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3409529
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Information
Patent Grant
3409529
References
Source
Patent Number
3,409,529
Date Filed
Not available
Date Issued
Tuesday, November 5, 1968
56 years ago
CPC
H01J37/3053 - for evaporating or etching
C23C14/46 - by ion beam produced by an external ion source
H01J27/10 - Duoplasmatrons
H01J37/08 - Ion sources Ion guns
H01J37/18 - Vacuum locks; Means for obtaining or maintaining the desired pressure within the vessel
Y10S422/906 - Plasma or ion generation means
US Classifications
204 - Chemistry: electrical and wave energy
250 - Radiant energy
313 - Electric lamp and discharge devices
373 - Industrial electric heating furnaces
422 - Chemical apparatus and process disinfecting, deodorizing, preserving, or sterilizing
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