Claims
- 1. A method for preparing a patterned surface for the selective adhesion and outgrowth of cells, comprising:
- (i) coating a substrate with a first compound to obtain an ultra-thin film which is reactive to radiation and has an exposed surface of at least one cell adhesion promoter or cell adhesion inhibitor; and
- (ii) irradiating said ultra-thin film in a pattern to obtain an irradiated film with a surface region in which at least a fraction of said promoter or inhibitor has been removed,
- wherein said cell adhesion promoter contains a group selected from the group consisting of --NHCH.sub.2 CH.sub.2 NHCH.sub.2 CH.sub.2 NH.sub.2, --NHCH.sub.2 CH.sub.2 NH.sub.2, 11-aminoundecyl, 3-aminopropyl, 3-(-amino-propoxy)-3,3-dimethyl-1-propenyl, 6-(aminohexyl)propyl, N-(2-aminoethyl)-3-aminopropyl, --(CH.sub.2).sub.3 --NH--(CH.sub.2).sub.2 --NH--(CH.sub.2 .paren close-st..sub.3, Gly-Arg-Gly-Asp-Tyr-, and Gly-Tyr-Ile-Gly-Ser-Arg-Tyr, and wherein said cell adhesion inhibitor contains a fluorinated alkyl group.
- 2. The method of claim 1, further comprising:
- (iii) treating the irradiated film with a second compound to bind to said surface region in which at least a fraction of said promoter or inhibitor has been removed.
- 3. The method of claim 1, wherein said ultra-thin film is coated on a substrate selected from the group consisting of silica, silicon, germanium, gallium, arsenide, epoxy resin, polystyrene, polysulfone, aluminum, platinum, alumina, silicone, fluoropolymers, polyesters, acrylic copolymers, polyglactin, and polylactates.
- 4. The method of claim 1, wherein said cell adhesion promoter contains a --NHCH.sub.2 CH.sub.2 NHCH.sub.2 CH.sub.2 NH.sub.2 group or a --NHCH.sub.2 CH.sub.2 NH.sub.2 group.
- 5. The method of claim 1, wherein said first compound is (a) a cell adhesion promoter compound selected from the group consisting of N-(2-aminoethyl-3-aminopropyl) trimethoxysilane, 11-aminoundecyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-aminopropylmethyldiethoxysilane, 3-aminopropyldimethylethoxysilane, 3-(1-aminopropoxy)-3,3-dimethyl-1-propenyltrimethoxysilane, 6-(aminohexylaminopropyl)trimethoxysilane, N-(2-aminoethyl)-3-aminopropylmethyldimethoxysilane, bis 3-(trimethoxysilyl)propyl!ethylenediamine, trimethoxysilylpropyldiethylenetriamine, (aminoethylaminomethyl)phenethyltrimethoxysilane, isopropyltri-(n-ethylenediamino)ethyltitanate, neopentyl(diallyl)oxytri(n-ethylenediamino)ethyltitanate, neopentyl(diallyl)oxytri(amino)phenyltitanate, neopentyl(diallyl)oxytri(n-ethylenediamino)ethylzirconate, and neopentyl(diallyl)oxytri(m-amino)phenylzirconate; or
- (b) a cell adhesion inhibitor compound selected from the group consisting of tridecafluoro-1,1,2,2-tetrahydrooctyl)-1-dimethylchlorosilane, tridecafluoro-1,1,2,2-tetrahydrooctyl)-1-trichlorosilane, tridecafluoro-1,1,2,2-tetrahydrooctyl)-1-methyldichlorosilane, tridecafluoro-1,1,2,2-tetrahydrooctyl)-1-triethoxysilane, (3,3,3-trifluoropropyl)trichlorosilane, (3,3,3-trifluoropropyl)methyldichlorosilane, (3,3,3-trifluoropropyl)-dimethylchlorosilane, (3,3,3-trifluoropropyl)methyldimethoxysilane, (3,3,3-trifluoropropyl)trimethoxysilane, (heptafluoroisopropoxy) propylmethyldichlorosilane, and (3-pentafluorophenylpropyl) dimethylchlorosilane.
- 6. A cell-based microsensor, comprising:
- (i) at least one transducer; and
- (ii) a substrate having a patterned surface for the selective adhesion and outgrowth of cells;
- wherein said patterned surface contains at least one region having an exposed surface of at least one cell adhesion promoter, such that said region is spatially related to said transducer so that a cell adhering to said region may be stimulated or detected by said transducer;
- wherein said patterned surface is prepared by a method comprising:
- (i) coating a substrate with a first compound to obtain an ultra-thin film which is reactive to radiation and has an exposed surface of at least one cell adhesion promoter or cell adhesion inhibitor; and
- (ii) irradiating said ultra-thin film in a pattern to obtain an irradiated film with a surface region in which at least a fraction of said promoter or inhibitor has been removed,
- wherein said cell adhesion promoter contains a group selected from the group consisting of --NHCH.sub.2 CH.sub.2 NHCH.sub.2 CH.sub.2 NH.sub.2, --NHCH.sub.2 CH.sub.2 NH.sub.2, 11-aminoundecyl, 3-aminopropyl, 3-(-aminopropoxy)-3,3-dimethyl-1-propenyl, 6-(aminohexyl)propyl, N-(2-aminoethyl)-3-aminopropyl, --(CH.sub.2).sub.3 -NH-(CH.sub.2).sub.2 -NH-(CH.sub.2 .paren close-st..sub.3, Gly-Arg-Gly-Asp-Tyr-, and Gly-Tyr-Ile-Gly-Ser-Arg-Tyr, and wherein said cell adhesion inhibitor contains a fluorinated alkyl group.
- 7. The microsensor of claim 6, wherein said method further comprises:
- (iii) treating the irradiated film with a second compound to bind to said surface region in which at least a fraction of said promoter or inhibitor has been removed.
- 8. The microsensor of claim 6, wherein said ultra-thin film is coated on a substrate selected from the group consisting of silica, silicon, germanium, gallium, arsenide, epoxy resin, polystyrene, polysulfone, aluminum, platinum, alumina, silicone, fluoropolymers, polyesters, acrylic copolymers, polyglactin, and polylactates.
- 9. The microsensor of claim 6, wherein said cell adhesion promoter contains a --NHCH.sub.2 CH.sub.2 NHCH.sub.2 CH.sub.2 NH.sub.2 group or a --NHCH.sub.2 CH.sub.2 NH.sub.2 group.
- 10. The microsensor of claim 6, wherein said first compound is (a) a cell adhesion promoter compound selected from the group consisting of N-(2-aminoethyl-3-aminopropyl) trimethoxysilane, 11-aminoundecyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-aminopropylmethyldiethoxysilane, 3-aminopropyldimethylethoxysilane, 3-(1-aminopropoxy)-3,3-dimethyl-1-propenyltrimethoxysilane, 6-(aminohexylaminopropyl)trimethoxysilane, N-(2-aminoethyl)-3-aminopropylmethyldimethoxysilane, bis 3-(trimethoxysilyl)propyl!ethylenediamine, trimethoxysilylpropyldiethylenetriamine, (aminoethylaminomethyl)phenethyltrimethoxysilane, isopropyltri-(n-ethylenediamino)ethyltitanate, neopentyl(diallyl)oxytri(n-ethylenediamino)ethyltitanate, neopentyl(diallyl)oxytri(amino)phenyltitanate, neopentyl(diallyl)oxytri(n-ethylenediamino)ethylzirconate, and neopentyl(diallyl)oxytri(m-amino)phenylzirconate; or
- (b) a cell adhesion inhibitor compound selected from the group consisting of tridecafluoro-1,1,2,2-tetrahydrooctyl)-1-dimethylchlorosilane, tridecafluoro-1,1,2,2-tetrahydrooctyl)-1-trichlorosilane, tridecafluoro-1,1,2,2-tetrahydrooctyl)-1-methyldichlorosilane, tridecafluoro-1,1,2,2-tetrahydrooctyl)-1-triethoxysilane, (3,3,3-trifluoropropyl)trichlorosilane, (3,3,3-trifluoropropyl)methyldichlorosilane, (3,3,3-trifluoropropyl)-dimethylchlorosilane, (3,3,3-trifluoropropyl)methyldimethoxysilane, (3,3,3-trifluoropropyl)trimethoxysilane, (heptafluoroisopropoxy) propylmethyldichlorosilane, and (3-pentafluorophenylpropyl) dimethylchlorosilane.
- 11. An implant, comprising at least one patterned surface for the selective adhesion and outgrowth of cells, wherein said patterned surface is prepared by a method, comprising:
- (i) coating a substrate with a first compound to obtain an ultra-thin film which is reactive to radiation and has an exposed surface of at least one cell adhesion promoter or cell adhesion inhibitor; and
- (ii) irradiating said ultra-thin film in a pattern to obtain an irradiated film with a surface region in which at least a fraction of said promoter or inhibitor has been removed,
- wherein said cell adhesion promoter contains a group selected from the group consisting of --NHCH.sub.2 CH.sub.2 NHCH.sub.2 CH.sub.2 NH.sub.2, --NHCH.sub.2 CH.sub.2 NH.sub.2, 11-aminoundecyl, 3-aminopropyl, 3-(-aminopropoxy)-3,3-dimethyl-1-propenyl, 6-(aminohexyl)propyl, N-(2-aminoethyl)-3-aminopropyl, --(CH.sub.2)3--NH--(CH.sub.2).sub.2 --NH--(CH.sub.2 .paren close-st..sub.3, Gly-Arg-Gly-Asp-Tyr-, and Gly-Tyr-Ile-Gly-Ser-Arg-Tyr, and wherein said cell adhesion inhibitor contains a fluorinated alkyl group.
