3021271

Information

• Patent Grant
• 3021271

• References
• Source

• Patent Number

  3,021,271

• Date Filed

  Not available

• Date Issued

  Tuesday, February 13, 1962
  62 years ago

• CPC

  • H01J37/36 - for cleaning surfaces while plating with ions of materials introduced into the discharge
  • C23C14/28 - by wave energy or particle radiation
  • C30B23/06 - Heating of the deposition chamber, the substrate or the material to be evaporated
  • Y10S148/158 - Sputtering
  • Y10S148/169 - Vacuum deposition
  • Y10S438/913 - Diverse treatments performed in unitary chamber

• US Classifications

  • 204 - Chemistry: electrical and wave energy
  • 117 - Single-crystal, oriented-crystal, and epitaxy growth processes
  • 148 - Metal treatment
  • 438 - Semiconductor device manufacturing: process