3577286

Information

• Patent Grant
• 3577286

• References
• Source

• Patent Number

  3,577,286

• Date Filed

  Not available

• Date Issued

  Tuesday, May 4, 1971
  53 years ago

• CPC

  • H01L21/02381 - Silicon, silicon germanium, germanium
  • C01G17/04 - Halides of germanium
  • C30B25/02 - Epitaxial-layer growth
  • C30B29/08 - Germanium
  • H01L21/00 - Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/02395 - Arsenides
  • H01L21/02532 - Silicon, silicon germanium, germanium
  • H01L21/02661 - In-situ cleaning
  • Y10S438/974 - Substrate surface preparation

• US Classifications

  • 117 - Single-crystal, oriented-crystal, and epitaxy growth processes
  • 257 - Active solid-state devices
  • 427 - Coating processes
  • 438 - Semiconductor device manufacturing: process