with perfluoro compounds

Industry

CPC
G03F7/0046

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/0046with perfluoro compounds

Industries

Patents Grantslast 30 patents

Information Patent Grant
Photoresist topcoat compositions and methods of processing photores...
- Patent number 12,234,369
- Issue date Feb 25, 2025
- DuPont Electronic Materials International, LLC
- Irvinder Kaur
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pattern formation methods
- Patent number 12,228,859
- Issue date Feb 18, 2025
- Rohm and Haas Electronic Materials LLC
- Choong-Bong Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
- Patent number 12,228,857
- Issue date Feb 18, 2025
- FUJIFILM Corporation
- Tetsuya Kamimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV photoresist with low-activation-energy ligands or high-develope...
- Patent number 12,210,283
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Epoxy formulations and processes for fabrication of relief patterns...
- Patent number 12,189,291
- Issue date Jan 7, 2025
- KAYAKU ADVANCED MATERIALS, INC.
- Daniel J. Nawrocki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 12,169,360
- Issue date Dec 17, 2024
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Negative resist formulation for producing undercut pattern profiles
- Patent number 12,124,166
- Issue date Oct 22, 2024
- Merck Patent GmbH
- Anupama Mukherjee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composition for forming underlayer film in imprinting method, kit,...
- Patent number 12,109,752
- Issue date Oct 8, 2024
- FUJIFILM Corporation
- Akihiro Hakamata
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Flow cells
- Patent number 11,988,957
- Issue date May 21, 2024
- Illumina, Inc.
- Jeffrey S. Fisher
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Grant
Solvent compatible nozzle plate
- Patent number 11,958,292
- Issue date Apr 16, 2024
- Funai Electric Co., Ltd.
- Sean T. Weaver
- B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
- Patent number 11,953,829
- Issue date Apr 9, 2024
- FUJIFILM Corporation
- Kazunari Yagi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Manufacturing method of semiconductor device and semiconductor proc...
- Patent number 11,899,368
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Kai Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heterogeneous fluoropolymer mixture polishing pad
- Patent number 11,897,082
- Issue date Feb 13, 2024
- Rohm and Haas Electronic Materials CMP Holdings, Inc.
- Matthew R. Gadinski
- B24 - GRINDING POLISHING
Information Patent Grant
Salts and photoresists comprising same
- Patent number 11,880,134
- Issue date Jan 23, 2024
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Soft mold formulations for surface relief grating fabrication with...
- Patent number 11,879,024
- Issue date Jan 23, 2024
- Meta Platforms Technologies, LLC
- Zachary Perlmutter
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist compositions and methods
- Patent number 11,829,069
- Issue date Nov 28, 2023
- Rohm and Haas Electronic Materials LLC
- Joshua Kaitz
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compound, resin, resist composition and method for producing resist...
- Patent number 11,815,813
- Issue date Nov 14, 2023
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet photoresist with high-efficiency electron transfer
- Patent number 11,809,080
- Issue date Nov 7, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Wei-Han Lai
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 11,782,342
- Issue date Oct 10, 2023
- Sumitomo Chemical Company, Limited
- Katsuhiro Komuro
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition and method for forming resist...
- Patent number 11,747,725
- Issue date Sep 5, 2023
- JSR Corporation
- Ken Maruyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method of forming resist pattern
- Patent number 11,747,726
- Issue date Sep 5, 2023
- Tokyo Ohka Kogyo Co., Ltd.
- Yuki Fukumura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Carboxylate, carboxylic acid generator, resist composition and meth...
- Patent number 11,739,056
- Issue date Aug 29, 2023
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 11,740,555
- Issue date Aug 29, 2023
- Sumitomo Chemical Company, Limited
- Yukako Anryu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, method for forming pattern,...
- Patent number 11,709,428
- Issue date Jul 25, 2023
- JSR Corporation
- Natsuko Kinoshita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-con...
- Patent number 11,703,760
- Issue date Jul 18, 2023
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Negative resist pattern-forming method, and composition for upper l...
- Patent number 11,687,003
- Issue date Jun 27, 2023
- JSR Corporation
- Taiichi Furukawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV photoresist with low-activation-energy ligands or high-develope...
- Patent number 11,681,221
- Issue date Jun 20, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 11,681,222
- Issue date Jun 20, 2023
- JSR Corporation
- Hiroki Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Flow cells
- Patent number 11,680,292
- Issue date Jun 20, 2023
- Illumina, Inc.
- Jeffrey S. Fisher
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 11,681,220
- Issue date Jun 20, 2023
- Sumitomo Chemical Company, Limited
- Yukako Anryu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN
- Publication number 20250076760
- Publication date Mar 6, 2025
- JSR Corporation
- Ryuichi NEMOTO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLOW CELLS
- Publication number 20240302738
- Publication date Sep 12, 2024
- Illumina, Inc.
- Jeffrey S. Fisher
- C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, MET...
- Publication number 20240248398
- Publication date Jul 25, 2024
- FUJIFILM CORPORATION
- Tsutomu YOSHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OXATHIANIUM ION-CONTAINING SULFONIC ACID DERIVATIVE COMPOUND AS PHO...
- Publication number 20240231227
- Publication date Jul 11, 2024
- Heraeus Epurio LLC
- Ram B. SHARMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SOLVENT COMPATIBLE NOZZLE PLATE
- Publication number 20240198675
- Publication date Jun 20, 2024
- Funai Electric Co., Ltd.
- Sean T. WEAVER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOLITHOGRAPHY PATTERNING METHOD
- Publication number 20240176245
- Publication date May 30, 2024
- Korea Advanced Institute of Science and Technology
- Jungchul SONG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, FLUORINE-CONTAININ...
- Publication number 20240134276
- Publication date Apr 25, 2024
- Central Glass Company, Limited
- Yuzuru KANEKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
- Publication number 20230367210
- Publication date Nov 16, 2023
- FUJIFILM CORPORATION
- Tsutomu YOSHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
- Publication number 20230341772
- Publication date Oct 26, 2023
- JSR Corporation
- Ken MARUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20230314956
- Publication date Oct 5, 2023
- Samsung Electronics Co., Ltd.
- Sungkun KANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Euv Photoresist With Low-Activation-Energy Ligands Or High-Develope...
- Publication number 20230305396
- Publication date Sep 28, 2023
- Taiwan Semiconductor Manufacturing Co., LTD
- An-Ren Zi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN,...
- Publication number 20230280652
- Publication date Sep 7, 2023
- JSR CORPORATION
- Natsuko KINOSHITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
REFRACTIVE INDEX CONTRAST POLYMERS AND METHODS FOR PRODUCING AND US...
- Publication number 20230258864
- Publication date Aug 17, 2023
- Arizona Board of Regents on behalf of The University of Arizona
- Dong-Chul "Jeffrey" PYUN
- G02 - OPTICS
Information Patent Application
SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...
- Publication number 20230135117
- Publication date May 4, 2023
- FUJIFILM CORPORATION
- Tetsuya KAMIMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR REMOVING FLUOROPOLYMER LIFT-OFF LAYER
- Publication number 20230047767
- Publication date Feb 16, 2023
- SOLVAY SPECIALTY POLYMERS ITALY S.P.A.
- Jung-Yul Lee
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUOROPOLYMER ADHESIVES AND METHODS THEREOF
- Publication number 20230002557
- Publication date Jan 5, 2023
- The Boeing Company
- Ashley M. DUSTIN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CROSSLINKABLE ELECTROACTIVE FLUOROPOLYMERS COMPRISING PHOTOACTIVE G...
- Publication number 20220411550
- Publication date Dec 29, 2022
- Arkema France
- Fabrice DOMINGUES DOS SANTOS
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR PROC...
- Publication number 20220382161
- Publication date Dec 1, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Kai Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Extreme Ultraviolet Photoresist With High-Efficiency Electron Transfer
- Publication number 20220382156
- Publication date Dec 1, 2022
- Taiwan Semiconductor Manufacturing Co., LTD
- Wei-Han Lai
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20220137508
- Publication date May 5, 2022
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20220026803
- Publication date Jan 27, 2022
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING UNDERLAYER FILM IN IMPRINTING METHOD, KIT,...
- Publication number 20220009152
- Publication date Jan 13, 2022
- FUJIFILM CORPORATION
- Akihiro HAKAMATA
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
COMPOSITION FOR FORMING PATTERN, KIT, CURED FILM, LAMINATE, PATTERN...
- Publication number 20220009153
- Publication date Jan 13, 2022
- FUJIFILM CORPORATION
- Yuichiro Goto
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...
- Publication number 20210389672
- Publication date Dec 16, 2021
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR PROC...
- Publication number 20210341843
- Publication date Nov 4, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yu-Kai Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLUOROCARBOXYLIC ACID-CONTAINING MONOMER, FLUOROCARBOXYLIC ACID-CON...
- Publication number 20210341839
- Publication date Nov 4, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
- Publication number 20210294217
- Publication date Sep 23, 2021
- FUJIFILM CORPORATION
- Akiyoshi Goto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
- Publication number 20210294212
- Publication date Sep 23, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- An-Ren ZI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20210286260
- Publication date Sep 16, 2021
- Sumitomo Chemical Company, Limited
- Yukako ANRYU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20210286261
- Publication date Sep 16, 2021
- Sumitomo Chemical Company, Limited
- Yukako ANRYU
- C07 - ORGANIC CHEMISTRY

