Zoom systems

Industry

CPC
G03F7/70183

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Parent Industries

GPHYSICS G03Photography G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES G03F7/00Photomechanical

Current Industry

G03F7/70183Zoom systems

Industries

Patents Grantslast 30 patents

Information Patent Grant
Illumination system for EUV projection lithography
- Patent number 10,310,381
- Issue date Jun 4, 2019
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beam delivery for EUV lithography
- Patent number 10,289,006
- Issue date May 14, 2019
- ASML Netherlands B.V.
- Jan Bernard Plechelmus Van Schoot
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system for EUV projection lithography
- Patent number 9,958,783
- Issue date May 1, 2018
- Carl Zeiss SMT GmbH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, programmable patterning device and lithogra...
- Patent number 9,335,638
- Issue date May 10, 2016
- ASML Netherlands B.V.
- Pieter Willem Herman De Jager
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, programmable patterning device and lithogra...
- Patent number 8,531,648
- Issue date Sep 10, 2013
- ASML Netherlands B.V.
- Pieter Willem Herman De Jager
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical apparatus, exposure apparatus, and device manu...
- Patent number 8,493,549
- Issue date Jul 23, 2013
- Nikon Corporation
- Hirohisa Tanaka
- G02 - OPTICS
Information Patent Grant
Illumination optical system and exposure apparatus having the same
- Patent number 8,154,707
- Issue date Apr 10, 2012
- Canon Kabushiki Kaisha
- Kanjo Orino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system of a microlithographic exposure apparatus
- Patent number 8,134,687
- Issue date Mar 13, 2012
- Carl Zeiss SMT GmbH
- Wolfgang Singer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical system, exposure apparatus, and device manufac...
- Patent number 8,098,365
- Issue date Jan 17, 2012
- Canon Kabushiki Kaisha
- Takafumi Kawasaki
- G02 - OPTICS
Information Patent Grant
Illumination system with zoom objective
- Patent number 7,626,770
- Issue date Dec 1, 2009
- Carl Zeiss SMT AG
- Wolfgang Singer
- G02 - OPTICS
Information Patent Grant
Beam reshaping unit for an illumination system of a microlithograph...
- Patent number 7,542,217
- Issue date Jun 2, 2009
- Carl Zeiss SMT AG
- Wolfgang Singer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical beam transformation system and illumination system comprisi...
- Patent number 7,511,886
- Issue date Mar 31, 2009
- Carl Zeiss SMT AG
- Joerg Schultz
- G02 - OPTICS
Information Patent Grant
Correction of off-axis translation of optical elements in an optica...
- Patent number 7,508,514
- Issue date Mar 24, 2009
- ASML Holding N.V.
- Kevin J. Violette
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical system and exposure apparatus having the same
- Patent number 7,499,145
- Issue date Mar 3, 2009
- Canon Kabushiki Kaisha
- Kanjo Orino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus
- Patent number 7,468,781
- Issue date Dec 23, 2008
- Canon Kabushiki Kaisha
- Takahisa Shiozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photolithographic method using exposure system for controlling vert...
- Patent number 7,408,619
- Issue date Aug 5, 2008
- Hynix Semiconductor Inc.
- Dong Gyu Yim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 7,349,068
- Issue date Mar 25, 2008
- ASML Netherlands B.V.
- Karel Diederick Van Der Mast
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus
- Patent number 7,286,206
- Issue date Oct 23, 2007
- Canon Kabushiki Kaisha
- Takahisa Shiozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Advanced illumination system for use in microlithography
- Patent number 7,187,430
- Issue date Mar 6, 2007
- ASML Holding N.V.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Efficiently illuminating a modulating device
- Patent number 7,158,307
- Issue date Jan 2, 2007
- ASML Holding N.V.
- Scott Coston
- G02 - OPTICS
Information Patent Grant
Exposure apparatus
- Patent number 7,142,283
- Issue date Nov 28, 2006
- Canon Kabushiki Kaisha
- Takahisa Shiozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and method, and device fabricating method using...
- Patent number 7,092,071
- Issue date Aug 15, 2006
- Canon Kabushiki Kaisha
- Kenichiro Shinoda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system and method allowing for varying of both field h...
- Patent number 7,079,321
- Issue date Jul 18, 2006
- ASML Holding N.V.
- Scott D. Coston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical system and method, and exposure apparatus
- Patent number 7,079,220
- Issue date Jul 18, 2006
- Canon Kabushiki Kaisha
- Michio Kohno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and method, and device fabricating method using...
- Patent number 7,009,681
- Issue date Mar 7, 2006
- Canon Kabushiki Kaisha
- Kenichiro Shinoda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination system and method for efficiently illuminating a patte...
- Patent number 7,006,295
- Issue date Feb 28, 2006
- ASML Holding N.V.
- Scott Coston
- G02 - OPTICS
Information Patent Grant
Illumination optical system and method, and exposure apparatus
- Patent number 6,999,157
- Issue date Feb 14, 2006
- Canon Kabushiki Kaisha
- Michio Kohno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Zoom system, in particular, a zoom system for an illumination devic...
- Patent number 6,900,946
- Issue date May 31, 2005
- Carl Zeiss SMT AG
- Jess Koehler
- G02 - OPTICS
Information Patent Grant
Illumination optical system, exposure apparatus having the same, an...
- Patent number 6,894,764
- Issue date May 17, 2005
- Canon Kabushiki Kaisha
- Kenichiro Shinoda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Zoom system for an illumination device
- Patent number 6,864,960
- Issue date Mar 8, 2005
- Carl Zeiss SMT AG
- Jess Koehler
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
