3540926

Information

• Patent Grant
• 3540926

• References
• Source

• Patent Number

  3,540,926

• Date Filed

  Not available

• Date Issued

  Tuesday, November 17, 1970
  54 years ago

• CPC

  • H01B3/025 - Other inorganic material
  • C23C14/0021 - Reactive sputtering or evaporation
  • H01L23/291 - Oxides or nitrides or carbides
  • H01L2924/0002 - Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
  • H01L2924/09701 - Low temperature co-fired ceramic [LTCC]
  • Y10S148/043 - Dual dielectric
  • Y10S148/065 - Gp III-V generic compounds-processing
  • Y10S148/112 - Nitridation, direct, of silicon
  • Y10S148/113 - Nitrides of boron or aluminum or gallium
  • Y10S148/169 - Vacuum deposition
  • Y10T29/435 - Solid dielectric type

• US Classifications

  • 427 - Coating processes
  • 029 - Metal working
  • 148 - Metal treatment
  • 361 - Electricity: electrical systems and devices