Semiconductor on Glass Photocathodes for High Throughput Maskless Electron Beam Lithography by Baum et al, 41st Electron Ion & Photon Beam Nanolithography Conference, 1997. |
J. E. Schneider et al. Semiconductor on Glass Photocathodes as High Performance Sources for Parallel Electron Beam Lithography. |
Coulomb effect in cell projection lithography, by Sohda et al. J. Vac. Sci. Technol. B, vol. 13, No. 6 Nov./Dec. 1995 pp. 2419-2423. |
Recent Progress in Electron-Beam Cell Projection Technology Yamashita et al. Jpn. J. Appl. Phys. vol. 35 1996 Pt. 1 No. 12 B pp. 6404-6414. |