with inorganic or organometallic light-sensitive compounds not otherwise provided for

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GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

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G03F7/0042with inorganic or organometallic light-sensitive compounds not otherwise provided for

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Patents Grantslast 30 patents

Information Patent Grant
Semiconductor photoresist composition and method of forming pattern...
- Patent number 12,306,534
- Issue date May 20, 2025
- Samsung SDI Co., Ltd.
- Seung Han
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Selective deposition of carbon on photoresist layer for lithography...
- Patent number 12,283,484
- Issue date Apr 22, 2025
- Applied Materials, Inc.
- Nancy Fung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Organotin oxide hydroxide patterning compositions, precursors, and...
- Patent number 12,276,913
- Issue date Apr 15, 2025
- Inpria Corporation
- Stephen T. Meyers
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Integrated dry processes for patterning radiation photoresist patte...
- Patent number 12,278,125
- Issue date Apr 15, 2025
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoactive, inorganic ligand-capped inorganic nanocrystals
- Patent number 12,265,328
- Issue date Apr 1, 2025
- The University of Chicago
- Dmitri V. Talapin
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photosensitive, inorganic ligand-capped inorganic nanocrystals
- Patent number 12,259,651
- Issue date Mar 25, 2025
- The University of Chicago
- Dmitri V. Talapin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV metallic resist performance enhancement via additives
- Patent number 12,253,800
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Selective deposition of carbon on photoresist layer for lithography...
- Patent number 12,249,509
- Issue date Mar 11, 2025
- Applied Materials, Inc.
- Larry Gao
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor photoresist composition, method for preparing thereof...
- Patent number 12,242,189
- Issue date Mar 4, 2025
- Samsung SDI Co., Ltd.
- Kyungsoo Moon
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 12,235,578
- Issue date Feb 25, 2025
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming an enhanced unexposed photoresist layer
- Patent number 12,222,644
- Issue date Feb 11, 2025
- ASM IP Holding B.V.
- Jan Willem Maes
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photoresist underlayer and method of manufacturing a semiconductor...
- Patent number 12,222,650
- Issue date Feb 11, 2025
- TAIWAN SEMICONDUCTOR MANUFACURING COMPANY, LTD.
- An-Ren Zi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method of manufacturing a semiconductor device and pattern formatio...
- Patent number 12,222,643
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Nanoparticle having dissociable protective group, nanoparticle laye...
- Patent number 12,203,019
- Issue date Jan 21, 2025
- BEIJING BOE TECHNOLOGY DEVELOPMENT CO., LTD.
- Zhuo Chen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 12,189,286
- Issue date Jan 7, 2025
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask with alloy based absorbers
- Patent number 12,181,797
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated dry processes for patterning radiation photoresist patte...
- Patent number 12,183,604
- Issue date Dec 31, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet photolithography method with developer composition
- Patent number 12,181,798
- Issue date Dec 31, 2024
- TAIWAIN SEMICONDUCTOR MANUFACTURING CO., LTD.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etching and thinning for the fabrication of lithographically patter...
- Patent number 12,184,259
- Issue date Dec 31, 2024
- University of Oregon
- Ignas Lekavicius
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Resist composition and pattern forming process
- Patent number 12,174,536
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor photoresist composition and method of forming pattern...
- Patent number 12,158,699
- Issue date Dec 3, 2024
- Samsung SDI Co., Ltd.
- Changsoo Woo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist for semiconductor fabrication
- Patent number 12,153,346
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organically modified metal oxide nanoparticle, method for producing...
- Patent number 12,153,347
- Issue date Nov 26, 2024
- National Institute of Advanced Industrial Science and Technology
- Kiwamu Sue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inorganic-infiltrated polymer hybrid thin film resists for advanced...
- Patent number 12,140,865
- Issue date Nov 12, 2024
- Brookhaven Science Associates, LLC
- Chang-Yong Nam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Organometallic photoresists for DUV or EUV lithography
- Patent number 12,135,503
- Issue date Nov 5, 2024
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organotin clusters, solutions of organotin clusters, and applicatio...
- Patent number 12,129,271
- Issue date Oct 29, 2024
- Inpria Corporation
- Brian J. Cardineau
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of manufacturing integrated circuit device using a metal-con...
- Patent number 12,112,948
- Issue date Oct 8, 2024
- Samsung Electronics Co., Ltd.
- Chawon Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist development with halide chemistries
- Patent number 12,105,422
- Issue date Oct 1, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Underlayer composition and method of manufacturing a semiconductor...
- Patent number 12,099,301
- Issue date Sep 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Chih Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive resin composition, pattern forming method, cured fil...
