EXPOSURE APPARATUS

Abstract

An exposure apparatus, which exposes a pattern on an original onto a substrate while a liquid fills a gap between a projection optical system and the substrate, includes a liquid holding plate which sets the substrate held on a substrate stage and the peripheral area around the peripheral portion of the substrate to form substantially the same surface to hold the liquid on the peripheral portion of the substrate. The liquid holding plate includes an inner member formed in the peripheral area of the peripheral portion of the substrate and holds the liquid on the peripheral portion of the substrate, an outer member formed on the peripheral portion of the inner member and attaching to the substrate stage, and a connection member which connects the inner member to the outer member.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a view showing an arrangement of a liquid immersion type exposure apparatus according to an embodiment of the present invention;

FIG. 2 is a view showing a liquid holding plate according to the first embodiment;

FIG. 3 is a view of the arrangement of the liquid holding plate in FIG. 2 seen from a side surface (X-Z plane);

FIG. 4 is an enlarged view of part of FIG. 3;

FIG. 5 is a view showing a liquid holding plate according to the second embodiment;

FIG. 6 is an enlarged view of the arrangement of the liquid holding plate in FIG. 5 seen from a side surface (X-Z plane);

FIG. 7 is a view showing a same structure member according to the third embodiment;

FIG. 8 is an enlarged view of the arrangement of the liquid holding plate in FIG. 7 seen from a side surface (X-Z plane);

FIG. 9 is a flowchart to explain the manufacture of devices according to the fourth embodiment; and

FIG. 10 is a flowchart to explain in detail the wafer process of step 4 shown in FIG. 4.

Claims

1. An exposure apparatus which exposes a pattern of an original onto a substrate while a liquid fills a gap between a projection optical system and the substrate, comprising: a liquid holding plate which sets the substrate held on a substrate stage and a peripheral area around a peripheral portion of the substrate to form substantially the same surface to hold said liquid on the peripheral portion of the substrate,wherein said liquid holding plate includesan inner member formed in the peripheral area around the peripheral portion of the substrate and holds said liquid on the peripheral portion of the substrate,an outer member formed on a peripheral portion of said inner member and attaching to said substrate stage, anda connection member which connects said inner member to said outer member.

2. An exposure apparatus which exposes a pattern of an original onto a substrate while a liquid fills a gap between a projection optical system and the substrate, comprising: a liquid holding plate which sets the substrate held on a substrate stage and a peripheral area around a peripheral portion of the substrate to form substantially the same surface to hold the liquid on the peripheral portion of the substrate, andan attaching member to attach said liquid holding plate onto said substrate stage,wherein said attaching member absorbs deformation occurring in said liquid holding plate by elastic deformation to decrease deformation which is to act on said substrate stage.

3. The apparatus according to claim 1, further comprising a temperature controller to control a temperature of said liquid holding plate which is cooled by said liquid.

4. The apparatus according to claim 1, wherein said liquid holding plate includes a recovery mechanism capable of recovering said held liquid.

5. The apparatus according to claim 1, wherein said connecting member absorbs deformation, occurring in said inner member cooled by said liquid, by elastic deformation, to decrease a deforming force which is to act on said outer member.

6. The apparatus according to claim 1, further comprising a separating portion which forms a gap between said inner member and said outer member, wherein said separating portion insulates a temperature change, occurring in said inner member which is cooled by said liquid, with respect to said outer member.

7. The apparatus according to claim 1, wherein said inner member, said outer member, and said connection member are formed integrally.

8. The apparatus according to claim 1, further comprising an attaching member to attach said liquid holding plate onto said substrate stage, wherein said attaching member absorbs deformation occurring in said liquid holding plate by elastic deformation to decrease deformation which is to act on said substrate stage.

9. A device manufacturing method comprising: a step of exposing a substrate using an exposure apparatus according to claim 1; anda step of developing the exposed substrate.

10. A device manufacturing method comprising: a step of exposing a substrate using an exposure apparatus according to claim 2; anda step of developing the exposed substrate.