BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a diagram illustrating an excimer laser according to an exemplary embodiment of the present invention;
FIGS. 2 and 3 are diagrams illustrating the generator of FIG. 1;
FIG. 4 is a graph plotting change of output energy according to a change of concentration of fluorine supplied into the laser chamber of FIG. 2;
FIG. 5 is a graph plotting change of output energy according to change of the pressure of a mixture gas supplied into the laser chamber of FIG. 2;
FIG. 6 is a detailed diagram illustrating the line-narrowing module of FIG. 1;
FIG. 7 is sectional view illustrating the reflection diffraction grating of FIG. 6; and
FIG. 8 is a schematic diagram illustrating an exposure apparatus to which an excimer laser according to an exemplary embodiment of the present invention is employed.