Claims
- 1. A multilayer interconnect tape for interconnecting bond pads of a bare semiconductor die to a substrate, said interconnect tape comprising:
a first layer of insulative film having a first surface and a second surface; a second layer of conductive metallic material formed on at least a portion of said first surface of said first layer of insulative film, said second layer of conductive metallic material including a plurality of leads, each lead of said plurality of leads having a first bent end for contacting at least one bond pad of said bond pads of said bare semiconductor die and having a second end for connection to said substrate.
- 2. The interconnect tape of claim 1, wherein said second layer of conductive metallic material comprises one of a metal and an alloy thereof.
- 3. The interconnect tape of claim 1, further comprising:
a resilient member for resiliently engaging a portion of said interconnect tape with said bond pads of said bare semiconductor die, said resilient member including one of an elastomeric member located on at least a portion of said first layer of insulative film, a bendable extension of an apparatus holding said interconnect tape, and a resilient first layer of insulative film.
- 4. The interconnect tape of claim 1, further comprising:
a third layer of conductive material formed on at least a portion of said second surface of said first layer of insulative film extending past said second layer of metallic conductive material for contacting said bond pads of said bare semiconductor die.
- 5. A multilayer tape for interconnecting bond pads of a bare semiconductor die to a substrate, said tape comprising:
a first layer of insulative film having a first surface and a second surface; a second layer of conductive metallic material formed on at least a portion of said first surface of said first layer of insulative film, said second layer of conductive metallic material including a plurality of leads, each lead of said plurality of leads having a first bent end for contacting at least one bond pad of said bond pads of said bare semiconductor die and having a second end for connection to said substrate.
- 6. The tape of claim 1, wherein said second layer of conductive metallic material comprises one of a metal and an alloy thereof.
- 7. The tape of claim 1, further comprising:
a resilient member for resiliently engaging a portion of said interconnect tape with said bond pads of said bare semiconductor die, said resilient member including one of an elastomeric member located on at least a portion of said first layer of insulative film, a bendable extension of an apparatus holding said interconnect tape, and a resilient first layer of insulative film.
- 8. The tape of claim 1, further comprising:
a third layer of conductive material formed on at least a portion of said second surface of said first layer of insulative film extending past said second layer of metallic conductive material for contacting said bond pads of said bare semiconductor die.
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This application is a divisional of application Serial No. 10/158,979, filed May 30, 2002, pending, which is a continuation of application Ser. No. 09/876,805, filed Jun. 7, 2001, now U.S. Pat. No. 6,478,627, issued Nov. 12, 2002, which is a continuation of application Ser. No. 09/487,935, filed Jan. 20, 2000, now U.S. Pat. No. 6,319,065 B1, issued Nov. 20, 2001, which is a continuation of application Ser. No. 09/072,260, filed May 4, 1998, now U.S. Pat. No. 6,089,920, issued Jul. 18, 2000.
Divisions (1)
|
Number |
Date |
Country |
Parent |
10158979 |
May 2002 |
US |
Child |
10401052 |
Mar 2003 |
US |
Continuations (3)
|
Number |
Date |
Country |
Parent |
09876805 |
Jun 2001 |
US |
Child |
10158979 |
May 2002 |
US |
Parent |
09487935 |
Jan 2000 |
US |
Child |
09876805 |
Jun 2001 |
US |
Parent |
09072260 |
May 1998 |
US |
Child |
09487935 |
Jan 2000 |
US |