Membership
Tour
Register
Log in
with perfluoro compounds
Follow
Industry
CPC
G03F7/0046
This industry / category may be too specific. Please go to a parent level for more data
Parent Industries
G
PHYSICS
G03
Photography
G03F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES
G03F7/00
Photomechanical
Current Industry
G03F7/0046
with perfluoro compounds
Industries
Overview
Organizations
People
Information
Impact
Patents Grants
last 30 patents
Information
Patent Grant
Solvent compatible nozzle plate
Patent number
11,958,292
Issue date
Apr 16, 2024
Funai Electric Co., Ltd.
Sean T. Weaver
B41 - PRINTING LINING MACHINES TYPEWRITERS STAMPS
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
11,953,829
Issue date
Apr 9, 2024
FUJIFILM Corporation
Kazunari Yagi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Manufacturing method of semiconductor device and semiconductor proc...
Patent number
11,899,368
Issue date
Feb 13, 2024
Taiwan Semiconductor Manufacturing Company, Ltd
Yu-Kai Chen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Heterogeneous fluoropolymer mixture polishing pad
Patent number
11,897,082
Issue date
Feb 13, 2024
Rohm and Haas Electronic Materials CMP Holdings, Inc.
Matthew R. Gadinski
B24 - GRINDING POLISHING
Information
Patent Grant
Salts and photoresists comprising same
Patent number
11,880,134
Issue date
Jan 23, 2024
Rohm and Haas Electronic Materials LLC
Emad Aqad
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Soft mold formulations for surface relief grating fabrication with...
Patent number
11,879,024
Issue date
Jan 23, 2024
Meta Platforms Technologies, LLC
Zachary Perlmutter
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photoresist compositions and methods
Patent number
11,829,069
Issue date
Nov 28, 2023
Rohm and Haas Electronic Materials LLC
Joshua Kaitz
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Compound, resin, resist composition and method for producing resist...
Patent number
11,815,813
Issue date
Nov 14, 2023
Sumitomo Chemical Company, Limited
Tatsuro Masuyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Extreme ultraviolet photoresist with high-efficiency electron transfer
Patent number
11,809,080
Issue date
Nov 7, 2023
Taiwan Semiconductor Manufacturing Co., Ltd.
Wei-Han Lai
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Salt and photoresist composition containing the same
Patent number
11,782,342
Issue date
Oct 10, 2023
Sumitomo Chemical Company, Limited
Katsuhiro Komuro
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive resin composition and method for forming resist...
Patent number
11,747,725
Issue date
Sep 5, 2023
JSR Corporation
Ken Maruyama
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Resist composition and method of forming resist pattern
Patent number
11,747,726
Issue date
Sep 5, 2023
Tokyo Ohka Kogyo Co., Ltd.
Yuki Fukumura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Carboxylate, carboxylic acid generator, resist composition and meth...
Patent number
11,739,056
Issue date
Aug 29, 2023
Sumitomo Chemical Company, Limited
Tatsuro Masuyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and method for producing resist pattern
Patent number
11,740,555
Issue date
Aug 29, 2023
Sumitomo Chemical Company, Limited
Yukako Anryu
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive resin composition, method for forming pattern,...
Patent number
11,709,428
Issue date
Jul 25, 2023
JSR Corporation
Natsuko Kinoshita
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-con...
Patent number
11,703,760
Issue date
Jul 18, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Negative resist pattern-forming method, and composition for upper l...
Patent number
11,687,003
Issue date
Jun 27, 2023
JSR Corporation
Taiichi Furukawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
EUV photoresist with low-activation-energy ligands or high-develope...
Patent number
11,681,221
Issue date
Jun 20, 2023
Taiwan Semiconductor Manufacturing Co., Ltd
An-Ren Zi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
Patent number
11,681,222
Issue date
Jun 20, 2023
JSR Corporation
Hiroki Nakagawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Flow cells
Patent number
11,680,292
Issue date
Jun 20, 2023
Illumina, Inc.
Jeffrey S. Fisher
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resist composition and method for producing resist pattern
Patent number
11,681,220
Issue date
Jun 20, 2023
Sumitomo Chemical Company, Limited
Yukako Anryu
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Resin composition, method for producing heat-resistant resin film,...
Patent number
11,640,110
Issue date
May 2, 2023
Toray Industries, Inc.
Keika Hashimoto
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information
Patent Grant
Resist composition, method of forming resist pattern, and compound
Patent number
11,635,686
Issue date
Apr 25, 2023
Tokyo Ohka Kogyo Co., Ltd.
Takuya Ikeda
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photoimageable compositions and processes for fabrication of relief...
Patent number
11,635,688
Issue date
Apr 25, 2023
KAYAKU ADVANCED MATERIALS, INC.
Daniel J. Nawrocki
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and patterning process
Patent number
11,614,688
Issue date
Mar 28, 2023
Shin-Etsu Chemical Co., Ltd.
Ryosuke Taniguchi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist composition and patterning process
Patent number
11,604,411
Issue date
Mar 14, 2023
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, res...
Patent number
11,604,412
Issue date
Mar 14, 2023
FUJIFILM Corporation
Akihiro Kaneko
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition, act...
Patent number
11,584,810
Issue date
Feb 21, 2023
FUJIFILM Corporation
Akira Takada
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Solution, solution storage body, actinic ray-sensitive or radiation...
Patent number
11,573,489
Issue date
Feb 7, 2023
FUJIFILM Corporation
Tetsuya Kamimura
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Salt, acid generator, resist composition and method for producing r...
Patent number
11,556,056
Issue date
Jan 17, 2023
Sumitomo Chemical Company, Limited
Yukako Anryu
C07 - ORGANIC CHEMISTRY
Patents Applications
last 30 patents
Information
Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, FLUORINE-CONTAININ...
