Chang-Nam Ahn, Ki-Ho Baik, Yong-Suk Lee, Hung-Eil Kim, Ik-Boum Hur, Young-Sik Kim, Ju-Hwan Kim, and Soo-Han Choi, "A Study of Optical Proximity Effects Using Off-axis Illumination with Attenuated Phase Shift Mask," Hyundai Electronics Industries Co., Ltd., Korea; SPIE vol. 2440, pp. 222-226, Feb. 1995. |
Nandasiri Samarakone, Wayne Chang, Erik Tandberg, Christina Elliott, Timothy Wang, "Comparative Study of I-line DUV Lithography for 0.35 .mu.m and Beyond," Northern Telecom Limited, Canada; SPIE vol. 2440, pp. 61-74, Feb. 1995. |
Ik-Boum Hur, Ju-Hwan Kim, Il-Ho Lee, Hung-Eil Kim, Chang-Nam Ahn, Ki-Ho Baik, and Soo-Han Choi, "Effect of Pattern Density for Contact Windows in an Attenuated Phase Shift Mask," Hyundai Electronics Co., Ltd., Korea; SPIE vol. 2440, pp. 278-289, Feb. 1995. |
Yong K. Choi, Young J. Song, Hong S. Kim, Woo S. Kim, "Optical Proximity Correction on Attenuated Phase Shifting Photo Mask for Dense Contact Array," Advanced Process Technology Dept., LG Semicon Co. 50, Korea; SPIE vol. 2440, pp. 328-332, Feb. 1995. |