MAGNIFICATION ADJUSTABLE PROJECTION SYSTEM USING MOVABLE LENS PLATES
- Publication number 20230137707
- Publication date May 4, 2023
- Corning Incorporated
- Paul Gerard Dewa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM FOR EUV PROJECTION LITHOGRAPHY
- Publication number 20180224750
- Publication date Aug 9, 2018
- Carl Zeiss SMT GMBH
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM FOR EUV PROJECTION LITHOGRAPHY
- Publication number 20160252823
- Publication date Sep 1, 2016
- Michael Patra
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRA...
- Publication number 20140055764
- Publication date Feb 27, 2014
- ASML NETHERLANDS B.V.
- Pieter Willem Herman DE JAGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRA...
- Publication number 20110188016
- Publication date Aug 4, 2011
- ASML NETHERLANDS B.V.
- Pieter Willem Herman De Jager
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICAL SYSTEM AND EXPOSURE APPARATUS HAVING THE SAME
- Publication number 20090091735
- Publication date Apr 9, 2009
- Canon Kabushiki Kaisha
- Kanjo ORINO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination optical apparatus, exposure apparatus, and device manu...
- Publication number 20090002671
- Publication date Jan 1, 2009
- Nikon Corporation
- Hirohisa Tanaka
- G02 - OPTICS
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20080218719
- Publication date Sep 11, 2008
- Canon Kabushiki Kaisha
- Takahisa SHIOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination System of a Microlithographic Exposure Apparatus
- Publication number 20080212327
- Publication date Sep 4, 2008
- CARL ZEISS SMT AG
- Wolfgang Singer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFAC...
- Publication number 20080212061
- Publication date Sep 4, 2008
- Canon Kabushiki Kaisha
- Takafumi Kawasaki
- G02 - OPTICS
Information Patent Application
Correction of off-axis translation of optical elements in an optica...
- Publication number 20070296974
- Publication date Dec 27, 2007
- ASML Holding N.V.
- Kevin Violette
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ILLUMINATION SYSTEM WITH ZOOM OBJECTIVE
- Publication number 20070236784
- Publication date Oct 11, 2007
- Carl Zeiss SMT AG
- Wolfgang Singer
- G02 - OPTICS
Information Patent Application
Advanced Illumination System for Use in Microlithography
- Publication number 20070146674
- Publication date Jun 28, 2007
- ASML Holding N.V.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Exposure system for controlling vertical/horizontal CD difference a...
- Publication number 20070076185
- Publication date Apr 5, 2007
- HYNIX SEMICONDUCTOR INC.
- Dong Gyu Yim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS
- Publication number 20070053033
- Publication date Mar 8, 2007
- Canon Kabushiki Kaisha
- Takahisa SHIOZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Laser beam irradiation apparatus and pattern drawing method
- Publication number 20060289412
- Publication date Dec 28, 2006
- Sumitomo Heavy Industries, Ltd.
- Shiro Hamada
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Optical beam transformation system and illumination system comprisi...
- Publication number 20060146384
- Publication date Jul 6, 2006
- Carl Zeiss SMT AG
- Joerg Schultz
- G02 - OPTICS
Information Patent Application
Lithographic apparatus and device manufacturing method
- Publication number 20060132742
- Publication date Jun 22, 2006
- ASML Netherland B.V.
- Karel Diederick Van Der Mast
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Efficiently illuminating a modulating device
- Publication number 20060119947
- Publication date Jun 8, 2006
- ASML Holding N.V.
- Scott Coston
- G02 - OPTICS
Information Patent Application
Exposure apparatus and method, and device fabricating method using...
- Publication number 20060050259
- Publication date Mar 9, 2006
- Kenichiro Shinoda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination optical system and method, and exposure apparatus
- Publication number 20050280796
- Publication date Dec 22, 2005
- Michio Kohno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Beam reshaping unit for an illumination system of a microlithograph...
- Publication number 20050219495
- Publication date Oct 6, 2005
- Carl Zeiss SMT AG
- Wolfgang Singer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High power laser output beam energy density reduction
- Publication number 20050100072
- Publication date May 12, 2005
- Rajasekhar M. Rao
- G02 - OPTICS
Information Patent Application
Illumination optical system and exposure apparatus having the same
- Publication number 20050094997
- Publication date May 5, 2005
- Kanjo Orino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination optical system and exposure apparatus having the same
- Publication number 20050073666
- Publication date Apr 7, 2005
- Kanjo Orino
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination system and method allowing for varying of both field h...
- Publication number 20050007677
- Publication date Jan 13, 2005
- Scott D. Coston
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Illumination optical apparatus and exposure apparatus provided with...
- Publication number 20040263817
- Publication date Dec 30, 2004
- Nikon Corporation
- Osamu Tanitsu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Advanced illumination system for use in microlithography
- Publication number 20040263821
- Publication date Dec 30, 2004
- ASML Holding N.V.
- Mark Oskotsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Zoom system, in particular, a zoom system for an illumination devic...
- Publication number 20040257669
- Publication date Dec 23, 2004
- Carl Zeiss SMT AG
- Jess Koehler
- G02 - OPTICS
Information Patent Application
Exposure apparatus
- Publication number 20040246456
- Publication date Dec 9, 2004
- Takahisa Shiozawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Zoom systems

