Patent Application
20080057270
a to 1c are simplified views showing patterns of perforations in the adhesive sheet for water jet laser dicing of the present invention.
The adhesive sheet for water jet laser dicing of the present invention mainly comprises a base film and an adhesive layer disposed on this base film. The phrase “adhesive sheet for water jet laser dicing” here refers to an adhesive sheet that is used in dicing with a laser beam guided by a liquid jet (usually a water jet), and with which the liquid used in this liquid jet during dicing, such as a liquid jet with at least a specific pressure, and the liquid that is applied directly or indirectly from the adhesive layer side can escape from one side of the adhesive sheet to the other side. The specific pressure here is usually about a few MPa or higher.
The adhesive layer comprises an adhesive coated on one side of the base film. This adhesive may be any type of pressure sensitive, heat-sensitive, photosensitive, but it is suitably a type that is cured by an energy radiation, because this allows the layer to be easily removed from the workpiece. The energy radiation used here can be radiation of various wavelengths, such as ultraviolet rays, visible light rays, or infrared rays, but since the laser beam used for dicing is one with an oscillation wavelength less than 400 nm, such as a third or fourth harmonic of a YAG laser with an oscillation wavelength of 355 nm or 266 nm, XeCI excimer laser with an oscillation wavelength of 308 nm, or KrF excimer laser with an oscillation wavelength of 248 nm, or one with an oscillation wavelength greater than 400 nm, such as a titanium sapphire laser with a wavelength near 750 to 800 nm, which allows light absorption in the UV band via a multi-photon absorption process, which allows cutting at a width of 20 μm or less by multi-photon absorption ablation, and which has a pulse width of 1 e−9 second or less, it is preferable to use an adhesive that will not be cured by a irradiation with the laser beam of the dicing apparatus being used.
A known adhesive including (meth)acrylic polymers and rubber-based polymers can be used as the material that forms the adhesive layer, but a (meth)acrylic polymer is particularly preferable because even when a photosensitive adhesive is formed, it can be cured without adding any special monomer/oligomer component or the like for an energy radiation curing.
Examples of rubber-based polymers include natural rubbers, such as polyisoprene; and synthetic rubbers, such as styrene-butadiene rubber or a rubber based on polybutadiene, butadiene-acrylonitrile, chloroprene and the like.
Examples of a monomer component of (meth)acrylic polymers include alkyl acrylates and alkyl methacrylates having linear or branched alkyl groups with 30 or fewer carbons, and preferably 4 to 18 carbons, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, t-butyl, isobutyl, pentyl, isopentyl, hexyl, cyclohexyl, heptyl, 2-ethylhexyl, octyl, isooctyl, nonyl, isononyl, decyl, isodecyl, undecyl, rauryl, tridecyl, tetradecyl, stearyl, octadecyl, and dodecyl. These alkyl(meth)acrylates can be used alone or as mixture of more than two components.
Examples of a monomer component other than the above monomers include carboxyl-containing monomer such as acrylic acid, methacrylic acid, carboxyethyl(meth)acrylate, carboxypentyl(meth)acrylate, itaconic acid, maleic acid, fumaric acid, and crotonic acid; acid anhydride monomer such as maleic anhydride, itaconic anhydride; hydroxyl group-containing monomer such as 2-hydroxyethyl(meth)acrylate, 2-hydroxypropyl(meth)acrylate, 4-hydroxybutyl(meth)acrylate, 6-hydroxyhexyl(meth)acrylate, 8-hydroxyoctyl(meth)acrylate, 10-hydroxydodecyl(meth)acrylate, 12-hydroxyrauryl(meth)acrylate, 4-hydroxymethyl cyclohexyl methyl(meth)acrylate; sulfonate-containing monomer such as styrenesulfonate, allylsulfonate, 2-(meth)acrylamide-2-methyl propanesulfonate, (meth)acrylamide propanesulfonate, sulfopropyl(meth)acrylate, (meth)acryloyl oxynaphthalenesulfonate; phosphate-containing monomer such as 2-hydroxyethyl acryloylphosphate; (meth)acrylamide; N-hydroxymethylamide(meth)acrylate; alkylamino alkylester(meth)acrylate such as dimethylamino ethylmethacrylate, t-butylamino ethylmethacrylate; N-vinylpyrrolidone; acryloyl morpholine; vinyl acetate; styrene; acrylonitrile and the like. These monomer components can be used alone or as mixture of more than two components.
