with inorganic or organometallic light-sensitive compounds not otherwise provided for

Industry

CPC
G03F7/0042

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0042with inorganic or organometallic light-sensitive compounds not otherwise provided for

Industries

Patents Grantslast 30 patents

Information Patent Grant
Extreme ultraviolet mask with alloy based absorbers
- Patent number 12,181,797
- Issue date Dec 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Pei-Cheng Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated dry processes for patterning radiation photoresist patte...
- Patent number 12,183,604
- Issue date Dec 31, 2024
- Lam Research Corporation
- Jengyi Yu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet photolithography method with developer composition
- Patent number 12,181,798
- Issue date Dec 31, 2024
- TAIWAIN SEMICONDUCTOR MANUFACTURING CO., LTD.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etching and thinning for the fabrication of lithographically patter...
- Patent number 12,184,259
- Issue date Dec 31, 2024
- University of Oregon
- Ignas Lekavicius
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Resist composition and pattern forming process
- Patent number 12,174,536
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Semiconductor photoresist composition and method of forming pattern...
- Patent number 12,158,699
- Issue date Dec 3, 2024
- Samsung SDI Co., Ltd.
- Changsoo Woo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist for semiconductor fabrication
- Patent number 12,153,346
- Issue date Nov 26, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organically modified metal oxide nanoparticle, method for producing...
- Patent number 12,153,347
- Issue date Nov 26, 2024
- National Institute of Advanced Industrial Science and Technology
- Kiwamu Sue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inorganic-infiltrated polymer hybrid thin film resists for advanced...
- Patent number 12,140,865
- Issue date Nov 12, 2024
- Brookhaven Science Associates, LLC
- Chang-Yong Nam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Organometallic photoresists for DUV or EUV lithography
- Patent number 12,135,503
- Issue date Nov 5, 2024
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organotin clusters, solutions of organotin clusters, and applicatio...
- Patent number 12,129,271
- Issue date Oct 29, 2024
- Inpria Corporation
- Brian J. Cardineau
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method of manufacturing integrated circuit device using a metal-con...
- Patent number 12,112,948
- Issue date Oct 8, 2024
- Samsung Electronics Co., Ltd.
- Chawon Koh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist development with halide chemistries
- Patent number 12,105,422
- Issue date Oct 1, 2024
- Lam Research Corporation
- Samantha Siamhwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Underlayer composition and method of manufacturing a semiconductor...
- Patent number 12,099,301
- Issue date Sep 24, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Chih Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photosensitive resin composition, pattern forming method, cured fil...
- Patent number 12,078,929
- Issue date Sep 3, 2024
- FUJIFILM Corporation
- Toshihide Aoshima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Tin dodecamers and radiation patternable coatings with strong EUV a...
- Patent number 12,071,449
- Issue date Aug 27, 2024
- Inpria Corporation
- Brian J. Cardineau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic radiation patternable coatings with low defectivity...
- Patent number 12,072,626
- Issue date Aug 27, 2024
- Inpria Corporation
- Benjamin L. Clark
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
- Patent number 12,068,170
- Issue date Aug 20, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Organic-inorganic hybrid photoresist processing liquid composition
- Patent number 12,050,403
- Issue date Jul 30, 2024
- YOUNG CHANG CHEMICAL CO., LTD
- Su Jin Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist for semiconductor fabrication
- Patent number 12,044,966
- Issue date Jul 23, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chih-Cheng Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition, light shielding film, solid-state imaging element, ima...
- Patent number 12,038,688
- Issue date Jul 16, 2024
- FUJIFILM Corporation
- Yoshinori Taguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Vapor phase thermal etch solutions for metal oxo photoresists
- Patent number 12,033,866
- Issue date Jul 9, 2024
- Applied Materials, Inc.
- Lakmal Charidu Kalutarage
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with part...
- Patent number 12,024,534
- Issue date Jul 2, 2024
- Inpria Corporation
- Benjamin L. Clark
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive material and method of lithography
- Patent number 12,019,375
- Issue date Jun 25, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor photoresist composition and method of forming pattern...
- Patent number 12,013,635
- Issue date Jun 18, 2024
- Samsung SDI Co., Ltd.
- Kyungsoo Moon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist material and patterning process
- Patent number 11,994,798
- Issue date May 28, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositio...
- Patent number 11,988,959
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,988,958
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organometallic solution based high resolution patterning compositions
- Patent number 11,988,960