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Illumination system for EUV projection lithography

Beam delivery for EUV lithography

Illumination system for EUV projection lithography

Lithographic apparatus, programmable patterning device and lithogra...

Lithographic apparatus, programmable patterning device and lithogra...

Illumination optical apparatus, exposure apparatus, and device manu...

Illumination optical system and exposure apparatus having the same

Illumination system of a microlithographic exposure apparatus

Illumination optical system, exposure apparatus, and device manufac...

Illumination system with zoom objective

Beam reshaping unit for an illumination system of a microlithograph...

Optical beam transformation system and illumination system comprisi...

Correction of off-axis translation of optical elements in an optica...

Illumination optical system and exposure apparatus having the same

Exposure apparatus

Photolithographic method using exposure system for controlling vert...

Lithographic apparatus and device manufacturing method

Exposure apparatus

Advanced illumination system for use in microlithography

Efficiently illuminating a modulating device

Exposure apparatus

Exposure apparatus and method, and device fabricating method using...

Illumination system and method allowing for varying of both field h...

Illumination optical system and method, and exposure apparatus

Exposure apparatus and method, and device fabricating method using...

Illumination system and method for efficiently illuminating a patte...

Illumination optical system and method, and exposure apparatus

Zoom system, in particular, a zoom system for an illumination devic...

Illumination optical system, exposure apparatus having the same, an...

Zoom system for an illumination device

Patents Applicationslast 30 patents

MAGNIFICATION ADJUSTABLE PROJECTION SYSTEM USING MOVABLE LENS PLATES

ILLUMINATION SYSTEM FOR EUV PROJECTION LITHOGRAPHY

ILLUMINATION SYSTEM FOR EUV PROJECTION LITHOGRAPHY

LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRA...

LITHOGRAPHIC APPARATUS, PROGRAMMABLE PATTERNING DEVICE AND LITHOGRA...

ILLUMINATION OPTICAL SYSTEM AND EXPOSURE APPARATUS HAVING THE SAME

Illumination optical apparatus, exposure apparatus, and device manu...

EXPOSURE APPARATUS

Illumination System of a Microlithographic Exposure Apparatus

ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFAC...

Correction of off-axis translation of optical elements in an optica...

ILLUMINATION SYSTEM WITH ZOOM OBJECTIVE

Advanced Illumination System for Use in Microlithography

Exposure system for controlling vertical/horizontal CD difference a...

EXPOSURE APPARATUS

Laser beam irradiation apparatus and pattern drawing method

Optical beam transformation system and illumination system comprisi...

Lithographic apparatus and device manufacturing method

Efficiently illuminating a modulating device

Exposure apparatus and method, and device fabricating method using...

Illumination optical system and method, and exposure apparatus

Beam reshaping unit for an illumination system of a microlithograph...

High power laser output beam energy density reduction

Illumination optical system and exposure apparatus having the same

Illumination optical system and exposure apparatus having the same

Illumination system and method allowing for varying of both field h...

Illumination optical apparatus and exposure apparatus provided with...

Advanced illumination system for use in microlithography

Zoom system, in particular, a zoom system for an illumination devic...

Exposure apparatus