Patent Application
20200035444
This application claims priority under 35 U.S.C. § 119 to German Application No. 10 2018 212 511.2, filed Jul. 26, 2018. The contents of this application are hereby incorporated by reference in its entirety.
The disclosure relates to devices and methods for preparing microscopic samples, such as TEM lamellae, for example, which are intended to be examined in a microscope.
Normally a microscope system is used to produce a microscopic sample. In the case of microscope systems which operate with a beam of charged particles, such as, for example, electron microscopes, ion beam microscopes, two- or multi-beam apparatuses, the microscopic sample to be prepared is usually held on a movable sample stage.
A two-beam apparatus is a combination apparatus including both an electron beam column and an ion beam column (focused ion beam, FIB). Two-beam apparatuses are often used to observe samples with the aid of the electron beam column and to process these with the aid of the ion beam column. By way of example, a cross section can be produced or a TEM lamella can be prepared in a two-beam apparatus.
For the preparation and/or observation of the microscopic sample, the sample—depending on the process step—is held in different positions, that is to say spatial locations and spatial orientations, relative to the optical axes of the particle beam columns. Often the sample is rotated and/or to tilted.
The movements of the sample can be realized using a five-axis stage, so that the sample can be moved in a targeted manner in the spatial directions X and Y, and also in the spatial direction Z, such that the distance between the sample and the objective lens of the particle beam apparatus can also be varied. Moreover, a five-axis stage has two rotation axes, wherein a first rotation axis usually extends parallel to the Z-axis, while a further rotation axis (tilt axis) is oriented orthogonally to the first rotation axis. A five-axis stage is generally configured such that eucentric tilting of the sample is possible.
A five-axis stage usually includes translational and rotational movement elements arranged successively in an open kinematic chain.
However, the possibilities for movement of a sample held on a sample stage are generally to limited. Owing to the geometric conditions, the possibility for movement of the second rotation axis (tilt axis), in particular, is insufficient for certain preparation and examination methods.
Therefore, further degrees of freedom of movement may be desired—depending on the embodiment of the microscope system used.
In order to make these degrees of freedom available, an additional stage (so-called substage) can be mounted onto the sample stage. It is also conceivable to use a micromanipulator that provides an additional degree of freedom of movement.
It is known that a sample stage can include an additional stage and a rotation unit, such that the sample can be rotated about an axis, wherein the additional rotation axis is oriented perpendicularly to the Z-axis of the stage.
Moreover, various attachment devices have been described which can be mounted onto a sample stage in order to enable an additional rotational movement of the sample.
Furthermore, methods are known in which a micromanipulator has a rotation axis, such that a sample secured to the micromanipulator can be moved by rotation about this axis.
Examples of references are DE 102007026847 (Schertel & Zeile), U.S. Pat. No. 7,474,419 B2 (Tappel et al.), and U.S. Pat. No. 8,642,958 B2 (Takahashi et al.)
The present disclosure proposes a receptacle device for samples and a sample holder system with which an additional degree of freedom of movement is provided for a received sample.
Moreover, the present disclosure proposes methods which facilitate the sample preparation since the receptacle device according to the disclosure makes available an additional degree of freedom of movement.
In an aspect, the disclosure provides a receptacle device for receiving and preparing a microscopic sample. The receptacle device is mountable onto a sample stage. The sample stage is arranged in a sample chamber of a microscope system and is movable by way of an open kinematic chain of rotational or rotational and translational elements. The last rotational element of the open kinematic chain is arranged such that it is rotatable about an axis R1. The receptacle device has an axis R2, about which the receptacle device is arranged such that it is rotatable. The axis R2 is arranged at an angle α relative to the axis R1, and the angle α assumes a value in the range of 10° to 80°. The receptacle device can adopt at least a first position and a second position. The receptacle device is transferrable from one position into another position by rotation about the axis R2.
In an aspect, the disclosure provides a sample holder system for preparing a microscopic sample. The sample holder system includes a receptacle device for receiving a sample block from which a microscopic sample is intended to be extracted. The sample holder also includes a receptacle device for receiving an extracted sample as disclosed herein.
In an aspect, the disclosure provides a method for preparing a microscopic sample with the aid of a multi-beam apparatus which includes an electron beam column for generating an electron beam and an ion beam column for generating a focused ion beam. The electron beam column and the ion beam column each have an optical axis. The method includes providing a first receptacle device for receiving a microscopic sample. The first receptacle device is mountable onto a sample stage of the multi-beam apparatus, and the sample stage is arranged in a sample chamber of the multi-beam apparatus and is movable by way of an open kinematic chain of rotational or rotational and translational elements. The last rotational element of the open kinematic chain is arranged such that it is rotatable about an axis R1. The first receptacle device has an axis R2, about which the first receptacle device is arranged such that it is rotatable. The axis R2 is arranged at an angle α relative to the axis R1 and the angle α assumes a value in the range of 10° to 80°. The receptacle device can adopt at least a first position and a second position, which are different from one another. The receptacle device is transferrable from one position into another position by rotation about the axis R2. The method also includes receiving a microscopic sample into the first receptacle device, and holding the first receptacle device in the first position, such that the sample is held in a first spatial orientation relative to the optical axes of the multi-beam apparatus. The method further includes imaging the surface to be processed of the microscopic sample with the aid of the electron beam. In addition, the method includes rotating the first receptacle device about the axis R2 until the first receptacle device adopts the second position, such that the microscopic sample adopts a second spatial orientation relative to the optical axes of the multi-beam apparatus. The second spatial orientation is different from the first spatial orientation. Further, the method includes processing the microscopic sample using the focused ion beam.
In an aspect, the disclosure provides a method for preparing a microscopic sample via back side thinning, with the aid of a multi-beam apparatus and a receptacle device. The multi-beam apparatus includes an electron beam column for generating an electron beam and an ion beam column for generating a focused ion beam. The electron beam column and the ion beam column each have an optical axis. The receptacle device is mountable onto a sample stage of the multi-beam apparatus. The sample stage is arranged in a sample chamber of the multi-beam apparatus and is movable by way of an open kinematic chain of rotational or rotational and translational elements. The last rotational element of the open kinematic chain is arranged such that it is rotatable about an axis R1. The receptacle device has an axis R2, about which receptacle device is arranged such that it is rotatable. The axis R2 is arranged at an angle α relative to the axis R1 and the angle α assumes a value in the range of 10° to 80°. The receptacle device can adopt at least a first position and a second position, which are different from one another. The receptacle device is transferrable from one position into another position by rotation about the axis R2. The method includes providing a microscopic sample that has already been thinned by processing using the ion beam, such that the sample has a side that faced the ion beam during the this first processing phase. The method also includes first rotating of the sample about a rotation axis, such that the sample adopts a first spatial orientation relative to the optical axes of the multi-beam apparatus, and transferring the sample to the receptacle device. The method further includes second rotating of the sample relative to the optical axes by the receptacle device being rotated about the axis R2, such that the sample adopts a second spatial orientation relative to the optical axes so that the side of the sample that faced the ion beam during the first processing phase now faces away from the ion beam. In addition, the method includes processing the sample using the ion beam.
In an aspect, the disclosure provides a computer program which includes a sequence of control commands that causes a microscope system to carry out a method as disclosed herein.
The disclosure is based on the insight that it is particularly advantageous if the sample to be prepared is held in a receptacle device that is arranged such that it is rotatable about a rotation axis R2. In this case, the receptacle device is arranged on a movable sample stage, and the rotation axis R2 is oriented at an angle of approximately 45° relative to the rotation axis R1 of the sample stage. It is also conceivable for the angle between the two rotation axes mentioned to adopt a different value between 0° and 90°, in particular between 10° and 80°. At all events an additional degree of freedom of movement is made available, such that the sample can be rotated by 90° in space, without further aids such as e.g. a micromanipulator having to be used.
Exemplary embodiments of the disclosure are described below with reference to figures. Therefore, in order to explain the components, reference is also made to the respectively preceding and subsequent description in its entirety.
An image of the sample 3 can be generated with the aid of an electron beam column 1 and a suitable detector 12. The electron beam column 1 has an optical axis 2. Moreover, the sample 3 can be processed with the aid of an ion beam generated in an ion beam column 8. The ion beam column 8 has an optical axis 9 oriented at an angle β, which can be 54°, for example, relative to the optical axis 2 of the electron beam column.
The receptacle device 5 is included by a sample holder 7, which is in turn mounted on a movable sample stage 6. Alternatively, it is also conceivable for the receptacle device to be mounted directly on the sample stage. The movable sample stage 6 has at least one rotation axis R1, about which the sample stage 6 is arranged such that it is rotatable.
It is particularly advantageous if the sample stage 6 has a plurality of translational and rotational degrees of freedom of movement. This is the case, for example, if the sample stage 6 is embodied as a five-axis stage including the translational axes X, Y and Z and the rotation axes R1 and T (tilt axis). In this case, the translation axes mentioned are oriented in each case perpendicularly to one another. The rotation axes are generally likewise oriented perpendicularly to one another.
A sample to be examined can thus be moved in the three spatial directions X, Y and Z by a five-axis stage in order to change the spatial location of the sample. The spatial location is understood to mean the positioning of the sample in three-dimensional space. The exact spatial location of the sample can be described by the indication of X-, Y- and Z-coordinates.
Moreover, the spatial orientation, i.e. the orientation of the sample relative to the optical axis/axes of the microscope system, can be altered by the sample being rotated and/or tilted via the rotation axes. In this case, it is particularly advantageous if the sample stage is embodied as a eucentric sample stage. That means that a sample which is held by the sample stage and which is arranged at the eucentric point can be tilted, without its moving laterally in the process. It is also conceivable for the sample stage to be embodied as a six-axis stage, that is to say as a five-axis stage (so-called super-eucentric stage) having an additional axis, the so-called M-axis.
In general, the movement of the sample stage is realized by translational (Z, M, X, Y) and rotational movement elements (T, R) being arranged successively in an open kinematic chain, such that the movement elements can be moved and/or oriented relative to one another. The axes can be arranged for example in the order Z-T-M-X-Y-R or Z-T-X-Y-M-R, wherein the sample to be examined is connected in each case to the last element of the chain. This is also referred to as stacking of the movement axes (axis stacking).
The arrangement in an open kinematic chain means that a movement element carries out in each case not only the movement realized by it, but also passively the movements of those other movement elements which are arranged upstream of the movement element in the chain. That is to say, therefore, that the movement of the first movement element in the chain, for example Z, concomitantly moves all other axes disposed downstream (in this example: in the Z-direction).
On the other hand, a movement element arranged last in the open kinematic chain has no further controllable degrees of freedom of movement. That is to say, therefore, that the last movement element can actively carry out only the movement assigned to it.
In the case of the embodiment shown in
In order to open up a further possibility for moving the sample 3, the receptacle device 5 has a rotation axis R2, about which the receptacle device 5 is arranged such that it is rotatable. This is particularly advantageous in order to vary the spatial orientation of the sample. The axis R2 is arranged at an angle α relative to the axis R1. The angle α can assume a value of 0° to 90°. It is advantageous if the angle α assumes a value of approximately 10° to 80°, in particular 40° to 60° or 20° to 30°. It can be particularly advantageous if the angle α is substantially 45°.
Optionally, the sample holder 7 additionally includes a further receptacle device 10, onto which a sample block 11 can be received. A microscopic sample can be freely prepared and extracted from the sample block (bulk sample) 11. The freely prepared sample 3 can be transferred and received into the receptacle device 5, where it can then be subjected to further preparation steps such as thinning and polishing. The transfer of the extracted sample from the sample block 11 to the receptacle device 5 can be carried out in situ, that is to say without the sample needing to be removed from the sample chamber or the vacuum in the sample chamber needing to be breached.
The sample can be a TEM lamella 20, for example, as illustrated in
The parallelepipedal sample 20 has the edges a, b and c. Firstly, the receptacle device 21 is situated in a first position (
As a result of the rotational movement about the axis R2, the receptacle device 21 is moved into the second position (
The sample holder system 33 is mounted onto a movable sample stage 37 and arranged in the sample chamber 31 of a microscope system. The sample chamber 31 is delimited by a chamber wall 38 and is embodied in such a way that vacuum conditions can be maintained in the sample chamber 31.
The receptacle device 34 includes an activatable switching element 35. By activation of the switching element 35, the rotational movement of the receptacle device 34 about the axis R2 (illustrated in plan view in
It is advantageous, moreover, if the first position is a position in which the sample is oriented such that, for example, the focused ion beam impinges on the sample more or less perpendicularly. The second position can be chosen such that the sample is held in a position such that the ion beam impinges on the sample with grazing incidence, such that thinning or polishing can be effected.
It is particularly advantageous, in addition, if the receptacle device is embodied in a eucentric fashion. For this purpose, the geometry of the receptacle device is chosen such that the upper edge of the receptacle device 34 substantially lies in the sample plane of the sample stage equipped with a eucentric tilting possibility. The receptacle device then likewise enables a eucentric tilting, that is to say that a received sample can be tilted eucentrically.
Moreover, the receptacle device should be embodied to be as flat as possible, i.e. with the smallest possible extent in the Z-direction. As a result, the receptacle device can be tilted through a large tilt angle. This has the advantage that, in a specific embodiment of a two-beam apparatus in which the angle β between the particle beam columns is 54° (cf.
In one advantageous configuration, the microscope system includes an activation element 36, by which the switching element 35 can be activated in order to initiate the rotational movement of the receptacle device 34. The activation element 36 can be arranged for example at a movement element of an upstream axis of the sample stage 37. However, it is also conceivable for the activation element 36 to be arranged at the chamber wall 38.
The activation can be realized by the switching element 35 and the activation element 36 being moved relative to one another. By way of example, the sample stage 37 together with the receptacle device 34 can be moved such that switching element 35 and activation element 36 touch one another or come into contact in some other way. This has the advantage that no drive device need be provided in the receptacle device itself.
However, it is also conceivable that the receptacle device can be rotated by way of one or more actuators. It is conceivable for electric or piezo drives to be used for this purpose, for example.
It is particularly advantageous if the sample holder system 33 is embodied such that it is transferrable via a lock 39 of the microscope system. The sample holder system 33 can be introduced into the sample chamber 31 of the microscope system from outside the microscope system via a lock chamber 30 of the lock 39. This is particularly advantageous if the microscope system is embodied as a particle beam apparatus in which a sample has to be examined and processed under vacuum conditions. As a result of the lockability of the sample holder system 33 according to the disclosure, when changing the sample it is not necessary to breach the vacuum in the sample chamber 31, with the result that changing the sample is significantly accelerated.
The axes R2 and R1 form an angle α with respect to one another. The angle α can assume a value of 0° to 90°. It is advantageous if the angle α assumes a value of approximately 10° to 80°, in particular 40° to 60° or 20° to 30°. It is particularly advantageous if the angle α is substantially 45°.
The subsequent step involves receiving a sample to be processed into the receptacle device (step S42). The sample can be for example a vertical TEM lamella (cross section, cross-sectional lamella) or a horizontal TEM lamella (plane view, planar lamella). The receptacle device is situated in a sample chamber of a microscope system with which the microscopic sample is intended to be prepared. This can be for example an SEM-FIB combination apparatus including an electron beam column and an ion beam column, which each have an optical axis.
Firstly, the receptacle device is held in a first position (step S43). In this case, the sample adopts a first spatial orientation relative to the optical axes of the microscope system. It is particularly advantageous if the sample is oriented in space such that a particle beam generated in one of the particle beam columns of the combination apparatus impinges on the sample substantially perpendicularly.
Step S44 involves processing the sample using the ion beam. However, it is also conceivable for an image of the sample to be generated in step S44, for example by a particle beam being directed onto the sample and interacting with the sample material. The interaction products that arise, such as backscattered electrons or secondary electrons, for example, can then be detected with the aid of a detector and used for image generation.
In the next step S45, the receptacle device is rotated about the axis R2. As a result, the sample is moved such that it adopts a second spatial orientation relative to the optical axes of the microscope system, the second spatial orientation being different from the first spatial orientation. The receptacle device remains in the second position, such that the sample is held in the second spatial orientation (step S46).
Optionally, in step S47, the orientation of the sample can be altered by the sample stage being moved. In this regard, by way of example, the sample can be oriented in space such that the ion beam of the two-beam apparatus impinges on the sample with grazing incidence in order to be able to process the side surfaces of the TEM lamella.
In step S48, an image of the sample is generated or the sample is processed, for example by thinning using a focused ion beam.
In one particular configuration of the preparation method, the sample to be processed, which is provided in step S42, is prepared and extracted in situ from a sample block (bulk sample). For this purpose, a sample holder system is provided which includes, besides the first receptacle device, a second receptacle device for receiving a sample block (original sample), as illustrated in
For this purpose, in step S401, a sample block from which the sample is intended to be extracted is received into the second receptacle device.