- Issue date May 21, 2024
- Inpria Corporation
- Stephen T. Meyers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation based patterning methods
- Patent number 11,988,961
- Issue date May 21, 2024
- Inpria Corporation
- Jason K. Stowers
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
RADIATION BASED PATTERNING METHODS
- Publication number 20250004365
- Publication date Jan 2, 2025
- INPRIA CORPORATION
- Jason K. Stowers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPO...
- Publication number 20240419072
- Publication date Dec 19, 2024
- FUJIFILM CORPORATION
- Takeshi KAWABATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240419078
- Publication date Dec 19, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
STRUCTURES FOR PATTERNING AND RELATED METHODS AND SYSTEMS
- Publication number 20240419068
- Publication date Dec 19, 2024
- ASM IP HOLDING B.V.
- Daniele Piumi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS
- Publication number 20240419069
- Publication date Dec 19, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR REMOVING EDGE BEADS FROM METAL-CONTAINING RESISTS,...
- Publication number 20240393698
- Publication date Nov 28, 2024
- Samsung SDI Co., Ltd.
- Si-Kyun PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERNS
- Publication number 20240393684
- Publication date Nov 28, 2024
- Samsung SDI Co., Ltd.
- Jongpil HO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, MULTIL...
- Publication number 20240393686
- Publication date Nov 28, 2024
- Resonac Corporation
- Hideyuki KATAGI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHY
- Publication number 20240385505
- Publication date Nov 21, 2024
- International Business Machines Corporation
- Gerhard Ingmar Meijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERNS
- Publication number 20240385515
- Publication date Nov 21, 2024
- Samsung SDI Co., Ltd.
- Gyeonghun PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST FOR SEMICONDUCTOR FABRICATION
- Publication number 20240385516
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Cheng Liu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR REMOVING EDGE BEADS FROM METAL CONTAINING RESISTS,...
- Publication number 20240385522
- Publication date Nov 21, 2024
- Samsung SDI Co., Ltd.
- Taeksoo KWAK
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION
- Publication number 20240377731
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOTIN PHOTORESIST COMPOSITION AND METHOD OF STABILIZATION
- Publication number 20240377729
- Publication date Nov 14, 2024
- Feng Lu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST FOR SEMICONDUCTOR FABRICATION
- Publication number 20240377732
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Cheng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV METALLIC RESIST PERFORMANCE ENHANCEMENT VIA ADDITIVES
- Publication number 20240377735
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- An-Ren Zi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERN FORMING PROCESS
- Publication number 20240377730
- Publication date Nov 14, 2024
- Shin-Etsu Chemical Co., Ltd.
- Masaki Ohashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TIN DODECAMERS AND RADIATION PATTERNABLE COATINGS WITH STRONG EUV A...
- Publication number 20240376135
- Publication date Nov 14, 2024
- INPRIA CORPORATION
- Brian J. Cardineau
- C07 - ORGANIC CHEMISTRY
Information Patent Application
LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES
- Publication number 20240377744
- Publication date Nov 14, 2024
- Geminatio, Inc.
- Brennan Peterson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ORGANOMETALLIC RADIATION PATTERNABLE COATINGS WITH LOW DEFECTIVITY...
- Publication number 20240369923
- Publication date Nov 7, 2024
- INPRIA CORPORATION
- Benjamin L. Clark
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIALS AND METHODS FOR DRY RESIST TECHNOLOGY
- Publication number 20240369933
- Publication date Nov 7, 2024
- David Howard Fairbrother
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRANSFER FILM, MANUFACTURING METHOD OF LAMINATE, LAMINATE, AND MICR...
- Publication number 20240369922
- Publication date Nov 7, 2024
- FUJIFILM CORPORATION
- Kentaro TOYOOKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...
- Publication number 20240369932
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chien-Chih CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR REMOVING EDGE BEAD FROM METAL-CONTAINING RESISTS, A...
- Publication number 20240369935
- Publication date Nov 7, 2024
- Samsung SDI Co., Ltd.
- Hyungrang MOON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES
- Publication number 20240361696
- Publication date Oct 31, 2024
- LAM RESEARCH CORPORATION
- Samantha SiamHwa Tan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...
- Publication number 20240355644
- Publication date Oct 24, 2024
- TOKYO ELECTRON LIMITED
- Shinsuke TAKAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Publication number 20240353755
- Publication date Oct 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shi-Cheng WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20240345478
- Publication date Oct 17, 2024
- Samsung SDI Co., Ltd.
- Soobin LIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...
- Publication number 20240345477
- Publication date Oct 17, 2024
- Samsung SDI Co., Ltd.
- Dong Wan RYU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADDITIVE FOR LITHOGRAPHY
- Publication number 20240345485
- Publication date Oct 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Yu CHANG
- H01 - BASIC ELECTRIC ELEMENTS