- Patent number 12,078,929
- Issue date Sep 3, 2024
- FUJIFILM Corporation
- Toshihide Aoshima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PROCESS ENVIRONMENT FOR INORGANIC RESIST PATTERNING
- Publication number 20250164887
- Publication date May 22, 2025
- INPRIA CORPORATION
- Alan J. Telecky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...
- Publication number 20250164873
- Publication date May 22, 2025
- Samsung Electronics Co., Ltd.
- Yonghoon Moon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LITHOGRAPHY COMPOSITIONS AND METHODS FOR FORMING RESIST PATTERNS AN...
- Publication number 20250164874
- Publication date May 22, 2025
- The Research Foundation for the State University of New York
- Robert Brainard
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TIN COMPOUND, TIN COMPOSITION, PRODUCING METHODS THEREOF, RESIST SO...
- Publication number 20250155798
- Publication date May 15, 2025
- MITSUBISHI CHEMICAL CORPORATION
- Yuta Hioki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250155800
- Publication date May 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20250155801
- Publication date May 15, 2025
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTE...
- Publication number 20250155799
- Publication date May 15, 2025
- Samsung SDI Co., Ltd.
- Soobin LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME
- Publication number 20250147415
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Sunyoung LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20250147416
- Publication date May 8, 2025
- POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION
- Myung-Gil KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND PATTERN FORMATIO...
- Publication number 20250147417
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Cheng LIU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...
- Publication number 20250149336
- Publication date May 8, 2025
- Samsung Electronics Co., Ltd.
- Yonghoon MOON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CROSS-LINKERS FOR METALLIC PHOTORESIST
- Publication number 20250147414
- Publication date May 8, 2025
- Taiwan Semiconductor Manufacturing company Ltd.
- Shi-Cheng Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENDPOINT DETECTION IN DRY DEVELOPMENT OF PHOTORESIST
- Publication number 20250138429
- Publication date May 1, 2025
- TOKYO ELECTRON LIMITED
- Qi WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING PATTERNS, SEMICONDUCTOR MEMORY DEVICE, AND METHOD...
- Publication number 20250140558
- Publication date May 1, 2025
- Samsung Electronics Co., Ltd.
- Yeongsup SOHN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOSENSITIVE COMPOSITION
- Publication number 20250138421
- Publication date May 1, 2025
- Tokyo Ohka Kogyo Co., Ltd.
- Kazuki URAKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, D...
- Publication number 20250123568
- Publication date Apr 17, 2025
- Samsung SDI Co., Ltd.
- Seung HAN
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD FOR MANUFACTURIN...
- Publication number 20250116923
- Publication date Apr 10, 2025
- Inha University Research and Business Foundation
- Jinkyun LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANOTIN PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTOLITHOG...
- Publication number 20250102908
- Publication date Mar 27, 2025
- Feng Lu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20250102907
- Publication date Mar 27, 2025
- Samsung SDI Co., Ltd.
- Minyoung LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS THAT USE INFRARED (IR) SPECTROSCOPY TO MONITOR...
- Publication number 20250105066
- Publication date Mar 27, 2025
- TOKYO ELECTRON LIMITED
- Sean Berglund
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TIN COMPOUNDS CONTAINING A TIN-OXYGEN DOUBLE BOND, A PHOTORESIST CO...
- Publication number 20250102909
- Publication date Mar 27, 2025
- INDUSTRY FOUNDATION OF CHONNAM NATIONAL UNIVERSITY
- Hyun-Dam JEONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND...
- Publication number 20250102906
- Publication date Mar 27, 2025
- Samsung Electronics Co., Ltd.
- Jinwon JEON
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS
- Publication number 20250093773
- Publication date Mar 20, 2025
- INPRIA CORPORATION
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING A PH...
- Publication number 20250093772
- Publication date Mar 20, 2025
- Korea University Research and Business Foundation
- Chawon Koh
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ORGANOTIN PHOTORESIST COMPOSITIONS HAVING FLUORIDE GENERATOR COMPOU...
- Publication number 20250085627
- Publication date Mar 13, 2025
- INPRIA CORPORATION
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN PHOTORESIST COMPOSITION FOR PHOTOLITHOGRAPHY PATTERNING
- Publication number 20250076755
- Publication date Mar 6, 2025
- Feng Lu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN COMPOSITIONS HAVING LIGANDS WITH ACETAL FUNCTIONAL GROUPS...
- Publication number 20250074930
- Publication date Mar 6, 2025
- INPRIA CORPORATION
- Alexander C. Marwitz
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FILMS WITH NARROW BAND EMISSION PHOSPHOR MATERIALS
- Publication number 20250066633
- Publication date Feb 27, 2025
- GE Intellectual Property Licensing, LLC
- Mark D. Doherty
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCED EUV UNDERLAYER EFFECT WITH DIFFUSION BARRIER LAYER
- Publication number 20250068065
- Publication date Feb 27, 2025
- LAM RESEARCH CORPORATION
- Sivananda Krishnan Kanakasabapathy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20250068066
- Publication date Feb 27, 2025
- Samsung SDI Co., Ltd.
- Young Keun KIM
- C07 - ORGANIC CHEMISTRY

