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Solid state devices adapted for rectifying, amplifying, oscillating or switching without a potential-jump barrier or surface barrier
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Industry
CPC
H01L45/00
This industry / category may be too specific. Please go to a parent level for more data
Parent Industries
H
ELECTRICITY
H01
Electric elements
H01L
SEMICONDUCTOR DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
Current Industry
H01L45/00
Solid state devices adapted for rectifying, amplifying, oscillating or switching without a potential-jump barrier or surface barrier
Sub Industries
H01L45/005
Charge density wave transport devices
H01L45/02
Solid state travelling-wave devices
H01L45/04
Bistable or multistable switching devices
H01L45/06
based on solid-state phase change
H01L45/065
between different crystalline phases
H01L45/08
based on migration or redistribution of ionic species
H01L45/085
the species being metal cations
H01L45/10
based on bulk electronic defects
H01L45/12
Details
H01L45/1206
Three or more terminal devices
H01L45/1213
Radiation or particle beam assisted switching devices
H01L45/122
Device geometry
H01L45/1226
adapted for essentially horizontal current flow
H01L45/1233
adapted for essentially vertical current flow
H01L45/124
on sidewalls of dielectric structures
H01L45/1246
Further means within the switching material region to limit current flow
H01L45/1253
Electrodes
H01L45/126
adapted for resistive heating
H01L45/1266
adapted for supplying ionic species
H01L45/1273
adapted for electric field or current focusing
H01L45/128
Thermal details
H01L45/1286
Heating or cooling means other than resistive heating electrodes
H01L45/1293
Thermal insulation means
H01L45/14
Selection of switching materials
H01L45/141
Compounds of sulfur, selenium or tellurium
H01L45/142
Sulfides
H01L45/143
Selenides
H01L45/144
Tellurides
H01L45/145
Oxides or nitrides
H01L45/146
Binary metal oxides
H01L45/147
Complex metal oxides
H01L45/148
Other compounds of groups 13-15
H01L45/149
Carbon or carbides
H01L45/16
Manufacturing
H01L45/1608
Formation of the switching material
H01L45/1616
by chemical vapor deposition
H01L45/1625
by physical vapor deposition
H01L45/1633
by conversion of electrode material
H01L45/1641
Modification of the switching material
H01L45/165
by implantation
H01L45/1658
by diffusion
H01L45/1666
Patterning of the switching material
H01L45/1675
by etching of pre-deposited switching material layers
H01L45/1683
by filling of openings
H01L45/1691
Patterning process specially adapted for achieving sub-lithographic dimensions
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