Number | Name | Date | Kind |
---|---|---|---|
4717462 | Homma et al. | Jan 1988 | |
4792378 | Rose et al. | Dec 1988 | |
4925542 | Kidd | May 1990 | |
4963239 | Shimamura et al. | Oct 1990 | |
5010842 | Oda et al. | Apr 1991 | |
5052339 | Vakerlis et al. | Oct 1991 | |
5108535 | Ono et al. | Apr 1992 | |
5273588 | Foster et al. | Dec 1993 | |
5284544 | Mizutani et al. | Feb 1994 | |
5330628 | Demaray et al. | Jul 1994 | |
5431799 | Mosely et al. | Jul 1995 | |
5433787 | Suzuki et al. | Jul 1995 | |
5811022 | Savas et al. | Sep 1998 |
Number | Date | Country |
---|---|---|
0 735 577 A2 | Oct 1996 | EPX |
53-91664 | Nov 1978 | JPX |
60-116126 | Jun 1985 | JPX |
62-77477 | Apr 1987 | JPX |
63-187619 | Aug 1988 | JPX |
Entry |
---|
Rossnagel, S.M., "Directional and preferential sputtering-based physical vapor deposition," Thin Solid Films, 263, (1995) 1-12, Elsevier Science S.A. |
Yoshio Homma, Sukeyoshi Tunekawa, Akira Satou, and Tomoguki Terada, "Planarization Mechanism of RF-Biased Al Sputtering," J. of Electrochem. Soc., 140 (1993) Mar., No. 3, Manchester, NH, U.S. |