with inorganic or organometallic light-sensitive compounds not otherwise provided for

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Extreme ultraviolet mask with alloy based absorbers

Integrated dry processes for patterning radiation photoresist patte...

Extreme ultraviolet photolithography method with developer composition

Etching and thinning for the fabrication of lithographically patter...

Resist composition and pattern forming process

Semiconductor photoresist composition and method of forming pattern...

Photoresist for semiconductor fabrication

Organically modified metal oxide nanoparticle, method for producing...

Inorganic-infiltrated polymer hybrid thin film resists for advanced...

Organometallic photoresists for DUV or EUV lithography

Organotin clusters, solutions of organotin clusters, and applicatio...

Method of manufacturing integrated circuit device using a metal-con...

Photoresist development with halide chemistries

Underlayer composition and method of manufacturing a semiconductor...

Photosensitive resin composition, pattern forming method, cured fil...

Tin dodecamers and radiation patternable coatings with strong EUV a...

Organometallic radiation patternable coatings with low defectivity...

Vapor phase thermal etch solutions for metal oxo photoresists

Organic-inorganic hybrid photoresist processing liquid composition

Photoresist for semiconductor fabrication

Composition, light shielding film, solid-state imaging element, ima...

Vapor phase thermal etch solutions for metal oxo photoresists

Monoalkyl tin trialkoxides and/or monoalkyl tin triamides with part...

Photosensitive material and method of lithography

Semiconductor photoresist composition and method of forming pattern...

Resist material and patterning process

Organometallic solution based high resolution patterning compositio...

Organometallic solution based high resolution patterning compositions

Organometallic solution based high resolution patterning compositions

Radiation based patterning methods

Patents Applicationslast 30 patents

RADIATION BASED PATTERNING METHODS

ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPO...

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

STRUCTURES FOR PATTERNING AND RELATED METHODS AND SYSTEMS

PHOTO LIGAND DESIGN FOR EUV OR E-BEAM METALLIC PHOTORESISTS

COMPOSITION FOR REMOVING EDGE BEADS FROM METAL-CONTAINING RESISTS,...

METHOD OF FORMING PATTERNS

PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, MULTIL...

DRY PHOTORESIST OR HARDMASK FOR EUV LITHOGRAPHY

METHOD OF FORMING PATTERNS

PHOTORESIST FOR SEMICONDUCTOR FABRICATION

COMPOSITION FOR REMOVING EDGE BEADS FROM METAL CONTAINING RESISTS,...

EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY METHOD WITH DEVELOPER COMPOSITION

ORGANOTIN PHOTORESIST COMPOSITION AND METHOD OF STABILIZATION

PHOTORESIST FOR SEMICONDUCTOR FABRICATION

EUV METALLIC RESIST PERFORMANCE ENHANCEMENT VIA ADDITIVES

RESIST COMPOSITION AND PATTERN FORMING PROCESS

TIN DODECAMERS AND RADIATION PATTERNABLE COATINGS WITH STRONG EUV A...

LOCAL SHADOW MASKING FOR MULTI-COLOR EXPOSURES

ORGANOMETALLIC RADIATION PATTERNABLE COATINGS WITH LOW DEFECTIVITY...

MATERIALS AND METHODS FOR DRY RESIST TECHNOLOGY

TRANSFER FILM, MANUFACTURING METHOD OF LAMINATE, LAMINATE, AND MICR...

UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR...

COMPOSITION FOR REMOVING EDGE BEAD FROM METAL-CONTAINING RESISTS, A...

PHOTORESIST DEVELOPMENT WITH HALIDE CHEMISTRIES

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND SU...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN...

ADDITIVE FOR LITHOGRAPHY