue date Oct 5, 2021
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimization of a lithographic projection apparatus accounting for...
- Patent number 11,112,700
- Issue date Sep 7, 2021
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Integrated circuit with scribe lane patterns for defect reduction
- Patent number 11,094,644
- Issue date Aug 17, 2021
- Texas Instruments Incorporated
- Adrian Salinas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Profile aware source-mask optimization
- Patent number 11,054,750
- Issue date Jul 6, 2021
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fast freeform source and mask co-optimization method
- Patent number 11,042,687
- Issue date Jun 22, 2021
- ASML Netherlands B.V.
- Luoqi Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optimization based on machine learning
- Patent number 11,029,605
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Xiaofeng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optimization of a lithography apparatus or patterning process based...
- Patent number 11,029,594
- Issue date Jun 8, 2021
- ASML Netherlands B.V.
- Steven George Hansen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Rule-based deployment of assist features
- Patent number 11,022,894
- Issue date Jun 1, 2021
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit and optical system for EUV projection lit...
- Patent number 10,976,668
- Issue date Apr 13, 2021
- Carl Zeiss SMT GmbH
- Joerg Zimmermann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing control apparatus, recording medium, and metho...
- Patent number 10,955,753
- Issue date Mar 23, 2021
- TOSHIBA MEMORY CORPORATION
- Kentaro Kasa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimization of assist features and source
- Patent number 10,955,755
- Issue date Mar 23, 2021
- ASML Netherlands B.V.
- Duan-Fu Stephen Hsu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods of determining process models by machine learning
- Patent number 10,948,831
- Issue date Mar 16, 2021
- ASML Netherlands B.V.
- Ya Luo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Semiconductor structure for optical validation
- Patent number 10,921,715
- Issue date Feb 16, 2021
- International Business Machines Corporation
- Daniel Corliss
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photolithography process and photolithography apparatus
- Patent number 10,908,495
- Issue date Feb 2, 2021
- Semiconductor Manufacturing International (Shanghai) Corporation
- Yao Jun Du
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithography system, simulation apparatus, and pattern forming method
- Patent number 10,846,457
- Issue date Nov 24, 2020
- Nikon Corporation
- Tomoyuki Matsuyama
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of performing model-based scanner tuning
- Patent number 10,795,266
- Issue date Oct 6, 2020
- ASML Netherlands B.V.
- Jun Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etch variation tolerant optimization
- Patent number 10,712,653
- Issue date Jul 14, 2020
- ASML Netherlands B.V.
- Xiaofeng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and device for characterizing a mask for microlithography
- Patent number 10,698,318
- Issue date Jun 30, 2020
- Carl Zeiss SMT GmbH
- Holger Seitz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated mask-aware lithography modeling to support off-axis illu...
- Patent number 10,691,015
- Issue date Jun 23, 2020
- Hongbo Zhang
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
OPTIMIZATION METHOD FOR MASK PATTERN OPTICAL TRANSFER
- Publication number 20240094638
- Publication date Mar 21, 2024
- United Microelectronics Corp.
- Chun-Yi CHANG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZATION OF SCANNER THROUGHPUT AND IMAGING QUALITY FOR A PATTER...
- Publication number 20230333483
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Xingyue PENG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A FABRICATION PROCESS DEVIATION DETERMINATION METHOD, CALIBRATION M...
- Publication number 20230280661
- Publication date Sep 7, 2023
- ASML NETHERLANDS B.V.
- Shakeeb Bin HASAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF PATTERNING A PHOTORESIST, AND RELATED PATTERNING SYSTEMS
- Publication number 20230161263
- Publication date May 25, 2023
- KULICKE & SOFFA LITEQ B.V.
- Jeroen de Boeij
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLOWS OF OPTIMIZATION FOR PATTERNING PROCESSES
- Publication number 20230047402
- Publication date Feb 16, 2023
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN FORMING METHOD, RESIST MATERIAL, AND PATTERN FORMING APPARATUS
- Publication number 20220365448
- Publication date Nov 17, 2022
- OJI HOLDINGS CORPORATION
- Kazuyo MORITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PHOTOLITHOGRAPHIC IMAGING
