The present invention relates to the field of electronic components, and in particular to an electronic component comprising at least two superposed conducting or semiconducting layers, either coupled electronically and/or magnetically.
Electronic components include superposed layers including conducting, semiconducting and/or insulating layers which may have between them electronic and/or magnetic coupling. These different layers may be ferromagnetic, antiferromagnetic or amagnetic as well as organic or inorganic.
Such electronic components may for example define a tunnel junction, a magnetic tunnel junction, a spin valve, a memristor, a junction based on semiconductors, an abrupt conductor/semiconductor interface, an abrupt conductor/conduct interface between two magnetic and/or amagnetic conductors or an abrupt conductor/insulator interface.
When operating or during manufacture, such electronic components may reach high temperatures and/or are subject to high electric fields. This promotes migration of species between the layers of these electronic components. The result thereof is a loss of performances.
In order to avoid diffusion during steps for depositing layers or during annealing, it is possible to limit the temperature for depositing the layers or of the annealing.
In order to avoid diffusion during operation, it is possible to limit the temperature and/or the electric field during operation.
Nevertheless, these solutions are not satisfactory insofar that they are constraints in the design of electronic components and may limit the performances of the electronic component.
An object of the invention is to propose an electronic component wherein the phenomena of diffusion of species between two electronically coupled conducting or semiconducting layers are at least limited.
For this purpose, the invention proposes a component having at least two conducting or semiconducting layers coupled electronically and/or magnetically, at least one graphene layer interposed between the conducting or semiconducting layers, so that the conducting or semiconducting layers are electronically and/or magnetically coupled through the thickness of said or each graphene layer.
According to other examples, the electronic component includes one or more of the following features, taken individually or according to any of the technically possible combinations the two coupled layers are two conducting layers;
The invention also relates to a method for manufacturing an electronic component having a first conducting or semiconducting layer and a second conducting or semiconducting layer electronically and/or magnetically coupled through the thickness of a graphene layer, having the steps of
The invention further relates to the use of a graphene layer interposed between two conducting or semiconducting layers electronically and/or magnetically coupled of an electronic component for preventing diffusion of species between the conducting or semiconducting layers electronically and/or magnetically coupled through the thickness of the graphene layer.
The invention and advantages thereof will be better understood upon reading the description which follows, only given as a non-limiting example, made with reference to the appended drawings wherein
The electronic component 2 illustrated in
The electrodes 4 are formed by conducting layers positioned on either side of the intermediate layer 6. The electrodes 4 are electronically and/or magnetically coupled through the intermediate layer 6.
Two layers are electronically coupled when they are capable of exchanging electrons with each other. Electrons may directly pass from one layer to the other.
Two layers are magnetically coupled when at least one of the layers exerts a magnetic influence on the other.
The two electrodes 4 consist of the same material or of different materials.
The layers forming the electronic component 2 are parallel with each other and stacked along a stacking direction E perpendicular to the layers.
The electronic component 2 defines a simple non-magnetic conductor/insulator/conductor tunnel junction when the coupling between the electrodes is simply electronic or a magnetic conductor/insulator/conductor tunnel junction when the electrodes 4 are ferromagnetic and the coupling is electronic and magnetic.
The electronic component 2 further includes at least one graphene layer 8 interposed between each electrode 4 and the intermediate layer 6 and separating the electrode 4 from the intermediate layer 6.
The graphene layer 8 is formed with one or several superposed graphene films.
Graphene is a single-plane two-dimensional carbon crystal. A graphene film has a single-atom thickness. Such a film is extremely thin while forming an efficient diffusion barrier against the passage of molecules, atoms and ions. A graphene layer therefore defines an anti-diffusion barrier.
The graphene layer 8 interposed between each electrode 4 and the intermediate layer 6 defines a very effective barrier against the diffusion of species between the materials of the electrode 4 and of the intermediate layer 6, while allowing electronic and/or magnetic coupling between the electrodes 4 through the thickness of each graphene layer 8, because of the very great fineness of the graphene layer.
The electronic component 2 of
In an alternative, the electronic component 2 includes a graphene layer between one of the electrodes and the intermediate layer, the other electrode being in contact with the intermediate layer.
The electronic component 2 of
The electronic component 2 defines a conductor/conductor/conductor junction or a conductor/semiconductor/conductor junction.
In an example, the electrodes 4 are magnetic, and the electronic component 2 of
In another example, the electronic component 2 defines a light-emitting diode in particular and organic light-emitting diode or OLED. In this case, the intermediate layer 6 is a light-emitting organic semiconductor layer and the metal electrodes 4 may be magnetic or amagnetic.
An amagnetic electrode is for example made in an amagnetic conductor or an amagnetic conductor alloy. An amagnetic electrode is for example made in aluminium (Al), gold (Au), copper (Cu), silver (Ag), mercury (Hg), lithium (Li), platinum (Pt), indium tin oxide (ITO) or in an alloy thereof or in graphene/graphite.
