Romen, Hydrogen, Chloride and Chlorine Gettering, J. Electrochem. Soc., vol. 119, No. 3, 1972, pp. 747-752. |
Sze, VLSI Technology, p. 472, 1983, McGraw-Hill. |
Solid State Technology, vol. 22, No. 8, Aug. 1979, pp. 113-119; J. Monkowski: "Role of chlorine in silicon oxidation." |
Japanese Journal of Applied Physics, Supplements 16th Int. Conf. Solid State Devices and Materials, Kobe, 30th Aug.-1st Sep. 1984, pp. 50-51, Tokyo, JP; K. Horioka et al.: "XeCl excimer laser oxidation of Si employing 02/Cl2 gas mixture." |
Solid State Technology, vol. 25, No. 7, Jul. 1982, pp. 83-86, Port Washington, New York, U.S.; T. Hattori: "Chlorine oxidation and annealing in the fabrication of high performance LSI devices." |