- Publication number 20220236645
- Publication date Jul 28, 2022
- ASML NETHERLANDS B.V.
- Joern-Holger FRANKE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR HIGH NUMERICAL APERTURE THRU-SLIT SOURCE MASK OPTIMIZATION
- Publication number 20220050373
- Publication date Feb 17, 2022
- ASML NETHERLANDS B.V.
- Kars Zeger TROOST
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING OR SETTING A PROJECTION EXPOSURE APPARATUS
- Publication number 20220043358
- Publication date Feb 10, 2022
- Carl Zeiss SMT GMBH
- Rolf FREIMANN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLOWS OF OPTIMIZATION FOR PATTERNING PROCESSES
- Publication number 20220011674
- Publication date Jan 13, 2022
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTEGRATED CIRCUIT WITH SCRIBE LANE PATTERNS FOR DEFECT REDUCTION
- Publication number 20210398910
- Publication date Dec 23, 2021
- TEXAS INSTRUMENTS INCORPORATED
- Adrian SALINAS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF DETERMINING PROCESS MODELS BY MACHINE LEARNING
- Publication number 20210271172
- Publication date Sep 2, 2021
- ASML NETHERLANDS B.V.
- Ya Luo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
INTEGRATED CIRCUIT WITH SCRIBE LANE PATTERNS FOR DEFECT REDUCTION
- Publication number 20210104468
- Publication date Apr 8, 2021
- TEXAS INSTRUMENTS INCORPORATED
- Adrian SALINAS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF PERFORMING MODEL-BASED SCANNER TUNING
- Publication number 20210018844
- Publication date Jan 21, 2021
- ASML NETHERLANDS B.V.
- Jun Ye
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK DESIGN FOR GENERATING PLASMONIC EFFECT
- Publication number 20200312835
- Publication date Oct 1, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Minfeng CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLOWS OF OPTIMIZATION FOR PATTERNING PROCESSES
- Publication number 20200257204
- Publication date Aug 13, 2020
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FAST FREEFORM SOURCE AND MASK CO-OPTIMIZATION METHOD
- Publication number 20200218850
- Publication date Jul 9, 2020
- Luoqi Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
CONTROL OF RETICLE PLACEMENT FOR DEFECTIVITY OPTIMIZATION
- Publication number 20200166855
- Publication date May 28, 2020
- ASML Holding N.V.
- Andrew JUDGE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING PROCESS MODELS BY MACHINE LEARNING
- Publication number 20200026196
- Publication date Jan 23, 2020
- ASML NETHERLANDE B.V.
- Ya LUO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTIMIZATION OF A LITHOGRAPHY APPARATUS OR PATTERNING PROCESS BASED...
- Publication number 20190369480
- Publication date Dec 5, 2019
- ASML NETHERLANDS B.V.
- Steven George HANSEN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTIMIZATION BASED ON MACHINE LEARNING
- Publication number 20190354023
- Publication date Nov 21, 2019
- ASML NETHERLANDS B.V.
- Xiaofeng Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEMICONDUCTOR STRUCTURE FOR OPTICAL VALIDATION
- Publication number 20190346773
- Publication date Nov 14, 2019
- International Business Machines Corporation
- Daniel Corliss
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
LITHOGRAPHY SYSTEM, SIMULATION APPARATUS, AND PATTERN FORMING METHOD
- Publication number 20190302622
- Publication date Oct 3, 2019
- Nikon Corporation
- Tomoyuki MATSUYAMA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
RULE-BASED DEPLOYMENT OF ASSIST FEATURES
- Publication number 20190294053
- Publication date Sep 26, 2019
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING CONTROL APPARATUS, RECORDING MEDIUM, AND METHO...
- Publication number 20190294052
- Publication date Sep 26, 2019
- Toshiba Memory Corporation
- Kentaro KASA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTIMIZATION OF ASSIST FEATURES AND SOURCE
- Publication number 20190285991
- Publication date Sep 19, 2019
- ASML NETHERLANDS B.V.
- Duan-Fu Stephen HSU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERN-EDGE PLACEMENT PREDICTOR AND MONITOR FOR LITHOGRAPHIC EXPOS...
- Publication number 20190278189
- Publication date Sep 12, 2019
- Nikon Corporation
- Jacek K. Tyminski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
OPTICAL MASK VALIDATION
- Publication number 20190163071
- Publication date May 30, 2019
- International Business Machines Corporation
- Daniel Corliss
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DISCRETE SOURCE MASK OPTIMIZATION
- Publication number 20190155165
- Publication date May 23, 2019
- ASML NETHERLANDS B.V.
- Xiaofeng LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ETCH VARIATION TOLERANT OPTIMIZATION
- Publication number 20190155145
- Publication date May 23, 2019
- ASML NETHERLANDS B.V.
- Xiaofeng Liu
- G06 - COMPUTING CALCULATING COUNTING

