3478253

Information

• Patent Grant
• 3478253

• References
• Source

• Patent Number

  3,478,253

• Date Filed

  Not available

• Date Issued

  Tuesday, November 11, 1969
  55 years ago

• CPC

  • H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • C30B29/40 - AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
  • C30B31/06 - by contacting with diffusion material in the gaseous state
  • H01L21/02164 - the material being a silicon oxide
  • H01L21/02269 - deposition by thermal evaporation
  • H01L21/31612 - on a silicon body
  • H01L29/00 - Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier
  • Y10S148/037 - Diffusion-deposition
  • Y10S148/062 - Gold diffusion
  • Y10S148/118 - Oxide films
  • Y10S438/923 - Diffusion through a layer

• US Classifications

  • 257 - Active solid-state devices
  • 438 - Semiconductor device manufacturing: process