Multifunctional monomers may be added as needed for the purpose of crosslinking (meth)acrylic polymer. Examples of the multifunctional monomer include 1,6-hexanediol di(meth)acrylate, polyethylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, neopentylglycol di(meth)acrylate, pentaerythritol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol monohydroxy penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, epoxy(meth)acrylate, polyester(meth)acrylate, urethane(meth)acrylate and the like. These multifunctional monomer components can be used alone or as mixture of more than two components. From the standpoint of adhesion characteristic and the like, the amount in which the multifunctional monomers are contained is preferably no more than 30 wt %, more preferably no more than 20 wt % of the total monomer component.
It is even more preferable to use a monomer and/or oligomer having an energy radiation curable functional group, such as a carbon-carbon double bond.
Examples of the monomer and/or oligomer include urethane(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol monohydroxy penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, 1,4-butylene glycol di(meth)acrylate and the like. These components can be used alone or as mixture of more than two components. There are no particular restrictions on the amount in which these are contained, but from the standpoint of adhesion characteristic, about 5 to 500 weight parts, or about 70 to 150 weight parts per 100 weight parts of the (meth)acrylic polymer or other base polymer of the adhesive is preferable.
It is preferable to use a photopolymerization initiator when a photosensitive adhesive is formed. Examples of the photopolymerization initiator include acetophenone compounds such as 4-(2-hydroxyethoxy)phenyl(2-hydroxy-2-propyl)ketone, α-hydroxy-α,α-methyl acetophenone, methoxy acetophenone, 2,2-dimethoxy-2-phenyl acetophenone, 2,2-diethoxy-acetophenone, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1-[4-(methyltio)phenyl]-2-morpholinoprophane-1; benzoine ether compounds such as benzoine ethyl ether, benzoine isopropyl ether, anisoin methyl ether; α-ketol compounds such as 2-methyl-2-hydroxypropylphenon; ketal compounds such as benzyldimethyl keral; aromatic sulfonyl chloride compounds such as 2-naphthalene sulfonyl chloride; light-active oxime compounds such as 1-phenon-1,1-propanedione-2-(o-ethoxycarbonyl)oxime; benzophenone compounds such as benzophenone, benzoylbenzoate, 3,3′-dimethyl-4-methoxybenzophenone; thioxanthone compounds such as thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, 2,4-dimethylthioxanthone, isopropylthioxanthone, 2,4-dichlorothioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone; camphor chinone; ketone halide; acyl phosphinoxide; acyl phosphonate and the like. These components can be used alone or as mixture of more than two components. The amount in which the photopolymerization initiators are contained, about 0.1 to 10 weight parts, or about 0.5 to 5 weight parts per 100 weight parts of the base polymer of the adhesive is preferable.
A crosslinking agent may also be added to raise the weight average molecular weight of the base polymer. Examples of the crosslinking agent include polyisocyanate compounds, epoxy compounds, aziridine compounds, melamine resins, urea resins, anhydrous compounds, polyamines, carboxyl group-containing polymers and the like. These can be used alone or as mixture of more than two compounds. When a crosslinking agent is used, it is generally preferable for it to be used in an amount of about 0.01 to 5 weight parts per 100 weight parts base polymer so that the peeling-off adhesion strength will not decrease too much.
In addition to the above components, the adhesive may optionally comprise any conventional additive such as tackifiers, antioxidants, fillers, pigments and the like.
The acrylic polymer can be prepared, for example, by applying a known method such as solution polymerization, emulsion polymerization, mass polymerization, suspension polymerization to one or more kinds of monomer or a mixture thereof. Among these, solution polymerization is preferable. Examples of solvents that can be used include ethyl acetate, toluene and other such polar solvents. The solution concentration is usually about 20 to 80 wt %.
A polymerization initiator may be used in the preparation of the polymer. Examples of the polymerization initiator include peroxides such as hydrogen peroxide, benzoyl peroxide, t-butyl peroxide, and the like. One may be used by itself, or it may be combined with a reducing agent and used as a redox type of polymerization initiator. Examples of the reducing agent include ionic salts such as salts of iron, copper, cobalt, sulfite, bisulfite; amines such as triethanol amine; reducing sugar such as aldose, ketose and the like. Also, azo compounds such as 2,2′-azobis-2-methylpropioamidine salt, 2,2′-azobis-2,4-dimethylvaleronitrile, 2,2′-azobis-N,N′-dimethyleneisobutylamidine salt, 2,2′-azobisisobutyronitrile, 2,2′-azobis-2-methyl-N-(2-hydroxyethyl)propionamide may be used. These can be used alone or as mixture of more than two components.
