Claims
- 1. A thermal interface for conducting heat generated by a semiconductor chip to a heat-dissipating member, the thermal interface comprising:
a flexible, hermetically sealed metallic envelope; and a thermal conductive matrix disposed within the envelope.
- 2. The thermal interface according to claim 1, wherein the thermal conductive matrix has a melting point that is lower than operating temperature of the semiconductor chip.
- 3. The thermal interface according to claim 1, wherein the conductive matrix comprises a eutectic alloy.
- 4. The thermal interface recited in claim 3, wherein the alloy comprises the bismuth, tellurium, indium or gallium alloy.
- 5. The thermal interface according to claim 1, having a thermal conductivity greater than 50 Watt/meter-Kelvin.
- 6. The thermal interface according to claim 1, comprising an electrically insulating coating on an exterior surface of the envelope.
- 7. The thermal interface according to claim 6, wherein the electrically insulating coating is at least on a portion of the exterior surface of the envelope facing the heat generating semiconductor chip, wherein a portion of the exterior of the envelope that faces the heat generating source is coated with an electrical insulator.
- 8. A thermally conductive spacer for interfacing a multi-chip module with a heat-dissipating member, the spacer comprising:
a conformable metallic substantially flat container containing a heat-conducting matrix.
- 9. The thermally conductive spacer recited in claim 8, wherein the container comprises a first wall and a second wall, the first wall, facing the multi-chip module, is insulated with an electrically non-conductive film, and the second wall facing the heat-dissipating member.
- 10. The thermally conductive spacer of claim 8, wherein the container is hermetically sealed.
- 11. The thermally conductive spacer of claim 8, wherein the heat-conducting matrix is characterized by a melting point lower than a normal operating temperature of the multi-chip module.
- 12. The thermally conductive spacer of claim 8, wherein the heat-conducting matrix has a melting point in a range of 93° C. to 125° C.
- 13. The thermally conductive spacer of claim 8, wherein the heat-conducting matrix is a eutectic alloy from a group comprising bismuth, tellurium, gallium and indium.
- 14. A method of producing a thermally conductive spacer, the method comprising:
forming a substantially flat container from a flexible metal; filling the container with a heat-conducting matrix; and hermetically sealing the container.
- 15. The method according to claim 14, wherein the metal has an electrically insulating film on a surface thereof, the method comprising forming the container such that the electrically insulating film is on an exterior surface thereof.
- 16. The method according to claim 14, further comprising applying an electrically insulating film on an outer surface of the container.
- 17. The method according to claim 14, wherein the heat-conducting matrix comprises an eutectic alloy.
- 18. The method according claim 17, where the eutectic alloy comprises a bismuth, tellurium, indium or gallium alloy.
- 19. The method of according to claim 17, further comprising:
- 20. A integrated circuit package arrangement, comprising:
a package substrate having a semiconductor die mounted thereon, a thermal interface disposed on top the semiconductor die or package; and a heat sink disposed on top of the thermal interface, wherein the thermal interface is substantially flat, flexible, and comprises a metallic envelope containing a thermal conductive matrix.
- 21. An integrated circuit package arrangement according to claim 20, wherein the thermal conductive matrix comprises a euctectic alloy.
- 22. The semiconductor integrated circuit package arrangement according to claim 21, wherein the eutectic alloy comprises a bismuth, tellurium, indium or gallium alloy.
RELATED APPLICATION
[0001] This application claims priority from Provisional Application Serial No. 60/215,097 filed on Jun. 29, 2000 entitled: “ENVELOPED THERMAL INTERFACE WITH METAL MATRIX COMPONENTS”, the entire disclosure of which is hereby incorporated by reference herein.
Provisional Applications (1)
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Number |
Date |
Country |
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60215097 |
Jun 2000 |
US |