This Disclosure relates to via arrangements for electronic substrates such as printed circuit boards (PCBs) or IC packages for electronic devices.
A PCB as known in the art mechanically supports and electrically connects electronic components mounted thereon using conductive tracks, pads and other features etched from generally copper sheets laminated onto at least one side of a dielectric substrate material (hereafter a ‘dielectric core’) to provide an electronic device (e.g., Central Processing Unit (CPU) or a graphic chip set). A double-sided PCB only has two electrically conductive layers of material, while multilayer PCBs have at least three layers of conductive material including at least one conductive layer between the PCB core and a prepeg layer. Prepeg and PCB core are essentially the same materials, but the prepeg is not fully cured making it more malleable as compared to the PCB core. Electrical components (e.g. capacitors, resistors, transistors, or an IC chip) are generally soldered on the PCB, in some cases soldered on both sides of the board. PCBs also generally include vias such as through-vias that extend from one side of the PCB core to the other. Advanced PCBs may also include some components embedded within the dielectric core.
An IC package (or chip package) like a PCB includes a dielectric core (sometimes referred to in the art as a ‘package core’), and generally also includes through-vias, where an IC chip is generally mounted on the top side of the IC package. One example IC package is a flip-chip (FC) bonding package, and another example package is a plastic wire bond ball grid array (PB GA) package. Yet another IC package arrangement is a package substrate that is configured for positioning between a FC die and an interposer.
Vias as known in the art are at least conductor (e.g., copper) lined holes which couple conductive layers of a multilayer substrate, such as for a multilayer PCB or an IC package. The most common via types are conductor lined through-vias known as a plating through hole (PTH) via, a via that is open only on one side known as a blind hole via, and an embedded via known as a buried hole via. Some circuit designs benefit from having the through-vias filled rather than a PTH that leaves them open on the surface of the PCB or package IC after the plating process. Filling of vias can be achieved with fill materials such as epoxy, paste, plating with copper, or tenting with solder mask. Such vias on the electronic device are used for signals, for power, and for ground.
This Summary is provided to introduce a brief selection of disclosed concepts in a simplified form that are further described below in the Detailed Description including the drawings provided. This Summary is not intended to limit the claimed subject matter's scope.
Disclosed aspects recognize standard through-vias (PTH vias or filled through-vias) in PCB or package IC-based electronic devices used for signals can lead to signal crosstalk issues particularly in high density PCBs or IC packages. Crosstalk can cause device problems such as for high-speed interface devices including for a Serializer/Deserializer (SerDes) or for a universal serial bus (USB) interface. The crosstalk can lead to poor device signal integrity and thus data conversion errors, leading to serious performance problems for the interface device.
The traditional PCB and package IC approach to reduce via-via crosstalk is to either increase the via-via distance or to add ground vias between and surrounding the signal vias. Both of these traditional approaches for reducing via-via crosstalk lead to a reduced signal via density in the PCB or package IC-based electronic device.
Disclosed aspects include an electronic substrate comprising a dielectric core, a first conducting layer on a first side of the dielectric core and a second conducting layer on the second side of the core opposite the first side. At least one differential coaxial through-via includes a first inner signal through-via that is at least conductor lined for a first signal path and at least a second inner signal through-via that is also at least conductor lined positioned side-by-side and being dielectrically isolated from the first inner signal through-via for a second signal path. An annular-shaped outer ground shield enclosure that is at least conductor lined surrounds and is dielectrically isolated from both the first and second inner signal through-vias.
Reference will now be made to the accompanying drawings, which are not necessarily drawn to scale, wherein:
Example aspects are described with reference to the drawings, wherein like reference numerals are used to designate similar or equivalent elements. Illustrated ordering of acts or events should not be considered as limiting, as some acts or events may occur in different order and/or concurrently with other acts or events. Furthermore, some illustrated acts or events may not be required to implement a methodology in accordance with this disclosure.
Also, the terms “coupled to” or “couples with” (and the like) as used herein without further qualification are intended to describe either an indirect or direct electrical connection. Thus, if a first device “couples” to a second device, that connection can be through a direct electrical connection where there are only parasitic s in the pathway, or through an indirect electrical connection via intervening items including other devices and connections. For indirect coupling, the intervening item generally does not modify the information of a signal but may adjust its current level, voltage level, and/or power level.
The dielectric core 105 can comprise epoxy resin for example. In the case the electronic substrate 100 comprises a PCB, the PCB can generally comprise any multilayer substrate such as a buildup or laminate multilayer PCB, or a buildup or laminate package substrate. As known in the art a conventional multilayer PCB can be prepared by building up a two-sided core laminate with one or more layers of single-sided laminate added to each side of the core laminate. Examples of dielectric materials used in laminates include, but are not limited to, FR-2 phenolic cotton paper, FR-4 woven glass and epoxy resin, G-10 woven glass and epoxy, CEM-1 cotton paper and epoxy, CEM-3 woven glass and epoxy, CEM-5 woven glass and polyester, polyimide, and other dielectric materials typically used in preparing multilayer substrates.
Another disclosed differential coaxial signal via is shown in
Disclosed inner signal through-vias 121 and 122 in
Electronic substrate 100 is shown including a first electrically conducting layer 106 on its top side and a second electrically conducting layer 107 on its bottom side. The first electrically conducting layer 106 is shown providing a first top side contact 106a over and extending beyond the first inner signal through-via 121, and also a second top side contact 106b over and extending beyond the second inner signal through-via 122, and a ground top side contact 106c shown over and extending beyond the ground shield 123. The second electrically conducting layer 107 is shown providing a first bottom side contact 107a over and extending beyond the first inner signal through-via 121, and a second bottom contact 107b over and extending beyond the second inner signal through-via 122, and a ground bottom side contact 107c shown over and extending beyond the outer ground shield 123.
Also shown in
The minimum spacing range between the closest edges of inner signal through-vias 121, 122 (or 121′, 122′) and the distance range of the closest edge of the inner signal through-vias 121, 122 (or 121′, 122′) to the outer ground shield enclosure 123 (or 123′) depends on the impedance requirements of the interface device, the technology/process limitations, package or PCB substrate, and dielectric constant of the dielectric core 105. For example, these spacings can be a few microns for a packaged IC to a few hundred microns for a PCB.
The IC die 310 may include or be a part of a processor, memory, switch, application specific IC (ASIC), or system-on-a-chip (SoC). In the FC configuration shown, the IC die 310 may be coupled to a top surface 332 of the FC bonding package 300a. In typical aspects, the electrical signals include differential signals, input/output (I/O) signals, power, and ground associated with operation of the IC die 310.
The BGA interconnect structures depicted by solder balls 314 and 324 are only meant to be example interconnect structures. In other aspects, a land-grid array (LGA) structure may electrically couple one or more lands on bonding package 300a with one or more pads on interposer or PCB 340, which may route electrical signals between bonding package 300a and the interposer or PCB 340. In the case of a WB package, there will be bond wire instead of solder balls.
Regarding fabrication of a disclosed electronic substrate having at least one disclosed differential coaxial via 120, and an annular shape ground through-cut for the outer ground shield enclosure 123 can be prepared by a method that comprises forming a through-hole pattern having a shape of the hole being circular, oval, or rectangle-like with two semicircles at the ends through-holes through a dielectric core 105. This is followed by lining the ground through-cut with an electrical conductor (e.g., metalizing).
The annular shape ground through-cut can be made by punching with an elongated punch, drilling multiple overlapping holes in proximity to each other or lasing the desired elongated shape, depending on considerations such as the shape and size of the hole and convenience. The annular shape ground through-cut can be lined by being plated, or metalized, by sputtering or electroplating. For example, electroless copper can be applied, followed by electrolytic copper. Other metals that can be applied during the sputtering and/or plating process include, but are not limited to, nickel, gold, palladium, or silver. Alternatively, the through-hole vias can be lined with an electrically conducting organic polymer such as polyacetylene, polypyrrole, or polyaniline.
The annular-shaped through-cut is then filled by depositing a differential signal through-via are then prepared by forming through-holes through dielectric material. These signal through-vias can as with the annular shape ground through-cut can be made by punching, drilling, or lasing. The signal through-vias are then filled or at least lined with a conductor in the same manner as the through-vias of the annular shape ground through-cut described above.
Disclosed electronic substrates do not require additional ground vias in the dielectric core 105 or 305 to reduce crosstalk or to increase signal via spacing. This helps in simplifying the electronic substrate routing and removes the potential need to increase package size and/or package layer count.
Disclosed aspects can be integrated into a variety of assembly flows to form a variety of different IC-based electronic devices and related products. The electronic devices can comprise a single IC die or multiple IC die, such as PoP configurations comprising a plurality of stacked IC die. The IC die may include various elements therein and/or layers thereon, including barrier layers, dielectric layers, device structures, active elements and passive elements including source regions, drain regions, bit lines, bases, emitters, collectors, conductive lines, conductive vias, etc. Moreover, the semiconductor die can be formed from a variety of processes including bipolar, insulated-gate bipolar transistor (IGBT), CMOS, BiCMOS and MEMS. A variety of dielectric core materials may be used. In some aspects, one or both of the dielectric core 105 and the electronic substrate 100 may be formed from a rigid and/or inflexible material.
Those skilled in the art to which this disclosure relates will appreciate that many other aspects and variations of aspects are possible within the scope of the claimed invention, and further additions, deletions, substitutions and modifications may be made to the described aspects without departing from the scope of this Disclosure.
This application is a continuation of U.S. patent application Ser. No. 17/483,726, filed Sep. 23, 2021, which is a divisional of U.S. patent application Ser. No. 15/816,667, filed Nov. 17, 2017, now U.S. Pat. No. 11,160,163, which applications are hereby incorporated herein by reference.
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Office Action for corresponding Chinese Application No. 201880070862.8, dated Aug. 4, 2023, 11 pgs. |
Number | Date | Country | |
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Number | Date | Country | |
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Parent | 15816667 | Nov 2017 | US |
Child | 17483726 | US |
Number | Date | Country | |
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Parent | 17483726 | Sep 2021 | US |
Child | 18353295 | US |