The reaction temperature is usually about 50 to 85° C., and the reaction time about 1 to 8 hours.
From the standpoint of preventing fouling of the workpiece and the like, it is preferable for the acrylic polymer to have a low content of low-molecular weight substances, and for the acrylic polymer to have a number average molecular weight of at least 300,000, particularly at a rage of about 800,000 to 3,000,000.
The thickness of the adhesive layer can be suitably adjusted within a range in which the layer will not come off the workpiece, but from the standpoints of ensuring adequate adhesive strength, preventing undesirable adhesive residue from remaining on the back of the semiconductor wafer or the like after the wafer or the like has been removed from the tape, and allowing water to pass through easily by cutting the adhesive layer, the thickness is usually less than about 300 μm, preferably about 1 to 200 μm, about 1 to 50 μm, about 3 to 20 μm. This minimizes resonance of the adhesive layer caused by vibration attributable to the liquid jet or irradiation with the laser beam during dicing, allows the oscillation amplitude to be suppressed, and prevents cracking, chipping, and the like of the chips. It also allows the workpiece to be securely fixed during dicing.
As discussed below, the adhesive layer may include perforations as the base film does. These perforations can be formed by any of the methods discussed below for the base film. It is preferable, though, to form these perforations simultaneously with the perforations in the base film because they will then go all the way through from the base film to the adhesive layer, that is, the perforations in the base film overlap with the perforations in the adhesive layer. To put this another way, it is preferable for the perforations in the base film and the perforations in the adhesive layer to have substantially the same size and shape, and to be formed in substantially the same locations.
Examples of the base film include non-woven, woven and the like made of a synthetic resin film, for example, polyolefins such as polyethylene, polypropylene (e.g., low-density polyethylene, liner low-density polyethylene, high-density polyethylene, drawn polypropylene, non-drawn polypropylene, ethylene-polypropylene copolymer, ethylene-vinyl acetate copolymer, ethylene-(meth)acrylic acid copolymer, ethylene-(meth)acrylic ester copolymer and the like), polyethylene terephthalate, polyurethane, EVA, polytetrafluoroethylene, polyvinyl chloride, polyvinylidene chloride, polyamide, acetal resin, polystyrene, polycarbonate, fluorocarbon polymer; rubber-containing polymer such as styrene-butadiene copolymer; polymer fiber such as PP, PVC, PE, PU, PS, PO, PET and the like; synthetic fiber such as rayon, acetylcellulose and the like; natural fiber such as cotton, silk, wool and the like; inorganic fiber such as glass fiber, carbon fiber and the like. These can be used single layer or multilayer of more than two layers. Among these, a layer made of or comprising polyolefins is preferable. As a result, both adequate strength and expandability for laser dicing can be ensured for the adhesive sheet.
The base film may be subjected to surface treatment, such as corona discharge treatment, flame treatment, plasma treatment, sputter etching treatment, undercoating (e.g., primer), fluorine treatment; or degreasing treatment using a chemical solution on the surface thereof on which the adhesive film is formed, for the enhancement of the adhesiveness to the adhesive film. Applying a primer is especially preferable. The thickness of the base film is generally 10 to 400 μm, preferably 30 to 250 μm, for avoiding fracture or breaking of the sheet during processing the semiconductor wafer or the like as well as decreasing manufacturing cost.
The adhesive sheet of the present invention can be formed by a tape manufacturing method known in this field of technology. For example, the base film is provided first. The adhesive, then, can be laminated onto the base film. The base film may be coated directly, or a transfer coating process may be employed in which a process material coated with a release agent is coated with the adhesive and dried, after which the adhesive is laminated to the base film, or the adhesive may be laminated in a rolling mill on the base film. These coating process can be performed by any existing coating method, for example, reverse roll coating, gravure coating, curtain spray coating, die coating, extrusion and other industrially applied coating methods may be used. The base film that is prepared may have perforations already in the base film, or the perforations may be formed after the base film has been coated with the adhesive.
The adhesive sheet which is constituted by the adhesive layer laminated on the base film possesses perforations which are perforated in the thickness direction of the base film or which is connected plural perforations. The perforations may be regularly or irregularly provided on the adhesive sheet. When the material of the base film comprises fibers, the perforations may be obtained naturally as a result of the fiber-fiber interstices, thus, rendering the base film porous. Apart from the such perforations, it is good for there to be perforations that substantially overlap with the perforations formed in the adhesive layer. This allows water to escape from one side of the adhesive sheet to the other side, regardless of the hydraulic pressure of the liquid jet, and prevents the chips from coming loose, etc.
