EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

Abstract

An exposure apparatus exposes a substrate via liquid, and includes a liquid holding plate configured to hold the liquid, and arranged around the substrate, and a chuck configured to hold the substrate, at least one of at least part of a surface of the liquid holding plate and at least part of a surface of the chuck being made of polyparaxylene resin or including a modified layer of polyparaxylene resin.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic sectional view showing a structure of an exposure apparatus according to one aspect of the present invention.

FIG. 2 is a graph showing a contact angle variation of polyparaxylylene resin to the UV dose.

FIGS. 3A and 3B are plane and sectional views of illustrative structures of a liquid holding plate and a wafer chuck in the exposure apparatus shown in FIG. 1.

FIGS. 4A and 4B are plane and sectional views of other illustrative structures of the liquid holding plate and wafer chuck in the exposure apparatus shown in FIG. 1.

FIG. 5 is a flowchart for explaining a manufacture of a device.

FIG. 6 is a flowchart for a wafer process of step 4 shown in FIG. 5.

Claims

1. An exposure apparatus for exposing a substrate via liquid, the exposure apparatus comprising: a liquid holding plate configured to hold the liquid, and arranged around the substrate; anda chuck configured to hold the substrate, at least one of at least part of a surface of the liquid holding plate and at least part of a surface of the chuck being made of polyparaxylene resin or including a modified layer of polyparaxylene resin.

2. An exposure apparatus according to claim 1, wherein at least one of at least part of the surface of the liquid holding plate and at least part of the surface of the chuck is coated with polyparaxylene resin or a modified layer of polyparaxylene resin.

3. An exposure apparatus according to claim 1, wherein the liquid holding plate has a first liquid holding plate that is arranged around the substrate, and a second liquid holding plate that is arranged around the first liquid holding plate, and wherein at least part of a surface of the first liquid holding plate is made of polyparaxylylene resin or has a modified layer of polyparaxylylene resin, and at least part of a surface of the second liquid holding plate is made of fluorine contained resin.

4. An exposure apparatus configured to expose a substrate via liquid, said exposure apparatus comprising: a liquid holding plate configured to hold the liquid, and arranged around the substrate; anda chuck configured to hold the substrate, at least one of at least part of a surface of the liquid holding plate and at least part of a surface of the chuck being made of an organic material that contains chlorine.

5. An exposure apparatus according to claim 4, wherein at least one of at least part of the surface of the liquid holding plate and at least part of the surface of chuck is coated with the organic material that contains chlorine.

6. An exposure apparatus according to claim 4, wherein the liquid holding plate has a first liquid holding plate that is arranged around the substrate, and a second liquid holding plate that is arranged around the first liquid holding plate, and wherein at least part of a surface of the first liquid holding plate is made of the organic material that contains chlorine, and at least part of a surface of the second liquid holding plate is made of fluorine contained resin.

7. A device manufacturing method comprising: exposing a substrate via liquid using an exposure apparatus; anddeveloping the substrate that has been exposed,wherein the exposure apparatus includes:a liquid holding plate configured to hold the liquid, and arranged around the substrate; anda chuck configured to hold the substrate, at least one of at least part of a surface of the liquid holding plate and at least part of a surface of the chuck being made of polyparaxylene resin or having a layer or modified layer of polyparaxylene resin.

8. A device manufacturing method comprising: exposing a substrate via liquid using an exposure apparatus; anddeveloping the substrate that has been exposed,wherein the exposure apparatus includes:a liquid holding plate configured to hold the liquid, and arranged around the substrate; anda chuck configured to hold the substrate, at least one of at least part of a surface of the liquid holding plate and at least part of a surface of the chuck being made of an organic material that contains chlorine.