Use of illumination settings tailored to particular mask patterns

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Method and apparatus for photolithographic imaging

Flows of optimization for patterning processes

Method for high numerical aperture thru-slit source mask optimization

Simulation of lithography using multiple-sampling of angular distri...

Flows of optimization for patterning processes

Mask and method for manufacturing the same, lithography method, dis...

Dynamic illumination method based on scan exposure machine

Control of reticle placement for defectivity optimization

Method of performing model-based scanner tuning

Metrology system and method for measuring diagonal diffraction-base...

Photomask design for generating plasmonic effect

Flows of optimization for patterning processes

Optimization of a lithographic projection apparatus accounting for...

Integrated circuit with scribe lane patterns for defect reduction

Profile aware source-mask optimization

Fast freeform source and mask co-optimization method

Optimization based on machine learning

Optimization of a lithography apparatus or patterning process based...

Rule-based deployment of assist features

Illumination optical unit and optical system for EUV projection lit...

Substrate processing control apparatus, recording medium, and metho...

Optimization of assist features and source

Methods of determining process models by machine learning

Semiconductor structure for optical validation

Photolithography process and photolithography apparatus

Lithography system, simulation apparatus, and pattern forming method

Method of performing model-based scanner tuning

Etch variation tolerant optimization

Method and device for characterizing a mask for microlithography

Integrated mask-aware lithography modeling to support off-axis illu...

Patents Applicationslast 30 patents

OPTIMIZATION METHOD FOR MASK PATTERN OPTICAL TRANSFER

OPTIMIZATION OF SCANNER THROUGHPUT AND IMAGING QUALITY FOR A PATTER...

A FABRICATION PROCESS DEVIATION DETERMINATION METHOD, CALIBRATION M...

METHODS OF PATTERNING A PHOTORESIST, AND RELATED PATTERNING SYSTEMS

FLOWS OF OPTIMIZATION FOR PATTERNING PROCESSES

PATTERN FORMING METHOD, RESIST MATERIAL, AND PATTERN FORMING APPARATUS

METHOD AND APPARATUS FOR PHOTOLITHOGRAPHIC IMAGING

METHOD FOR HIGH NUMERICAL APERTURE THRU-SLIT SOURCE MASK OPTIMIZATION

METHOD FOR PRODUCING OR SETTING A PROJECTION EXPOSURE APPARATUS

FLOWS OF OPTIMIZATION FOR PATTERNING PROCESSES

INTEGRATED CIRCUIT WITH SCRIBE LANE PATTERNS FOR DEFECT REDUCTION

METHODS OF DETERMINING PROCESS MODELS BY MACHINE LEARNING

INTEGRATED CIRCUIT WITH SCRIBE LANE PATTERNS FOR DEFECT REDUCTION

METHOD OF PERFORMING MODEL-BASED SCANNER TUNING

PHOTOMASK DESIGN FOR GENERATING PLASMONIC EFFECT

FLOWS OF OPTIMIZATION FOR PATTERNING PROCESSES

FAST FREEFORM SOURCE AND MASK CO-OPTIMIZATION METHOD

CONTROL OF RETICLE PLACEMENT FOR DEFECTIVITY OPTIMIZATION

METHODS OF DETERMINING PROCESS MODELS BY MACHINE LEARNING

OPTIMIZATION OF A LITHOGRAPHY APPARATUS OR PATTERNING PROCESS BASED...

OPTIMIZATION BASED ON MACHINE LEARNING

SEMICONDUCTOR STRUCTURE FOR OPTICAL VALIDATION

LITHOGRAPHY SYSTEM, SIMULATION APPARATUS, AND PATTERN FORMING METHOD

RULE-BASED DEPLOYMENT OF ASSIST FEATURES

SUBSTRATE PROCESSING CONTROL APPARATUS, RECORDING MEDIUM, AND METHO...

OPTIMIZATION OF ASSIST FEATURES AND SOURCE

PATTERN-EDGE PLACEMENT PREDICTOR AND MONITOR FOR LITHOGRAPHIC EXPOS...

OPTICAL MASK VALIDATION

DISCRETE SOURCE MASK OPTIMIZATION

ETCH VARIATION TOLERANT OPTIMIZATION