The adhesive sheet can be perforated by a variety of through-hole making methods. Examples include a mechanical and/or a thermal method. Examples of how the perforations are made in the base film include water jet processing, laser processing, and punching with a press (such as a Thompson press) or a rotary roll (such as a punching machine or a rotary roll equipped with needles).
The shape and size of the perforations of the adhesive sheet are not limited as long as it ensures water-permeability, for example, the shape may be irregular as in the case of the fiber-fiber interstices, and the perforations of square (e.g.,
The adhesive sheet preferably has a porosity of about 3 to 90%, preferably about 3 to 60%, about 10 to 55%, about 20 to 50%. As a result, the water permeability is good, and the separation of the chips from the adhesive sheet and/or the admixture of foreign matter between the sheet and the chips can be prevented. Also, good mechanical strength is ensured in the sheet, a decrease in the smoothness of the sheet is prevented, and a secure bond can be achieved between the base film and the adhesive. In this case, the porosity is calculated from the perforation size and the perforation density, i.e.
porosity(%)=(perforation size)×(perforation density)×100.
The adhesive sheet of the present invention preferably has an elongation of over 100%, and more preferably 150%. This is because stretching the adhesive sheet makes it possible for the chips or the like to be easily picked up from the adhesive sheet after the dicing step.
Furthermore, the adhesive sheet preferably has a tensile strength of over 0.1 N/10 mm, more preferably over 0.3 N/10 mm. The reason for this is to avoid breaking and/or cutting the adhesive sheet itself.
The elongation percentage and tensile strength can be measured, for example, with a tensile tester using a sample with a length of 5.0 cm and a width of 20 mm. The tensile speed during the test is 300 mm/minute at room temperature (according to ASTM D1000). The elongation percentage can be calculated as follows.
Elongation(%)=(Fracture Length−Original Length)÷(Original Length)×100
The tensile strength is a value at fracturing.
The adhesive sheet of the present invention has an adhesive strength of at least 1.5 N/20 mm, preferably at least 3 N/20 mm, and less than 10 N/20 mm, preferably less than 8 N/20 mm. In other words, along with changes in dicing technology to technology involving the use of a water jet laser, the critical significance of the adhesive strength of an adhesive sheet used for dicing is also changing, and as a result, good adhesion with the wafer or the like during dicing can be ensure even at a weaker adhesive strength, and chips or parts can be prevented from coming loose from the adhesive tape. In addition, a reduction in the initial adhesive strength allows chipping and other such defects to chips, IC parts, and the like during pick-up to reduce. In particular, in the case of a photosensitive adhesive, the adhesive strength of the adhesive after irradiation can be effectively, quickly, and easily reduced. The adhesive strength after irradiation is preferably less than 0.2 N/20 mm, more preferably less than 0.18 N/20 mm.
Here, an adhesive strength is the value which is measured on an Si-mirror wafer under the conditions of 23±3° C., 180° peeling angle and a peeling speed of 300 mm/min (according to ASTM D1000).
Examples of the adhesive sheet for water jet laser dicing of the present invention will now be described in detail.
An acrylic adhesive composed of 100 parts acrylic copolymer, 30 parts plasticizer, and 10 parts crosslinking agent was used to coat one side of a 50 μm process liner in a thickness 15 μm, after which the coating was dried for 3 minutes at 100° C. After drying, the coating side was immediately applied to a base film (a blended film of EVA (vinyl content of 9%) and polyethylene (blend ratio (wt %) of EVA:polyethylene=30:70)) to obtain an adhesive sheet.
Perforations were made in the film thus produced by thermal machining using a laser with a wavelength of 1064 nm and a laser boring apparatus M4350 (made by esi), which gave an adhesive sheet for semiconductor wafer processing. Circular perforations with an area of 0.2 mm2 were made so that the spacing D of the perforations in
An acrylic adhesive composed of 100 parts acrylic copolymer, 30 parts plasticizer, and 10 parts crosslinking agent was used to coat one side of a 50 μm process liner in a thickness 15 μm, after which the coating was dried for 3 minutes at 100° C. After drying, the coating side was immediately applied to a base film (a blended film of EVA (vinyl content of 9%) and polyethylene (blend ratio (wt %) of EVA:polyethylene=30:70)) to obtain an adhesive sheet.