A ferromagnetic electrode is for example made in a ferromagnetic metal, such as cobalt (Co), nickel (Ni), iron (Fe) or in an alloy of ferromagnetic metals, cobalt-iron-boron (CoFeB), nickel-iron (NiFe), or in a metal oxide such as manganites ((La, Sr)MnO3) or in Heusler alloys such as Co2MnSi, Co2MnGe or Co2FeAl(1-x)Si(x).
A conducting intermediate layer 6 is made for example in metal or in a metal alloy such as gold (Au), copper (Cu), ruthenium (Ru) and silver (Ag).
An insulating or semiconducting intermediate layer 6 is organic or inorganic. A component may include several organic and/or inorganic intermediate layers 6.
An organic insulating or semiconducting intermediate layer 6 is for example formed with tris(8-hydroxyquinoline)aluminium(III) (Alq3), anthracene, polymers such as poly(para-phenylene-vinylene) (PPV) or polyfluorene (PFO) and/or self-assembled monolayers such as alkane-thiols or any other organic material or combination thereof.
The electronic component 2 of
The intermediate layers 6 are separated by a graphene layer 8 interposed between the intermediate layers 6.
The electronic component 2 thus includes a graphene layer 8 between each electrode 4 and the intermediate layer 6 adjacent to this electrode 4, and a graphene layer 8 between the intermediate layers 6.
Alternatively, the electronic component 2 only includes a graphene layer 8 interposed between one of the electrodes 4 and the adjacent intermediate layer 6 or between the intermediate layers 6.
In another alternative, the electronic component 2 includes two graphene layers 8 each interposed between a respective electrode 4 and the adjacent intermediate layer 6, or interposed between an electrode 4 and the adjacent intermediate layer 6 and between the intermediate layers 6.
The electronic component 2 of
The conducting layer 10 and the semiconducting layer 12 define between them an abrupt interface and are coupled electronically.
The electronic component 2 of
The magnetic layers 14 and 16 define between them an abrupt interface and are coupled magnetically.
In an example, a hard magnetic layer 14 is made in a harder magnetic material than the other soft magnetic layer 16.
The hard magnetic layer 14 is for example made in iron (Fe), cobalt (Co) or nickel (Ni).
The soft magnetic layer 16 is for example made in a cobalt-iron-boron alloy (CoFeB).
In an example, a magnetic layer 14 is made in a ferromagnetic material and the other magnetic layer 16 is made in antiferromagnetic material.
The antiferromagnetic layer 16 is for example made in iridium-manganese (IrMn), in cobalt oxide (CoO) or in bismuth ferrite (BiFeO3).
A method for manufacturing an electronic component having a first conducting or semiconducting layer and a second conducting or semiconducting layer electronically and/or magnetically coupled through the thickness of a graphene layer, includes the steps of
In an example, the method includes, before the step for depositing said or each graphene layer on the first layer, a step for depositing an intermediate layer on the first layer.
In an example, the method includes, before the step for depositing the second layer, a step for depositing an intermediate layer over said or each graphene layer, and optionally an additional step for depositing at least one additional graphene layer on the intermediate layer.
A graphene film with single-atom thickness may be formed in a known way. According to a first known method, a graphene film with single-atom thickness is directly deposited on an electrode by physical vapor deposition. This method is known as chemical vapor deposition . According to a second known method, a graphene film is obtained by exfoliation of a graphite crystal. In both cases, the film may then be transferred onto a layer of the electronic component.
In the described electronic components, at least one graphene layer is interposed between two electronically coupled conducting or semiconducting layers, which gives the possibility of preventing or at least limiting the diffusion of species between these layers. The conducting or semiconducting layers remain electronically coupled through the thickness of said or each graphene layer.
In the described examples, the graphene layers are formed with a single graphene film with a single-atom thickness. It is possible to interpose a graphene layer formed with several superposed graphene films.
The invention applies to electronic components in general and to junctions in particular. As a nonlimiting example, the invention allows formation of tunnel junctions, either magnetic or not, spin valves, memristors, . . . etc.
Number | Date | Country | Kind |
---|---|---|---|
1100553 | Feb 2011 | FR | national |
This application is the National Stage under 37 U.S.C. §371 of International Application No. PCT/EP2012/053127, filed on Feb. 24, 2012, which claims priority to French Application No. 11 00553, filed on Feb. 24, 2011. The International Application published on Aug. 30, 2012 as WO 2012/113898. All of the above applications are incorporated herein by reference.
Filing Document | Filing Date | Country | Kind | 371c Date |
---|---|---|---|---|
PCT/EP12/53127 | 2/24/2012 | WO | 00 | 11/6/2013 |