with inorganic or organometallic light-sensitive compounds not otherwise provided for

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/0042with inorganic or organometallic light-sensitive compounds not otherwise provided for

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Patents Grantslast 30 patents

Information Patent Grant
Stabilized interfaces of inorganic radiation patterning composition...
- Patent number 12,360,454
- Issue date Jul 15, 2025
- Inpria Corporation
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV metallic resist performance enhancement via additives
- Patent number 12,360,456
- Issue date Jul 15, 2025
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., TLD.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metal oxide resists for EUV patterning and methods for developing t...
- Patent number 12,332,568
- Issue date Jun 17, 2025
- Tokyo Electron Limited
- Hamed Hajibabaeinajafabadi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Films with narrow band emission phosphor materials
- Patent number 12,331,208
- Issue date Jun 17, 2025
- EDISON INNOVATIONS, LLC
- Mark D. Doherty
- G02 - OPTICS
Information Patent Grant
Semiconductor photoresist composition and method of forming pattern...
- Patent number 12,306,534
- Issue date May 20, 2025
- Samsung SDI Co., Ltd.
- Seung Han
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Selective deposition of carbon on photoresist layer for lithography...
- Patent number 12,283,484
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Nancy Fung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated dry processes for patterning radiation photoresist patte...
- Patent number 12,278,125
- Issue date Apr 15, 2025
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Organotin oxide hydroxide patterning compositions, precursors, and...
- Patent number 12,276,913
- Issue date Apr 15, 2025
- Inpria Corporation
- Stephen T. Meyers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photoactive, inorganic ligand-capped inorganic nanocrystals
- Patent number 12,265,328
- Issue date Apr 1, 2025
- The University of Chicago
- Dmitri V. Talapin
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photosensitive, inorganic ligand-capped inorganic nanocrystals
- Patent number 12,259,651
- Issue date Mar 25, 2025
- The University of Chicago
- Dmitri V. Talapin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV metallic resist performance enhancement via additives
- Patent number 12,253,800
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selective deposition of carbon on photoresist layer for lithography...
- Patent number 12,249,509
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Larry Gao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor photoresist composition, method for preparing thereof...
- Patent number 12,242,189
- Issue date Mar 4, 2025
- Samsung SDI Co., Ltd.
- Kyungsoo Moon
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 12,235,578
- Issue date Feb 25, 2025
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming an enhanced unexposed photoresist layer
- Patent number 12,222,644
- Issue date Feb 11, 2025
- ASM IP Holding B.V.
- Jan Willem Maes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photoresist underlayer and method of manufacturing a semiconductor...
- Patent number 12,222,650
- Issue date Feb 11, 2025
- TAIWAN SEMICONDUCTOR MANUFACURING COMPANY, LTD.
- An-Ren Zi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of manufacturing a semiconductor device and pattern formatio...
- Patent number 12,222,643
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nanoparticle having dissociable protective group, nanoparticle laye...
- Patent number 12,203,019
- Issue date Jan 21, 2025
- BEIJING BOE TECHNOLOGY DEVELOPMENT CO., LTD.
- Zhuo Chen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 12,189,286
- Issue date Jan 7, 2025
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask with alloy based absorbers
- Patent number 12,181,797
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated dry processes for patterning radiation photoresist patte...
- Patent number 12,183,604
- Issue date Dec 31, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching and thinning for the fabrication of lithographically patter...
- Patent number 12,184,259
- Issue date Dec 31, 2024
- University of Oregon
- Ignas Lekavicius
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Extreme ultraviolet photolithography method with developer composition
- Patent number 12,181,798
- Issue date Dec 31, 2024
- TAIWAIN SEMICONDUCTOR MANUFACTURING CO., LTD.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and pattern forming process
- Patent number 12,174,536
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor photoresist composition and method of forming pattern...
- Patent number 12,158,699
- Issue date Dec 3, 2024
- Samsung SDI Co., Ltd.
- Changsoo Woo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist for semiconductor fabrication
- Patent number 12,153,346
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organically modified metal oxide nanoparticle, method for producing...
- Patent number 12,153,347
- Issue date Nov 26, 2024
- National Institute of Advanced Industrial Science and Technology
- Kiwamu Sue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inorganic-infiltrated polymer hybrid thin film resists for advanced...
- Patent number 12,140,865
- Issue date Nov 12, 2024
- Brookhaven Science Associates, LLC
- Chang-Yong Nam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Organometallic photoresists for DUV or EUV lithography
