This application is a division of Application Ser. No. 08/712,716, filed Sep. 12, 1996, now U.S. Pat. No. 5,866,899.
Number | Name | Date | Kind |
---|---|---|---|
3064130 | Di Lanni et al. | Nov 1962 | |
3107299 | Jachter | Oct 1963 | |
3519821 | Bolster | Jul 1970 | |
3751661 | Packer et al. | Aug 1973 | |
3859179 | Staples | Jan 1975 | |
4092539 | Pao et al. | May 1978 | |
4119847 | Waggoner | Oct 1978 | |
4256960 | Snider | Mar 1981 | |
4270052 | King | May 1981 | |
4406947 | Burton et al. | Sep 1983 | |
4510573 | Boyce et al. | Apr 1985 | |
4524279 | Christianson et al. | Jun 1985 | |
4771177 | Brown | Sep 1988 | |
4779621 | Mattson | Oct 1988 | |
4912323 | Bhat et al. | Mar 1990 | |
4985906 | Arnold | Jan 1991 | |
5024801 | Impink, Jr. et al. | Jun 1991 | |
5164093 | Chilton et al. | Nov 1992 | |
5210778 | Massart | May 1993 | |
5373544 | Goebel | Dec 1994 | |
5376803 | McFee et al. | Dec 1994 | |
5497407 | Komatsu et al. | Mar 1996 | |
5559324 | Rapkin et al. | Sep 1996 | |
5637506 | Goken et al. | Jun 1997 | |
5760394 | Welle | Jun 1998 |
Number | Date | Country |
---|---|---|
59-116533 | May 1984 | JPX |
60-135842 | Jul 1985 | JPX |
6-148337 | May 1994 | JPX |
1146-091 | Jan 1984 | SUX |
1469-402 | Apr 1987 | SUX |
984834 | Mar 1965 | GBX |
Entry |
---|
"Automatic Calibration of Radiation Monitoring Films" Abstract, UKAEA Res. Group; AERE, Harwell, Berks., England; Report No. AERE-R6037; (1969). |
John Volpe, "Bettis Reactor Engineering School Nuclear Physics Notes", Rev. 1; Topic 8--Radioactivity, pp. 8-1 to 8-8. |
R.S. Hockett, TXRF Detection of Subsurface Metals in Silicon Substrates, in the Proceedings of the Symposium on Diagnostic Techniques for Semiconductor Materials and Devices, vol. 92-2, pp. 132-139. |
Patent Abstracts of Japan Grp P1598, vol. 17, No. 461, Abs. p-6, dated Aug. 23, 1993 (05-107388) Ueda et al. "Method for Measuring Neutron Effective Multiplication Constant During Storage of Radiation Fuel." |
Minutes of ISO/TC201/WG2 on Total Reflection X-Ray Fluorescence Spectroscopy, ISO/TC 201/WG2 N 27, Jan. 29, 1996. |
Third Working Draft, Surface Chemical Analysis--Determination Of Contamination Elements Contents On Silicone Wafer--Total Reflections X-Ray Fluorescence Spectroscopy (TXRF), ISO/TC 201/WG2 N 26, Nov. 27, 1995. |
R. S. Hockett, Proceedings from the Denver X-Ray Conference, An Update on Standards Activity for TXRF and the Challenges Ahead, Aug. 1995, pp. 1-4. |
Number | Date | Country | |
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Parent | 712716 | Sep 1996 |