Publication number
20240134276
Publication date
Apr 25, 2024
Central Glass Company, Limited
Yuzuru KANEKO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACT...
Publication number
20230367210
Publication date
Nov 16, 2023
FUJIFILM CORPORATION
Tsutomu YOSHIMURA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST...
Publication number
20230341772
Publication date
Oct 26, 2023
JSR Corporation
Ken MARUYAMA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
SUBSTRATE PROCESSING METHOD
Publication number
20230314956
Publication date
Oct 5, 2023
Samsung Electronics Co., Ltd.
Sungkun KANG
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Euv Photoresist With Low-Activation-Energy Ligands Or High-Develope...
Publication number
20230305396
Publication date
Sep 28, 2023
Taiwan Semiconductor Manufacturing Co., LTD
An-Ren Zi
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN,...
Publication number
20230280652
Publication date
Sep 7, 2023
JSR CORPORATION
Natsuko KINOSHITA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
REFRACTIVE INDEX CONTRAST POLYMERS AND METHODS FOR PRODUCING AND US...
Publication number
20230258864
Publication date
Aug 17, 2023
Arizona Board of Regents on behalf of The University of Arizona
Dong-Chul "Jeffrey" PYUN
G02 - OPTICS
Information
Patent Application
SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION...
Publication number
20230135117
Publication date
May 4, 2023
FUJIFILM CORPORATION
Tetsuya KAMIMURA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHOD FOR REMOVING FLUOROPOLYMER LIFT-OFF LAYER
Publication number
20230047767
Publication date
Feb 16, 2023
SOLVAY SPECIALTY POLYMERS ITALY S.P.A.
Jung-Yul Lee
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
FLUOROPOLYMER ADHESIVES AND METHODS THEREOF
Publication number
20230002557
Publication date
Jan 5, 2023
The Boeing Company
Ashley M. DUSTIN
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
CROSSLINKABLE ELECTROACTIVE FLUOROPOLYMERS COMPRISING PHOTOACTIVE G...
Publication number
20220411550
Publication date
Dec 29, 2022
Arkema France
Fabrice DOMINGUES DOS SANTOS
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR PROC...
Publication number
20220382161
Publication date
Dec 1, 2022
Taiwan Semiconductor Manufacturing Company, Ltd.
Yu-Kai Chen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Extreme Ultraviolet Photoresist With High-Efficiency Electron Transfer
Publication number
20220382156
Publication date
Dec 1, 2022
Taiwan Semiconductor Manufacturing Co., LTD
Wei-Han Lai
C07 - ORGANIC CHEMISTRY
Information
Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
Publication number
20220137508
Publication date
May 5, 2022
JSR Corporation
Hiroki NAKAGAWA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20220026803
Publication date
Jan 27, 2022
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
COMPOSITION FOR FORMING UNDERLAYER FILM IN IMPRINTING METHOD, KIT,...
Publication number
20220009152
Publication date
Jan 13, 2022
FUJIFILM CORPORATION
Akihiro HAKAMATA
B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information
Patent Application
COMPOSITION FOR FORMING PATTERN, KIT, CURED FILM, LAMINATE, PATTERN...
Publication number
20220009153
Publication date
Jan 13, 2022
FUJIFILM CORPORATION
Yuichiro Goto
B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information
Patent Application
COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...
Publication number
20210389672
Publication date
Dec 16, 2021
Sumitomo Chemical Company, Limited
Tatsuro MASUYAMA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR PROC...
Publication number
20210341843
Publication date
Nov 4, 2021
Taiwan Semiconductor Manufacturing Company, Ltd.
Yu-Kai Chen
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
FLUOROCARBOXYLIC ACID-CONTAINING MONOMER, FLUOROCARBOXYLIC ACID-CON...
Publication number
20210341839
Publication date
Nov 4, 2021
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
C07 - ORGANIC CHEMISTRY
Information
Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RES...
Publication number
20210294217
Publication date
Sep 23, 2021
FUJIFILM CORPORATION
Akiyoshi Goto
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN
Publication number
20210294212
Publication date
Sep 23, 2021
Taiwan Semiconductor Manufacturing Company, Ltd.
An-Ren ZI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Publication number
20210286260
Publication date
Sep 16, 2021
Sumitomo Chemical Company, Limited
Yukako ANRYU
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
Publication number
20210286261
Publication date
Sep 16, 2021
Sumitomo Chemical Company, Limited
Yukako ANRYU
C07 - ORGANIC CHEMISTRY
Information
Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
Publication number
20210278764
Publication date
Sep 9, 2021
JSR Corporation
Hiroki NAKAGAWA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
TREATMENT LIQUID AND PATTERN FORMING METHOD
Publication number
20210200097
Publication date
Jul 1, 2021
FUJIFILM CORPORATION
Hideaki TSUBAKI
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
PRODUCTION METHOD OF COMPOSITION FOR RESIST TOP COAT LAYER, METHOD...
Publication number
20210181630
Publication date
Jun 17, 2021
JSR Corporation
Sosuke OSAWA
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
EUV Photoresist With Low-Activation-Energy Ligands or High-Develope...
Publication number
20210063876
Publication date
Mar 4, 2021
Taiwan Semiconductor Manufacturing Co., LTD
An-Ren Zi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COM...
Publication number
20210055656
Publication date
Feb 25, 2021
Tokyo Ohka Kogyo Co., Ltd.
Koshi ONISHI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
Publication number
20210048746
Publication date
Feb 18, 2021
Shin-Etsu Chemical Co., Ltd.
Jun Hatakeyama
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY