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H01J2237/20214

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Parent Industries

HELECTRICITY H01Electric elements H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS H01J2237/00Discharge tubes exposing object to beam

Current Industry

H01J2237/20214Rotation

Industries

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Patents Grantslast 30 patents

Information Patent Grant
Workpiece processing apparatus with thermal processing systems
- Patent number 12,183,558
- Issue date Dec 31, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dixit Desai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning ion beam deposition and etch
- Patent number 12,176,178
- Issue date Dec 24, 2024
- Plasma-Therm NES LLC
- Sarpangala Hariharakeshava Hegde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating apparatus and coating method
- Patent number 12,170,189
- Issue date Dec 17, 2024
- Jiangsu Favored Nanotechnology Co., LTD
- Jian Zong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface processing equipment and surface processing method
- Patent number 12,154,768
- Issue date Nov 26, 2024
- Industrial Technology Research Institute
- Chih-Chieh Chen
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
PECVD apparatus
- Patent number 12,112,928
- Issue date Oct 8, 2024
- GUANGZHOU AIFO LIGHT COMMUNICATION TECHNOLOGY COMPANY LTD.
- Guoqiang Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rotating substrate support
- Patent number 12,106,944
- Issue date Oct 1, 2024
- ASM IP Holding B.V.
- Yukihiro Mori
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and methods for beam processing of substrates
- Patent number 12,105,423
- Issue date Oct 1, 2024
- Tokyo Electron Limited
- Mirko Vukovic
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing device and substrate processing method
- Patent number 12,106,941
- Issue date Oct 1, 2024
- Jusung Engineering Co., Ltd.
- Chul-Joo Hwang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 12,087,556
- Issue date Sep 10, 2024
- Kioxia Corporation
- Yosuke Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Movement systems for sputter coating of non-flat substrates
- Patent number 12,080,527
- Issue date Sep 3, 2024
- SOLERAS ADVANCED COATINGS BV
- Wilmert De Bosscher
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Rotating sample holder for random angle sampling in tomography
- Patent number 12,074,007
- Issue date Aug 27, 2024
- FEI Company
- Bart Jozef Janssen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition system with integrated cooling on a rotating drum
- Patent number 12,057,297
- Issue date Aug 6, 2024
- Richard DeVito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 12,051,566
- Issue date Jul 30, 2024
- Tokyo Electron Limited
- Hitoshi Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Nitriding apparatus and nitriding method
- Patent number 12,033,836
- Issue date Jul 9, 2024
- Kobe Steel, Ltd.
- Maiko Abe
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor device using plasma-enhanced...
- Patent number 12,027,364
- Issue date Jul 2, 2024
- Taiwan Carbon Nano Technology Corporation
- Tsung-Fu Yen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spinning disk with electrostatic clamped platens for ion implantation
- Patent number 12,002,649
- Issue date Jun 4, 2024
- Applied Materials, Inc.
- Robert Mitchell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sample mount for electron backscatter diffraction
- Patent number 11,996,264
- Issue date May 28, 2024
- Honeywell Federal Manufacturing & Technologies, LLC
- David M. Wieliczka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Specimen machining device and specimen machining method
- Patent number 11,990,312
- Issue date May 21, 2024
- Jeol Ltd.
- Shogo Kataoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,986,867
- Issue date May 21, 2024
- SCREEN Holdings Co., Ltd.
- Akira Horikoshi
- B08 - CLEANING
Information Patent Grant
Wafer positioning method and apparatus
- Patent number 11,978,677
- Issue date May 7, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Temperature measurement system, temperature measurement method, and...
- Patent number 11,972,921
- Issue date Apr 30, 2024
- Tokyo Electron Limited
- Takeshi Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Replaceable module for a charged particle apparatus
- Patent number 11,961,698
- Issue date Apr 16, 2024
- ASML Netherlands B.V.
- Christiaan Otten
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grid structures of ion beam etching (IBE) systems
- Patent number 11,961,706
- Issue date Apr 16, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chansyun David Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 11,961,710
- Issue date Apr 16, 2024
- Canon Anelva Corporation
- Tadashi Inoue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, substrate retainer and method of ma...
- Patent number 11,961,715
- Issue date Apr 16, 2024
- Kokusai Electric Corporation
- Daisuke Hara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Workpiece processing apparatus with plasma and thermal processing s...
- Patent number 11,955,315
- Issue date Apr 9, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dieter Hezler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,955,333
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Jethro Tannos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Dynamic phased array plasma source for complete plasma coverage of...
- Patent number 11,948,783
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Hari Ponnekanti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor wafer
- Patent number 11,929,229
- Issue date Mar 12, 2024
- MI2-FACTORY GMBH
- Florian Krippendorf
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing method, plasma processing apparatus, and control...
- Patent number 11,901,158
- Issue date Feb 13, 2024
- Tokyo Electron Limited
- Takeshi Kobayashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SURFACE PROCESSING EQUIPMENT
- Publication number 20250006475
- Publication date Jan 2, 2025
- Industrial Technology Research Institute
- Chih-Chieh Chen
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
Sample Milling System and Apparatus and Method for Image Generation
- Publication number 20250006458
- Publication date Jan 2, 2025
- JEOL Ltd.
- Munehiro Kozuka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETIC ROTATION DEVICE FOR HIGH VACUUM APPLICATIONS SUCH AS ION A...
- Publication number 20240429019
- Publication date Dec 26, 2024
- SHINE Technologies, LLC
- Daniel Martin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROTATING SUBSTRATE SUPPORT
- Publication number 20240420931
- Publication date Dec 19, 2024
- ASM IP HOLDING B.V.
- Yukihiro Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES
- Publication number 20240419080
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Mirko Vukovic
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ME...
- Publication number 20240420935
- Publication date Dec 19, 2024
- Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Tsunahiko NAITO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS
- Publication number 20240404795
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Fully Integrated Microcrystal Electron Diffra...
- Publication number 20240387141
- Publication date Nov 21, 2024
- The Regents of the University of California
- Tamir Gonen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORM PLASMA PROCESSING WITH A LINEAR PLASMA SOURCE
- Publication number 20240355592
- Publication date Oct 24, 2024
- Applied Materials, Inc.
- Vladimir Nagorny
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DEVICE AND METHOD FOR PREPARING MICROSCOPIC SAMPLES VIA BACKSIDE TH...
- Publication number 20240347312
- Publication date Oct 17, 2024
- CARL ZEISS MICROSCOPY GMBH
- Heiko Stegmann
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
Sample Holder and Sample Processing Apparatus
- Publication number 20240331970
- Publication date Oct 3, 2024
- JEOL Ltd.
- Jun Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CRENELLATED SAMPLE HOLDER AND SPUTTER TARGET FOR SAMPLE PREPARATION...
- Publication number 20240331969
- Publication date Oct 3, 2024
- FEI Company
- Chad Rue
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Microscope Stage Fixture for Horizontal Rotation
- Publication number 20240321546
- Publication date Sep 26, 2024
- Gabriel Demeneghi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20240321563
- Publication date Sep 26, 2024
- SHIBAURA MECHATRONICS CORPORATION
- Shigeki MATSUNAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WAFER POSITIONING METHOD AND APPARATUS
- Publication number 20240274478
- Publication date Aug 15, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chia-Cheng Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Sample Holder and Analysis System
- Publication number 20240266141
- Publication date Aug 8, 2024
- Hitachi High-Tech Corporation
- Hiroyuki ASAKURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR DETERMINING A POSITION OF AN OBJECT IN A BEAM APPARATUS,...
- Publication number 20240258068
- Publication date Aug 1, 2024
- CARL ZEISS MICROSCOPY GMBH
- Josef Biberger
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Grid Structures Of Ion Beam Etching (IBE) Systems
- Publication number 20240222071
- Publication date Jul 4, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chansyun David YANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Workpiece Processing Apparatus with Plasma and Thermal Processing S...
- Publication number 20240212981
- Publication date Jun 27, 2024
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Dieter Hezler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING APPARATUS
- Publication number 20240209507
- Publication date Jun 27, 2024
- TOKYO ELECTRON LIMITED
- Manabu HONMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GUIDE PIN, SYSTEM FOR PRECISELY CONTROLLING SPECIMEN INCLUDING THE...
- Publication number 20240203686
- Publication date Jun 20, 2024
- Samsung Electronics Co., Ltd.
- Kilho Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND CLEANING METHOD
- Publication number 20240177978
- Publication date May 30, 2024
- TOKYO ELECTRON LIMITED
- Masato SHINADA
- B08 - CLEANING
Information Patent Application
Charged Particle Beam Apparatus
- Publication number 20240177963
- Publication date May 30, 2024
- HITACHI HIGH-TECH CORPORATION
- Yuki UCHIOKE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHODS FOR DEPOSITING MATERIAL ON A SUBSTRATE
- Publication number 20240170269
- Publication date May 23, 2024
- Applied Materials, Inc.
- Harish PENMETHSA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION METHOD AND DEPOSITION APPARATUS
- Publication number 20240170281
- Publication date May 23, 2024
- TOKYO ELECTRON LIMITED
- Yuya TAKAMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Dynamic Phased Array Plasma Source For Complete Plasma Coverage Of...
- Publication number 20240162020
- Publication date May 16, 2024
- Applied Materials, Inc.
- Hari Ponnekanti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING HIGHLY UNIFORM DIELECTRIC FILM
- Publication number 20240145217
- Publication date May 2, 2024
- Applied Materials, Inc.
- Qintao Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ROTATABLE TEM GRID HOLDER FOR IMPROVED FIB THINNING PROCESS
- Publication number 20240128046
- Publication date Apr 18, 2024
- SANDISK TECHNOLOGIES LLC
- Xiaochen Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS DESIGN FOR FILM REMOVAL FROM THE BEVEL AND EDGE OF THE SU...
- Publication number 20240128061
- Publication date Apr 18, 2024
- Applied Materials, Inc.
- FARZAD HOUSHMAND
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BACKSIDE DEPOSITION FOR WAFER BOW MANAGEMENT
- Publication number 20240096605
- Publication date Mar 21, 2024
- Applied Materials, Inc.
- Arun Kumar Kotrappa
- H01 - BASIC ELECTRIC ELEMENTS

Industry

Parent Industries

Current Industry

Patents Grantslast 30 patents

Workpiece processing apparatus with thermal processing systems

Scanning ion beam deposition and etch

Coating apparatus and coating method

Surface processing equipment and surface processing method

PECVD apparatus

Rotating substrate support

Apparatus and methods for beam processing of substrates

Substrate processing device and substrate processing method

Plasma processing apparatus and plasma processing method

Movement systems for sputter coating of non-flat substrates

Rotating sample holder for random angle sampling in tomography

Deposition system with integrated cooling on a rotating drum

Plasma processing apparatus

Nitriding apparatus and nitriding method

Method for manufacturing semiconductor device using plasma-enhanced...

Spinning disk with electrostatic clamped platens for ion implantation

Sample mount for electron backscatter diffraction

Specimen machining device and specimen machining method

Substrate processing method and substrate processing apparatus

Wafer positioning method and apparatus

Temperature measurement system, temperature measurement method, and...

Replaceable module for a charged particle apparatus

Grid structures of ion beam etching (IBE) systems

Plasma processing apparatus

Substrate processing apparatus, substrate retainer and method of ma...

Workpiece processing apparatus with plasma and thermal processing s...

Methods and apparatus for processing a substrate

Dynamic phased array plasma source for complete plasma coverage of...

Semiconductor wafer

Plasma processing method, plasma processing apparatus, and control...

Patents Applicationslast 30 patents

SURFACE PROCESSING EQUIPMENT

Sample Milling System and Apparatus and Method for Image Generation

MAGNETIC ROTATION DEVICE FOR HIGH VACUUM APPLICATIONS SUCH AS ION A...

ROTATING SUBSTRATE SUPPORT

APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND ME...

SUBSTRATE-PROCESSING METHOD AND SUBSTRATE-PROCESSING APPARATUS

System and Method for Fully Integrated Microcrystal Electron Diffra...

UNIFORM PLASMA PROCESSING WITH A LINEAR PLASMA SOURCE

DEVICE AND METHOD FOR PREPARING MICROSCOPIC SAMPLES VIA BACKSIDE TH...

Sample Holder and Sample Processing Apparatus

CRENELLATED SAMPLE HOLDER AND SPUTTER TARGET FOR SAMPLE PREPARATION...

Microscope Stage Fixture for Horizontal Rotation

FILM FORMING APPARATUS

WAFER POSITIONING METHOD AND APPARATUS

Sample Holder and Analysis System

METHOD FOR DETERMINING A POSITION OF AN OBJECT IN A BEAM APPARATUS,...

Grid Structures Of Ion Beam Etching (IBE) Systems

Workpiece Processing Apparatus with Plasma and Thermal Processing S...

FILM FORMING APPARATUS

GUIDE PIN, SYSTEM FOR PRECISELY CONTROLLING SPECIMEN INCLUDING THE...

SUBSTRATE PROCESSING APPARATUS AND CLEANING METHOD

Charged Particle Beam Apparatus

SYSTEM AND METHODS FOR DEPOSITING MATERIAL ON A SUBSTRATE

DEPOSITION METHOD AND DEPOSITION APPARATUS

Dynamic Phased Array Plasma Source For Complete Plasma Coverage Of...

METHOD FOR FORMING HIGHLY UNIFORM DIELECTRIC FILM

ROTATABLE TEM GRID HOLDER FOR IMPROVED FIB THINNING PROCESS

APPARATUS DESIGN FOR FILM REMOVAL FROM THE BEVEL AND EDGE OF THE SU...

BACKSIDE DEPOSITION FOR WAFER BOW MANAGEMENT