- 12. The implant of claim 11, further comprising:
- (iii) treating the irradiated film with a second compound to bind to said surface region in which at least a fraction of said promoter or inhibitor has been removed.
- 13. The implant of claim 11, wherein said ultra-thin film is coated on a substrate selected from the group consisting of silica, silicon, germanium, gallium, arsenide, epoxy resin, polystyrene, polysulfone, aluminum, platinum, alumina, silicone, fluoropolymers, polyesters, acrylic copolymers, polyglactin, and polylactates.
- 14. The implant of claim 11, wherein said cell adhesion promoter contains a --NHCH.sub.2 CH.sub.2 NHCH.sub.2 CH.sub.2 NH.sub.2 group or a --NHCH.sub.2 CH.sub.2 NH.sub.2 group.
- 15. The implant of claim 11, wherein said first compound is (a) cell adhesion promoter compound selected from the group consisting of N-(2-aminoethyl-3-aminopropyl) trimethoxysilane, 11-aminoundecyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-aminopropylmethyldiethoxysilane, 3-aminopropyldimethylethoxysilane, 3-(1-aminopropoxy)-3,3-dimethyl-1-propenyltrimethoxysilane, 6-(aminohexylaminopropyl)trimethoxysilane, N-(2-aminoethyl)-3-aminopropylmethyldimethoxysilane, bis 3-(trimethoxysilyl)propyl!ethylenediamine, trimethoxysilylpropyldiethylenetriamine, (aminoethylaminomethyl)phenethyltrimethoxysilane, isopropyltri-(n-ethylenediamino)ethyltitanate, neopentyl(diallyl)oxytri(n-ethylenediamino)ethyltitanate, neopentyl(diallyl)oxytri(amino)phenyltitanate, neopentyl(diallyl)oxytri(n-ethylenediamino)ethylzirconate, and neopentyl(diallyl)oxytri(m-amino)phenylzirconate; or
- (b) a cell adhesion inhibitor compound selected from the group consisting of tridecafluoro-1,1,2,2-tetrahydrooctyl)-1-dimethylchlorosilane, tridecafluoro-1,1,2,2-tetrahydrooctyl)-1-trichlorosilane, tridecafluoro-1,2,2,2-tetrahydrooctyl)-1-methyldichlorosilane, tridecafluoro-1,1,2,2-tetrahydrooctyl)-1-triethoxysilane, (3,3,3-trifluoropropyl)trichlorosilane, (3,3,3-trifluoropropyl)methyldichlorosilane, (3,3,3-trifluoropropyl)-dimethylchlorosilane, (3,3,3-trifluoropropyl)methyldimethoxysilane, (3,3,3-trifluoropropyl)trimethoxysilane, (heptafluoroisopropoxy) propylmethyldichlorosilane, and (3-pentafluorophenylpropyl) dimethylchlorosilane.
- 16. The implant of claim 11, which is in the form of a tube, wherein the inner surface of said tube is said patterned surface.
- 17. The implant of claim 11, which is in the form of a rolled sheet, wherein at least one side of said sheet is said patterned surface.
- 18. The implant of claim 11, which is in the form of a transducer.
- 19. A method for culturing cells, comprising plating cells on a patterned surface for the selective adhesion and outgrowth of cells, wherein said patterned surface is prepared by a process comprising:
- (i) coating a substrate with a first compound to obtain an ultra-thin film which is reactive to radiation and has an exposed surface of at least one cell adhesion promoter or cell adhesion inhibitor; and
- (ii) irradiating said ultra-thin film in a pattern to obtain an irradiated film with a surface region in which at least a fraction of said promoter or inhibitor has been removed,
- wherein said cell adhesion promoter contains a group selected from the group consisting of --NHCH.sub.2 CH.sub.2 NHCH.sub.2 CH.sub.2 NH.sub.2, --NHCH.sub.2 CH.sub.2 NH.sub.2, 11-aminoundecyl, 3-aminopropyl, 3-(-aminopropoxy)-3,3-dimethyl-1-propenyl, 6-(aminohexyl)propyl, N-(2-aminoethyl)-3-aminopropyl, --(CH.sub.2).sub.3 --NH--(CH.sub.2).sub.2 --NH--(CH.sub.2 .paren close-st..sub.3, Gly-Arg-Gly-Asp-Tyr-, and Gly-Tyr-Ile-Gly-Ser-Arg-Tyr, and wherein said cell adhesion inhibitor contains a fluorinated alkyl group.
- 20. The method of claim 19 wherein said process for preparing said patterned surface further comprises:
- (iii) treating the irradiated film with a second compound to bind to said surface region in which at least a fraction of said promoter or inhibitor has been removed.
- 21. The method of claim 19, wherein said ultra-thin film is coated on a substrate selected from the group consisting of silica, silicon, germanium, gallium, arsenide, epoxy resin, polystyrene, polysulfone, aluminum, platinum, alumina, silicone, fluoropolymers, polyesters, acrylic copolymers, polyglactin, and polylactates.
- 22. The method of claim 19, wherein said cell adhesion promoter contains a --NHCH.sub.2 CH.sub.2 NHCH.sub.2 CH.sub.2 NH.sub.2 group or a --NHCH.sub.2 CH.sub.2 NH.sub.2 group.
- 23. The method of claim 19, wherein said first compound is (a) a cell adhesion promoter compound selected from the group consisting of N-(2-aminoethyl-3-aminopropyl) trimethoxysilane, 11-aminoundecyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-aminopropylmethyldiethoxysilane, 3-aminopropyldimethylethoxysilane, 3-(1-aminopropoxy)-3,3-dimethyl-1-propenyltrimethoxysilane, 6-(aminohexylaminopropyl)trimethoxysilane, N-(2-aminoethyl)-3-aminopropylmethyldimethoxysilane, bis 3-(trimethoxysilyl)propyl!ethylenediamine, trimethoxysilylpropyldiethylenetriamine, (aminoethylaminomethyl)phenethyltrimethoxysilane, isopropyltri-(n-ethylenediamino)ethyltitanate, neopentyl(diallyl)oxytri(n-ethylenediamino)ethyltitanate, neopentyl(diallyl)oxytri(amino)phenyltitanate, neopentyl(diallyl)oxytri(n-ethylenediamino)ethylzirconate, and neopentyl(diallyl)oxytri(m-amino)phenylzirconate; or
- (b) a cell adhesion inhibitor compound selected from the group consisting of tridecafluoro-1,1,2,2-tetrahydrooctyl)-1-dimethylchlorosilane, tridecafluoro-1,1,2,2-tetrahydrooctyl)-1-trichlorosilane, tridecafluoro-1,1,2,2-tetrahydrooctyl)-1-methyldichlorosilane, tridecafluoro-1,1,2,2-tetrahydrooctyl)-1-triethoxysilane, (3,3,3-trifluoropropyl)trichlorosilane, (3,3,3-trifluoropropyl)methyldichlorosilane, (3,3,3-trifluoropropyl)-dimethylchlorosilane, (3,3,3-trifluoropropyl)methyldimethoxysilane, (3,3,3-trifluoropropyl)trimethoxysilane, (heptafluoroisopropoxy) propylmethyldichlorosilane, and (3-pentafluorophenylpropyl) dimethylchlorosilane.
Parent Case Info
This is a division of application Ser. No. 07/598,194, filed on Oct. 16, 1990, now Pat. No. 5,329,591, which is a Continuation-In-Part of application Ser. No. 07/182,123, now U.S. Pat. No. 5,079,600, filed on Apr. 14, 1988, which is a Continuation-In-Part of application Ser. No. 07/022,439, filed on Mar. 6, 1987, and now Pat. No. 5,077,085.
U.S. GOVERNMENT RIGHTS IN THE INVENTION
This invention was made jointly by two employees of the Naval Research Laboratory, Washington, D.C. and one employee of Geo-Centers, Inc. The one Geo-Centers employee, at the time the invention was made, was in the performance of work under Naval Research Laboratory contract N00014-86-C-2540. The United States of America has certain rights in the invention arising out of that contract, including a nonexclusive, nontransferable, irrevocable, paid-up license to practice the invention or have it practiced for or on behalf of the United States throughout the world. The United States of America may also have rights in the invention derived from the two employees of the Naval Research Laboratory who are joint inventors of this invention.
US Referenced Citations (6)
Divisions (1)
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598194 |
Oct 1990 |
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Continuation in Parts (2)
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182123 |
Apr 1988 |
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22439 |
Mar 1987 |
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