The above-mentioned film was machined with a precision film punching machine (RFP-S20, made by UHT), which gave an adhesive sheet for semiconductor wafer processing in which circular perforations with an area of 0.2 mm2 were made so that the spacing D of the perforations in
An acrylic adhesive composed of 100 parts acrylic copolymer, 30 parts plasticizer, and 10 parts crosslinking agent was used to coat one side of a 50 μm process liner in a thickness 15 μm, after which the coating was dried for 3 minutes at 100° C. After drying, the coating side was immediately applied to a base film (a blended film of EVA (vinyl content of 9%) and polyethylene (blend ratio (wt %) of EVA:polyethylene=30:70)) to obtain an adhesive sheet.
A rotary roll equipped on its surface with hollow needles for making perforations was used, which gave an adhesive sheet for semiconductor wafer processing in which circular perforations with an area of 0.2 mm2 were made so that the spacing D of the perforations in
An acrylic adhesive composed of 100 parts acrylic copolymer, 30 parts plasticizer, and 10 parts crosslinking agent was used to coat one side of a 50 μm process liner in a thickness 15 μm, after which the coating was dried for 3 minutes at 100° C. After drying, the coating side was immediately applied to a base film (a blended film of EVA (vinyl content of 9%) and polyethylene (blend ratio (wt %) of EVA:polyethylene=30:70)) to obtain an adhesive sheet.
The above-mentioned film was continuously pressed by using a Thompson press mold, which gave an perforated film for processing semiconductor wafers in which circular perforations with an area of 0.2 mm2 were made so that the spacing D of the perforations in
An acrylic adhesive composed of 100 parts acrylic copolymer, 30 parts plasticizer, and 10 parts crosslinking agent was used to coat one side of a 50 μm process liner in a thickness 15 μm, after which the coating was dried for 3 minutes at 100° C.
The coating side of the above-mentioned acrylic adhesive was applied to a base film (porosity of 30%) produced by making perforations of 0.1 to 0.3 mm in a non-woven cloth composed of polypropylene fiber, which gave an adhesive sheet.
An acrylic adhesive usually using for processing silicon wafer utilizing rotary diamond blade method was used to coat a 70 μm standard PVC film in a thickness 10 μm, and thus obtaining an adhesive sheet.
Die fry-off rate (chip fly rate, %) is calculated at dicing semiconductor chips in the following conditions.
Laser wavelength: 532 nm
Dicing speed: 50 mm/s
Laser diameter: 50 μm
Water jet pressure: 40 MPa
Chip size: 3 mm×3 mm
Wafer size: 13.7 cm (5 inch)
Wafer thickness: 150 μm.
The results are shown in Table 1.
Tensile strength and fracture elongation were measured as follows. Samples of 30 mm×10 mm were taken, taking three each in the machine and transverse directions, the fracture elongation was measured at a pulling rate of 300 mm/minute with an ordinary tensile strength tester (Tensilon), and the average value thereof was termed the tensile strength.
As is clear from Table 1, when perforations were made in the adhesive sheet, that is, when perforations were formed that were substantially aligned all the way through from the adhesive layer to the base film, and when porosity is set at predetermined value, the water originating in the water jet could easily go through the adhesive sheet, and chip fly-off could be effectively prevented. Also, since the fracture elongation was ensured at a suitable value, there was good expansion during pick-up after dicing, and no defects were caused by pick-up.
Meanwhile, in Comparative Example 1, because the fracture elongation was low, the adhesive sheet split when it expanded. Also, since the perforations in the base film and the adhesive layer did not line up all the way through, water did not pass through well and chip fly-off occurred.
With Comparative Example 2, because the water could not pass through the adhesive sheet, either dicing itself could not be performed well, or the water did not pass through and chip fly-off occurred.
This application claims priority to Japanese Patent Application No. 2006-232732. The entire disclosure of Japanese Patent Application No. 2006-232732 is hereby incorporated herein by reference.
While only selected embodiments have been chosen to illustrate the present invention, it will be apparent to those skilled in the art from this disclosure that various changes and modifications can be made herein without departing from the scope of the invention as defined in the appended claims. Furthermore, the foregoing descriptions of the embodiments according to the present invention are provided for illustration only, and not for the purpose of limiting the invention as defined by the appended claims and their equivalents. Thus, the scope of the invention is not limited to the disclosed embodiments.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2006-232732 | Aug 2006 | JP | national |
