3755001

Information

• Patent Grant
• 3755001

• References
• Source

• Patent Number

  3,755,001

• Date Filed

  Not available

• Date Issued

  Tuesday, August 28, 1973
  52 years ago

• CPC

  • H01L21/76216 - introducing electrical active impurities in the local oxidation region for the sole purpose of creating channel stoppers
  • H01L21/32 - using masks
  • H01L21/74 - Making of localized buried regions
  • H01L21/7621 - the recessed region having a shape other than rectangular
  • Y10S148/043 - Dual dielectric
  • Y10S148/051 - Etching
  • Y10S148/085 - Isolated-integrated
  • Y10S148/103 - Mask, dual function
  • Y10S148/106 - Masks, special
  • Y10S148/117 - Oxidation, selective
  • Y10S148/141 - Self-alignment coat gate
  • Y10S148/143 - Shadow masking
  • Y10S148/145 - Shaped junctions
  • Y10S438/944 - Shadow

• US Classifications

  • 438 - Semiconductor device manufacturing: process
  • 148 - Metal treatment
  • 257 - Active solid-state devices