with inorganic or organometallic light-sensitive compounds not otherwise provided for

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Semiconductor photoresist composition and method of forming pattern...

Selective deposition of carbon on photoresist layer for lithography...

Organotin oxide hydroxide patterning compositions, precursors, and...

Integrated dry processes for patterning radiation photoresist patte...

Photoactive, inorganic ligand-capped inorganic nanocrystals

Photosensitive, inorganic ligand-capped inorganic nanocrystals

EUV metallic resist performance enhancement via additives

Selective deposition of carbon on photoresist layer for lithography...

Semiconductor photoresist composition, method for preparing thereof...

Organometallic solution based high resolution patterning compositions

Method of forming an enhanced unexposed photoresist layer

Photoresist underlayer and method of manufacturing a semiconductor...

Method of manufacturing a semiconductor device and pattern formatio...

Nanoparticle having dissociable protective group, nanoparticle laye...

Organometallic solution based high resolution patterning compositions

Extreme ultraviolet mask with alloy based absorbers

Integrated dry processes for patterning radiation photoresist patte...

Extreme ultraviolet photolithography method with developer composition

Etching and thinning for the fabrication of lithographically patter...

Resist composition and pattern forming process

Semiconductor photoresist composition and method of forming pattern...

Photoresist for semiconductor fabrication

Organically modified metal oxide nanoparticle, method for producing...

Inorganic-infiltrated polymer hybrid thin film resists for advanced...

Organometallic photoresists for DUV or EUV lithography

Organotin clusters, solutions of organotin clusters, and applicatio...

Method of manufacturing integrated circuit device using a metal-con...

Photoresist development with halide chemistries

Underlayer composition and method of manufacturing a semiconductor...

Photosensitive resin composition, pattern forming method, cured fil...

Patents Applicationslast 30 patents

PROCESS ENVIRONMENT FOR INORGANIC RESIST PATTERNING

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...

LITHOGRAPHY COMPOSITIONS AND METHODS FOR FORMING RESIST PATTERNS AN...

TIN COMPOUND, TIN COMPOSITION, PRODUCING METHODS THEREOF, RESIST SO...

RESIST COMPOSITION AND PATTERN FORMING PROCESS

RESIST COMPOSITION AND PATTERN FORMING PROCESS

SEMICONDUCTOR PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTE...

RESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME

PHOTORESIST COMPOSITION

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND PATTERN FORMATIO...

PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRC...

CROSS-LINKERS FOR METALLIC PHOTORESIST

ENDPOINT DETECTION IN DRY DEVELOPMENT OF PHOTORESIST

METHOD OF FORMING PATTERNS, SEMICONDUCTOR MEMORY DEVICE, AND METHOD...

PHOTOSENSITIVE COMPOSITION

COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS, D...

RESIST COMPOSITION FOR PHOTOLITHOGRAPHY AND METHOD FOR MANUFACTURIN...

ORGANOTIN PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTOLITHOG...

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

SYSTEMS AND METHODS THAT USE INFRARED (IR) SPECTROSCOPY TO MONITOR...

TIN COMPOUNDS CONTAINING A TIN-OXYGEN DOUBLE BOND, A PHOTORESIST CO...

ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND...

ORGANOMETALLIC SOLUTION BASED HIGH RESOLUTION PATTERNING COMPOSITIONS

PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING A PH...

ORGANOTIN PHOTORESIST COMPOSITIONS HAVING FLUORIDE GENERATOR COMPOU...

ORGANOTIN PHOTORESIST COMPOSITION FOR PHOTOLITHOGRAPHY PATTERNING

ORGANOTIN COMPOSITIONS HAVING LIGANDS WITH ACETAL FUNCTIONAL GROUPS...

FILMS WITH NARROW BAND EMISSION PHOSPHOR MATERIALS

ENHANCED EUV UNDERLAYER EFFECT WITH DIFFUSION BARRIER LAYER

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...