Self-Aligned Titanium Silicidation by Lamp Annealing, K. Tsukamoto et al., SSDM 1984 P47-50 J �Reference 1!. |
Impact of Surface Proximity Gettering and Nitrided Oxide Side-Wall Spacer by Nitrogen Implantation on Sub-Quarter Micron CMOS LDD FETs, S. Shimizu et al., IEDM95 P859-862 �Reference 2!. |
Novel Low Leakage and Low Resistance Titanium Salicide Technology with Recoil Nitrogen Achieved by Silicidation after Ion Implantation through Contamination-Restrained Oxygen Free LPCVD-Nitride Layer (SICRON), H. Kotaki et al., SSDM 1995 P85-87, including Contents �Reference 3!. |