A sample region including a region of interest (ROI) is then exposed for example using a focused ion beam (step S402). For this purpose, the sample region can be covered with a protective layer of platinum or carbon. The exposed sample region is secured to a micromanipulator tip. This can be done by welding with the aid of the ion beam. In step S403, the exposed sample region that is intended thereafter to be processed and examined as the sample is then separated and removed from the sample block (so-called lift-out).
In step S404, the extracted sample is finally transferred to the first receptacle device with the aid of a micromanipulator, such that the method can subsequently be carried out with steps S42 to S48.
One advantage in the case of this embodiment of the method is that both lift-out and the further preparation and examination of the sample can be carried out in situ, i.e. within the sample chamber of the microscope system.
A further particular embodiment of the method according to the disclosure relates to so-called back side thinning, which is important for processing with grazing incidence of the particle beam. This embodiment is illustrated schematically in
Firstly, a sample 60 is prepared from a sample block with the aid of the focused ion beam and is thinned in a first processing phase. Usually, for this purpose, firstly a protective layer is applied to the sample surface in a targeted manner, such that the region of interest (ROI) is maintained in the sample. For thinning purposes, the sample is processed using an ion beam. In this case, the ion beam impinges on a first side 62 (front side) of the sample, facing the incident ion beam. The sample additionally has a second side 66 (back side), facing away from the ion beam. Undesired curtaining effects can occur in the region of the second side 66 (back side) of the sample.
After thinning, the sample is extracted from the sample block (lift-out). A micromanipulator is usually used for this purpose, the exposed sample being transferred to the needle tip of the micromanipulator. Step S50 thus involves providing a freely prepared, prethinned sample held by a micromanipulator tip 61.
Then (step S52) the sample is transferred to a receptacle device according to the disclosure, which is situated in the sample chamber of a microscope system, for example an SEM-FIB combination apparatus. The receptacle device is included by a movable sample stage, which can be moved via rotational or translational and rotational movement elements. The movement elements of the sample stage are arranged serially one after another, such that they form an open kinematic chain. The rotation axis R1 of the sample stage is the last rotational movement element in the open kinematic chain, such that the rotation axis R1 has no further controllable degrees of freedom of movement.
The receptacle device has an axis R2 arranged at the angle α relative to a rotation axis R1 of the sample stage. In this case, it is particularly advantageous if the axes R1 and R2 form an angle α of substantially 45° with respect to one another (α=) 45°.
However, it is also conceivable for the angle α to adopt some other value between 0° and 90°.
As illustrated in
Then (step S53) the receptacle device is transferred into a second position by the receptacle device being rotated about the axis R2. The sample 60 then adopts a second spatial orientation relative to the optical axis 67, the second spatial orientation being different from the first spatial orientation (
In the subsequent step (step S54)—as illustrated in
In an alternative embodiment of the method (alternative A1), steps S52, S53 and S54 (identified as alternative A in
Independently of whether alternative A or A1 was implemented, step S55 involves providing a receptacle device according to the disclosure, which is situated in the first position.
Step S56 involves transferring the sample to the receptacle device 64 (
Finally, the receptacle device is transferred into the second position (step S57), such that the sample adopts a different spatial orientation relative to the optical axes 67 of the microscope system, as shown in
Finally, in step S58, the sample is processed using a particle beam, which can be a focused ion beam, for example. This is illustrated in
In a further alternative embodiment of the method (alternative B1), steps S55, S56 and S57 (identified as B in
Since attaching the sample to the micromanipulator tip constitutes a relatively important step, it is particularly advantageous if, in one specific method configuration, the alternatives A1 and B1 from
Step S1000 involves providing a freely prepared, wedge-shaped sample held by a micromanipulator tip. In order to produce a horizontal lamella, firstly a wedge-shaped sample piece is exposed from a sample block with the aid of the focused ion beam. In general, for this purpose, a protective layer is applied to the sample surface, such that the region of interest (ROI) in the sample is protected. The wedge-shaped sample is extracted from the sample block and transferred to a needle tip of a micromanipulator. The sample wedge can be secured to the needle tip e.g. via ion beam deposition.
Then (step S1001) the sample is transferred to a receptacle device according to the disclosure, which is arranged in a sample chamber of a microscope system. The receptacle device is situated on a movable sample stage, as described for
The receptacle device adopts a first position relative to the optical axes of the microscope system, such that the sample is held in a first spatial orientation relative to the optical axes of the microscope system. The sample is advantageously oriented in space such that a particle beam can impinge on the sample perpendicularly and the sample can be processed or observed.
