1. Field of the Invention
The invention relates to a low-pressure process apparatus, and in particular to a low-pressure process apparatus for drying photoresist.
2. Description of the Related Art
a shows a conventional low-pressure process apparatus 10 comprising a base 1, a housing 2, a stage 3, supporting elements 5, actuating devices 6 and an exhaust pipe 7. The stage 3 is disposed on the base 1, supporting a substrate 4. The housing 2 and the base 1 form a chamber 8 receiving the stage 3 and the substrate 4. The exhaust pipe 7 and the supporting elements 5 are disposed on the base 2. The actuating devices 6 are disposed on the base 1. With reference to
When the low-pressure process apparatus 10 dries a photoresist material (for example, resin), volatile chemical or particles are deposited on an inner wall of the housing of the exhaust pipe 7. Thus, the housing 2 and the exhaust pipe 7 require regular cleaning. Conventionally, the housing 2 and the exhaust pipe 7 are manually cleaned after the housing is elevated. The cleaning process is difficult and time consuming Additionally, when the housing 2 and the exhaust pipe 7 are cleaned, the low-pressure process apparatus 10 is shut down affecting process yield.
A detailed description is given in the following embodiments with reference to the accompanying drawings.
The invention provides low-pressure process apparatus for processing a substrate, comprising a base, a stage, a housing and at least one first roller set. The stage is disposed on the base, supporting the substrate. The housing is detachably disposed on the base and moves between a first position and a second position, wherein, when in a first position, the housing and the base form a chamber to receive the stage. When the housing is detached, the first roller set contacts and supports the housing to allow movement in a first horizontal direction.
The housing of the invention is detached and removed from the base to be cleaned. Thus, when the original housing (first housing) is cleaned, another housing (second housing) can be disposed on the base to continue the low-pressure process. Shutdown time of the low-pressure process apparatus is thus shortened, and yield and cost are conserved.
The invention can be more fully understood by reading the subsequent detailed description and examples with references made to the accompanying drawings, wherein:
a shows a conventional low-pressure process apparatus;
b shows the conventional low-pressure process apparatus raising a housing thereof;
a is a front view of a low-pressure process apparatus of a first embodiment of the invention;
b is a front view of a low-pressure process apparatus of the invention when a housing thereof is in a second position;
c is a side view of a low-pressure process apparatus of the invention when the housing is in the second position;
a and 3b show first roller sets contacting lead grooves;
c shows the housing sliding by the first roller sets and the lead grooves;
a shows substrate processing equipment of the invention;
b shows the housing detached from the substrate processing equipment;
a shows a low-pressure process apparatus of a second embodiment of the invention;
b shows a housing detached from the low-pressure process apparatus of the second embodiment.
The following description is of the best-contemplated mode of carrying out the invention. This description is made for the purpose of illustrating the general principles of the invention and should not be taken in a limiting sense. The scope of the invention is best determined by reference to the appended claims.
a is a front view of a low-pressure process apparatus 100 of a first embodiment of the invention, comprising a base 111, a housing 120, lead grooves 140, first roller sets 150 and air cylinders (actuating devices) 160. A stage 112 is disposed on the base 111 supporting a substrate 113. The housing 120 is disposed on the base 111, and forms a chamber 114 with the base 111. The stage 112 and the substrate 113 are received in the chamber 114. An exhaust pipe 130 is disposed on the housing 120 extending into the chamber 114 for exhausting air therefrom. The actuating devices 160 are disposed on the base 111. The first roller sets 150 are disposed on the actuating devices 160. The lead grooves are disposed on two sides of the housing 114 corresponding to the first roller sets 150.
With reference to
c is a side view of the low-pressure process apparatus 100 when the housing 120 is in the second position. Each first roller set 150 comprises a supporting element 151 and a plurality of rollers 152. The rollers 152 are disposed on the supporting element 151. The supporting element 151 contacts the actuating device 160.
With reference to
a shows the low-pressure process apparatus 100 of the invention disposed in substrate process equipment 300. The substrate process equipment 300 comprises a plurality of stockers 310, a cleaning unit (first process apparatus) 320, a photoresist coating apparatus (second process apparatus) 330, low-pressure process apparatus 100, an exposure unit 340 and robots 350, wherein the cleaning unit (first process apparatus) 320, the photoresist coating apparatus (second process apparatus) 330, and the low-pressure process apparatus 100 are arranged along a second horizontal direction x. With reference to
The housing 120 of the invention is detached and removed from the base 111 to be cleaned. Thus, when the original housing (first housing) is cleaned, another housing (second housing) can be disposed on the base 111 to continue the low-pressure process. Shutdown time of the low-pressure process apparatus is thus shortened, and yield and cost are conserved.
The low-pressure process apparatus 100 of the invention can be utilized drying organic solvents, such as photoresist (for example, resin).
With reference to
a shows a low-pressure process apparatus 100′ of a second embodiment of the invention, wherein the housing 120′ comprises a gate 121 disposed on a back side thereof. Thus, in the second embodiment, when the robot accesses the substrate 113, the housing 120′ is not raised. With reference to
While the invention has been described by way of example and in terms of preferred embodiment, it is to be understood that the invention is not limited thereto. To the contrary, it is intended to cover various modifications and similar arrangements (as would be apparent to those skilled in the art). Therefore, the scope of the appended claims should be accorded the broadest interpretation so as to encompass all such modifications and similar arrangements.
Number | Date | Country | Kind |
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94146971 | Dec 2005 | TW | national |
This present application is a divisional application of and claims priority from U.S. patent application Ser. No. 11/421,501, filed Jun. 1, 2006, the content of which is hereby incorporated by reference in its entirety.
Number | Date | Country | |
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Parent | 11421501 | Jun 2006 | US |
Child | 13085209 | US |