- Patent number 12,135,503
- Issue date Nov 5, 2024
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organotin clusters, solutions of organotin clusters, and applicatio...
- Patent number 12,129,271
- Issue date Oct 29, 2024
- Inpria Corporation
- Brian J. Cardineau
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
ORGANOTIN COMPOUND PHOTORESIST COMPOSITION FOR PHOTOLITHOGRAPHY PAT...
- Publication number 20250237946
- Publication date Jul 24, 2025
- Feng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME
- Publication number 20250237945
- Publication date Jul 24, 2025
- Samsung Electronics Co., Ltd.
- Kyuhyun IM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR D...
- Publication number 20250231479
- Publication date Jul 17, 2025
- Samsung Electronics Co., Ltd.
- Chawon Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, D...
- Publication number 20250230355
- Publication date Jul 17, 2025
- Samsung SDI Co., Ltd.
- Taeho KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250226222
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTIVE DEPOSITION ON METAL-CONTAINING MASK USING PROMOTER
- Publication number 20250224677
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Katie Lutker-Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERNS AND PHOTORESIST FILM
- Publication number 20250224669
- Publication date Jul 10, 2025
- Samsung SDI Co., Ltd.
- Changsoo WOO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND...
- Publication number 20250224680
- Publication date Jul 10, 2025
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELECTIVE DEPOSITION OF CARBON ON PHOTORESIST LAYER FOR LITHOGRAPHY...
- Publication number 20250226221
- Publication date Jul 10, 2025
- Applied Materials, Inc.
- NANCY FUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20250226223
- Publication date Jul 10, 2025
- TOKYO ELECTRON LIMITED
- Sho KUMAKURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN FORMATION METHOD
- Publication number 20250224679
- Publication date Jul 10, 2025
- JSR Corporation
- Ken MARUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20250216776
- Publication date Jul 3, 2025
- Samsung SDI Co., Ltd.
- Jung Min CHOI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20250216777
- Publication date Jul 3, 2025
- Samsung SDI Co., Ltd.
- Seung-Wook SHIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS THAT UTILIZE PHOTOSENSITIVE ORGANOMETALLIC OXIDES FORMED BY...
- Publication number 20250207247
- Publication date Jun 26, 2025
- TOKYO ELECTRON LIMITED
- Kandabara Tapily
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOACTIVE ORGANIC LIGANDS AND METHODS FOR RADIATION PATTERNING OF...
- Publication number 20250207017
- Publication date Jun 26, 2025
- NanoPattern Technologies, Inc.
- Forrest S. Etheridge
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHODS FOR MAKING EUV PATTERNABLE HARD MASKS
- Publication number 20250201553
- Publication date Jun 19, 2025
- LAM RESEARCH CORPORATION
- Chenghao Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PATTERNS AND METHOD OF MANUFACTURING INTEGRATED C...
- Publication number 20250201577
- Publication date Jun 19, 2025
- Samsung Electronics Co., Ltd.
- Jiyeon YI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION, METHOD FOR PREPARING THEREOF...
- Publication number 20250199400
- Publication date Jun 19, 2025
- Samsung SDI Co., Ltd.
- Kyungsoo MOON
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...
- Publication number 20250201586
- Publication date Jun 19, 2025
- TOKYO ELECTRON LIMITED
- Shinsuke TAKAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...
- Publication number 20250199399
- Publication date Jun 19, 2025
- Samsung Electronics Co., Ltd.
- Ji Young Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PATTERN STRUCTURE PRESERVATION
- Publication number 20250201559
- Publication date Jun 19, 2025
- International Business Machines Corporation
- Dario Goldfarb
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF INCREASING CROSSLINKING DENSITY OF PHOTORESIST
- Publication number 20250199412
- Publication date Jun 19, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yuan Chih LO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN POLYMER PHOTORESIST COMPOSITION FOR PHOTOLITHOGRAPHY PATT...
- Publication number 20250189886
- Publication date Jun 12, 2025
- Feng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TIN COMPOUND AND RESIST SOLUTION USING THE SAME, PATTERN FORMING ME...
- Publication number 20250179100
- Publication date Jun 5, 2025
- MITSUBISHI CHEMICAL CORPORATION
- Yuta HIOKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS ENVIRONMENT FOR INORGANIC RESIST PATTERNING
- Publication number 20250164887
- Publication date May 22, 2025
- INPRIA CORPORATION
- Alan J. Telecky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...
- Publication number 20250164873
- Publication date May 22, 2025
- Samsung Electronics Co., Ltd.
- Yonghoon Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY COMPOSITIONS AND METHODS FOR FORMING RESIST PATTERNS AN...
- Publication number 20250164874
- Publication date May 22, 2025
- The Research Foundation for the State University of New York
- Robert Brainard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TIN COMPOUND, TIN COMPOSITION, PRODUCING METHODS THEREOF, RESIST SO...
- Publication number 20250155798
- Publication date May 15, 2025
- MITSUBISHI CHEMICAL CORPORATION
- Yuta Hioki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250155800
- Publication date May 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250155801
- Publication date May 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