Then (step S1002) the receptacle device is transferred into a second position by the receptacle device being rotated about the axis R1. The sample then adopts a second spatial orientation relative to the optical axis. By way of example, in the second spatial orientation, the particle beam can impinge on the sample with grazing incidence. That can mean, for example, that the sample has been rotated by 90° in comparison with the first spatial orientation.
Step 1003 involves processing the sample using a particle beam, which can be a focused ion beam, for example, wherein the final lamella shape can be worked therefrom.
Firstly, a TEM lamella 71 to be examined is received into a receptacle device 72 (
The receptacle device is situated in a first position, in which the TEM lamella 71 is held such that it can be processed, for example thinned and polished (
The receptacle device 72 is then rotated about the axis R2 (
A STEM detector 74 can then be positioned below the TEM lamella in order to radiate an electron beam 77 through the TEM lamella in order to carry out STEM examinations (
During operation, ions are generated in an ion source 81, the ions being accelerated and focused along the optical axis 83 of the ion beam column 82, with the result that the ions impinge on the sample 89 in a focused manner. The particle beam apparatus includes at least one detector 87 for detecting interaction products of the interaction of ion beam and sample material, such that an image of the sample can be generated. Moreover, the sample 89 can be processed, e.g. thinned or polished, with the aid of the focused ion beam.
The microscope system advantageously includes a movable sample stage 91, onto which the receptacle device 90 can be received directly or indirectly. The sample stage 91 is advantageously embodied as a eucentric five-axis stage. That means that the sample can be moved in the X-, Y- and Z-directions—that is to say in three mutually perpendicular spatial directions—and can be rotated about a tilt axis and a rotation axis.
Vacuum conditions usually prevail in the sample chamber 84 during operation. Therefore, it is particularly advantageous if the microscope system has a lock device 92, via which the receptacle device 90 loaded with a sample 89 can be introduced and discharged, without the vacuum of the sample chamber needing to be breached in the process.
Moreover, the microscope system has a control device 88, into which can be loaded a computer program which has the effect that the microscope system carries out one of the methods described.
It is also conceivable for the microscope system to be embodied as a scanning electron microscope. In contrast to the FIB system described above, the scanning electron microscope has an electron beam column for generating an electron beam instead of an ion beam column.
During operation, primary electrons are generated in an electron source (cathode), the primary electrons being accelerated along the optical axis of the electron beam column, focused by condenser lens systems and trimmed by at least one aperture stop. Moreover, the electron beam column includes a deflection system, by which the primary electron beam is guided over the surface of the sample in a raster-type fashion. The scanning electron microscope includes at least one detector for detecting interaction products of the interaction of particle beam and sample.
It is also conceivable for the microscope system—as illustrated in
The electron beam column 901 and the ion beam column 920 generally adopt a fixed angle β with respect to one another, which is usually between 20° and 60°, for example 54°. However, two-beam apparatuses are also known in which the two columns are arranged orthogonally with respect to one another, such that the angle β is 90°.
Both particle beams that can be generated via the two-beam apparatus are directed onto the processing site on the sample 911, which is usually situated at the coincidence point of both particle beams. The sample 911 to be examined is received into a receptacle device 914. The receptacle device 914 is received onto a movable sample stage 912 directly or by way of a sample holder system 113, the sample stage being situated in an evacuatable sample chamber 908. Moreover, the two-beam apparatus 900 has at least one detector 909 for detecting interaction products. Furthermore, the two-beam apparatus 900 has a control device 910. It is particularly advantageous if the two-beam apparatus 900 additionally includes a lock device 915 for introducing and discharging the receptacle device loaded with the sample, or the sample holder system.
What all the microscope systems described have in common is that they have a control device 88, 910. The control device 88, 910 can carry out a sequence of control commands encompassed in a computer program. As a result of the command sequence being carried out, the respective microscope system 80, 900 is caused to carry out one of the methods according to the disclosure for sample preparation.
The preparation method according to the disclosure is not restricted to the exemplary microscope systems shown. It is likewise conceivable to use the method according to the disclosure when observing and/or processing samples that are intended to be examined using light microscopes, laser microscopes or x-ray microscopes.
| Number | Date | Country | Kind |
|---|---|---|---|
| 102018212511.2 | Jul 2018 | DE | national |