with perfluoro compounds

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Photoresist topcoat compositions and methods of processing photores...

Pattern formation methods

Solution, solution storage body, actinic ray-sensitive or radiation...

EUV photoresist with low-activation-energy ligands or high-develope...

Epoxy formulations and processes for fabrication of relief patterns...

Resist composition and patterning process

Negative resist formulation for producing undercut pattern profiles

Composition for forming underlayer film in imprinting method, kit,...

Flow cells

Solvent compatible nozzle plate

Actinic ray-sensitive or radiation-sensitive resin composition, res...

Manufacturing method of semiconductor device and semiconductor proc...

Heterogeneous fluoropolymer mixture polishing pad

Salts and photoresists comprising same

Soft mold formulations for surface relief grating fabrication with...

Photoresist compositions and methods

Compound, resin, resist composition and method for producing resist...

Extreme ultraviolet photoresist with high-efficiency electron transfer

Salt and photoresist composition containing the same

Radiation-sensitive resin composition and method for forming resist...

Resist composition and method of forming resist pattern

Carboxylate, carboxylic acid generator, resist composition and meth...

Resist composition and method for producing resist pattern

Radiation-sensitive resin composition, method for forming pattern,...

Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-con...

Negative resist pattern-forming method, and composition for upper l...

EUV photoresist with low-activation-energy ligands or high-develope...

Fluorine-containing polymer, purification method, and radiation-sen...

Flow cells

Resist composition and method for producing resist pattern

Patents Applicationslast 30 patents

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN

FLOW CELLS

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, MET...

OXATHIANIUM ION-CONTAINING SULFONIC ACID DERIVATIVE COMPOUND AS PHO...

SOLVENT COMPATIBLE NOZZLE PLATE

PHOTOLITHOGRAPHY PATTERNING METHOD

PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, FLUORINE-CONTAININ...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...

RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...

SUBSTRATE PROCESSING METHOD

Euv Photoresist With Low-Activation-Energy Ligands Or High-Develope...

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN,...

REFRACTIVE INDEX CONTRAST POLYMERS AND METHODS FOR PRODUCING AND US...

SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...

METHOD FOR REMOVING FLUOROPOLYMER LIFT-OFF LAYER

FLUOROPOLYMER ADHESIVES AND METHODS THEREOF

CROSSLINKABLE ELECTROACTIVE FLUOROPOLYMERS COMPRISING PHOTOACTIVE G...

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR PROC...

Extreme Ultraviolet Photoresist With High-Efficiency Electron Transfer

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

RESIST COMPOSITION AND PATTERNING PROCESS

COMPOSITION FOR FORMING UNDERLAYER FILM IN IMPRINTING METHOD, KIT,...

COMPOSITION FOR FORMING PATTERN, KIT, CURED FILM, LAMINATE, PATTERN...

COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR PROC...

FLUOROCARBOXYLIC ACID-CONTAINING MONOMER, FLUOROCARBOXYLIC ACID-CON...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...

PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN