This application relates to the field of flexible devices, particularly but not exclusively to flexible electronic devices including flexible electronic displays. More particularly, this application relates to the structure of a layer on a flexible substrate, wherein the structure of the layer enables it to withstand higher levels of strain before fracture than conventional layers.
Flexible substrates are substrates that may be deformed whilst maintaining their functional integrity. They can, for example, be made of plastic, metal foil or very thin glass; in general they will have a low elastic modulus or be relatively thin. The development of flexible substrates allows greater freedom in the design of electronic devices, and thus enables the development of previously impracticable electronic appliances in numerous areas of technology. One example is the development of flexible electronic displays. These have numerous benefits over the rigid devices that are currently available. Curved or roll-up displays could be developed which are cheap enough to manufacture and have sufficient flexibility and durability such that they could, one day, rival paper.
A limitation to the production of flexible displays is that the flexible substrates often require coatings of more brittle materials. An example of one of these materials is the Indium Tin Oxide (ITO) electrode used in active matrix liquid crystal displays (AMLCDs). An example of the use of ITO in AMLCDs is provided in U.S. Pat. No. 5,130,829. Brittle materials, such as ITO, fracture when exposed to strains above a certain limit and thus lose functionality. Due to its brittleness, when strained, ITO is likely to crack or delaminate, having the effect of reducing its conductivity. This greatly inhibits the performance of the display.
WO-A-96/39707 describes an electrode for use on flexible substrates, which is designed to retain more of its conductivity for greater amounts of strain. To achieve this, a coating of a second more flexible conductive material is applied such that it is in contact with the relatively brittle electrode material. Accordingly, when the brittle electrode is put under strain and therefore starts to crack, electrical continuity is maintained via the second, more flexible material.
The drawback of this approach is that the second material has a much greater resistivity than the brittle electrode material. The price for increased flexibility is an increase in resistance of the electrode, and accordingly this approach is not applicable where good electrode conductivity is required, such as in electronic displays.
WO-A-02/45160 describes a flexible metal connector for providing a link between rigid substrate portions. A cross-sectional view of a flexible substrate 1 having a connector 2 with a similar structure to that described in WO-A-02/45160 is shown in
The structure of the connector 2 is such that it is able to flex in a concertina-like manner when strained and may thus withstand larger amounts of strain before fracture than conventional connectors. However, using this particular structure for brittle materials may be inappropriate because, as longitudinal strain is applied to the brittle conductor material, there would be a concentration of stress in the corners of the connector 2, for example the left-hand corner 6 of the ridge 5, causing the material to fracture.
Furthermore, a connector such as that of WO-A-02/45160, having raised bridging portions, would require several photolithographic steps for its manufacture, as are described in WO-A-02/45160. For example, in one process, the first step would be the deposition of a layer of photoresist onto the surface of the substrate 1. This would then be patterned to leave three blocks, one 7 marking the left-hand boundary of the connector 2, one 8 marking the right-hand boundary, and the last 9 formed to shape the ridge 5 of the connector 2. The next step would be that of depositing a thin electroplating seed layer, for instance copper over chromium, to the substrate, covering the blocks of photoresist 7, 8, 9 and the exposed substrate. The connector 2 would then be electroplated over the seed layer. In a final stage, the photoresist blocks 7, 8, 9 are removed.
These steps required for the fabrication of the connector 2 of
The present invention aims to address the above problems.
According to a first aspect of the invention there is provided a device comprising first and second layers wherein the first layer is flexible and the second layer has a corrugated structure and is in contact with the first layer along a substantial portion of the length of the second layer so as to prevent fracture of the second layer when the first layer is deformed.
The second layer being in contact with the first layer along a substantial portion of the length of the second layer ensures that the second layer is both robust and able to withstand greater strains than would be possible with conventional flat layers of functional materials.
The device may comprise a third layer in contact with the first layer, wherein the third layer comprises a substrate and the first layer is a coating on the substrate.
Applying an intermediate layer between the substrate and the second layer may facilitate the vertical movement of portions of the second layer and thus aid the absorption by the second layer of longitudinal strains applied to the substrate. Also, the steps required for patterning a coating on a substrate to accommodate the corrugated top layer may be simpler than those required for patterning a substrate directly.
The second layer may comprise a series of adjoining troughs and ridges, each trough and each ridge including substantially flat portions. The widths of the substantially flat portions may be selected to prevent fracture when the first layer is deformed to a predetermined radius of curvature.
The widths may be selected to be less than a predetermined length, the predetermined length being dependent on the average length between fractures for a continuous layer deformed to the predetermined radius of curvature.
According to a second aspect of the invention there is provided a method of making a device comprising first and second layers wherein the first layer is flexible and the second layer has a corrugated structure and is in contact with the first layer along a substantial portion of the length of the second layer so as to prevent fracture of the second layer when the first layer is deformed, the second layer comprising a plurality of interconnected portions each having a portion length, the method including selecting the portion length to prevent fracture when the first layer is deformed to a predetermined radius of curvature.
The method may further comprise determining a spacing between fractures for a continuous layer of material which forms the first layer, when deformed to a predetermined radius of curvature, and selecting the portion length to be a value that is dependent on the determined spacing.
The method may comprise determining an average spacing between the fractures.
For a better understanding of the invention, embodiments thereof will now be described, purely by way of example, with reference to the accompanying drawings, in which:
Referring to
To enable the ITO layer 11 to withstand higher strains before fracture, it is provided with a corrugated structure shown in
As is shown in the example of
The functional layer 11 may be any of numerous brittle functional coatings, such as a scratch-resistant coating, a solvent or gas resistant coating, or a conductive coating such as Transparent Conductive Oxide (TCO), an example being Indium Tin Oxide (ITO). These coatings generally have higher values of Young's Modulus to those of the materials used for the substrate 10. Accordingly, they are more likely to fracture when strains, at which the substrate 10 may be stable, are exerted on them.
The thickness of the layer 11 and of the flexible substrate 10 are dependent on the particular application and the materials used. In the case of an AMLCD having a flexible polyvinyl chloride substrate with an ITO electrode layer, the thickness of the substrate is likely to be to the order of 0.1 mm to 1 mm with an ITO layer thickness of 50 to 200 nm.
To produce the corrugated structure of the substrate 10 of
The replication technique described above may well be required for patterning the substrate for reasons other than for introducing the corrugated topography. In this case, the patterning process for the corrugated topography and that for the other required patterning can be combined, with the advantage that no additional manufacturing processes are required to form the corrugated layer, and thus manufacturing time is minimised.
Following the patterning of the upper surface of the substrate 10 with the corrugated topography, the functional layer 11 may be applied. The functional layer 11 may, for example, be formed by vacuum deposition, for example spluttering or vapour deposition, followed by photolithographic patterning. Alternatively, a printing technique such as ink-jet printing, soft lithographic techniques such as microcontact printing, flexographic printing or screen printing may be used. The specific processes involved in these methods and other methods for applying the functional layer 11 would be apparent to the skilled person. The choice of method and processes involved in the chosen method will depend on the exact material required for the functional layer 11.
The lengths 19, 20 of the flat portions 16, 17 of the functional layer 11 will influence the properties of the functional layer 11 when under strain. When crack formation in an ITO line on a flexible substrate undergoing tensile or bending tests is analysed, a statistical pattern emerges. For a certain radius of curvature of the flexible substrate, the ITO line may, for example, crack perpendicularly at roughly 300 micron intervals. However, each of the 300 micron sections thus formed will then be stable and will not exhibit further cracking until the substrate undergoes a further change to a smaller radius of curvature. Hence, for each radius of curvature to which the flexible substrate is bent, there is a length of ITO line that will be stable and therefore less likely to crack. This property is also true of layers of other materials on flexible substrates. The length of portions of the layer on the substrate that will be stable will be dependent on the radius of curvature of the substrate, the thickness of the substrate and the brittleness of the material forming the layer, which will depend on the specific application for which the invention is being used.
The methods of fabricating the substrate 24 and functional layer 25 having undulating topographies are similar to those for fabricating the substrate 10 and functional layer 11 of
A well-known process to produce the substrate 26 with the UV-curable acrylate lacquer coating 28 involves placing free-flowing lacquer between a microstructure tooling having a reverse pattern of the desired topographical structure and a film. The lacquer is then exposed to UV light, which makes it solidify and bond permanently to the film. The functional layer 27 may then be added using a conventional technique, such as those described above for applying the functional layer 11 of
The lengths 31, 32 of the flat portions 29, 30 of the corrugated functional layer 27 will influence the properties of the functional layer 27 when under strain, in a similar manner to the lengths of the flat portions 16, 17 of
In a similar manner to the functional layer 25 of
From reading the present disclosure, other variations and modifications will be apparent to persons skilled in the art. Such variations and modifications may involve equivalent and other features which are already known in the design, manufacture and use of flexible electronic devices and which may be used instead of or in addition to features already described herein.
In particular, the invention is not limited to use in an AMLCD display, nor to a polycarbonate substrate. It is also applicable to any flexible substrate having a functional coating. It is also applicable to other types of display, such as foil displays, e-ink displays, poly-LED displays, O-LED displays and other electroluminescent displays.
Also, the illustrations of
Further embodiments may comprise more than one interposed layer 28, 35, for instance several layers forming a stack of interposed layers. The interposed layer 28, 35 on which the functional layer is coated need not be patterned to have the corrugated topography. In alternative embodiments, other interposed layers in a stack of interposed layers, or the substrate 26, 34, are patterned with a corrugated topography. In this case, the interposed layer 28, 35 on which the functional layer is coated is of uniform thickness and has a corrugated structure by virtue of the corrugated topography of the layers or substrate upon which it is applied.
Although claims have been formulated in this application to particular combinations of features, it should be understood that the scope of the disclosure of the present invention also includes any novel features or any novel combination of features disclosed herein either explicitly or implicitly or any generalisation thereof, whether or not it relates to the same invention as presently claimed in any claim and whether or not it mitigates any or all of the same technical problems as does the present invention. The applicants hereby give notice that new claims may be formulated to such features and/or combinations of such features during the prosecution of the present application or of any further application derived therefrom.
Number | Date | Country | Kind |
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0323286.5 | Oct 2003 | GB | national |
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/IB04/51931 | 9/30/2004 | WO | 3/29/2006 |