Extreme ultra violet light source device

Abstract

An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a sectional view showing a configuration of an extreme ultra violet light source device according to the first embodiment of the present invention;

FIGS. 2A and 2B are diagrams for explanation of the action of an asymmetric magnetic field shown in FIG. 1;

FIGS. 3A and 3B show a configuration of an extreme ultra violet light source device according to the second embodiment of the present invention;

FIGS. 4A and 4B show a configuration of an extreme ultra violet light source device according to the third embodiment of the present invention;

FIG. 5 shows a modified example of the extreme ultra violet light source device according to the third embodiment of the present invention;

FIGS. 6A and 6B show a configuration of an extreme ultra violet light source device according to the fourth embodiment of the present invention;

FIG. 7 shows a modified example of the extreme ultra violet light source device according to the fourth embodiment of the present invention;

FIG. 8 is a sectional view showing a configuration of an extreme ultra violet light source device according to the fifth embodiment of the present invention;

FIGS. 9A and 9B are diagrams for explanation of the first configuration of asymmetric magnetic field forming means;

FIG. 10 is a diagram for explanation of the second configuration of the asymmetric magnetic field forming means;

FIG. 11 is a diagram for explanation of the third configuration of the asymmetric magnetic field forming means;

FIG. 12 is a diagram for explanation of the fourth configuration of the asymmetric magnetic field forming means;

FIG. 13 is a diagram for explanation of the fifth configuration of the asymmetric magnetic field forming means;

FIG. 14 is a diagram for explanation of the sixth configuration of the asymmetric magnetic field forming means;

FIG. 15 is a diagram for explanation of the seventh configuration of the asymmetric magnetic field forming means;

FIGS. 16A and 16B are diagrams for explanation of the seventh configuration of the asymmetric magnetic field forming means;

FIGS. 17A and 17B show an example of applying the above explained seventh configuration for forming an asymmetric magnetic field to an extreme ultra violet light source device having an exhaust system;

FIGS. 18A and 18B show a configuration of an extreme ultra violet light source device according to the sixth embodiment of the present invention;

FIGS. 19A and 19B show a configuration of an extreme ultra violet light source device according to the seventh embodiment of the present invention;

FIG. 20 shows a configuration of an extreme ultra violet light source device according to the eighth embodiment of the present invention;

FIG. 21 shows a configuration of an extreme ultra violet light source device according to the ninth embodiment of the present invention; and

FIG. 22 is a diagram for explanation of a principle of generating EUV light in an extreme ultra violet light source device of a laser produced plasma (LPP) type.

Claims

1. An extreme ultra violet light source device of a laser produced plasma type comprising: a target nozzle that supplies a target material;a laser oscillator that applies a laser beam to the target material supplied from said target nozzle to generate plasma;collector optics that collects extreme ultra violet light radiated from the plasma; andmagnetic field forming means that forms an asymmetric magnetic field in a position where the laser beam is applied to said target material.

2. The extreme ultra violet light source device according to claim 1, wherein said magnetic field forming means includes plural coils that generate a magnetic field when applied with electric currents.

3. The extreme ultra violet light source device according to claim 2, wherein said magnetic field forming means includes plural iron cores having different shapes from each other and/or different sizes from each other and inserted into central openings of said plural coils, respectively.

4. The extreme ultra violet light source device according to claim 2, wherein said plural coils includes superconducting coils.

5. The extreme ultra violet light source device according to claim 2, wherein said magnetic field forming means applies electric currents having different magnitudes from each other in said plural coils, respectively.

6. The extreme ultra violet light source device according to claim 2, wherein said magnetic field forming means applies electric currents in different directions from each other in said plural coils, respectively.

7. The extreme ultra violet light source device according to claim 2, wherein numbers of turns and/or diameters of turns of winding wires in said plural coils are different from each other.

8. The extreme ultra violet light source device according to claim 2, wherein said magnetic field forming means includes shielding means for shielding a part of the magnetic field formed by said plural coils.

9. The extreme ultra violet light source device according to claim 2, wherein said magnetic field forming means forms an asymmetric magnetic field in which a central axis of lines of magnetic flux is not a straight line.

10. The extreme ultra violet light source device according to claim 9, wherein said plural coils are provided to face each other at a predetermined angle.

11. The extreme ultra violet light source device according to claim 1, wherein said magnetic field forming means includes plural permanent magnets that generate magnetic fields having different sizes from each other, respectively.

12. The extreme ultra violet light source device according to claim 11, wherein said magnetic field forming means includes shielding means for shielding a part of the magnetic field formed by said plural permanent magnets.

13. The extreme ultra violet light source device according to claim 12, wherein said shielding means contains one of iron, cobalt, nickel and ferrite.

14. The extreme ultra violet light source device according to claim 1, wherein said magnetic field forming means forms an asymmetric magnetic field with respect to a surface perpendicular to a central axis of lines of magnetic flux.

15. The extreme ultra violet light source device according to claim 14, wherein said magnetic field forming means forms an asymmetric magnetic field having a higher magnetic flux density at one side of a central axis of lines of magnetic flux and a lower magnetic flux density at the other side thereof.

16. The extreme ultra violet light source device according to claim 11, wherein said magnetic field forming means forms an asymmetric magnetic field in which a central axis of lines of magnetic flux is not a straight line.

17. The extreme ultra violet light source device according to claim 16, wherein said plural permanent magnets are provided to face each other at a predetermined angle.

18. The extreme ultra violet light source device according to claim 1, further comprising: an ion ejection port provided in a direction from a higher magnetic flux density to a lower magnetic flux density of the asymmetric magnetic field formed by said magnetic field forming means.

19. The extreme ultra violet light source device according to claim 1, further comprising: electric field forming means for forming an electric field in the asymmetric magnetic field formed by said magnetic field forming means.

20. The extreme ultra violet light source device according to claim 1, wherein a central axis of said target nozzle is oriented in a direction perpendicular to a central axis of lines of magnetic flux of the asymmetric magnetic field formed by said magnetic field forming means.