with inorganic or organometallic light-sensitive compounds not otherwise provided for

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Stabilized interfaces of inorganic radiation patterning composition...

EUV metallic resist performance enhancement via additives

Metal oxide resists for EUV patterning and methods for developing t...

Films with narrow band emission phosphor materials

Semiconductor photoresist composition and method of forming pattern...

Selective deposition of carbon on photoresist layer for lithography...

Integrated dry processes for patterning radiation photoresist patte...

Organotin oxide hydroxide patterning compositions, precursors, and...

Photoactive, inorganic ligand-capped inorganic nanocrystals

Photosensitive, inorganic ligand-capped inorganic nanocrystals

EUV metallic resist performance enhancement via additives

Selective deposition of carbon on photoresist layer for lithography...

Semiconductor photoresist composition, method for preparing thereof...

Organometallic solution based high resolution patterning compositions

Method of forming an enhanced unexposed photoresist layer

Photoresist underlayer and method of manufacturing a semiconductor...

Method of manufacturing a semiconductor device and pattern formatio...

Nanoparticle having dissociable protective group, nanoparticle laye...

Organometallic solution based high resolution patterning compositions

Extreme ultraviolet mask with alloy based absorbers

Integrated dry processes for patterning radiation photoresist patte...

Etching and thinning for the fabrication of lithographically patter...

Extreme ultraviolet photolithography method with developer composition

Resist composition and pattern forming process

Semiconductor photoresist composition and method of forming pattern...

Photoresist for semiconductor fabrication

Organically modified metal oxide nanoparticle, method for producing...

Inorganic-infiltrated polymer hybrid thin film resists for advanced...

Organometallic photoresists for DUV or EUV lithography

Organotin clusters, solutions of organotin clusters, and applicatio...

Patents Applicationslast 30 patents

ORGANOTIN COMPOUND PHOTORESIST COMPOSITION FOR PHOTOLITHOGRAPHY PAT...

RESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR D...

COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, D...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

SELECTIVE DEPOSITION ON METAL-CONTAINING MASK USING PROMOTER

METHOD OF FORMING PATTERNS AND PHOTORESIST FILM

ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND...

SELECTIVE DEPOSITION OF CARBON ON PHOTORESIST LAYER FOR LITHOGRAPHY...

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM

RESIST PATTERN FORMATION METHOD

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

METHODS THAT UTILIZE PHOTOSENSITIVE ORGANOMETALLIC OXIDES FORMED BY...

PHOTOACTIVE ORGANIC LIGANDS AND METHODS FOR RADIATION PATTERNING OF...

METHODS FOR MAKING EUV PATTERNABLE HARD MASKS

METHOD OF FORMING PATTERNS AND METHOD OF MANUFACTURING INTEGRATED C...

SEMICONDUCTOR PHOTORESIST COMPOSITION, METHOD FOR PREPARING THEREOF...

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...

PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CI...

SEMICONDUCTOR PATTERN STRUCTURE PRESERVATION

METHOD OF INCREASING CROSSLINKING DENSITY OF PHOTORESIST

ORGANOTIN POLYMER PHOTORESIST COMPOSITION FOR PHOTOLITHOGRAPHY PATT...

TIN COMPOUND AND RESIST SOLUTION USING THE SAME, PATTERN FORMING ME...

PROCESS ENVIRONMENT FOR INORGANIC RESIST PATTERNING

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...

LITHOGRAPHY COMPOSITIONS AND METHODS FOR FORMING RESIST PATTERNS AN...

TIN COMPOUND, TIN COMPOSITION, PRODUCING METHODS THEREOF, RESIST SO...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS